A method for attenuating within a microelectronics fabrication a standing wave photoexposure of a photoresist layer formed upon a reflective layer, and a microelectronics fabrication employed within the method. To practice the method, there is first provided a substrate employed within a microelectronics...http://www.google.com.au/patents/US5945255?utm_source=gb-gplus-sharePatent US5945255 - Birefringent interlayer for attenuating standing wave photoexposure of a photoresist layer formed over a reflective layer
