Embodiments generally provide an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool). In one embodiment, the cluster tool is adapted to perform a track lithography process in which a photosensitive material is applied to a substrate, patterned...http://www.google.com.au/patents/US7743728?utm_source=gb-gplus-sharePatent US7743728 - Cluster tool architecture for processing a substrate
