WO2014108473A1 - Fabrication d'un objet en volume par lithographie, a resolution spatiale amelioree - Google Patents
Fabrication d'un objet en volume par lithographie, a resolution spatiale amelioree Download PDFInfo
- Publication number
- WO2014108473A1 WO2014108473A1 PCT/EP2014/050326 EP2014050326W WO2014108473A1 WO 2014108473 A1 WO2014108473 A1 WO 2014108473A1 EP 2014050326 W EP2014050326 W EP 2014050326W WO 2014108473 A1 WO2014108473 A1 WO 2014108473A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- plane
- projection image
- illuminated
- along
- mask
- Prior art date
Links
- 238000001459 lithography Methods 0.000 title claims abstract description 17
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 13
- 230000033001 locomotion Effects 0.000 claims abstract description 70
- 238000006073 displacement reaction Methods 0.000 claims abstract description 43
- 239000000463 material Substances 0.000 claims abstract description 21
- 238000000034 method Methods 0.000 claims description 20
- 230000005855 radiation Effects 0.000 claims description 20
- 230000001360 synchronised effect Effects 0.000 claims description 9
- 230000004048 modification Effects 0.000 claims description 8
- 238000012986 modification Methods 0.000 claims description 8
- 230000001131 transforming effect Effects 0.000 abstract description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 6
- 239000007788 liquid Substances 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 230000008021 deposition Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000004513 sizing Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000005510 radiation hardening Methods 0.000 description 1
- 239000007779 soft material Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
- B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
Definitions
- the oblique axis preferably forms a right angle with the plane to be illuminated.
- FIG. 6 is a schematic side view of the inside of a first variant of the head 12 of the device according to the invention of FIG. 1,
- FIG. 7 a chip (DLP for "Digital Light Processor", for example of the XGA or 1080p type) 3b constituted by a grid of moving mirrors, each moving mirror corresponding to a pixel of the mask 3 which is turned on or off according to the position of this mobile mirror.
- DLP Digital Light Processor
- the projection image 5, issuing from the head 12, can thus be displaced in two different directions of the plane to be illuminated 9. In this way, by moving this image 5 along the two directions, it is possible to cover a desired area of the plane 9 .
- the displacement of the mask 3 comprises a displacement of the mask 3 with respect to the mirror 6, and the means 7 for moving the mask 3 are arranged to move said mask 3 with respect to the mirror 6.
- the device 1 further comprises means for modifying the projection image 5 in the plane 9 synchronously with the displacement of the projection image 5 along the first direction 10 (on the principle of the document EPI, 344, 633) including in the specific case of the invention means for modifying the mask 3 in a manner synchronized with the movement of the mask 3 having the component 15 along the oblique axis 16.
- a position 25 of the projection image 5 on the plane to be illuminated 9 along the finished line 22 is bordered with a position 26 of the projection image 5 on the plane to be illuminated 9 along the following line 23 (i.e., an edge of the projection image 5 in its position along the finished line 22 touches an edge of the projection image 5 in its position 26 along the line 23, but that the position 25 of the projection image 5 on the plane to be illuminated 9 along the finished line 22 is not superimposed with the position 26 of the projection image 5 on the plane to be illuminated 9 along the next line 23) or
Abstract
Description
Claims
Priority Applications (11)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP14700275.2A EP2943329B1 (fr) | 2013-01-09 | 2014-01-09 | Fabrication d'un objet en volume par lithographie, a resolution spatiale amelioree |
SG11201505400VA SG11201505400VA (en) | 2013-01-09 | 2014-01-09 | Production of a volume object by lithography, having improved spatial resolution |
CN201480004293.9A CN104981339B (zh) | 2013-01-09 | 2014-01-09 | 通过具有改进的空间分辨率的平版印刷制备体积物体 |
BR112015016385A BR112015016385A2 (pt) | 2013-01-09 | 2014-01-09 | fabricação de um objeto em volume por litografia, de resolução espacial melhorada |
EA201591209A EA030782B1 (ru) | 2013-01-09 | 2014-01-09 | Устройство и способ для изготовления объемного объекта посредством стереолитографии с повышенным пространственным разрешением |
US14/759,796 US9632420B2 (en) | 2013-01-09 | 2014-01-09 | Production of a volume object by lithography, having improved spatial resolution |
KR1020157019324A KR102217967B1 (ko) | 2013-01-09 | 2014-01-09 | 개선된 공간 해상도를 갖는, 리소그래피에 의한 체적 물체의 생산 |
MX2015008589A MX2015008589A (es) | 2013-01-09 | 2014-01-09 | Produccion de un objeto voluminoso mediante litografia, con resolucion espacial mejorada. |
CA2897119A CA2897119A1 (fr) | 2013-01-09 | 2014-01-09 | Fabrication d'un objet en volume par lithographie, a resolution spatiale amelioree |
IL239835A IL239835A0 (en) | 2013-01-09 | 2015-07-08 | Fabrication of a volume object using lithography with improved spatial resolution |
HK15112424.4A HK1211540A1 (en) | 2013-01-09 | 2015-12-17 | Production of a volume object by lithography, having improved spatial resolution |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1350177A FR3000698B1 (fr) | 2013-01-09 | 2013-01-09 | Fabrication d'un objet en volume par lithographie, a resolution spatiale amelioree |
FR1350177 | 2013-01-09 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2014108473A1 true WO2014108473A1 (fr) | 2014-07-17 |
Family
ID=47833292
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2014/050326 WO2014108473A1 (fr) | 2013-01-09 | 2014-01-09 | Fabrication d'un objet en volume par lithographie, a resolution spatiale amelioree |
Country Status (13)
Country | Link |
---|---|
US (1) | US9632420B2 (fr) |
EP (1) | EP2943329B1 (fr) |
KR (1) | KR102217967B1 (fr) |
CN (1) | CN104981339B (fr) |
BR (1) | BR112015016385A2 (fr) |
CA (1) | CA2897119A1 (fr) |
EA (1) | EA030782B1 (fr) |
FR (1) | FR3000698B1 (fr) |
HK (1) | HK1211540A1 (fr) |
IL (1) | IL239835A0 (fr) |
MX (1) | MX2015008589A (fr) |
SG (1) | SG11201505400VA (fr) |
WO (1) | WO2014108473A1 (fr) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10151960B2 (en) | 2015-09-25 | 2018-12-11 | Microsoft Technology Licensing, Llc | Backlight assembly with tunable grating layer for local dimming |
US10792868B2 (en) | 2015-09-09 | 2020-10-06 | Carbon, Inc. | Method and apparatus for three-dimensional fabrication |
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US10543645B2 (en) * | 2017-09-15 | 2020-01-28 | The Boeing Company | Feedstock lines for additive manufacturing of an object |
US11351724B2 (en) | 2017-10-03 | 2022-06-07 | General Electric Company | Selective sintering additive manufacturing method |
US11420384B2 (en) | 2017-10-03 | 2022-08-23 | General Electric Company | Selective curing additive manufacturing method |
US11590691B2 (en) | 2017-11-02 | 2023-02-28 | General Electric Company | Plate-based additive manufacturing apparatus and method |
US11254052B2 (en) | 2017-11-02 | 2022-02-22 | General Electric Company | Vatless additive manufacturing apparatus and method |
US20190129308A1 (en) | 2017-11-02 | 2019-05-02 | Taiwan Green Point Enterprises Co., Ltd. | Digital masking system, pattern imaging apparatus and digital masking method |
US10821668B2 (en) | 2018-01-26 | 2020-11-03 | General Electric Company | Method for producing a component layer-by- layer |
US10821669B2 (en) | 2018-01-26 | 2020-11-03 | General Electric Company | Method for producing a component layer-by-layer |
US11498283B2 (en) | 2019-02-20 | 2022-11-15 | General Electric Company | Method and apparatus for build thickness control in additive manufacturing |
US11794412B2 (en) | 2019-02-20 | 2023-10-24 | General Electric Company | Method and apparatus for layer thickness control in additive manufacturing |
US11254053B2 (en) | 2019-02-28 | 2022-02-22 | 3D Systems, Inc. | High resolution three-dimensional printing system |
US11179891B2 (en) | 2019-03-15 | 2021-11-23 | General Electric Company | Method and apparatus for additive manufacturing with shared components |
US11951679B2 (en) | 2021-06-16 | 2024-04-09 | General Electric Company | Additive manufacturing system |
US11731367B2 (en) | 2021-06-23 | 2023-08-22 | General Electric Company | Drive system for additive manufacturing |
US11958250B2 (en) | 2021-06-24 | 2024-04-16 | General Electric Company | Reclamation system for additive manufacturing |
US11958249B2 (en) | 2021-06-24 | 2024-04-16 | General Electric Company | Reclamation system for additive manufacturing |
US11826950B2 (en) | 2021-07-09 | 2023-11-28 | General Electric Company | Resin management system for additive manufacturing |
US11813799B2 (en) | 2021-09-01 | 2023-11-14 | General Electric Company | Control systems and methods for additive manufacturing |
Citations (3)
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US5247180A (en) | 1991-12-30 | 1993-09-21 | Texas Instruments Incorporated | Stereolithographic apparatus and method of use |
WO1995015841A1 (fr) | 1992-06-05 | 1995-06-15 | Finab Limited | Machine de fabrication d'objets par photopolymerisation selective de liquides ou poudres par couches |
EP1344633A1 (fr) | 2002-03-12 | 2003-09-17 | Teijin Seiki Co., Ltd. | Procédé et dispositif stéréolitographique en trois dimensions |
Family Cites Families (14)
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JPS5994419A (ja) * | 1982-11-19 | 1984-05-31 | Canon Inc | 分割焼付け装置におけるアライメント方法 |
US5133987A (en) * | 1989-10-27 | 1992-07-28 | 3D Systems, Inc. | Stereolithographic apparatus and method |
JPH04305438A (ja) * | 1991-04-02 | 1992-10-28 | Sanyo Electric Co Ltd | 光学的立体造形方法 |
JPH07290578A (ja) * | 1994-04-26 | 1995-11-07 | Japan Synthetic Rubber Co Ltd | 光造形装置 |
JPH08281810A (ja) * | 1995-04-18 | 1996-10-29 | New Kurieishiyon:Kk | 光造形装置 |
JPH09213623A (ja) * | 1996-02-02 | 1997-08-15 | Canon Inc | 走査露光装置及びそれを用いたデバイスの製造方法 |
AU2001296428A1 (en) * | 2000-09-27 | 2002-04-08 | The Regents Of The University Of California | Dynamic mask projection stereo micro lithography |
JP2005268439A (ja) * | 2004-03-17 | 2005-09-29 | Tadahiro Omi | 等倍x線露光方法及び等倍x線露光装置 |
US20060147845A1 (en) | 2005-01-05 | 2006-07-06 | Flanigan Kyle Y | Electrically reconfigurable photolithography mask for semiconductor and micromechanical substrates |
JP4713223B2 (ja) * | 2005-05-26 | 2011-06-29 | 芝浦メカトロニクス株式会社 | パターン転写装置及び転写方法 |
JP2008225417A (ja) * | 2007-03-16 | 2008-09-25 | Fujitsu Ltd | 構造体の製造方法 |
JP5234315B2 (ja) * | 2007-12-03 | 2013-07-10 | ソニー株式会社 | 光造形装置および光造形方法 |
JP5234319B2 (ja) | 2008-01-21 | 2013-07-10 | ソニー株式会社 | 光造形装置および光造形方法 |
IT1403482B1 (it) * | 2011-01-18 | 2013-10-17 | Dws Srl | Metodo per la produzione di un oggetto tridimensionale e macchina stereolitografica impiegante tale metodo |
-
2013
- 2013-01-09 FR FR1350177A patent/FR3000698B1/fr active Active
-
2014
- 2014-01-09 SG SG11201505400VA patent/SG11201505400VA/en unknown
- 2014-01-09 BR BR112015016385A patent/BR112015016385A2/pt not_active IP Right Cessation
- 2014-01-09 EP EP14700275.2A patent/EP2943329B1/fr active Active
- 2014-01-09 US US14/759,796 patent/US9632420B2/en active Active
- 2014-01-09 CN CN201480004293.9A patent/CN104981339B/zh active Active
- 2014-01-09 MX MX2015008589A patent/MX2015008589A/es unknown
- 2014-01-09 EA EA201591209A patent/EA030782B1/ru not_active IP Right Cessation
- 2014-01-09 WO PCT/EP2014/050326 patent/WO2014108473A1/fr active Application Filing
- 2014-01-09 KR KR1020157019324A patent/KR102217967B1/ko active IP Right Grant
- 2014-01-09 CA CA2897119A patent/CA2897119A1/fr not_active Abandoned
-
2015
- 2015-07-08 IL IL239835A patent/IL239835A0/en unknown
- 2015-12-17 HK HK15112424.4A patent/HK1211540A1/xx unknown
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5247180A (en) | 1991-12-30 | 1993-09-21 | Texas Instruments Incorporated | Stereolithographic apparatus and method of use |
WO1995015841A1 (fr) | 1992-06-05 | 1995-06-15 | Finab Limited | Machine de fabrication d'objets par photopolymerisation selective de liquides ou poudres par couches |
EP1344633A1 (fr) | 2002-03-12 | 2003-09-17 | Teijin Seiki Co., Ltd. | Procédé et dispositif stéréolitographique en trois dimensions |
EP1344633B1 (fr) | 2002-03-12 | 2007-07-11 | Teijin Seiki Co., Ltd. | Procédé et dispositif stéréolitographique en trois dimensions |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10792868B2 (en) | 2015-09-09 | 2020-10-06 | Carbon, Inc. | Method and apparatus for three-dimensional fabrication |
US10151960B2 (en) | 2015-09-25 | 2018-12-11 | Microsoft Technology Licensing, Llc | Backlight assembly with tunable grating layer for local dimming |
Also Published As
Publication number | Publication date |
---|---|
EA201591209A1 (ru) | 2015-12-30 |
FR3000698A1 (fr) | 2014-07-11 |
SG11201505400VA (en) | 2015-08-28 |
KR102217967B1 (ko) | 2021-02-19 |
CN104981339A (zh) | 2015-10-14 |
EP2943329A1 (fr) | 2015-11-18 |
IL239835A0 (en) | 2015-08-31 |
EP2943329B1 (fr) | 2018-05-16 |
EA030782B1 (ru) | 2018-09-28 |
HK1211540A1 (en) | 2016-05-27 |
KR20150118105A (ko) | 2015-10-21 |
FR3000698B1 (fr) | 2015-02-06 |
CN104981339B (zh) | 2017-10-27 |
US20150355553A1 (en) | 2015-12-10 |
MX2015008589A (es) | 2016-01-15 |
BR112015016385A2 (pt) | 2017-07-11 |
CA2897119A1 (fr) | 2014-07-17 |
US9632420B2 (en) | 2017-04-25 |
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