An adjustable, in-situ photolithography process is taught, where incident exposure light is passed through two polarizers; the first polarizer capable of altering its polarization direction, during exposure, relative to the polarization direction of the second polarizer, in order to enhance the contrast...http://www.google.com.au/patents/US6163367?utm_source=gb-gplus-sharePatent US6163367 - Apparatus and method for in-situ adjustment of light transmission in a photolithography process
