Chemical mechanical polisher is disclosed. A polishing slurry stored in a polishing slurry tank, used in this polishing contains a solvent and polishing particles dispersed in the solvent. The polishing particles are selected from silicon nitride, silicon carbide, and graphite. The material to be polished...http://www.google.com.au/patents/US6069083?utm_source=gb-gplus-sharePatent US6069083 - Polishing method, semiconductor device fabrication method, and semiconductor fabrication apparatus
