A method and apparatus for efficiently heating for instance a semiconductor wafer or reticle substrate in either vacuum or air, by exposing the wafer or reticle to radiation whose spectrum is such that it includes only wavelengths which have been determined to be efficiently absorbed by the material...http://www.google.com.au/patents/US5954982?utm_source=gb-gplus-sharePatent US5954982 - Method and apparatus for efficiently heating semiconductor wafers or reticles
