Structures and methods for preventing fluorine diffusion from a fluorinated dielectric material having a low dielectric constant are disclosed. Various fluorine diffusion barriers are described, each of which comprises doped or undoped silicon in combination with tantalum, tantalum nitride, tantalum...http://www.google.com.au/patents/US6818990?utm_source=gb-gplus-sharePatent US6818990 - Fluorine diffusion barriers for fluorinated dielectrics in integrated circuits
