WO2016206708A1

WO2016206708A1 - Coating chamber

Info

Publication number: WO2016206708A1
Application number: PCT/EP2015/063937
Authority: WO
Inventors: Felix MASSA; Tobias ZENGER
Original assignee: Ev Group E. Thallner Gmbh
Priority date: 2015-06-22
Filing date: 2015-06-22
Publication date: 2016-12-29

Abstract

The invention relates to a coating chamber, a mask for said coating chamber, a processing system comprising said coating chamber, and a system for coating substrates.

Description

coating chamber

Description

The production of integrated components such as circuits, which are used as logic devices, microfluidic devices, MEMS devices, filters,

Light-emitting diodes etc. take place on substrates. In the semiconductor industry, the semiconductor components, also called chips, are produced on or in the substrates.

Substrates are preferably wafers. Wafers are standardized substrates with well-defined, standardized diameters. However, the substrates may generally have any shape. The diameters of the substrates may generally be of any size, but most often have one of the standard diameters of 1, 2, 3, 4, 5 inches and 150, 200, 300 or 450 mm, corresponding to 6, 8, 10, 12 or 18 inches.

Furthermore, as substrates, arbitrarily shaped pieces or fragments, in particular of wafers, should be understood. As substrates are

in particular square objects with edge lengths, in particular greater than 10 mm, greater than 50 mm, in a preferred variant with edge lengths greater than 100 mm, in a further preferred variant greater than 200 mm, in a further preferred variant greater than 280 mm. In the further course of the description is generally spoken of substrates. In particular, the invention relate

Embodiments, however, predominantly on wafers.

The semiconductor industry employs a variety of technologies known to those skilled in the art for processing the substrates.

One of these technologies serves to provide the substrates with a functional layer or layer sequence, which is referred to as coating.

In the further course is generally spoken by layers, mutatis mutandis, but should also be understood Schtchtfolgen.

The coatings can be produced in a variety of ways and applied to the substrate. Physical processes such as vapor deposition, sputtering or physical and chemical deposition are used, such as chemical vapor deposition (CVD), plasma assisted chemical vapor deposition (PECVD), physical vapor deposition (PVD). In addition to these methods of thin-film technology, coatings by means of dipping, spraying and spin-coating on the substrate surfaces are widespread.

The equipment which produces the coating is called

Coating plants referred. The coating operations are described as methods that are guided by recipes.

Recipes are optimized value collections of parameters that are in functional or procedural context. The use of recipes allows a reproducibility of To ensure production processes. This reproducibility of the results is understood among other things as quality.

For the quality of the coating, features must be defined and subdivided.

Quality criteria for all coating processes as well as for the

exporting coating systems include the

Uniformity (homogeneity) of the obtained coating, layer thickness and freedom from defects of the produced layer.

The quality criteria can be subdivided, for example, into three generic terms: input, process and output characteristics.

The input features include, for example, all substrate parameters, non-changeable machine parameters, non-influenceable

Environmental conditions such as the local gravitational constant at the site.

Process characteristics are all features that relate to the application of the coating on the substrate: for example, substrate preparation and coating material preparation, the application as a process itself and the aftertreatment of the substrate until the next

Processing step.

The starting characteristics are all features that have changed the substrate by means of coating process, be it energetic, material changes or the information content of the substrate, which is coded, for example, in the structural geometry (s). The achievement of the quality criteria requires an interaction of all

Input and process features ahead so that the output characteristics are reproducibly achieved. This interaction is thus on the part of the coating system, the process and the used

Materials (layer and substrate, plant materials) and, for example, substrate quality, substrate material, cleanliness,

Characterized environmental conditions.

Current coating plants, in particular for lithography or for impregnation, in particular for nanoimprinten, have several coating methods which are realized by suitable technical measures. These are the spin coating and the

Spray coating, as well as the plasma-assisted variants of the above coating method.

In lithography, lacquers or other materials are generally applied to the substrates. But coatings are possible with any, target-oriented materials or material mixtures.

The process features are also understood as process features and used synonymously.

The general method, which achieves the coating of substrates and can be carried out by means of coating systems, consists essentially of the following substeps, wherein known

Subdivisions of the sub-steps are assumed as general knowledge of the skilled person.

In a recipe, the process characteristics are targeted

summarized, the sub-steps created in a meaningful combination. The Recipes can be provided both as instruction sets in machine-understandable form or for the operator. The execution of the recipe to implement the process characteristics, which on the

Coating systems is done, is described here. Preparatory process steps will be omitted here.

In the first general step, the recipe is loaded. In the second general step, the substrate is loaded or at several

simultaneously treated substrates all substrates are loaded. For the general method, the number of substrates is irrelevant, so is still spoken of the substrate; however, it is analogously the plural form also included.

In the third general step, the dispensing of the coating material takes place. In this step, a movement, in particular a rotation of the substrate holder (chuck) irrelevant.

In spray coating at the same time the uniform distribution of the coating material takes place in this process step.

In the fourth, optional general step, the coating material for achieving the uniformity of the layer thickness is spun on and excess coating material is spun off. There is

Coating operations which require a re-application of the material, mutatis mutandis, the general steps three and four are carried out again.

In the fifth method step, the substrate is removed from the

Coating chamber removed and processed further. In the sixth, optional process step, the coating chamber is cleaned of the residues and deposits of the coating material.

One of the problems of the current coating systems is that the particles produced during spraying or spin-coating contaminate large portions of the coating chamber. On the one hand, this is detrimental to the throughput of the plant with increased cleaning times and associated reduced productive times, on the other hand, the flow properties in the chamber are thereby adversely affected in a non-reproducible manner, because the photoresist residues as deposits flow cross-sections and surface roughness

change.

The changes in the flow cross sections or surface roughnesses are particularly disadvantageous as dynamic processes, since the local gas concentration of the solvent and the flow conditions in the chamber atmosphere are different depending on the solvent content of the layer or splash produced, whereby the quality of the coating is adversely affected.

It is therefore the object of the present invention to eliminate the disadvantages of the prior art and in particular to increase the throughput of the coating chamber or the system, to reduce cleaning times, to increase productive times and to improve the quality of the coating.

This object is achieved with the objects according to the invention according to the independent claims. Advantageous developments of the invention are specified in the subclaims. In the context of the invention, all combinations of at least two of in the description, the claims and / or the figures given characteristics. For specified value ranges, values lying within the stated limits should also be disclosed as limit values and may be claimed in any combination.

An article according to the invention relates to a coating chamber, in particular a coating chamber, for coating a substrate, in particular a wafer, comprising a chamber opening for loading and / or unloading the coating chamber, wherein the

Coating chamber has a diaphragm, in particular an iris, for at least partially closing the chamber opening.

Another object of the invention relates to a diaphragm for a, in particular according to the invention, coating chamber, comprising a, in particular central, preferably circular, aperture and

at least one movable, in particular rotatable, lamella for at least partially covering the aperture.

Another object of the invention relates to a

Processing plant for processing substrates, in particular wafers, with a, in particular according to the invention, coating chamber, wherein the coating chamber can be at least partially sealed off by a, in particular according to the invention, aperture of other parts of the system.

Another object of the invention relates to a method for coating a substrate, in particular wafer, with the following steps, in particular with the following sequence:

a) loading a, in particular according to the invention, coating chamber with a substrate through a chamber opening in the Coating chamber;

b) at least partially closing the chamber opening by a, in particular according to the invention, aperture;

c) applying a coating material to the substrate within the coating chamber;

d) at least partially releasing the chamber opening through the panel; e) removal of the coated substrate from the coating chamber.

It is also conceivable that the two steps b) and c) are reversed, so that first applied the coating material and then the shutter is closed.

The essence of the invention relates in particular to a coating chamber (also referred to below as chamber for short), in particular a coating chamber

Belackerkammer, which with a diaphragm, in particular continuously and / or regulated, from the rest of the system, at least partially,

can be foreclosed to temporarily create an atmosphere

Coating, in particular coating, to produce and / or to avoid spatter in the other parts of the system and / or the chamber geometry and / or the chamber volume targeted, in particular on

different substrate sizes, set.

A main advantage of the invention is in particular the increased quality of the coating of substrates due to the increased reproducibility of the coating process.

In a preferred embodiment, the diaphragm, in particular continuously and / or automatically, is configured so adjustable that the effective size of the opening of the coating chamber is variable, in particular as desired, preferably continuously, through the diaphragm can be adjusted. The effective size of the chamber opening or the effective chamber opening is that part of the chamber opening which is or will be released from the panel, which is therefore not covered by the panel or slats. As a result, in particular, the conditions in the coating chamber (process conditions) can be adjusted in an efficient manner exactly, and in particular continuously, as desired, and in particular the quality of the coating can be improved. In addition, the effective chamber opening can be adapted as needed particularly well to the desired size eg for loading, for coating, for spinning, etc. This process times can be reduced in particular.

In another preferred embodiment, the adjustment of the diaphragm is controllable by a, in particular closed, control loop. Thus, the conditions can be optimally adjusted within the coating chamber, which in particular the quality of the

Coating can be optimized. In particular, in the

Control loop at least one, in particular arranged in the coating chamber, sensor be arranged, in particular an environmental sensor for measuring temperatures, gas, solvent concentrations, flow velocities, and / or rotational velocities of currents in the coating chamber, thereby advantageously measured values, with sensors, for example in the Coating chamber can be used to adjust the optimal size of the opening of the coating chamber. This makes it even better possible to have the optimal process conditions within the

Adjust coating chamber.

In particular, the adjustability of a solvent concentration in the coating chamber with, in particular continuously and / or automatic, adjustable, aperture, especially in conjunction with a closed loop, leads to better manageable and

adjustable process conditions and thus to a better

Coating quality.

In particular, at least one sensor is arranged in the control loop, for example an environment sensor which measures, for example, temperatures, gas and / or solvent concentrations, flow velocities, rotational speed of the flow, etc. in the coating chamber. By influencing the flow conditions in the

Coating chamber by means of open, partially open or close or partially close the aperture, which can preferably be automated and / or continuously, should constant

Environmental conditions for the coating are produced.

The data of the sensor are processed, evaluated, corrected (eg.

Dead times or delays considered, random

Controller fluctuations, interference signals eliminated) and output as a control signal to the aperture.

The control signal is fed to the diaphragm, in particular an actuator, which is operated electronically, electrically, hydraulically and / or pneumatically. The actuator generates the adjusting movement of the diaphragm in order to achieve the required position or the desired state of the diaphragm and / or to approach and / or reach the target value by means of a movement sequence. Then a new control cycle can be started analogously.

Another advantage is the closable aperture in the protection of Entire plant from splashes, especially paint splashes, and / or unwanted deposits from a spray in the

Coating chamber, wherein the influence of the flow field in the chamber and / or the closure of the chamber also considered, in particular can be considered simultaneously in the control process.

In particular, the diaphragm for the substances used in the chamber, a bead-off surface property, ie low surface adhesion, have. The aperture can for this purpose have the largest possible contact angle. Thereby, it is advantageously possible to keep the aperture as possible of unwanted impurities free.

Furthermore, the diaphragm may in particular consist of functional materials which in the given vapors, droplets and

Aerosol atmosphere of the chamber are inert, especially not

are corrosive.

In particular, the coating chamber contains all components which are necessary for a substrate coating and which are known to the person skilled in the art in order to fulfill the function

rotatable or stationary substrate chuck, a holding device for the substrate or for the substrates, drains, and suction,

Dosing devices and Reinigungsvor-directions and / or

Sensors be contained in the chamber.

The aperture of the coating chamber is preferably a cover ring, which in a preferred embodiment may be formed as a one-piece ring, in a further preferred embodiment as a one-time split ring, in another embodiment as a multiple-split ring. In particular, the diaphragm can be designed as an iris diaphragm. This is advantageous a particularly efficient control of the diaphragm or the

Closing and opening achievable. Alternatively, the aperture as

Slit diaphragm be formed.

The main function of the diaphragm is in particular, the

Separate coating chamber from the other parts of the system and / or limit the chamber volume. The separation is intended to prevent the escape of particles, splashes, aerosols, vapors, gases,

Prevent solvents from entering the chamber so that they do not get outside the coating chamber to other dividers in the system. Another essential function of the diaphragm according to the invention is the achievement of a defined chamber atmosphere, in particular by means of, at least in part, closing the chamber opening

Dosing device on procedural ways. A defined chamber atmosphere can increase the conformity of the applied layer.

The chamber atmosphere can in particular over the contained

Gas concentrations and / or liquid concentrations are characterized. The concentrations in the chamber are between 0% to 100%, preferably between 25% -10%, even more preferably between 50% -100%, more preferably between 75% -100%, most preferably between 90% -100%, im most preferred case between 95% - 100%. In particular, the listed percentages relate in each case to the saturated states of the individual, the atmosphere-generating gases and / or vapors and / or mist. These characteristic values are known to the person skilled in the art, for example. from the pressure-temperature state diagrams known. The control of the chamber atmosphere can be adjusted in a preferred embodiment according to the invention via a gas purging. In a further preferred embodiment of the invention, the atmosphere within the coating chamber by a

Exhaust air control / regulation are set. In another

According to the invention preferred embodiment, the setting of the chamber atmosphere via a combination of a gas supply and / or liquid supply and / or exhaust air control / regulation is adjustable.

A further preferred embodiment according to the invention can

additionally have corresponding liquid reservoirs that the

Surface of the liquid and / or a liquid mixture

enlarge and thus influence the atmosphere by evaporation. A further embodiment may have a temperature-controlled and / or regulated heated reservoir for targeted evaporation.

The concentrations of the substances in the chamber atmosphere are in particular temperature-dependent. The temperature within the chamber is between 10 ° C and 500 ° C, preferably between 10 ° C and 400 ° C, more preferably between 10 ° C and 300 ° C, most preferably between 10 ° C and 200 ° C most preferably between 1 0 ° C and 100 ° C.

The temperature of the sample holder (Engl, chuck) can also be the

Influence coating results. The sample holder can open

Temperatures greater than 10 ° C, preferably greater than 20 ° C, more preferably greater than 25 ° C, even more preferably greater than 50 ° C, more preferably greater than 100 ° C, most preferably greater than 200 ° C, most preferably greater than 300 ° C are heated. The temperature of the sample holder can be set to an error of less than 10%, more preferably less than 5%, even more preferably less than 1%, most preferably less than 0.5%, ideally 0% and stable being held. The errors can be considered locally and / or temporally.

In particular, the diaphragm can be moved relative to the sample holder, in particular toward the sample holder, whereby the diaphragm and / or the chamber and / or the chuck can be moved. The goal of this movement is in particular the process-related reduction or minimization of the distance between the diaphragm and the substrate surface to be coated.

In a preferred embodiment, the diaphragm has at least one movable, in particular drehb are. Lamel! e for at least partially closing the chamber opening, wherein the coating chamber has in particular a plurality of at least partially overlapping lamellae. By the movable blade or lamellae, the effective chamber opening can be adjusted very precisely. Preferably, the aperture has more than 2, more preferably more than 3, even more preferably more than 4, more preferably more than 5, most preferably more than 6, even more preferably more than 7, even more preferably more than 8, most preferably more than 10 lamellae on.

In a further embodiment of the invention, the diaphragm may have a fixed blade in another invention

Embodiment, the diaphragm may have a fixed and exactly one movable blade. In a further preferred embodiment of the invention, the aperture may be a solid and more than 1, preferably more than 2, more preferably more than 4, most preferably more than 6, even more preferably more than 8, most preferably more than 10, on

Most preferably have more than 12 movable blades. There may be molds with more than one fixed lamella, in particular more than 2, more preferably more than 4, most preferably more than 6, most preferably more than 8, most preferably more than 10 solid lamellae are used. In another preferred invention

Embodiment, all the slats of the diaphragm can be designed to be movable. The number of slats depends in particular on the shape of the desired opening or after the approach of a circle.

In particular, the at least one lamella can be arched outward (ie away from the interior of the chamber) or inwards (ie toward the interior of the chamber). Alternatively, the at least one lamella may be flat.

In addition, the panel can in particular open inward, outward or in a plane.

The diaphragm, in particular a retaining ring or the lamella (s) of the diaphragm (or the iris diaphragm), consists or consist in particular of:

• Metal and its alloys, especially from

o steel and / or its alloys,

o aluminum and / or its alloys,

o CMOS-compatible metals and alloys, virtually free of: Cu, Au, Ag, Pb, V,

• Semiconductor materials, in particular from

o silicon and / or its alloys,

• polymers, especially from

o thermoplastics,

o thermosets,

o amorphous polymers,

o chlorinated or fluorinated or other copolymers • glasses, in particular

O oxide glasses, in particular

■ phosphatic glasses,

«Silicate glass, eg quartz glass, aluminosilicate glass, lead silicate glass and alkali earth alkali silicate glass,

■ borate glasses or borosilicate glasses.

• Ceramics.

In a preferred embodiment, the functionally relevant parts of the diaphragm are made of one of the following materials

• Polymer, in particular

o Elastomer

• metal

• metal alloy

• Semiconductor material

• Composite material

The material from which the panel is made, can

• amorphous

• semi-crystalline or

• crystalline

be.

The tensile strength of the material is in particular greater than 10 Pa, preferably greater than 100 Pa, more preferably greater than 1 kPa, most preferably greater than 1 MPa, most preferably greater than 1 GPa.

In particular, the material of the diaphragm can be uncoated. In a preferred embodiment, the material of the diaphragm with one or more functional layers, hereinafter also referred to as coating, be provided. The advantage of the coating lies in the reduction of the adhesion of the media present in the Beschtchtungskammer and the prevention of contamination of the aperture. In addition, the

Coating a reduction in the friction of the diaphragm, achieving a material compatibility and / or an acid or

Alkali resistance allow.

The coating is preferably a

Non-stick coating (anti-sticking layer). The non-stick property of a surface is preferably given by the energy necessary to separate the coated surface from a second surface. The energy is given in J / m2. The energy per unit area is less than 2.5 J / m2, preferably less than 0.1 J / m2, more preferably less than 0.01 J / m2 _} , most preferably less than 0.001 J / m2, most preferably less than 0.0001 J / m2, most preferably less than 0.00001 J / m2.

In a further embodiment, the coating chamber for achieving, for example, a low cost target without

Self-cleaning functionality can be applied.

In a preferred embodiment, the chamber has a,

in particular automated _} (in particular self) cleaning device for cleaning the aperture or for removing impurities on the panel. As a result, it is advantageously possible to prevent the contamination of the substrate or of the coating of the substrate, for example due to the dripping-in of impurities. In addition, the durability of the aperture is extended. In addition, the aperture does not need to be cleaned be exchanged, so that the throughput can be increased, because times of stagnation of the chamber can be avoided in particular for maintenance.

The cleaning device preferably comprises a, in particular rotatable, scraper, in particular a scraper ring, and / or at least one, in particular pivotable and / or translational within the coating chamber (3) movable, cleaning nozzle for the removal of impurities on the panel.

The self-cleaning is in a preferred embodiment with a Abperl effect with a hydrophobicity with preferably higher

Contact angle as 20 degrees, more preferably greater than 30 degrees, most preferably greater than 40 degrees, even more preferably greater than 60 degrees, most preferably greater than 70 degrees, most preferably reaches greater than 95 degrees.

In particular, the scraper can be operated mechanically, more preferably pneumatically, even more preferably electrically and / or electronically, by the operator and / or by prescription, in particular automatically.

In a particularly preferred embodiment, a nozzle system or nozzle systems for cleaning the diaphragm can be provided. The nozzle or the nozzles can aim at a contaminated side or location of the diaphragm and remove with a cleaning fluid, for example, residues of photoresist. The cleaning fluid may in particular be adapted to the applied photoresists. The following solvents are conceivable:

* Water, in particular

o Di-water

• Organic solvents, in particular o isopropanol (IPA)

o mesitylene

o PG EA

• Inorganic solvents

• Mixture of the above solvents

In a further embodiment, the cleaning nozzles or the nozzle system can clean the panel by means of gases and / or liquids, in particular with a high flow rate. In particular, CDA, (liquefied) CO 2, N 2, a gas mixture and / or a vapor / solvent mixture can be used for this purpose.

In a further embodiment of the invention, the diaphragm can be removed and cleaned on a dedicated cleaning station. In a preferred embodiment, in the

Coating system multiple panels are used, which are cached after cleaning, so that the functionality of the coating chamber is maintained during the cleaning of a panel, as decontaminated panels are available for replacement as needed.

In another preferred embodiment of the invention, the cleaning and / or replacement of the aperture is automated.

In a further embodiment of the invention, the

Cleaning functionality from a combination of the already

described nozzle system and the scraper system.

In another embodiment of the invention, the aperture for providing the functionality may be discretely adjustable between the fully opened and fully closed states. so that the aperture can be opened or closed in a manner known to those skilled in the art.

The residual opening of the discretely controllable steps in the opening or closing, in a preferred embodiment, a residual opening of greater than 1 mm, more preferably greater than 1/8 inches or 3 mm, more preferably greater than 50 mm, even more preferably greater than 200 mm most preferably greater than 350 mm, most preferably greater than 500 mm, in particular corresponding to the wafer sizes described in the preceding paragraphs of this patent.

In an alternative preferred embodiment of the invention, the shutter may continuously assume any state between the fully open and fully closed states.

This embodiment of the invention can be carried out both manually and automatically. The securing of the position can be done, for example, by suitable fixation measures such as self-locking, brake, locking mechanism or arrester (engage, tighten, magnetic clamping). Furthermore, if present, the drive of the aperture for position change can be used for the fixation.

The manual embodiment is preset by a device operator according to the recipe. The automated, preferred

Embodiment of the invention is controlled in a manner known in the art by means of a system consisting of measuring element, control element and actuator.

The opening or closing speed of the shutter is between 1 mm / s to 450 mm / s, preferably between 1 mm / s and 300 mm / s, still more preferably between 1 mm / s and 200 mm / s, most preferably between 1 mm / s and 100 mm / s, most preferably between 1 mm / s and 50 mm / s, in particular irrespective of whether they are to be closed

Coating chamber is completely or incompletely closed. As a result, a comparatively rapid adjustment of the desired size of the opening is advantageously possible, so that the coating process can take place comparatively quickly.

In particular, the diaphragm can be firmly connected, in particular with a retaining ring, to an edge of the chamber opening. This results in advantageous a particularly stable connection and a particularly good utilization of the chamber opening for the effective chamber opening.

Alternatively, the diaphragm can in particular be rotatable, in particular with the retaining ring, mounted on the edge of the chamber opening. The

Turning speed is given in revolutions per minute (rounds per minute, rpm). In particular, the aperture is more than 1 rpm, more preferably more than 10 rpm, even more preferably more than 100 rpm, even more preferably more than 500 rpm, even more preferably more than 1000 rpm, even more preferably more than 2500 rpm is more preferably rotatable at more than 5000 rpm. This can be advantageous one

Relative movement between the diaphragm and the substrate, the

Cleaning device, etc. can be achieved, so that for example a better cleaning can be achieved.

According to another exemplary embodiment, the

Coating chamber formed such that the change of

Opening the aperture or the coating chamber changes the chamber volume, in particular between 1 liter and 20 liters. This can be done, for example, with a curved aperture. In addition, the Flow conditions are changed to a desired state, so that, for example, turbulence and other turbulence can be avoided. Another advantage of this embodiment is seen in the spray coating. The distance between the

closed aperture of the substrate chosen so that the liquid

Components which are over the wafer on the panel, solidify there and do not drip onto the substrate causing defects in the coating.

According to a further preferred embodiment, the diaphragm is designed such that the chamber is optimized for volume reduction, wherein the enclosed volume remains virtually constant. Thus, the free gas volume between the substrate and the diaphragm is set to an optimum. This optimum is made up of the factors

Flow conditions, speeds when spinning, gas or

Solvent composition and concentration in the

Coating chamber, coating method, coating recipe, etc. together.

According to another exemplary embodiment, the

Coating chamber formed such that the aperture as a functional group during the coating in the coating chamber

clamped and / or otherwise secured. Thus, except the adjusting movement of the opening and / or closing of the aperture no

Movement necessary. This embodiment may be advantageous in particular in the case of spray painting and / or at low chucking speeds.

According to another exemplary embodiment, the

Coating chamber formed such that the aperture as a functional Group during the coating to the sample holder synchronized co-rotated and / or with one of the speed of the sample holder

different speeds co-rotated.

The rotational speeds of the substrate and / or the diaphragm may in particular be more than 1 rpm, more preferably more than 10 rpm, 100 rpm, 500 rpm, 1 000 rpm, 1500 rpm, 2000 rpm, 2500 rpm, 3000 rpm, 3500 rpm, 4000 rpm, 5000 rpm, 10000 rpm or 20000 rpm.

So that the coating system can achieve corresponding process results, in particular not only the speed but also the

Angular acceleration of central importance. The angular acceleration is a core parameter, in particular for the uniformity or avoidance of the formation of a bead edge. In particular, the angular acceleration is more than 1 rpm / s, 1000 rpm / s, 5000 rpm / s, 10000 rpm / s, 20000 rpm / s or 30 000 rpm / s.

Regardless of this rotation, the function-relevant movement (opening, partially opening, closing, partial closing) can also be recipe-controlled and / or regulated in the diaphragm.

The application of the medium (coating material) can already be done with almost completely closed aperture, so advantageously a waiting time to drive in particular a loading arm out of the chamber and / or close a lid omitted.

The rotations of the diaphragm and / or the sample holder are understood in the context of this description in the same or opposite rotation as co-rotated. As drives for the rotation are direct drives and / or drives with gearbox in question. According to a further exemplary embodiment, the coating chamber is designed such that the diaphragm

Complete coating chamber, virtually gas-tight, can complete. The main advantage of this embodiment lies in the better control of the chamber atmosphere and the reduced odor, spatter and / or pollutant contamination of the other parts of the coating system.

According to another exemplary embodiment, the

Coating chamber formed such that the aperture in the fully closed state, the coating chamber partially covers and thereby, for example, one, in particular continuous and / or bilateral, suction of the solvent granted. This embodiment is particularly useful for very low flash point solvents,

Carcinogenic, tetragenen and / or otherwise unhealthy photoresists or coating precursors advantageous.

According to another exemplary embodiment, the

Coating chamber formed such that the aperture itself has the necessary for the performance of facilities. This can be advantageous in a reduced design.

According to another exemplary embodiment, the

Coating chamber formed such that the panel at least two, in particular stacked and / or stacked one behind the other,

Single screens includes. This allows the effective opening to be set even more precisely. The individual apertures can be designed according to the invention. Reference is made to the above statements. The individual apertures can in particular be individually adjustable. The number of individual apertures can be greater than 2, preferably greater than 3,

more preferably greater than 4, more preferably greater than 5, more preferably greater than 6, most preferably greater than 7, most preferably greater than 8.

Sub-tasks such as splash guard, gas-tight sealing of the chamber, light protection, in-situ sensors can be divided into different trained individual screens. The main advantage lies in the

Function separation and in the application of the same

Design principle.

According to another exemplary embodiment, the

Coating chamber formed such that the aperture is operated in a, in particular closed, control loop. The control can in particular all measurable and / or calculable parameters or their meaningful combinations such as temperature, partial pressures of

Atmosphere, saturation of the atmosphere, speed and / or

Angular acceleration of the chuck, flow rates of the gases and / or liquids used, process time. This results in better process control and thus an increase in quality.

According to another exemplary embodiment of the

Coating chamber, the aperture can be controlled and / or manually adjusted. This embodiment may be particularly advantageous in manually operated systems.

In the following, an inventive method step of opening the aperture or at least partially releasing the chamber opening through the aperture will be described. In a variant preferred according to the invention, this means the complete opening of the panel. In another In a preferred variant, the opening of the diaphragm can mean a partial opening, in particular down to the size of the substrate, in particular in such a way that the substrate can be removed from the coating chamber. In a further preferred variant, the opening of the aperture a

Simultaneous cleaning by scraper.

In the following, another method step according to the invention for closing the panel or at least partially closing the chamber opening through the panel will be described. In a preferred variant according to the invention, this may mean the practically gas-tight closing. In a further variant disclosed according to the invention, the partial closure should take place up to a flow-optimized or otherwise determined position.

Furthermore, another optional process step of cleaning the diaphragm, in particular after the coating, is described. In a variant which is preferred according to the invention, this is intended to include cleaning by means of a scraper, which takes place at the same time as the aperture is opened.

In particular, the chamber may have a ventilation device for ventilating the interior of the coating chamber, wherein the

Ventilation device is designed in particular as at least one passage and / or as at least one valve in the diaphragm, in particular in the retaining ring of the diaphragm, and / or in a chamber wall. As a result, the conditions within the chamber can be regulated even better.

In particular, special process gas can be supplied by the ventilation device into the chamber. This can be beneficial a gas / steam mixture act. The vapor is in particular solvent vapor. Advantageously, the vapor may also be an educt for reaction with the coating material. The gas and / or the gas / steam mixture are processed in a corresponding feeder and fed controlled into the chamber. such

Devices are known in the art and are not described here.

Cleaning the aperture

In an exemplary variant according to the invention, the cleaning of the diaphragm should include the following partial steps:

In a first process step, the aperture is closed.

In a second process step, solvent on one side, in another preferred variant on both sides, the diaphragm

applied, which should replace the splashes and all other deposits.

In a third optional process step, the aperture with

Solvents such as di-water, ultrapure water rinsed off. Optionally, to remove the residual particles, solvent combinations can be used to achieve Marangoni convection.

In a fourth process step, the aperture is blown off with CDA, nitrogen or another gas or gas mixture without particles and / or droplets.

In a fifth method step, the aperture is opened. In another preferred variant of the invention is intended to

Cleaning the panel include the following steps:

In a first process step, the aperture of the

Coating chamber removed.

In a second process step, the aperture is on a

Transfer cleaning station.

In the further process steps, the purification will proceed analogously to the previously described variant. After the completion of the

Cleaning process, the aperture is transferred to a storage station. The cleaned aperture is then on the

Coating chamber mounted.

coating process

A first exemplary method according to the invention for coating a substrate proceeds as follows:

In a first method step according to the invention, a recipe is started.

In a second method step according to the invention, the substrate is loaded onto a chuck in the coating chamber when the aperture is at least partially open.

In a third method step according to the invention, the diaphragm is set to a defined dispensing position. In a fourth method step according to the invention, the

Dosing of the coating agent, also called Dispense. The chuck can rotate together with the substrate.

In a fifth method step according to the invention, the diaphragm is closed.

In a sixth process step according to the invention, the spin coating of the coating agent is optionally carried out.

In a seventh method step according to the invention, the diaphragm is opened.

The eighth method step according to the invention is the removal of the substrate from the coating chamber.

As the ninth method step according to the invention, the optional

Cleaning the coating chamber performed so that then the next coating process can proceed.

A second, preferred method according to the invention proceeds as follows:

The first and second steps according to the invention are identical to those of the first method according to the invention.

In a third method step according to the invention, the diaphragm is closed.

In a fourth method step according to the invention, a defined Gas atmosphere (eg. With a defined solvent concentration) generated.

In a fifth method step according to the invention, the diaphragm is set to a defined dispensing position.

In a sixth method step according to the invention, the

In a seventh method step according to the invention, the diaphragm is closed.

In an eighth process step according to the invention, the spin coating of the coating agent is optionally carried out.

In a ninth method step according to the invention, the diaphragm is opened.

The tenth process step according to the invention is the removal of the substrate from the coating chamber.

As the eleventh method step according to the invention, the cleaning of the coating chamber is optionally carried out, so that thereafter the next

Coating process can take place.

Further advantages, features and details of the invention will become apparent from the following description of preferred embodiments and from the drawings. The following figures show schematically:

Fig. La shows schematically a diaphragm according to the invention according to a exemplary embodiment with slats in the open position dar. shows the diaphragm of Fig. La with lamellae in half closed position. shows a coating chamber according to the invention in accordance with an exemplary embodiment with an outwardly curved aperture in the closed position. Shows the coating chamber in the open position, represents a coating chamber according to the invention according to another exemplary embodiment with an inwardly curved aperture in the closed position shows the coating chamber in open position. shows a coating chamber according to the invention according to a third exemplary embodiment with a flat shutter in the closed position. Shows the coating chamber with a flat panel in the open position. schematically represents an inventive

Coating chamber according to a fourth exemplary embodiment with a diaphragm attached thereto.

Fig. 5 is the schematic illustration of an inventive Coating chamber according to a fifth exemplary embodiment with rotatable diaphragm.

Fig. 6 illustrates an exemplary diaphragm according to the invention

several individual screens.

FIG. 7 shows an exemplary block diagram according to the invention for controlling a shutter in a closed control loop.

8 shows an exemplary block diagram according to the invention for controlling a shutter in an open control chain.

Fig. 9a is an overview of another example

coating chamber according to the invention with a flat diaphragm.

Fig. 9b illustrates the coating chamber with additional

Ventilation functionality on the panel is.

Fig. 9c is another variant of the coating chamber with aperture with ventilation functionality of the chamber.

Fig. 10a illustrates an exemplary invention

Procedure for a coating of a substrate.

Fig. 10b shows another exemplary invention

Procedure for a coating of a substrate.

Fig. 10c shows another exemplary invention

Procedure for a coating of a substrate. is a partial schematic representation of another

exemplary coating chamber according to the invention with aperture and a fixed Abstreiferring. is a partial schematic representation of another

exemplary coating chamber according to the invention with fixed scraper and rotatable diaphragm. is a partial schematic representation of another

exemplary coating chamber according to the invention with rotatable scraper and rotatable diaphragm. is a partial schematic representation of another

exemplary coating chamber according to the invention with fixed aperture and rotatable scraper. is a partial schematic representation of another

exemplary coating chamber according to the invention with pivotable cleaning nozzle and fixed aperture. is a partial schematic representation of another

exemplary coating chamber according to the invention with several pivotable cleaning nozzles and fixed aperture. is a partial schematic representation of another

exemplary coating chamber according to the invention with a pivotable nozzle or nozzle system, which can be moved translationally in the chamber, and fixed aperture. Fig. 12d is a partial schematic illustration of another

exemplary coating chamber according to the invention with pivotable cleaning nozzle and rotterbarer aperture.

Fig. 12e is a partial schematic illustration of another

exemplary coating chamber according to the invention with several pivotable cleaning nozzles and rotatable diaphragm.

Fig. 12f is a partial schematic illustration of another

exemplary coating chamber according to the invention with a pivotable nozzle or nozzle system, which can be moved translationally in the chamber, and rotatable diaphragm.

In the figures, the same or components or features with the same function with the same reference numerals.

Fig. 1a represents a schematic plan view of an exemplary

Panel 2 according to the invention with four slats 1 in the fully open position. In this embodiment, the panel 2 is formed as an iris diaphragm. The panel 2 has a central circular opening 23 which can be closed by the slats 1. The slats 1 are rotatably connected via a respective rotary joint 22 with an annular retaining ring 2 1. The lamellae 1 can, in particular by a drive, not shown, are rotated via the pivot joints 22 such that the opening 23 is at least partially covered or closed by the slats 1. When the slats 1 are open, as explained below, a coating chamber 3, not shown, is accessible. This is especially the position in which a substrate is free in the coating chamber 3 can be introduced or from the

Coating chamber 3 can be removed.

Fig. Lb shows a schematic top view of the panel 2 in the half-closed position. This can in particular represent an intermediate position of the panel 2 between completely open as shown in Fig. L a and virtually gas-tight. The slats 1 are moved with a Versteümehmamsmus, not shown, so that the desired opening can be adjusted. The slats 1 partially overlap to close the opening 23. As a support of the slats 1 serves the retaining ring 21, on which the slats 1 are rotatably mounted on the pivot joints 22.

FIG. 2 a shows a schematic sectional view of an exemplary coating chamber 3 according to the invention with an aperture 2 curved outwards or with curved blades 1 in the closed position. With an outward curvature, it is meant that the panel 2 or lamellae 1 of the coating chamber 3 way arched. The diaphragm 2 is fastened with its retaining ring 21 on an edge 36 of a chamber opening 35 and completely comprises the chamber opening 35 of the coating chamber 3, which serves to load and / or discharge the coating chamber 3 with a substrate, in particular wafer. Thus, a substrate holder, not shown, including substrate in the coating chamber 3 is separated from other parts of a coating system virtually gas-tight, whereby the formation of a provided with, for example. Solvent or in another advantageous embodiment of the invention solvent mixture local atmosphere can be carried out.

FIG. 2b shows a schematic sectional view of the coating chamber 3 from FIG. 2a in the open position. In this position, the substrate is freely removable. The splash guard functionality is for those of the

Inner side of the iris I ring 1 protected areas present, the outer side l a of the iris ring 1 is the other parts of the

Coating system turned.

FIG. 2 c illustrates a coating chamber 3 according to the invention in accordance with a further exemplary embodiment with an inwardly curved diaphragm 2 or with inwardly curved blades 1 in the closed position. With inwardly curved is meant that the diaphragm 2 or blades 1 in the direction the coating chamber 3 are curved.

In this embodiment according to the invention, the iris ring lamellae 1 are concave, as seen from the coating chamber 3. With the choice of the curvature, a position, for example, the flow of splashes can be controlled.

Fig. 2d shows the coating chamber 3 of Figure 2c in an open position. In this embodiment of the invention protrude the

Iris ring blades 1 in the open position in the coating chamber 3 inside. Particularly advantageous in this embodiment is the

Combination of the curvature with the consistency of the coating chamber height in open and closed position. A change in the

Flow conditions in the chamber is possible by adjusting the slats.

FIGS. 3 a and 3 b show a schematic sectional view of a coating chamber 3 according to another example

Embodiment with a panel 2 with flat slats, wherein in Fig. 3a, the slats 1 'are schematically shown as closed and in Fig. 3b, the slats 1' as open. In this preferred Embodiment, the small footprint is particularly advantageous.

In addition, flat panels 2 are particularly suitable for stacking several panels 2 one above the other.

4 shows a schematic side view of a coating chamber 3 according to another exemplary embodiment according to the invention with a fixed diaphragm 2. An attachment 4 between diaphragm 2 and coating chamber 3 indicates the immobility of the diaphragm 2 and the coating chamber 3 during operation of the coating chamber 3. The attachment 4 can both in the aperture 2 and in the

Coating chamber 3 to be integrated. Another attachment 5 secures the local position of the coating chamber 3 in the coating anion, not shown.

5 is the schematic sectional view of a coating chamber 3 according to another exemplary embodiment of the invention with a rotatable diaphragm 2. This particularly advantageous

Embodiment includes for the rotation of the diaphragm 2 bearing elements 6, preferably acting in the axial direction of the coating chamber 3, between the diaphragm 2 and the coating chamber 3, which a

Allow rotation of the diaphragm 2 during operation. It can take place between a sample holder 7 and the aperture 2 equal and / or opposing twists. The speed of the aperture 2 can with the

Speed of the sample holder 7 synchronously done. Accordingly, they are

in particular the angular accelerations and angular velocities of said parts in magnitude and direction are the same.

This embodiment of the invention is, for example. For the targeted

Generation of turbulences with different speeds,

Angular accelerations and angular velocities in the same and / or anticonvulsive movements usable.

FIG. 6 shows a schematic sectional view of a diaphragm 2 according to another exemplary embodiment of the invention. The diaphragm 2 has 4 individual diaphragms (2 \ 2 ", 2" 2 ""). The single panels (2 \ 2 ", 2 ', 2" ") are stacked on top of each other, so one is almost

Continuous change of the airfoil is possible because several individual apertures (2 \ 2 ", 2 ^m , 2"") with their iris ring fins (1 \ 1", 1 "\ 1"") flow through the individual apertures (2 ', 2", 2 "', 2"") more exactly,

especially gentle, can adjust as a single iris.

7 shows an exemplary block diagram according to the invention for the control and / or regulation of a diaphragm 2 in a closed control loop. As is apparent to those skilled in the art, it is a control loop in the minimum configuration with actuator, displaced object aperture 2 and in the feedback path the sensors. In this presentation are control approaches, type of controller, data processing,

Energy supply, interference factors for the clarity of the presentation are not listed, since these are known in the art.

Possible control parameters can be all measurable and / or calculable parameters or their meaningful combinations such as temperature,

Partial pressures of the atmosphere, atmospheric saturation, speed and / or angular acceleration of the chuck, flow rates of the gases and / or liquids used, process time; the controlled variable may also be a control parameter and / or the distance to be adjusted of the iris ring, the speed of movement of the lamellae, the speed of the ring, the cleaning speed, the cleaning effect (determined by, for example, the change in the layer thickness on the chamber wall, etc.). 8 illustrates an exemplary block diagram according to the invention for the control of a diaphragm in an open control chain. This open form of influencing the output variable (opening diameter of the diaphragm 2, defined by the position of the lamellae 1) known to the person skilled in the art may be advantageous in particular in manual systems be used. In this case, the position of the actuator is provided, which puts them on the panel 2.

Fig. 9a is an illustration of another example

Coating chamber 3 according to the invention with a flat diaphragm 2 or planar Irisringlamellen, the different

Embodiments are shown below.

9b shows an enlargement of a schematic sectional view of another exemplary coating chamber 3 according to the invention. In this embodiment, the coating chamber 3 has at least one additional ventilation functionality 8 'on the retaining ring 21. The

Ventilation functionality 8 'may be formed as the retaining ring 21 passing through implementation and / or as a valve in the retaining ring 21.

Accordingly, the integrated ventilation or

Air purge functionality in particular by means of valves, advantageously rectifying valves, which are integrated in the retaining ring 21,

be educated.

9c shows an enlargement of a schematic sectional view of a further exemplary coating chamber 3 according to the invention. In this embodiment, the coating chamber 3 has at least one ventilation functionality 8 ", wherein in the chamber wall 3 1 of FIG

Coating chamber 3 itself at least one passage 8 "and / or The passage 8 "or the valve 8" is arranged in the upper region of the coating chamber 3, the upper region being that region of the coating chamber 3 which faces the diaphragm 2. This embodiment of the invention separates the

At the same time, this embodiment simplifies the design of the diaphragm 2 in comparison to Fig. 9b., Furthermore, the ventilation can be carried out with a special process gas and / or gas / steam mixture, not separately on their preparation will be received.

Fig. 10a shows a block diagram for an exemplary

inventive process flow for a coating of a substrate.

In a first method step according to the invention, in particular in a control unit for controlling the coating chamber 3, a recipe which, in particular, can be preset manually and / or automatically, is started. in an optional second method step according to the invention, the panel 2 is opened, in particular completely, if the panel 2 was closed.

In a third method step, a substrate to be coated, in particular a wafer, is inserted into the aperture 2 through the aperture

Coating chamber 3 loaded on a substrate holder.

In a fourth method step according to the invention, the diaphragm 2 is adjusted to a defined dispensing position by an adjusting mechanism or coating position provided. In this case, the slats 1 are adjusted so that the desired size of the opening of the panel 2 is achieved. In this case, in particular, the opening of the aperture 2 can be reduced.

In a fifth method step according to the invention, the

Dosing of the coating agent, also called Dispense. In particular, the substrate holder together with the substrate can rotate.

In a sixth method step according to the invention, the diaphragm 2 is brought by the adjusting mechanism into a coating position defined by the recipe, in particular completely closed.

In a seventh method step according to the invention, the spin coating of the coating agent is optionally carried out.

In an eighth method step according to the invention, the panel 2 is opened, in particular completely.

The ninth method step according to the invention is the removal of the substrate from the coating chamber 3 through the open panel 2.

As tenth process step according to the invention is optionally the

Cleaning the coating chamber 3 performed so that after the next coating process can proceed.

As a final inventive step, the recipe is stopped.

FIG. 10 b shows a block diagram for a further exemplary method sequence according to the invention for a coating of a substrate represents.

In a first method step according to the invention, in particular in a control unit for controlling the coating chamber 3, a recipe which can be preset in particular manually and / or automatically is started.

In an optional second method step according to the invention, the panel 2 is opened, in particular completely, if the panel 2 was closed.

In a third method step, a substrate to be coated, in particular an afer, is introduced into the aperture 2 through the opening

Coating grains 3 loaded on a substrate holder.

In a fourth method step according to the invention, the panel 2 is closed, in particular completely.

In a fifth process step according to the invention is in the

Coating 3, a defined gas atmosphere (eg. With a defined solvent concentration) generated.

In a sixth method step according to the invention, the diaphragm 2 is set by an adjusting mechanism to a defined dispensing position or coating position. In this case, the slats 1 are adjusted so that the desired size of the opening of the panel 2 is achieved. In particular, the opening of the aperture 2 can be increased.

In a seventh method step according to the invention, the Dosing of the coating agent, also called Dispense. In particular, the substrate holder together with the substrate can rotate.

In an eighth method step according to the invention, the diaphragm 2, in particular completely, is closed by the adjusting mechanism.

In a ninth method step according to the invention, the spin coating of the coating agent is optionally carried out.

In a tenth method step according to the invention, the panel 2 is opened, in particular completely.

The eleventh method step according to the invention is the removal of the

Substrate from the coating chamber 3 through the open aperture. 2

As a further method step according to the invention is optionally the

The last method step according to the invention is the stopping of the expired recipe.

FIG. 10 c illustrates a block diagram for a further exemplary method sequence according to the invention for a coating of a substrate.

Coating chamber 3 loaded on a substrate holder.

In a fourth method step according to the invention, the diaphragm 2 is set by an adjusting mechanism to a defined dispensing position or coating position. In this case, the slats 1 are adjusted so that the desired size of the opening of the panel 2 is achieved. In particular, the opening of the aperture 2 can be increased.

In a fifth method step according to the invention, the

In a sixth method step according to the invention, a defined gas atmosphere (for example with a defined solvent concentration) is produced in the coating chamber 3.

In a seventh method step according to the invention, the diaphragm 2, in particular completely, is closed by the adjusting mechanism.

In an eighth process step according to the invention, the spin coating of the coating agent is optionally carried out. In a tenth method step according to the invention, the panel 2 is opened, in particular completely.

The eleventh method step according to the invention is the removal of the

Substrate from the coating chamber 3 through the open aperture. 2

As a further method step according to the invention is optionally the

1a is a schematic partial representation of another exemplary coating chamber 3 according to the invention with diaphragm 2 and a fixed and attached to the chamber wall 31 scraper ring 9. The diaphragm 2 is with its retaining ring 21 in the region of the opening of the

Plating chamber 3 attached. The scraper ring 9 is in contact with the inside I i of the slats. 1 To fulfill the function, the aperture 2 is opened, so that the adhering impurities, remains of the

Coating material, in particular photoresist residues, or other as a result of the movement of the slats 1 are stripped by the scraper ring 9. For this function, the relative translation of the slats I of the diaphragm 2 to Abstreiferring 9 is the prerequisite. It is particularly desirable to position the scraper ring 9 near the aperture 2 in order to be able to achieve a large area as completely as possible of the slats 1 and strip.

Fig. 1 lb is a partial schematic representation of another exemplary coating chamber according to the invention 3. In this embodiment For example, as in FIG. 10 a, the coating chamber 3 has a fixed scraper ring 9 'which is fastened to the chamber wall 3 1. in the

In contrast to FIG. 1a, the diaphragm 2 or the retaining ring 21 is rotatably mounted on the chamber wall 3 1 via bearing elements 6, for example ball bearings. The storage 6 allows the rotation of the diaphragm 2 and the retaining ring 21. In this variant according to the invention is the

Relative movement, which is necessary for stripping, composed of two components. The scraper 9 'is fixed, all radii of the aperture 2 are achieved by opening or closing the aperture 2 with the scraper 9 similar to a line. The rotation of the diaphragm 2 as a second component of motion in the circumferential direction enhances the cleaning action of the scraper 9 ⁴ . Incidentally, on the

Remarks to Figure 1 l a referenced.

1 c is a schematic partial representation of another exemplary coating chamber 3 according to the invention. In this embodiment, both the wiper ring 9 "and the diaphragm 2 are rotatable

Scraper ring 9 ' ⁴ is rotatable by means of a bearing 32 on the

Chamber wall 3 1 stored.

Here, the relative movement between the scraper 9 "and the diaphragm 2 is generated in the radial direction as described above with the adjustment of the diaphragm 2. The rotation of the diaphragm 2 and of the scraper ring 9" achieves the effect in the circumferential direction and thereby improved cleaning. In this variant, an increase in the

Self-cleaning rate to be expected, which provides a significant contribution to shorten the processing time and to increase the throughput. Incidentally, reference is made to the comments on the figures II a to 1 1 b. Fig. 1 ld is a partial schematic representation of another exemplary coating chamber according to the invention 3. In this embodiment, the diaphragm 2 and the retaining ring 21 as in the figure II a fixed to the chamber wall 3 1 is connected. In addition, the scraper ring 9 "is rotatably mounted on the chamber wall 31 by means of the bearing 32 as in FIG. 11c. Here, the relative movement necessary for cleaning is generated by opening the diaphragm 2 in the radial direction, the effect in FIG

Circumferential direction is generated by means of rotation of the scraper 9 "with respect to the coating chamber 3 or the fixed diaphragm 2. Incidentally, reference is made to the explanations concerning the FIGS. 11a to 11c.

12a is a schematic partial representation of another exemplary coating chamber 3 according to the invention with a pivotable cleaning nozzle 10 and a stationary diaphragm 2. The pivotable cleaning nozzle 10 is mounted on the chamber wall 31 via a bearing 33.

A cleaning fluid is sprayed by means of the pivotable cleaning nozzle 10 in the coating chamber to the inside I i of the blades 1 of the panel 2. It is a switch between different ones

Cleaning fluids useful and possible. Thus, for example, first a solvent, or solvent mixture, are applied to the panel 2, which can then be rinsed, for example, by means of di-water. Advantageous for this embodiment is the minimization of the moving components in the system, whereby a simple structure can be made possible.

FIG. 12b is a partial schematic illustration of another exemplary coating chamber 3 according to the invention with a plurality of pivotable cleaning nozzles 10 'and a stationary diaphragm 2. These Embodiment is an extension of Fig. 12a, Here, the diaphragm 2 can be used simultaneously with different solvents or

Be sprayed solvent mixtures. In addition, by the plurality of pivotable cleaning nozzles 10 'a better

Surface uniformity of the cleaning effect can be achieved.

12c is a schematic partial representation of another exemplary coating chamber 3 according to the invention. In this embodiment, the pivotable cleaning nozzle 10 "or a corresponding nozzle system is translationally movable in the coating chamber 3 via a drive 34, wherein the diaphragm 2 is immovable Agility of the cleaning nozzle 10 "is an improved cleaning effect achievable because the aperture 2 with more uniform

Cleaning agent can be sprayed.

FIG. 12 d is a schematic partial representation of another exemplary coating chamber 3 according to the invention. In this embodiment, the cleaning nozzle 1 0 is pivotable and the diaphragm 2 is rotatably mounted on the bearing 6 as disclosed, for example, in FIG.

In this variant is to be expected with a more thorough cleaning effect, since by the rotation of the diaphragm 2 of the angle of the

Cleaning nozzle 10 less need to be adjusted. The stationary

Embodiment of the nozzle 10 also simplifies the supply of the cleaning fluid. Not shown is the variant, according to which the diaphragm 2 is stationary and the nozzle 10 or the nozzle system is rotatable.

Fig. 12e is a schematic partial view of another exemplary coating chamber 3 according to the invention. In this embodiment, the coating chamber 3 has a plurality of pivotable cleaning nozzles 10 ', with only a single one shown. In this embodiment, as in the figure 12d, the diaphragm 2 is rotatably mounted.

The functionality is an extension of the approach described in FIG. 12d. Here, the diaphragm 2 is rotatable on the bearing element 6, a nozzle system or nozzle array of a plurality of nozzles 10 'provides a faster and more thorough cleaning action than in Fig. 12d disclosed.

12f is a partial schematic illustration of another exemplary coating chamber 3 according to the invention, in this embodiment the coating chamber 3 comprises a pivotable nozzle 10 "or a pivotable nozzle system which can be translationally moved in the coating chamber 3 analogously to the embodiment of FIG as in the figure 12d, the aperture 2 rotatably mounted on the bearing elements 6.

The surface of the diaphragm 2 is in this embodiment by means of

Scanning panning and translation, which can lead to a more thorough cleaning effect in a shorter cleaning time. This is of considerable importance for the throughput optimization of the plant. Incidentally, reference is made to the comments on the figures 12a to 12e. LIST OF REFERENCE NUMBERS

1, 1 ', 1 ", 1" \ 1 "" slats

I i inside of the slats

l a outside of the slats

, 2 ', 2 ", 2"', 2 "" aperture

1 retaining ring

swivel

23 aperture

3 coat it £ l mm

31 chamber wall

32 Storage of the scraper

33 Storage of the cleaning nozzle

34 drive and positioning of the

cleaning nozzle

35 chamber opening

36 edge of the chamber opening

4 Mounting the panel

5 Fixation of the coating chamber

6 bearing elements

7 substrate holder

8 'passage or vent valve

8 "passage or vent valve

wiper ring

'Scraper ring

"Wiper ring

10 cleaning nozzle

10 ^* cleaning nozzle

10 "cleaning nozzle

Claims

claims

Coating chamber (3), in particular coating chamber, for coating a substrate, in particular a wafer, comprising a chamber opening (35) for loading and / or unloading the coating chamber (3),

characterized,

the coating chamber (3) has a diaphragm (2), in particular an iris diaphragm, for at least partially closing the chamber opening (35).

Coating chamber (3) according to one of the preceding

Claims, characterized in that the diaphragm (2),

in particular continuously and / or automatically, in such a way

adjustable, that the effective size of the chamber opening (35) is variably adjustable.

Coating chamber (3) according to claim 2, characterized

characterized in that the adjustment of the diaphragm (2) by a, in particular closed, control loop is controllable, preferably in the control loop at least one, in particular in the coating chamber (3) arranged, sensor is arranged, in particular an environmental sensor for measuring temperatures, gas -, solvent concentrations, flow velocities, and / or rotational velocities of flows in the

Coating chamber (3).

Coating chamber (3) according to one of the preceding

Claims, characterized in that the diaphragm (2) at least one movable, in particular rotatable, lamella (1, V, 1 ",", 1 "") for at least partially closing the chamber opening (35), wherein the coating chamber (3) in particular a plurality of at least partially overlapping lamellae (1, 1 ",", 1 "").

Coating chamber (3) according to one of the preceding

Claims, comprising one, in particular automated,

Cleaning device for removing contaminants on the panel (2), wherein the cleaning device preferably a, in particular rotatable scraper (9, 9 ', 9 "), in particular a Scraper ring, and / or at least one, in particular pivotable and / or translationally within the coating chamber (3) movable cleaning nozzle (10, 10 ', 10 ") for removing impurities on the diaphragm (2).

6. coating chamber (3) according to one of the preceding

Claims, characterized in that the opening and / or Schüeßgeschwindigkeit the aperture (2) between 1 mm / s to 450 mm / s, preferably between 1 mm / s and 300 mm / s, still

more preferably between 1 mm / s and 200 mm / s, most preferably between 1 mm / s and 1 00 mm / s, most preferably between 1 mm / s and 50 mm / s.

7 coating chamber (3) according to one of the preceding

Claims, characterized in that the at least one lamella (1,, 1 ", 1" ") is curved outwardly and / or opens the panel (2) to the outside.

8. coating chamber (3) according to one of claims 1 to 6,

characterized in that the at least one lamella (1, 1 ", Γ", 1 "") is curved inwards and / or the diaphragm (2) opens inwards.

9. coating chamber (3) according to any one of claims 1 to 6,

characterized in that the at least one lamella (1,, 1 ",", '") is planar and / or the diaphragm (2) opens in a plane.

10. coating chamber (3) according to one of the preceding

Claims, characterized in that the diaphragm (2) firmly in particular with a retaining ring (21), with an edge (36) of the chamber opening (35) is connected.

1 1. Coating chamber (3) according to one of claims 1 to 9,

characterized in that the diaphragm (2) is rotatably mounted, in particular with a retaining ring (21), on an edge (36) of the chamber opening (35), the diaphragm (2) in particular with more than 1 rpm, more preferably with more than 0 rpm, more preferably more than 100 rpm, most preferably more than 500 rpm, on

most preferably with more than 1000 rpm is rotatable.

12. coating chamber (3) according to one of the preceding

Claims, characterized in that the diaphragm (2) comprises at least two, in particular stacked, individual apertures (2 ', 2 ", 2'", 2 "").

13. coating chamber (3) according to one of the preceding

Claims, comprising a ventilation device for ventilating the interior of the coating chamber (3), wherein the

Ventilation device in particular as at least one

Implementation (8 ', 8 ") and / or as at least one valve in the diaphragm (2), in particular in a retaining ring (21) of the diaphragm (2), and / or in a chamber wall (3 1) is formed.

14. panel (2) for a coating chamber (3), in particular according to one of the preceding claims, comprising a,

in particular central, preferably circular, aperture (23) and at least one movable, in particular rotatable, lamella (1, 1 ",", 1 "") for at least partially concealing the

Aperture (23). Processing plant for processing substrates, in particular wafers, comprising a coating chamber (3), in particular according to one of claims 1 to 13, wherein the

Coating chamber (3) by a diaphragm (2), in particular according to claim 14, can be at least partially sealed off from other parts of the system.

Method for coating at least one substrate, in particular wafer, with the following steps, in particular with the following sequence:

a) loading of a coating chamber (3), in particular according to one of claims 1 to 13, with a substrate by a

Chamber opening (35) of the coating chamber (3);

b) at least partially closing the chamber opening (35) by a diaphragm (2), in particular according to claim 14;

c) applying a coating material to the substrate within the coating chamber (3);

d) at least partially releasing the chamber opening (35) through the diaphragm (2);

e) removal of the coated substrate from the

Coating chamber (3).