A plasma processing apparatus and a plasma processing method preferably used when processing a wafer by means of plasma etching, able to prevent contamination of a wafer or a chamber. The plasma processing apparatus converts a process gas into plasma, sprays the process gas from a spray nozzle 24a to...http://www.google.com.au/patents/US20030176069?utm_source=gb-gplus-sharePatent US20030176069 - Plasma processing apparatus and plasma processing method
