WO2015082818A1

WO2015082818A1 - Method for locally repairing thermal barriers

Info

Publication number: WO2015082818A1
Application number: PCT/FR2014/053101
Authority: WO
Inventors: Marie-Pierre Bacos; Odile Lavigne; Catherine Rio; Marie-Hélène VIDAL-SETIF; Frédéric Rousseau; Daniel Morvan
Original assignee: Office National D'etudes Et De Recherches Aérospatiales (Onera)
Priority date: 2013-12-02
Filing date: 2014-12-01
Publication date: 2015-06-11
Also published as: EP3077570B1; CA2931927A1; CA2931927C; US20170044901A1; US10267151B2; FR3013996A1; EP3077570A1; ES2655532T3; FR3013996B1

Abstract

The invention relates to a method for repairing a thermal barrier of a component comprising a substrate coated with such a thermal barrier, said substrate being made of a high-performance alloy, said thermal barrier being adhered to the alloy and having lower thermal conductivity than the alloy, the thermal barrier including at least one ceramic, one region of the thermal barrier being a region to be repaired, wherein said method includes the following steps: a) defining the region to be repaired, using a mask which protects the other regions of the thermal barrier; b) injecting a carrier gas loaded with droplets of ceramic precursor into a plasma discharge inside a plasma chamber of a plasma reactor containing the component to be repaired, while making the concentration of ceramic precursor in the carrier gas dependent on at least one parameter of the reactor selected from among: the pressure of the plasma chamber, the power of the plasma generator and the diameter of the precursor droplets, in order to control the state — liquid, gel or solid — of the ceramic precursor having an effect on the region to be repaired; c) injecting a gas not loaded with ceramic precursor into a plasma discharge within the plasma chamber, steps b) and c) being repeated.

Description

PROCESS FOR THE LOCAL REPAIR OF THERMAL BARRIERS

The invention relates to a method for the local repair of components comprising a substrate coated with a thermal barrier such as the vanes of the vanes, the blades of turbomachines turbomachines high pressure turbines, including aviation, and combustion chambers.

Improving the efficiency of the turbomachines, especially in the aeronautical field, has led to an increase in the temperature of the gases leaving the combustion chamber to the turbine. An adaptation of the components to this temperature rise was carried out thanks to the development of new alloys for the substrates, in particular nickel-based monocrystalline superalloys, to the implementation of gas injection cooling systems passing through the component, and the deposit of ceramics as thermal insulation called thermal barrier. This thermal barrier creates for a component cooled in steady state a temperature gradient of up to 200 ° C for a thermal barrier thickness of about 150μιη thickness. The desired qualities of a thermal barrier are a low thermal conductivity, a strong adhesion to the substrate when the component is in use, and a permanence of this adhesion, especially during severe thermal cycles experienced by the component.

To meet these requirements, a thermal barrier sublayer and a protective oxide are generally disposed between the superalloy substrate and the thermal barrier. The underlayer may be made of an alloy of MCrAlY composition, in particular with M being equal to iron, cobalt and / or nickel, or in single nickel or modified with a metal of the platinum group or doped with an element. reagent, for example zirconium, hafnium or yttrium, or a diffused platinum deposition. The thermal barrier sub-layer makes it possible to adapt the differences in coefficient of expansion between the superalloy and the thermal barrier. The underlayer also protects the superalloy against oxidation, the thermal barrier being porous. The sub-layer creates by interaction with oxygen a protective oxide growth, typically alumina, called TGO for "Thermally Growth Oxide" in English. Layer TGO oxide starts to grow during the thermal barrier deposition process and serves as an adhesive for fixing the thermal barrier on the superalloy.

The thermal barriers can be deposited on the substrate to be coated either by a projection technique, for example the thermal spray APS for "Air Plasma Spray" or LPPS "Low Pressure Plasma Spray" or HVOF for "High Velocity Oxy Fuel", or by deposition by physical vapor phase that is to say by evaporation, for example by EB-PVD for "Electron Beam - Physical Vapor Deposition".

Alternative techniques have also been published as SCP processes for "Spray Conversion Processing" or SPPS for "Precursor Plasma Spray Solution" described in US 6025034, US2003 / 0077398, Padture et al., "Towards sustainable thermal barrier coatings with novel microstructures deposited by solution. -precusor plasma spray "Acta Materialia (2001) 2251-2257 and M. Gell et al" Highly durable thermal barrier coatings made by the precursor solution plasma spray process "Surface and Coating technology 177-178 (2004) 97-102 and which consist to inject the particles in the form of salts in the liquid state into the flame of a high-power plasma torch (35-45 kW) in order to transform them into solid oxide, then to melt them in the plasma torch and to project them under molten oxide form. Other techniques for producing thick-oxide ceramics or thermal barriers exist such as chemical vapor deposition known by the acronym CVD or plasma-assisted known by the acronym PE-CVD for "Plasma Enhanced Chemical Vapor Deposition" , cf. FR 2 695 944, the sol-gel route published in US Pat. No. 5,585,136 or the low-pressure plasma reactor method of the Rousseau et al. Article "Deposition of thick and 50% porous YpSZ layer by spraying nitrate solution in a low pressure plasma reactor ", Surface and Coating Technology 206 (7) (2011) 1621-1627.

A deposit obtained by thermal spraying generally has a lamellar structure that can be altered by the presence of unmelted. The SPPS and SCP techniques make it possible to obtain a less marked lamellar structure with a microporosity and a nanoporosity of the deposit. The morphology of thermal barriers obtained by thermal spraying favors multi cracking and flaking within the ceramic following a crack parallel to the underlayer / ceramic interface.

A deposit obtained by EB-PVD has a columnar type structure which allows a better adaptation of the mechanical and thermal stresses and is generally preferred for high temperature applications such as turbine blades where damage is concentrated at the alumina layer at the undercoat / ceramic interface.

The Applicant has been particularly interested in deposited thermal barriers based on zirconia, in particular yttria zirconia, cerium oxide, magnesia. In operation, thermal barriers can be damaged by contaminants, such as sand, dust, sediments, volcanic ash, present in the engine environment and under the influence of temperature and heat. oxidizing atmosphere decompose and form on the surface of the thermal barrier, liquid or semi-liquid compounds. These compounds, typically consisting of oxides of calcium, magnesium, aluminum and silicon, are designated by the generic term CMAS. These undesirable compounds may also contain other oxides such as metal oxides, for example iron, titanium or nickel, or alkaline oxides, for example Na ₂ 0 or K ₂ 0. Due to their low viscosity, the melted CMAS infiltrate during the operation of the engine in the porosity of the thermal barrier (pores themselves, cracks, inter-columnar spaces) and solidify to the cooling resulting in the appearance of delamination cracks in the infiltrated thermal barrier which can carry out its flaking. In addition, there may be dissolution of the thermal barrier in the molten CMAS which leads to degradation and modification of the morphology and structure of the thermal barrier in contact with the CMAS. US 2007/0160859 describes the composition of anti-CMAS layers based on zirconia doped with different oxides of rare earths or based on compounds of X ₂ Zr ₂ 0 _{7 type} , X being a rare earth. Generally, the anti-CMAS layer considered to be the most effective is that described by S. Kramer, J. Yang and C. Levi, in J. Am. Ceram. Soc. 91 [2] 576-583, (2008) and is based on gadolinium zirconate Gd ₂ Zr ₂ 0 ₇ .

Although progress has been made to limit the cracking and peeling of these thermal barriers, the Applicant has identified a primary need to be able to repair local damage. Indeed the flaking can occur either just after depositing the thermal barrier on the component following a mechanical shock or heat, or later in service. In the latter case, generally the flaking is in the most thermally and mechanically stressed zones as per example the top of the blades that can be touched with the housing, or the leading edge seat of impacts of particles or debris. In the case of impacts or delamination of the thermal barrier and / or the anti-CMAS layer, the repair will be addressed to these two layers only with reconstruction of the thermal barrier and / or its anti-CMAS layer, depending on the case. In the case of a scaling of a portion of the thermal barrier as a result of thermal and / or mechanical stresses, the local repair will take place on a bare, possibly oxidized, undercoat with cracking at the interface sub-layer / thermal barrier that is to be recapped to make again adhere the thermal barrier and its anti-CMAS layer.

To repair the thermal barriers, the current state of the art advocates to completely remove the thermal barrier and its underlayer. Such an operation begins with sandblasting or water jet abrasive techniques or by dissolving techniques in alkaline solutions at high temperature and pressure or by thermochemical treatment with a fluorinated gas. It is then followed by deoxysulfuration and dealumination. Finally, on the substrate exposed, the underlayment and thermal barrier assembly is deposited again. The presence of very local damage leads to a total repackaging of the component with the implementation of aggressive techniques that present risks of damage to the component, a reduction of material sections and dimensions which is disadvantageous in the walled areas fine and imposed radius of curvature and finally the implementation of specific and heavy means such as autoclave, fluorinated gases, etc. In addition, it is often difficult to remove the entire thermal barrier especially during a deposit with EB-PVD columnar microstructure optimized for strong adhesion.

For this purpose, FR 2827311 and US 7008522 describe a method for repairing thermal barriers. After the usual techniques for preparing the area to be repaired by sandblasting, polishing, and undercoat reconstitution by deposition of metals by electric current, and formation of the growth oxide layer, the barrier is reconstituted by EB-PVD. It is then necessary to subject the component to oscillation movements, during the EB-PVD deposit, in order to standardize the repair. It is therefore a complex technique requiring both an EB-PVD installation and a specific motorized tooling. US 5723078 discloses a technique of local repair of a thermal barrier by local cleaning of the undercoat of the flaked ceramic and redeposition of a ceramic layer by plasma spraying. This deposit can be done after treatment of the bonding layer by sandblasting, micromachining, photolithography or laser grooving to increase its roughness as described in EP 0808913, US 7094450, US 2004/0219290 and US 2005/0191516. It can also be realized after having removed the flaked layer of ceramic by water jet and after having created a profile adapted to the deposit of powders which are projected by plasma atmospheric projection or in a HVOF installation (High Velocity Oxy-Fuel or Projection by Supersonic flame), see EP 1832668, US 2007/0202269, or by other projection variants such as plasma spraying, flame spraying, and arc and arc flash plasma projection. The ceramic powder can be introduced into an oxyacetylene torch in order to project it semi-melted on the part to be repaired, cf. US 2005/0129868. The projected ceramic powder may be composed of a mixture of powders having a melting point sufficiently low that the phase is melted at the time of projection, see US 2005/0003097. The projected ceramic deposit may also have a variable or defined composition gradient between the underlayer and the thermal barrier as described by US 2011/287191 and WO 2011/144860.

Finally, US 7115832 discloses a so-called device for repairing thermal barriers based on the technology of arc plasmas in the atmosphere. This process, also called micro-plasma, consists of a gun equipped with a plasma torch formed between two electrodes and an argon powder injector as a plasma gas. The plasma gun should be water cooled and protected with gas, for example argon at 2-8 liters per minute. It only makes it possible to develop repair strips with a small width of between 0.5 and 5 mm.

Due to the poor mechanical properties of lamellar layers obtained by plasma spraying, all of these techniques are not applicable for areas with high thermal and mechanical stress such as leading edges, the preferred seat of erosional peeling, or soffit. In addition, the known projection installations have major drawbacks related to their high consumption of energy, gas and powders with low efficiency and significant environmental disadvantages and exposure of workers to fine powders. US 7476703, US 6875464, US 2004/214938, US 2005/0111903, US 2005/0228098 and 2007/0134408 disclose a method of repair from a ceramic paste comprising a ceramic material, a binder and a lubricant, deposited on the surface to be repaired and then heated up to 700 ° C in order to obtain a vitreous repair. The ceramic material generally consists of solid particles of zirconia with solid particles of yttrine and the binder may be based on silicone resin. The ceramic particles can be nanometric which makes it possible to have a thixotropic behavior of the repair during its application.

A variant published in US 2005/0118331 proposes to apply a mixture of ceramic solid particles, ceramic hollow spheres with a silica precursor binder and then heat-treated. However, the ceramic is injected in solid form which does not fill either the small interstices or existing cracks at the substrate / ceramic interface. By such a method, the repair obtained does not have the microporous morphology necessary to withstand the strong thermomechanical stresses experienced by the component, especially the blade. Indeed, during drying and annealing, the applied layer tends to sinter resulting in the formation of cracks, adhesion defects and desquamation. This process involves powders and dangerous products, some of which, in particular, the binder and the lubricant by decomposing will pollute the thermal barrier and modify its thermal properties.

US 2010/0247740 discloses a technique for repairing thermal barriers based on the principle of depositing in the area to be repaired, a wet carrier ceramic film of a composition material of the thermal barrier to be repaired. The film may consist of one or more layers, and be infiltrated beforehand by a wet deposit made by sol-gel or slip, in the English language "slurry". The temperatures to be applied may be between 400 and 2000 ° C. Different types of thermal barrier that can be repaired: zirconia stabilized or partially stabilized with oxides of Ce, Hf, Y, Ca ..., this does not allow to carry out simple repairs in areas of delamination or very small dimension since the films must be cut to the dimensions of the areas to be repaired. In addition it is long and expensive since it is necessary to infiltrate the ceramic film beforehand and the annealing temperature must be high. The techniques of repair of thermal barriers by sol-gel see US 6235352, allow some infiltration in areas to repair difficult to access while leading however to too low thicknesses. The repair of a thermal barrier typically of thickness ΙΟΟμιη is not possible with this type of deposition technique in a thin layer because typically the thickness of a layer deposited by sol-gel is 0.1 μιη. The number of successive layers to be deposited to repair a thermal barrier in all its thickness would be very expensive in time. Solid oxide particles have been added, up to 90% by weight, in the sol-gel solutions, for example in the publications US 5585136 and US 2004/0258611, so that the thickness of a layer deposited is higher. If the thickness obtained is then compatible with a method of repairing a thick layer of thermal barrier, the particles introduced are solid and therefore the process has the same disadvantages as those of the projection methods. An example is given by L. Pin et alia in "processing, repairing and cycling oxidation behavior of sol-gel thermal barrier coating" Surface and Coating Technology 206 (2011) 1609-1614, which discloses that the sol-gel process loaded with powders solids causes non-homogeneous filling of cracks.

With the exception of the EB-PVD process, which is sophisticated and expensive in repair, the other techniques for repairing thermal barriers use either the injection of solid or melted powders, or a single liquid route, in particular sol-gel, but with incompatible yields. with the use.

The publication of Rousseau et al "Deposition of Thick and 50% porous YpSZ layer by spraying nitrate solution in a low pressure plasma reactor", Surface and Coating Technology 206 (7) (2011) 1621-1627 proposes to elaborate on the alumina a thermal barrier of zirconia stabilized with yttrine or YpSZ (Yttria partially Stabilized Zirconia) thickness 200 μιη at 50%> porosity with a nanoporous structure and vertical microcracks. However, this technique does not allow the particles to be deposited in liquid form, which makes it impossible to repair the longitudinal cracks at the substrate / thermal barrier interface.

After carrying out this important qualitative review of the technologies, the Applicant realized that it was desirable to take into account the repair of the thermal barrier and its anti-CMAS layer while avoiding the toxic products for man, because of the size of the powders used or their chemical nature.

The invention aims to overcome the disadvantages of the above techniques identified by the Applicant. More particularly, the invention provides a method for controlling the state of the ceramic precursors injected into a low-pressure plasma discharge and thereby locally repairing the locally damaged thermal barriers by firstly infiltrating the emergent cracks. and longitudinal delamination of the thermal barrier and then clogging the scaled surface areas of larger size. A longitudinal crack delamination may be located under the thermal barrier, that is to say between the thermal barrier and the substrate optionally coated with a metal underlayer or an oxide layer. Another longitudinal delamination crack may be in the thermal barrier itself.

A component thermal barrier repair method comprising a substrate coated with such a thermal barrier, said substrate being made of a high performance alloy, said thermal barrier being adherent to the alloy and having a lower thermal conductivity than the alloy, the thermal barrier comprising at least one ceramic, a region of the thermal barrier to be repaired, comprises the following steps:

a) Delimitation of the region to be repaired, by a mask protecting the other regions of the thermal barrier;

b) Injecting a carrier gas loaded with ceramic precursor droplets into a plasma discharge within a plasma reactor plasma chamber housing the component to be repaired while controlling the concentration of ceramic precursor in the carrier gas and at least one reactor parameter among: plasma chamber pressure, plasma generator power, precursor droplet diameter, for controlling the state - liquid, gel or solid - of the ceramic precursor impacting the region to be repaired,

c) Injection of the uncharged ceramic precursor gas into a plasma discharge within the plasma chamber,

steps b) and c) being repeated. In one embodiment, said concentration is increasing at each iteration of step b) and said parameter is decreasing at each iteration of step b) to infiltrate delamination cracks of the thermal barrier and then clog chipped surface areas of said region.

In one embodiment, the ceramic precursor impacting the component to be repaired is in the liquid state in a first series of steps b), in the gel state in a second series of steps b), in the state solid in a third series of steps b).

In one embodiment, the method includes a step of cleaning said region performed in the plasma chamber prior to step a), comprising injecting a reducing gas into a plasma discharge.

In one embodiment, the method comprises a step of preparing said region carried out in the plasma chamber prior to step a), comprising injecting an oxidizing gas into a plasma discharge.

The cleaning step can take place before the preparation step.

In one embodiment, step b) comprises pulsed injections of said carrier gas, with a ratio injection duration / rest period between 1/5 and 1/30.

In one embodiment, steps b) and c) are performed 6 to 30 times.

In one embodiment, the ceramic precursor comprises at least one of zirconium nitrates or oxynitrates, yttrium nitrates, gadolinium nitrates and europium nitrates, with a concentration of between 0.05 and 0.5. mole per liter, pH between 1.2 and 2 and electrical conductivity between 0.02 and 0.2 Siemens cm ^-1 .

In one embodiment, the ceramic precursor comprises at least one of acetates or chlorides.

In one embodiment, the power of the generator that delivers the electromagnetic waves to create the plasma is between 60 and 20000 W, preferably between 200 and 10000 W.

In one embodiment, the pressure in the plasma chamber is between 1 and 20000 Pa during steps b) and c), preferably between 100 and 10000 Pa.

In one embodiment, the injection is performed by a capillary of diameter between 50 and 900 μιη. In one embodiment, the alloy comprises a nickel base superalloy. The alloy may be monocrystalline for a blade or polycrystalline for a combustion chamber.

In one embodiment, the alloy comprises a cobalt base superalloy. The alloy can be polycrystalline.

In one embodiment, the thickness of the thermal barrier is between 50 and 300 μιη, preferably between 100 and 150 μιη.

In one embodiment, the thermal barrier is permeable and contains open pores.

In one embodiment, the thermal barrier is permeable and contains closed pores.

In one embodiment, the thermal barrier comprises at least one of zirconia, preferably yttria or doped with neodymium oxide, gadolinium zirconate, neodymium zirconate and europium zirconate.

In one embodiment, a low power plasma, for example 0.2 to 20 kW, in a vacuum, for example 10 to 10,000 Pa, is created in a reactor in which a solution of precursors of ceramics, such as nitrates, oxynitrates, acetates, chlorides or any other liquid organometallic, is introduced by use of an injector, for example a spray, a jet, a nebulizer, an atomizer, making it possible to produce droplets with a diameter of between 100 nm and 2 nm. mm.

In one embodiment, a servo-control between the concentration of the ceramic precursors and at least one of the plasma chamber pressure, the plasma generator power, and the droplet generation system is implemented to control the temperature. liquid-state, gel or solid-particles impacting the component for repair where the thermal barrier is damaged. The state - liquid, gel or solid - impacting particles - at the place and at the moment of the impact - is modifiable during the process. For a solution of ceramic precursors, said servocontrol can be carried out from an electrical conductivity cell, measuring the electrical conductivity of the solution, a pH meter, a probe for measuring the concentration of the precursor solution. ceramic as a selective electrode of nitrate ions or a capillary viscometer. The enslavement of the droplet production depends on the type of atomizer used. He can be performed by varying the diameter of the capillary for a liquid type pressure atomizer, or the frequency and power of the piezoelectric for a piezoelectric nebulizer. The pressure in the plasma chamber can be controlled by the pumping unit and the power of the plasma generator servocontrolled by the generator controller. A control between the concentration of the ceramic precursors and a parameter among the pressure of the plasma chamber, the power of the plasma generator and the droplet production system is sufficient to control the liquid, gel or solid state of the particles repairing the plasma. damaged thermal barrier.

In another embodiment, finer optimization and improved efficiency are achieved by slaving the concentration of the ceramic precursors to at least two of these parameters, or to the three parameters of the plasma chamber, the power of the plasma generator, and droplet production system, especially the diameter.

The component to be repaired can be placed in a landfill or in a plasma discharge. In discharge, the substrate holder plays the role of counter electrode. In post-discharge, the circuit is closed by a counter-electrode separate from the substrate holder, for example a metal braid grounded. The steering will be adapted according to the difference in yield induced.

In the case of perforated components, in order to prevent ceramic deposition in the cooling holes or channels, the component provided with the holes may be connected to a fluid with a pressure greater than the pressure in the plasma chamber, for example the atmospheric pressure, external air then occupying the cooling channels and blocking the deposition of precursors on these areas. It is also possible to provide a flow of fluid other than air through the perforated component, for example through the hollow fir root in the case of a cooled blade.

By ceramic precursor is meant a chemical object containing at least one element of the ceramic and for initiating a formation reaction of said ceramic.

The invention makes it possible to perform a local repair of new or used thermal barriers by a method of reasonable cost, low energy consumption and allowing that are sent to the surface of the material to repair repair particles in the liquid state, gel or solid controllable throughout the process. In addition, The method makes it possible to carry out, within the same enclosure, the steps that are desirable for the local repair of the thermal barriers, in particular the preliminary stages of etching of the non-protective oxides or corrosion products, and the formation of the oxide layer (TGO) in the exposed metal parts to ensure adherence of the thermal barrier and deposition of the thermal barrier with its anti-CMAS layer. The thickness of the repair on the damaged area can be high, substantially equal to that of the original thermal barrier. The products implemented are satisfactory for the health of the operators. The microstructure of the repair obtained is microporous and nanoporous with a very low thermal conductivity and therefore compatible with the micro structure obtained by EB-PVD or by plasma projection of the thermal barrier to be repaired.

The method makes it possible to preserve a heat barrier deposited on a perforated component by avoiding the clogging of holes such as the cooling channels of a blade or the holes of a multi-perforated combustion chamber. The method also makes it possible to repair the thermal barrier and its anti-CMAS layer in the same enclosure by implementing steps performed within the same enclosure.

The component to be repaired can be permeable with open pores, the open pores being able to be fed with a pressure fluid greater than the pressure in the plasma chamber, said fluid then occupying the open pores, blocking the deposition of the precursors in the open pores and leaving open pore free after repair.

In addition, it is possible to inject, with ceramic precursors, suspensions, metal alkoxides, colloidal solutions or precursors of compounds comprising ions with particular properties, in particular optical properties, thus making it possible to obtain particular compositions or to include in the thermal barrier deposited at the desired depth of thermal sensors whose use is known in the field of thermal diagnostics or non-destructive testing.

Other features and advantages of the invention will appear on examining the detailed description below, and the attached drawings, in which:

- Figure 1 is a sectional view of a component equipped with a thermal barrier in good condition;

- Figure 2 is a sectional view, enlarged with respect to Figure 1, a component whose thermal barrier is damaged; and FIG. 3 is a schematic view of an apparatus for implementing the method.

- Figure 4 is a sectional view of a repaired component; and

FIG. 5 is a detail view of FIG.

The Applicant has found that a technique from fuel cells was interesting. The reader is invited to refer to FR 2729400 describing a method for depositing a thin film of metal oxide for a fuel cell. A substrate is placed in a vacuum chamber communicating with a plasma chamber having a convergent nozzle opening into the vacuum chamber through an outlet orifice disposed facing the substrate and having a diameter of between 2 and 5 mm. The pressure in the vacuum chamber is between 10 and 2000 Pa. A small flow rate of a gas comprising at least the oxygen element is continuously injected into the plasma chamber and a plasma is generated in the plasma chamber by electromagnetic excitation. some gas. An aqueous solution containing at least the metallic element is nebulized, thereby generating an aerosol in a carrier gas which has a pressure greater than the pressure prevailing in the vacuum chamber and sequentially, by suction, predetermined quantities of the gas are introduced. carrier loaded with aerosol in the plasma chamber. From the reactor of this process as a base, the Applicant has developed a method for repairing locally damaged thermal barriers.

As illustrated in Figure 1, a component comprises a substrate 1 made of nickel-based superalloy, coated on its outer face with a metal underlayer 2 alloy. The metal underlayer 2 may essentially comprise the elements M, Cr, Al and Y with M being equal to iron, cobalt and / or nickel. In a variant, the underlayer comprises single nickel aluminide, or modified with a metal of the platinum group, in particular Pt, Pd, Ru, Rh, Os, Ir and Re or doped with a reactive element, for example Zr, Hf or Y. The metal sub-layer may alternatively comprise a platinum deposit formed by diffusion. The metal sub-layer 2 comprises an outer face coated with an oxide layer 3. The oxide layer 3 has an outer face coated by the thermal barrier 4.

The thermal barrier may have a thickness of between 100 and 150 μιη. The thermal barrier 4 can be developed by EB-PVD. The thermal barrier 4 may comprise a zirconium oxide partially stabilized with yttrine. The oxide layer 3 has a thickness between 0.1 and 1 μιη and preferably between 0.3 and 6 μηι. The underlayer 2 has a thickness of between 10 and 100 μιη, preferably between 20 and 50 μιη. The underlayer 2 can comprise platinum modified or zirconium-modified nickel aluminide, cf US Pat. No. 7,608,301, or a γ-γ 'alloy, cf. US 7273662 and may itself comprise a diffusion barrier according to US 7482039. The underlayer 2 is based on the monocrystalline superalloy based on nickel 1. Alternatively, the oxide layer 3 rests directly on the super alloy as indicated in US 5538796.

In operation, the component may undergo damage related to thermal shocks, flaking of the outer layer, oxidation of the whole or to interactions with the environment. We then observe, see Figure 2, surface CMAS 5 deposits, strongly scaled surface areas 7 in which the undercoat is oxidized or corroded, and further longitudinal cracks 6 delamination between the superalloy and the thermal barrier, and within the thermal barrier.

Typically, the component has peeling from a few mm ² to a few cm ² with numerous longitudinal delamination cracks between the thermal barrier 4 and the substrate 1. The oxide layer 3 has a thickness between 0.3 and 6 μιη. The thermal barrier 4 here has a columnar structure.

As can be seen in FIG. 3, the system comprises a reactor 11 provided with a plasma chamber 12 in which a substrate holder 13 is placed. The component 30 can be installed on the substrate holder 13. A radio frequency generator 14 It supplies inductive turns arranged around the plasma chamber 12. The electric ground of the radio frequency generator is connected to the substrate holder 13. A vacuum pump 16 is connected by a pipe 17 inside the plasma chamber 12. On the pipe 17, there are provided filters 18 for capturing acids and dust and at least one controlled valve 19.

At least one container 20 is provided to contain the precursors. In the container 20, there are arranged probes 21 of a phmeter 22 and a conductivity meter 23. The container 20 is connected to the plasma chamber 12 via a gas introduction and injection device precursors 24 having a valve. The introducer 24 is also fluidly connected to a gas distributor 25 provided with at least one mass flow meter. The introduction device 24 comprises a capillary of fixed or adjustable diameter as required or a nebulizer optionally coupled to a valve. A control, acquisition and control unit 26 is connected to outputs of the meter 22 and the conductivity meter 23 and to the pressure sensor 29 upstream of the pump valve 19. The control box 26 comprises connected control outputs to the vacuum pump 16, to the radio frequency generator 14, to the feed device 24 and to the gas distributor 25. Optionally there is provided a pipe 27 between the gas distributor 25 and the substrate holder 13 and a pressure gauge 31 to supply gas to keep open bores of the component to be repaired. The housing 26 is also in communication with a computer 28 equipped with an acquisition card and stores the implementation data of the servocontrol, in particular Tables 1 to 3.

After sandblasting the component directed to the regions to repair and masking the healthy regions of the thermal barrier, the component is installed in a low pressure plasma reactor on a substrate holder.

The plasma chamber of the reactor is depressed. The plasma is generated by plasma discharge in an inter-electrode area. A reducing plasma is then created in order to operate the cleaning of the regions to be repaired. The adhesion promoting oxide layer is then formed with an oxidizing plasma. Then, while maintaining the oxidizing plasma, the pressure of the plasma chamber and the power of the plasma generator are increased and a solution of hydrated oxynitrate of zirconium (IV) ZrO (NO ₃ ) ₂ 6H ₂ O and, optionally, nitrate yttrium Y (N0 ₃ ) ₂ , is sprayed by a capillary. The hydrated oxynitrate of zirconium (IV) and optionally yttrium nitrate undergo oxidation. The nitrates arrive on the substrate in the liquid state and infiltrate in the longitudinal delamination cracks of the thermal barrier.

Then we proceed to a post-treatment step with plasma gas maintenance and lit plasma discharge. Thus, hydrated oxynitrate of zirconium (IV) and, optionally, yttrium nitrate Y, deposited in and on the substrate are still subject to oxidation.

The injection and post-treatment cycles are repeated 6 to 30 times in order to infiltrate the longitudinal fissures between the damaged thermal barrier and the substrate, and the emergent cracks whether they are within the thermal barrier or that they are under the thermal barrier and to cover large scaled surface areas. The invention is further illustrated by the following examples.

Example 1

Thermal barrier 4 is developed by EB-PVD and comprises a partially stabilized zirconia oxide YpSZ. The thickness of the thermal barrier is between 100 and 150 μιη. The thermal barrier is based on an oxide layer with a thickness of approximately 0.5 μιη. The oxide layer was created in situ during the deposition of the thermal barrier.

The underlayer may be of platinum modified nickel or zirconium-doped nickel aluminide type. The thickness of the underlayer is between 20 and 50 μιη. The underlay rests on the nickel-based monocrystalline superalloy.

A light sanding of the component, for example a dry sanding made with corundum, is then carried out in order to flake the areas covered with CM AS, easily removable areas due to the delamination cracks created by said CMAS deposits, and the barrier zones. thermal non-adherent.

The component is then placed in a low pressure plasma reactor and connected to the substrate holder which can be cooled or heated, immobile or rotating (depending on the complexity of the component to be treated). The healthy parts of the component that one does not want to repair are protected by a mask, for example a sheet of aluminum.

The plasma is generated, for example by inductive turns in which passes a radiofrequency current. The frequency of the current may be of the order of 40 MHz. The generator used to supply this current may be a TOCCO-STEL generator transferring to the gas powers between 60 and 600W. The generator comprises two parts, one provided with a compartment that creates a high-voltage direct current from the three-phase power of the sector, the other to produce a high-frequency current. For this purpose, the generator is equipped with a triode and comprises an oscillating circuit based on inductors and capacitors. This compartment provides a high frequency current across the solenoid which has between 5 and 6 turns. The plasma discharge can be capacitive or inductive.

The start of the process includes starting up the pumping system in order to bring the plasma chamber of the reactor into depression. The pressure is controlled by a gauge, for example of the MKSA type. The pumping system makes it possible to put the reactor in depression to control low power plasma discharge. The generator is then turned on to initiate the plasma discharge. A plasma of hydrogen or argon-hydrogen or ammonia is then created in order to operate the cleaning of the component under the following conditions: power: 200W, pressure: 560 to 650 Pa, flow of argon 1.8 liters per minute STP (under standard conditions of temperature and pressure), nitrogen flow rate 0.215 liter per minute STP, hydrogen flow rate 0.1 liter per minute STP, duration 25 minutes. The region to be repaired being then freed from impurities and poorly adhering compounds, the adhesion promoter oxide layer is formed. For this purpose, an argon / nitrogen / oxygen / steam plasma is initiated under the following conditions: power 260 W, pressure 780 to 1000 Pa, argon flow rate 2.1 liters per minute STP, flow rate nitrogen 0.275 liter per minute STP, oxygen flow rate 0.22 liter per minute STP, water flow 0.0015 liter per minute STP by pulsed 2 minute injections according to a valve opening cycle of the introducer for 0.2 seconds and closing the valve for 2 seconds, all for a period of 90 minutes, recreating the oxide layer in places where it is absent.

Then, keeping the argon / nitrogen / oxygen plasma under the above conditions, the pressure of the plasma chamber is increased up to 5300 Pa, the power of the plasma generator increased to 400W and a solution of hydrated oxynitrate of zirconium (IV) and yttrium nitrate (ZrO (N0 ₃ ) ₂ 6H ₂ 0 and Y (N0 ₃ ) ₂ molar ratio 8.5 / 1 is sprayed with a capillary diameter 500 μιη, with a flow rate of 1 , 5 cm ³ per minute, by pulsed injections of 2 minutes following a valve opening cycle of the introduction device for 0.2 second and closure of the valve for 2 seconds in the plasma discharge. the pH of the injected solution is measured continuously.

During this step, hydrated oxynitrate of zirconium (IV) and yttrium nitrate undergo the action of oxidizing species O and OH both in flight and on the substrate. The pressure conditions in the plasma chamber and the power generated by the reactor associated with the size of the droplets produced by the injector, cause the nitrates to arrive on the substrate in the liquid state and can infiltrate the longitudinal cracks. and in delamination cracks between the substrate and the thermal barrier. Then we proceed to a post-treatment step of a duration of the order of 8 minutes of maintaining the plasma gas flow rates and the plasma discharge on. Thus, hydrated oxynitrate of zirconium (IV) and yttrium nitrate deposited in and on the substrate still undergo the oxidative chemistry of the discharge, mainly the action of species O, since the solution is no longer introduced during this step. In addition, the reactor can also be supplied with water so as to produce OH species during the post-treatment. The temperature at the substrate gate remains below 400 ° C.

Taking into account the deposition rate, which is between 15 and 25 μηι / ΐι, the injection and post-treatment cycles are repeated 10 times in order to infiltrate as much as possible the longitudinal cracks, in particular existing between the damaged thermal barrier and the substrate. Then gradually, thanks to the servocontrol set up between the pumping unit, the generator, the injector, and the measurement of the pH or the electrical conductivity value of the solution to be injected or both, the pressure in the chamber to plasma is decreased, the power of the plasma generator decreased, the size of the ceramic precursor droplets decreased and the nitrate solution concentration increased. Thus, the precursor droplets pass from the liquid state to a viscous gel state during the intermediate cycles, and then solid during the last injection / post-treatment cycles the recovery of large scaled surface areas. The first 10 injection / post-treatment cycles completed, the plasma generator power table pressure parameters, the ceramic precursor solution injection system are slaved, see FIG. function of the measurement of the electrical conductivity and pH of the solution in nitrates. The parameters are modified at the beginning of each injection cycle according to Table 1 given below. This control is achieved by playing on a pump valve, the control of the generator and the capillary injector used here by the diameter of the capillary. Table 1

The thermal barrier obtained after the injection / post-treatment cycles has at the reactor outlet a crystallized structure visible in the diffractogram while the temperature in the plasma discharge remains moderate.

The thermal barrier may finally, optionally, undergo a temperature annealing of between 300 and 1400 ° C. The annealing can be carried out in the reactor, then equipped of a heating substrate holder, or outside, under air or under a controlled atmosphere of gas and pressure. Annealing removes residual surface traces of nitrates and water. The annealing is also at the origin of a germination-growth process of the constitutive grains of the layer.

The method makes it possible to obtain, see FIGS. 4 and 5, a good local repair of the thermal barrier by recreating on the underlayer 2 an oxide layer 9 at the locations where the initial thermal barrier 4 and the initial oxide layer 3 have peeled off and infiltrating a new ceramic layer 8 thus allowing the initial thermal barrier 4 to be bonded. The new deposited ceramic 8 comprises micropores and nanopores 10. The new ceramic layer 8 has a very low thermal conductivity and is well adherent to the initial thermal barrier 4 and the substrate 1. The longitudinal emergent cracks initially present in the thermal barrier are also clogged. Any ceramic surplus 8 deposited on the top of the initial thermal barrier 4 may be removed by light dry sandblasting or polishing.

During the above steps, the component to be repaired can be connected to a source of external pressure in excess pressure relative to the pressure of the plasma chamber. Thus a flow of gas, for example air, comes from the outside through the perforated component and exits through the cooling channels thus preventing the deposit of precursors in the holes. A gas other than air may also be used. This avoids a hole punching operation that is both expensive and relatively risky for the integrity of the component.

Example 2

The procedure is as in Example 1 except that there is no servocontrol on the injection system of the ceramic precursor droplets. The diameter of the capillaries remains fixed at 500 μιη. The enslavement is given in Table 2. Table 2

At the level of the repaired zone results are obtained very similar to those obtained in Example 1, namely a good infiltration of the deposited ceramic and a good adhesion between the initial thermal barrier 4 and the newly deposited ceramic. total of the ceramic 8 deposited is slightly lower. With a control on two parameters, pressure in the plasma chamber and power of the plasma generator, instead of three, pressure in the plasma chamber, power of the plasma generator and injection system, the setting is less fine and the The last cycles in which a good yield is obtained with a solid state of the precursors of ceramics are less optimized.

Example 3

The procedure is as in Example 1 except that the component is covered with a projected plasma thermal barrier such as a multi-perforated combustion chamber. Conventionally, such a combustion chamber has large chipped areas of several cm ² of surface with delamination cracks. The component to be repaired can be connected to the external pressure, or underpressure or overpressure with respect to the external pressure while being in excess pressure with respect to the pressure of the plasma chamber.

At the repaired zone, results are obtained very similar to those obtained in Example 1, in particular a good infiltration of the deposited ceramic 8 and a good adhesion between the initial thermal barrier 4 and the newly deposited ceramic 8. After repair the multi-perforation holes of the combustion chamber remain open and there is no need for a spotting operation.

For this example, the servo-control table of the composition of the solution to be injected, the pressure in the plasma chamber, the power of the plasma generator and the injection system is as follows:

Table 3

Example 4

The procedure is as in Example 1 or 3, but after the injection / post-treatment sequences, a solution of hydrated zirconium (IV) oxynitrate and yttrium nitrate for repairing the thermal barrier is added. injection ceramic precursors of anti-CMAS composition such as gadolinium zirconate Gd ₂ Zr ₂ 0 ₇ or neodymium zirconate or neodymium oxide doped zirconia to create an anti-CMAS layer.

The precursors are, for example, ZrO (NO ₃ ) ₂ , 6H ₂ O and Gd (NO ₃ ) ₃ , 6H ₂ O to form gadolinium zirconate. The results are substantially identical to those of Example 1, namely a good well-infiltrated repair and on the surface a ceramic of Gd ₂ Zr ₂ 0 ₇ microporous and nano porous while being well adherent.

Example 5

The procedure is as in Examples 1 or 3, but the injection / post-treatment sequences of a hydrated oxynitrate solution of zirconium (IV) and of yttrium nitrate are replaced by injection / post-treatment sequences of other thermal barrier precursors. It is thus possible to inject ceramic precursors of composition called anti-CMAS such as ZrO (NO ₃ ) ₂ , 6H ₂ 0 and Gd (NO ₃ ) ₃ , 6H ₂ 0 precursors of Gd ₂ Zr ₂ O ₇ or precursors of doped zirconia. with neodymium oxide. The local repair of the initial thermal barrier is then carried out with a ceramic of anti-CMAS composition comprising micropores and nanopores. This anti-CMAS composition has a very low thermal conductivity and is therefore well suited for thermal barrier repair. The anti-CMAS composition is well adhered to the substrate and to the initial thermal barrier 4 consisting of zirconia partially stabilized with yttrine.

Example 6

The procedure is as in Examples 1 or 3 but by injecting an evolutionary composition solution during the injection / post-treatment cycles. For example, during the first ten cycles, a solution of (ZrO (NO ₃ ) ₂ , 6H ₂ O and Y (NO ₃ ) ₂ ) precursors of the yttriated zirconia is injected. Gradually the concentration of these precursors is adjusted to add Gd (N0 ₃ ) ₃ , 6H ₂ 0 precursor of gadolinium zirconate Gd ₂ Zr ₂ 0 ₇ , while respecting a total concentration compatible with the servocontrol. During the last cycles of injection / post-treatment, the concentration of yttrium nitrate is gradually reduced to zero, the other two precursors remaining. Is obtained a good repair of the damaged thermal barrier 4 with a ceramic having a composition gradient: composition Zr ₂ 0 ₃ , Y ₂ 0 ₃ near the substrate 1 nickel-based superalloy, composition Gd ₂ Zr ₂ 07 in the outer surface. The microporous and nanoporous structure of the deposited ceramic 8 is hardly influenced by the composition or the composition gradient.

Example 7

The procedure is as in Examples 1 or 3 but by injecting a solution of ceramic precursors of particular composition during the first ten cycles of injection / post-treatment. Said solution of ceramic precursors is intended to introduce, for example, compounds having particular properties at the oxide layer 9 interface and deposited thermal barrier 8. It may be for example a solution of Eu (N0 ₃ ) ₃ , 6H ₂ 0 and ZrO (N0 ₃ ) ₂ , 6H ₂ 0 precursors of europium zirconate Eu ₂ Zr ₂ 0 ₇ OR yttrium-doped zirconia or Eu solution (N0 ₃ ) ₃ , 6H ₂ 0, ZrO (NO ₃ ) ₂ , 6H ₂ 0 and Gd (NO ₃ ) ₃ , 6H ₂ 0 precursors of europium doped gadolinium zirconate. These compounds possess ions with particular optical properties, can be used to check the state of stress of the repaired area in the context of non-destructive testing. In this way, besides a good repair of the damaged barrier with a ceramic, an ease of control thanks to the sensors close to the substrate 1 of the component. The microporous and nanoporous structure of the deposited ceramic is hardly influenced by the composition of this particular layer.

Depending on the requirements, this particular solution of ceramic precursors can be injected during other injection / post-treatment cycles than the first ten. It may also be precursors of ceramics mixed with suspensions, colloids or metal alkoxides in order to obtain specific properties locally.

Example 8

One operates as in the previous examples but with another device for creating the plasma which comprises a device for generating and transporting the microwave energy and a device for coupling with the flow, for example an atomizer. The microwave energy created by two microwave generators in pulsed mode at 2.45 GHz, type SAIREM GMP 20 KE / D adjustable power from 200 to 10000 W each stabilized to ± 0.1%, placed face to face. The microwave energy is injected along a diameter of the quartz tube by two waveguides. The device also includes two impedance adapters, computer control interfaces and reflected power meters.

The coupling with the gas produced in a cylindrical exciter in stainless steel cooled by circulating water in a double jacket and placed around a quartz tube with a base in which the plasma is created and cooled for example in air. There are provided flanges connected to the subassembly for injecting the precursors and to the heating device of the substrate. The substrate holder can be cooled or heated and used in a static or rotating configuration.

The working pressure in the plasma chamber is from 1 to 20000 Pa, with a maximum gas flow rate of about 12 liters per minute STP, of which 5 liters per minute of STPet oxygen and 7 liters per minute of argon STP.

With the enslavement between the concentration of the ceramic precursor solution to be injected, the pressure in the plasma chamber, the power of the microwave generators and the injection system, satisfactory results are obtained.

Claims

claims

A method of repairing a component thermal barrier comprising a substrate coated with such a thermal barrier, said substrate being made of a high-performance alloy, said thermal barrier being adherent to the alloy and having a lower thermal conductivity than the alloy, the barrier thermal device comprising at least one ceramic, a region of the thermal barrier to be repaired, comprising the following steps:

c) Injecting an uncharged ceramic precursor gas into a plasma discharge within the plasma chamber,

steps b) and c) being repeated.

The method of claim 1, wherein said concentration is increasing at each iteration of step b) and said parameter is decreasing at each iteration of step b) to infiltrate delamination cracks of the thermal barrier and then clog surface areas chipped of said region.

A method according to claim 1 or 2 comprising a step of cleaning said region performed in the plasma chamber prior to step a), comprising injecting a reducing gas into a plasma discharge.

Method according to one of the preceding claims, comprising a step of preparing said region carried out in the plasma chamber prior to step a), comprising injecting an oxidizing gas in a plasma discharge.

The method of claims 3 and 4, wherein the cleaning step occurs before the preparation step.

6. Method according to one of the preceding claims, wherein step b) comprises pulsed injections of said carrier gas, with a ratio of injection time / rest period between 1/5 and 1/30.

7. Method according to one of the preceding claims, wherein steps b) and c) are performed 6 to 30 times.

8. Method according to one of the preceding claims, wherein the ceramic precursor comprises at least one of hydrated oxynitrate zirconium (IV), yttrium nitrate, gadolinium nitrate and europium nitrate, concentration between 0.05 and 0.5 mole per liter, pH between 1.2 and 2 and electrical conductivity of between 0.02 and 0.2 Siemens cm ^-1 .

9. Method according to one of the preceding claims, wherein the power of the plasma discharge is between 60 and 20000 W, preferably between 200 and 10000 W.

10. Method according to one of the preceding claims, wherein the pressure in the plasma chamber of the plasma reactor is between 1 and 20000 Pa during steps b) and c), preferably between 100 and 10000 Pa.

11. Method according to one of the preceding claims, wherein the injection is performed by a capillary diameter between 50 and 900 μιη.

12. Method according to one of the preceding claims, wherein the alloy comprises a base superalloy selected from at least one nickel and cobalt.

13. Method according to one of the preceding claims, wherein the thickness of the thermal barrier is between 50 and 300 μιη, preferably between 100 and 150 μιη.

14. Method according to one of the preceding claims, wherein the thermal barrier is permeable.

15. Method according to one of the preceding claims, wherein the component to be repaired is permeable with open pores, the open pores being fed with a pressure fluid greater than the pressure in the plasma chamber, said fluid then occupying the pores. open, blocking the deposition of the precursors in the open pores and leaving open pore free after repair.

The method according to one of the preceding claims, wherein the thermal barrier comprises at least one of zirconia, preferably yttrié or doped with neodymium oxide, gadolinium zirconate, neodymium zirconate and europium zirconate. .