A method of fabricating a flash memory cell is provided. The method includes providing a substrate and forming a patterned mask layer over the substrate. Using the patterned mask layer as an etching mask, the substrate is etched to form a trench. Thereafter, a first dielectric layer is formed over the...http://www.google.com.au/patents/US6972260?utm_source=gb-gplus-sharePatent US6972260 - Method of fabricating flash memory cell
