An exposure apparatus includes an optical unit which defines a first exposure area and a second exposure area at different positions in a first direction and which radiates exposure light beams onto the first and second exposure areas respectively; and a first movement system which moves the first exposure...http://www.google.com.au/patents/US7782442?utm_source=gb-gplus-sharePatent US7782442 - Exposure apparatus, exposure method, projection optical system and device producing method
