This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing...http://www.google.com.au/patents/US6563586?utm_source=gb-gplus-sharePatent US6563586 - Wafer metrology apparatus and method
