WO2016003301A1 - Method for preparing of thin and ultrathin polymer films on solid substrates - Google Patents

Method for preparing of thin and ultrathin polymer films on solid substrates Download PDF

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Publication number
WO2016003301A1
WO2016003301A1 PCT/PL2015/000110 PL2015000110W WO2016003301A1 WO 2016003301 A1 WO2016003301 A1 WO 2016003301A1 PL 2015000110 W PL2015000110 W PL 2015000110W WO 2016003301 A1 WO2016003301 A1 WO 2016003301A1
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WO
WIPO (PCT)
Prior art keywords
layer
laser light
substrate
polymer
line
Prior art date
Application number
PCT/PL2015/000110
Other languages
French (fr)
Inventor
Krzysztof JANUS
Juliusz SWORAKOWSKI
Adam SANISZEWSKI
Urszula BIELECKA
Original Assignee
Politechnika Wrocławska
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Filing date
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Publication of WO2016003301A1 publication Critical patent/WO2016003301A1/en

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
    • C03C17/32—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with synthetic or natural resins
    • C03C17/328—Polyolefins
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/42—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating of an organic material and at least one non-metal coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254—After-treatment
    • B05D3/0263—After-treatment with IR heaters
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/75—Hydrophilic and oleophilic coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/76—Hydrophobic and oleophobic coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/90—Other aspects of coatings
    • C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
    • C03C2217/948—Layers comprising indium tin oxide [ITO]

Definitions

  • the invention relates to method for preparing thin and ultrathin polymer films on solid substrates, in particular glass and plastic, by using a laser light.
  • the method is applicable to functionalization of surface of the substrates to obtain desired physicochemical properties, such as: creating conductive layer on dielectric substrate, hydrophobization or hydrophilization of the surface, fabrication of radiation-absorbing layer.
  • US patent application no. US5143533 also presents laser method for manufacturing of amorphous layer of material through zone melting of solid colloidal solution with working temperature range of around 1000°C.
  • the invention relates to method for preparing thin and ultrathin polymer films on solid substrates in which a layer of solution or suspension of the polymer is deposited on a substrate, particularly: glass, quartz, ITO coated glass, polymer and mica, and then a laser light forming a line with uniform intensity which moves in a direction perpendicular to its axis produces a solid film of deposited material.
  • the used laser light is of the same wavelength as absorption band of the substrate on which polymer layer is deposited.
  • the used laser light is of the wavelength which does not cause degradation of deposited material.
  • the used laser light is formed into a line with length equal to or greater than width of the substrate.
  • laser light intensity is uniform along the entire length of the line.
  • laser light intensity and the speed of movement of the laser line are adjusted in such a way that temperature of the substrate does not exceed the temperature of degradation of the deposited polymer and/or of the substrate.
  • solvent volatility is selected in such a way that the layer of solution does not get dry before a laser light heats up the substrate.
  • the layer of solution consisting of mixture of polymers is deposited.
  • polymer doped with nanoparticles is deposited.
  • a suspension of polymer or mixture of polymers is deposited.
  • Laser light wavelength is selected in such a way that it is absorbed by the substrate on which the layer is formed, causing local heating of the substrate. In consequence, surface tension of the liquid layer decreases locally which causes removal of excess solution, the solvent from remaining thin layer evaporates and the layer dries.
  • the advantage of the method resulting from this invention is the possibility of formation of thin layer with uniform thickness and high smoothness on large area substrates.
  • the method for preparing layer consists in deposition of a layer of pMMA solution in chlorobenzene (50 mg/ml) on a glass substrate. Next this layer is irradiated with a line of laser light with wavelength of 10.6 microns (which is absorbed by the glass substrate) originating from CO2 gas laser.
  • the laser power was equal to 7.2 W, the line size was 40 x 0.150 mm.
  • the line was moving with the speed of 2 mm/s. Obtained layer was 98 nm thick.
  • the method for preparing layer consists in deposition of a layer of pMMA solution in chlorobenzene (50 mg/ml) on a substrate made of glass with thin ITO layer. Next this layer is irradiated with a line of laser light with wavelength of 10.6 microns (which is absorbed by the glass substrate) originating from CO2 gas laser.
  • the laser power was equal to 7.2 W, the line size was 40 x 0.150 mm.
  • the line was moving with the speed of 2mm/s. Obtained layer was 90 nm thick.
  • the method for preparing layer consist in deposition of a layer of pMMA solution in chlorobenzene (50 mg/ml) mixed (25 vol%) with toluene solution of PbS nanoparticles (5 mg/ml) on a glass substrate with ITO layer.
  • this layer is irradiated with a line of laser light with wavelength of 10.6 microns (which is absorbed by the glass substrate) originating from CO2 gas laser.
  • the laser power was equal to 7.2 W, the line size was 40 x 0.150 mm.
  • the line was moving with the speed of 2 mm/s. Obtained layer was 60nm thick.
  • the method for preparing layer consists in deposition of a layer of fluoropolymer solution in 1 , 3, and 9% w/v on a glass substrate. Next these layers were irradiated with a line of laser light with wavelength of 10.6 microns (which is absorbed by the glass substrate) originating from CO2 gas laser.
  • the laser power was equal to 4.8, 4.8 and 12 W, respectively; the line size was 40 x 0.150 mm.
  • the line was moving with the speed of 2, 2 and 0.5 mm/s. Thicknesses of obtained layers were equal to 3.5, 1 1 and 270 nm.
  • the method for preparing layer consist in deposition of a layer of p3HT solution in chlorobenzene (5 and 10 mg/ml) on a glass substrate.
  • these layers were irradiated with a line of laser light with wavelength of 10.6 microns (which is absorbed by the glass substrate) originating from CO2 gas laser.
  • the laser power was equal to 12 W
  • the line size was 40 x 0.150 mm.
  • the line was moving with the speed of 2 mm/s. Thicknesses of obtained layers were equal to 1.5 and 6 nm.
  • PEDOT:PSS poly(3,4- ethylenedioxythiophene) polystyrene sulfonate
  • the method for preparing layer consists in deposition of a layer of PEDOT:PSS suspension in water (2% w/v) on a glass substrate.
  • the layer was irradiated with a line of laser light with wavelength of 10.6 microns (which is absorbed by the glass substrate) originating from CO2 gas laser.
  • the laser power was equal to 12 W
  • the line size was 24 x 0.150 mm.
  • the line was moving with the speed of 0.5 mm/s. Thickness of obtained layer was equal to 150 nm.
  • the method for preparing layer consists in deposition of a layer of p3HT solution in chlorobenzene (5 mg/ml) on 125 micron thick PEN substrate.
  • the layer was irradiated with a line of laser light with wavelength of 10.6 microns (which is absorbed by the glass substrate) originating from CO2 gas laser.
  • the laser power was equal to 9.6 W
  • the line size was 47 x 0.150 mm.
  • the line was moving with the speed of 4 mm/s. Thickness of obtained layer was equal to ca 2 nm.
  • the method for preparing layer consists in deposition of a layer of p3HT solution in chlorobenzene (5 mg/ml) on 125 micron thick polyester substrate.
  • the layer was irradiated with a line of laser light with wavelength of 10.6 microns (which is absorbed by the glass substrate) originating from CO2 gas laser.
  • the laser power was equal to 9.6 W
  • the line size was 47 x 0.150 mm.
  • the line was moving with the speed of 4 mm/s. Thickness of obtained layer was equal to ca 2 nm.
  • the method for preparing layer consists in deposition of a layer of p3HT solution in chlorobenzene (5 mg/ml) on 125 micron thick PEN substrate.
  • the layer was irradiated with a line of laser light with wavelength of 10.6 microns (which is absorbed by the glass substrate) originating from CO2 gas laser.
  • the laser power was equal to 12 W
  • the line size was 40 x 0.150 mm.
  • the line was moving with the speed of 2 mm/s. Thickness of obtained layer was equal to 6 nm.

Abstract

The invention relates to method for preparing thin and ultrathin polymer films on solid substrates, in particular: glass, quartz, ITO coated glass, mica, comprising deposition of a layer of solution or suspension of polymer, followed by fabrication of solid layer by using a laser light forming a line with uniform light intensity, which is moving in a direction perpendicular to its axis.

Description

Method for preparing of thin and ultrathin polymer films on solid substrates
The invention relates to method for preparing thin and ultrathin polymer films on solid substrates, in particular glass and plastic, by using a laser light. According to the invention, the method is applicable to functionalization of surface of the substrates to obtain desired physicochemical properties, such as: creating conductive layer on dielectric substrate, hydrophobization or hydrophilization of the surface, fabrication of radiation-absorbing layer.
Many methods of fabrication of thin polymer layers from solution, applicable to both research and large-scale production are known. None of them, however, allows for deposition of thin layer on large area substrate with maintenance of uniform thickness and high smoothness of the layer.
Methods for processing of thin layer of inorganic material on solid substrate making use of a laser light in the form of continuously moving line are known from US patents no. US8617313 B1 , US8445365 B2 and from the American patent application no. US20090242805 A1. The said patents describe techniques of recrystallization of amorphous layer leading to formation of ordered polycrystalline layer (e.g. of silicon). In these methods a laser light locally melts amorphous layer at the temperature of the order of 1000°C, which then undergoes slow crystallization and, due to movement of the melted zone, obtained crystals are ordered.
US patent application no. US5143533 also presents laser method for manufacturing of amorphous layer of material through zone melting of solid colloidal solution with working temperature range of around 1000°C.
Inventions in which a laser light in the form of a line is used for drying wet layers of deposited materials are also known. In the US patent application US20140059878 A1 and the patent description US8485096 B2 the layer of material absorbs laser radiation, and then is locally heated and dries. It is noteworthy that there is no heating of the substrate on which the material is being deposited.
The invention relates to method for preparing thin and ultrathin polymer films on solid substrates in which a layer of solution or suspension of the polymer is deposited on a substrate, particularly: glass, quartz, ITO coated glass, polymer and mica, and then a laser light forming a line with uniform intensity which moves in a direction perpendicular to its axis produces a solid film of deposited material.
For best results, the used laser light is of the same wavelength as absorption band of the substrate on which polymer layer is deposited.
For best results, the used laser light is of the wavelength which does not cause degradation of deposited material.
For best results, the used laser light is formed into a line with length equal to or greater than width of the substrate.
For best results, laser light intensity is uniform along the entire length of the line.
For best results, laser light intensity and the speed of movement of the laser line are adjusted in such a way that temperature of the substrate does not exceed the temperature of degradation of the deposited polymer and/or of the substrate.
For best results, solvent volatility is selected in such a way that the layer of solution does not get dry before a laser light heats up the substrate.
For best results, the layer of solution consisting of mixture of polymers is deposited.
For best results, polymer doped with small molecule materials is deposited.
For best results, polymer doped with nanoparticles is deposited. For best results, a suspension of polymer or mixture of polymers is deposited.
Laser light wavelength is selected in such a way that it is absorbed by the substrate on which the layer is formed, causing local heating of the substrate. In consequence, surface tension of the liquid layer decreases locally which causes removal of excess solution, the solvent from remaining thin layer evaporates and the layer dries.
The advantage of the method resulting from this invention is the possibility of formation of thin layer with uniform thickness and high smoothness on large area substrates.
The subject of the invention is shown below in examples.
Example 1 .
Preparation of poly(methyl methacrylate) (pMMA) layer on glass substrates
The method for preparing layer consists in deposition of a layer of pMMA solution in chlorobenzene (50 mg/ml) on a glass substrate. Next this layer is irradiated with a line of laser light with wavelength of 10.6 microns (which is absorbed by the glass substrate) originating from CO2 gas laser. The laser power was equal to 7.2 W, the line size was 40 x 0.150 mm. The line was moving with the speed of 2 mm/s. Obtained layer was 98 nm thick.
Example 2.
Preparation of poly(methyl methacrylate) (pMMA) layer on glass substrates with ITO thin layer.
The method for preparing layer consists in deposition of a layer of pMMA solution in chlorobenzene (50 mg/ml) on a substrate made of glass with thin ITO layer. Next this layer is irradiated with a line of laser light with wavelength of 10.6 microns (which is absorbed by the glass substrate) originating from CO2 gas laser. The laser power was equal to 7.2 W, the line size was 40 x 0.150 mm. The line was moving with the speed of 2mm/s. Obtained layer was 90 nm thick.
Example 3.
Preparation of layer of poly(methyl methacrylate) (pMMA) doped with PbS nanoparticles on glass substrates with ITO thin layer
The method for preparing layer consist in deposition of a layer of pMMA solution in chlorobenzene (50 mg/ml) mixed (25 vol%) with toluene solution of PbS nanoparticles (5 mg/ml) on a glass substrate with ITO layer. Next this layer is irradiated with a line of laser light with wavelength of 10.6 microns (which is absorbed by the glass substrate) originating from CO2 gas laser. The laser power was equal to 7.2 W, the line size was 40 x 0.150 mm. The line was moving with the speed of 2 mm/s. Obtained layer was 60nm thick.
Example 4.
Preparation of layer of soluble fluoropolymer on glass substrates.
The method for preparing layer consists in deposition of a layer of fluoropolymer solution in 1 , 3, and 9% w/v on a glass substrate. Next these layers were irradiated with a line of laser light with wavelength of 10.6 microns (which is absorbed by the glass substrate) originating from CO2 gas laser. The laser power was equal to 4.8, 4.8 and 12 W, respectively; the line size was 40 x 0.150 mm. The line was moving with the speed of 2, 2 and 0.5 mm/s. Thicknesses of obtained layers were equal to 3.5, 1 1 and 270 nm.
Example 5.
Preparation of layer of poly(3-hexylothiophene) (p3HT) on glass substrates.
The method for preparing layer consist in deposition of a layer of p3HT solution in chlorobenzene (5 and 10 mg/ml) on a glass substrate. Next these layers were irradiated with a line of laser light with wavelength of 10.6 microns (which is absorbed by the glass substrate) originating from CO2 gas laser. The laser power was equal to 12 W, the line size was 40 x 0.150 mm. The line was moving with the speed of 2 mm/s. Thicknesses of obtained layers were equal to 1.5 and 6 nm.
Example 6.
Preparation of layer of PEDOT:PSS (poly(3,4- ethylenedioxythiophene) polystyrene sulfonate) on glass substrates.
The method for preparing layer consists in deposition of a layer of PEDOT:PSS suspension in water (2% w/v) on a glass substrate. Next the layer was irradiated with a line of laser light with wavelength of 10.6 microns (which is absorbed by the glass substrate) originating from CO2 gas laser. The laser power was equal to 12 W, the line size was 24 x 0.150 mm. The line was moving with the speed of 0.5 mm/s. Thickness of obtained layer was equal to 150 nm.
Example 7.
Preparation of layer of poly(3-hexylothiophene) (p3HT) on PEN (polyethylene naphthalate) substrates.
The method for preparing layer consists in deposition of a layer of p3HT solution in chlorobenzene (5 mg/ml) on 125 micron thick PEN substrate. Next the layer was irradiated with a line of laser light with wavelength of 10.6 microns (which is absorbed by the glass substrate) originating from CO2 gas laser. The laser power was equal to 9.6 W, the line size was 47 x 0.150 mm. The line was moving with the speed of 4 mm/s. Thickness of obtained layer was equal to ca 2 nm.
Example 8.
Preparation of layer of poly(3-hexylothiophene) (p3HT) on polyester substrates.
The method for preparing layer consists in deposition of a layer of p3HT solution in chlorobenzene (5 mg/ml) on 125 micron thick polyester substrate. Next the layer was irradiated with a line of laser light with wavelength of 10.6 microns (which is absorbed by the glass substrate) originating from CO2 gas laser. The laser power was equal to 9.6 W, the line size was 47 x 0.150 mm. The line was moving with the speed of 4 mm/s. Thickness of obtained layer was equal to ca 2 nm.
Example 9.
Preparation of layer of poly(3-hexylothiophene) (p3HT) on PET (polyethylene terephthalate) substrates.
The method for preparing layer consists in deposition of a layer of p3HT solution in chlorobenzene (5 mg/ml) on 125 micron thick PEN substrate. Next the layer was irradiated with a line of laser light with wavelength of 10.6 microns (which is absorbed by the glass substrate) originating from CO2 gas laser. The laser power was equal to 12 W, the line size was 40 x 0.150 mm. The line was moving with the speed of 2 mm/s. Thickness of obtained layer was equal to 6 nm.

Claims

Claims
1. The method for preparing thin and ultrathin layers of polymers on solid substrates comprising the following steps:
a. deposition of layer of polymer solution or suspension on solid substrate (in particular glass, ITO coated glass, polymer sheets and mica);
b. fabrication of thin solid layer by using a laser light forming a line with uniform intensity which is moving in a direction perpendicular to its axis.
2. The method according to claim 1 , wherein the laser light wavelength is in absorption band of the substrate on which polymer layer is being deposited
3. The method according to claim 1 , wherein the laser light does not cause degradation of deposited polymer.
4. The method according to claim 1 , wherein the laser light forms a line with length equal to or greater than the width of the substrate.
5. The method according to claim 1 , wherein the laser light line has uniform intensity along its overall length.
6. The method according to claim 1 , wherein the laser light intensity and speed of movement of the laser light line are adjusted in such a way that temperature of the substrate does not exceed the temperature of degradation of deposited polymer or the substrate.
7. The method according to claim 1 , wherein the volatility of solvents is selected in such a way, that the layer of solution does not get dry before a laser light heats up the substrate.
8. The method according to claim 1 , which comprises preparing of a layer from solution consisting of mixture of polymers.
9. The method according to claim 1 , which comprises preparing of a layer from solution of polymer doped with low molecular materials.
10. The method according to claim 1 , which comprises preparing of a layer from solution of polymer doped with nanoparticles.
1. The method according to claim 1 , which comprises preparing of a layer from suspension of polymer or a mixture of polymers.
PCT/PL2015/000110 2014-07-04 2015-07-02 Method for preparing of thin and ultrathin polymer films on solid substrates WO2016003301A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
PL408763A PL234891B1 (en) 2014-07-04 2014-07-04 Method for producing thin and ultrathin polymer layers on solid substrates
PLP.408763 2014-07-04

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WO2016003301A1 true WO2016003301A1 (en) 2016-01-07

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020099729A1 (en) * 2018-11-14 2020-05-22 Saint-Gobain Glass France Method for the selective etching of a layer or a stack of layers on a glass substrate
RU2774070C1 (en) * 2018-11-14 2022-06-15 Сэн-Гобэн Гласс Франс Method for selective etching of a layer or a batch of layers on a glass substrate

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3743777A (en) * 1969-07-17 1973-07-03 Vianova Kunstharz Ag Process for hardening coatings with lasers emitting infra-red radiation
US5143533A (en) 1991-08-22 1992-09-01 The United States Of America As Represented By The Department Of Energy Method of producing amorphous thin films
US20090242805A1 (en) 2005-08-16 2009-10-01 Im James S Systems and methods for uniform sequential lateral solidification of thin films using high frequency lasers
US8445365B2 (en) 2003-09-19 2013-05-21 The Trustees Of Columbia University In The City Of New York Single scan irradiation for crystallization of thin films
US8485096B2 (en) 2007-12-07 2013-07-16 Heidelberger Druckmaschinen Ag Method for drying printing ink and printing ink
US8617313B2 (en) 2005-04-06 2013-12-31 The Trustees Of Columbia University In The City Of New York Line scan sequential lateral solidification of thin films
US20140059878A1 (en) 2011-02-25 2014-03-06 Saint-Gobain Glass France Heat treatment of a laser coating

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3743777A (en) * 1969-07-17 1973-07-03 Vianova Kunstharz Ag Process for hardening coatings with lasers emitting infra-red radiation
US5143533A (en) 1991-08-22 1992-09-01 The United States Of America As Represented By The Department Of Energy Method of producing amorphous thin films
US8445365B2 (en) 2003-09-19 2013-05-21 The Trustees Of Columbia University In The City Of New York Single scan irradiation for crystallization of thin films
US8617313B2 (en) 2005-04-06 2013-12-31 The Trustees Of Columbia University In The City Of New York Line scan sequential lateral solidification of thin films
US20090242805A1 (en) 2005-08-16 2009-10-01 Im James S Systems and methods for uniform sequential lateral solidification of thin films using high frequency lasers
US8485096B2 (en) 2007-12-07 2013-07-16 Heidelberger Druckmaschinen Ag Method for drying printing ink and printing ink
US20140059878A1 (en) 2011-02-25 2014-03-06 Saint-Gobain Glass France Heat treatment of a laser coating

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020099729A1 (en) * 2018-11-14 2020-05-22 Saint-Gobain Glass France Method for the selective etching of a layer or a stack of layers on a glass substrate
CN112969671A (en) * 2018-11-14 2021-06-15 法国圣戈班玻璃厂 Method for selectively etching a layer or stack on a glass substrate
JP2022510109A (en) * 2018-11-14 2022-01-26 サン－ゴバン グラス フランス Methods for Selective Etching of Layers or Layers of Glass Substrate
RU2774070C1 (en) * 2018-11-14 2022-06-15 Сэн-Гобэн Гласс Франс Method for selective etching of a layer or a batch of layers on a glass substrate
JP7234358B2 (en) 2018-11-14 2023-03-07 サン－ゴバン グラス フランス Method for selective etching of a layer or stack of layers of a glass substrate

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PL234891B1 (en) 2020-04-30

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