A substrate processing chamber has a substrate support to support a substrate, and an exhaust conduit about the substrate support. A first process gas distributor directs a first process gas, such as a non-reactive gas, about the substrate perimeter and toward the exhaust conduit at a first flow rate...http://www.google.com.au/patents/US6676760?utm_source=gb-gplus-sharePatent US6676760 - Process chamber having multiple gas distributors and method
