WO2013120648A1 - Method for the temporary connection of a product substrate to a carrier substrate - Google Patents
Method for the temporary connection of a product substrate to a carrier substrate Download PDFInfo
- Publication number
- WO2013120648A1 WO2013120648A1 PCT/EP2013/050849 EP2013050849W WO2013120648A1 WO 2013120648 A1 WO2013120648 A1 WO 2013120648A1 EP 2013050849 W EP2013050849 W EP 2013050849W WO 2013120648 A1 WO2013120648 A1 WO 2013120648A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- substrate
- product substrate
- layer
- product
- carrier substrate
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0213—Electrical arrangements not otherwise provided for
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68309—Auxiliary support including alignment aids
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68318—Auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/6834—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used to protect an active side of a device or wafer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
Definitions
- the invention relates to a method according to claim 1 for temporarily connecting a product substrate to a carrier substrate.
- Product substrates are often required in the semiconductor industry and may include mechanical and / or chemical or other processing steps (lithography, lacquering, coating, etc.) as well as transports of the product substrates from A to B.
- Bonding known, such as the use of UV light, laser beams, temperature or solvent.
- the thin substrates have little to no dimensional stability and typically curl without support material. While handling the mostly on back-thinned wafers based
- Bonding layer before detachment of the product substrate some places continue to be adhesive and then lead to the destruction of the product wafer when peeling at these locations.
- Peripheral edge of the product substrate more preferably in a region on the opposite side of the carrier substrate
- Connection layer is provided.
- the non-stick layer is dimensioned and designed so that when contacting with the bonding layer on the
- Carrier substrate acts a sufficient for processing and transport of the product substrate adhesive force.
- product substrate is a product substrate, for example a
- Semiconductor wafer which is usually thinned to a thickness between 0.5 .mu.m and 250 .mu.m, is tended to become increasingly thinner product substrates.
- the carrier used is, for example, a carrier substrate having a thickness of between 50 ⁇ m and 5,000 ⁇ m, in particular between 500 ⁇ m and 1000 ⁇ m.
- Carrier substrate in particular in one, preferably for Product substrate receiving side concentric, ring portion, is arranged.
- Carrier substrate in particular in a, preferably concentric, ring section, the product substrate is attached to the carrier substrate with the least possible effort and is just as easily detachable from this, without damaging the structures present on the product substrate.
- the structures are at least partially, preferably completely, surrounded by the non-stick layer. In this way, the structures are at the same time protected from the outside by the non-stick layer
- Carrier substrate acting tensile force takes place.
- a release side in particular the entire surface, sucking, preferably flexible carrier holder.
- a carrier holder is particularly suitable a chuck, in particular a spinner chuck for receiving the carrier substrate, in particular by means of negative pressure, for example
- Suction pads, holes or suction cups Suction pads, holes or suction cups.
- a mechanical recording for example by lateral brackets, conceivable.
- the recording takes place
- a flexible carrier holder is advantageous, so that the detachment of the product substrate can take place in a particularly gentle manner, while a rigid carrier holder is conceivable in the event of lateral detachment.
- a product substrate holder is, in particular similar, preferably identical in construction, as the carrier holder designed and brings a the
- this relates to the variant of the centric loading of the carrier substrate during detachment, in particular in conjunction with the flexible carrier holder. This is a particularly gentle, piece by piece evenly from
- the adhesion force acting between the connecting layer and the non-stick layer lies between 0.1 mJ / m 2 and 10 J / m 2 , in particular between 1 mJ / m 2 and 1 J / m 2 , wherein the adjustment is made by the choice of material and the size of the contact surface.
- Fig. 1 a schematic representation of an inventive
- FIG. 2 shows a schematic side view of a product substrate connected to a carrier substrate according to the invention
- Fig. 3 a schematic representation of the invention
- Fig. 4 is a schematic representation of the invention
- FIG. 1 describes a method sequence according to the invention for temporarily connecting one with structures 3, in particular one
- Topography preferably at least partially consisting of chip-stocked product substrate 2, with a substrate substrate 6.
- the process is in the plane of the drawing from left to right up to a finished product substrate-carrier substrate composite.
- 7 In the supporting substrate 6, in a connecting surface portion 13 of a product substrate receiving side 6o of the supporting substrate 6, a ring-shaped concentric to the product substrate receiving side 6o is formed
- Connecting layer 5 is applied, which extends from the side periphery 6s of the support substrate 6 inwardly.
- the bonding layer 5 protrudes from the product substrate receiving side 6o.
- Non-stick surface portion 15 applied an anti-adhesive layer 4.
- the non-stick layer 4 extends from a side circumference 2s of the
- the ring width 4b of the non-stick layer 4 approximately corresponds to the ring width 5b of the connecting layer 5.
- the non-stick layer 4 also protrudes from the connecting side 2u.
- the non-stick layer 4 surrounds, in particular encloses, at the same time the structures 3 applied on the connection side 2u.
- the ring width 4b and / or ring width 5b is advantageously between 1 mm and 25 mm, in particular between 5 mm and 15 mm.
- the product substrate 2 is rotated by 180 degrees, so to speak upside down, in order to mechanically and / or optically align the product substrate 2 with the non-stick layer 4 in a further step with respect to the carrier substrate 6 with its bonding layer 5. Subsequently, in a further process step, the
- Non-stick layer 4 is temporarily connected to the connection layer 5 at a contact surface 16.
- Non-stick layer 4 only on the edge, so peripherally and not over the entire surface of the product substrate 2 and / or the carrier substrate 6 to apply.
- the structures 3, in particular dices of the product substrate 2, in particular a product wafer, are located within the annular non-stick layer 4.
- a receiving space 14 for receiving the structures 3, in particular a sealing layer is formed by the product substrate 2 and the respective annular bonding layer 5 and adhesive layer 4 applied to the respective side perimeter 2s and 6s and the carrier substrate 6, the thickness 4d of the non-stick layer 4 and the thickness 5d of the connecting layer 5 together form the height H of the receiving space 14, which is higher according to the invention than that
- the thickness 4d is advantageously greater than the thickness of a monolayer and less than 5 .mu.m, in particular less than 2 microns.
- the thickness 5d is in an advantageous embodiment between 1 .mu.m and 1000 .mu.m, in particular between 5 .mu.m and 500 .mu.m, preferably between 10 .mu.m and 200 .mu.m.
- the height H of the receiving space 14 can be adapted to the height of the structures 3.
- the contact surface 16, which forms the temporary connection between the carrier substrate 6 and the product substrate 2 has a lot smaller area than in the previously known methods and peeling only those between the non-stick layer 4 and the
- Bonding layer 5 acting adhesive forces are overcome, which are large enough, the product substrate 2 and the carrier substrate 6 during processing and during transport
- FIG. 3 and FIG. 4 For detachment of the product substrate 2 from the carrier substrate 6 after carrying out corresponding processing steps or transport, two preferred embodiments according to the invention are shown in FIG. 3 and FIG. 4, which differ in particular in the position of introduction of the tensile force to overcome the adhesive force on the carrier substrate 6.
- the detachment of the product substrate 2 from the carrier substrate 6 takes place at least predominantly on a peripheral portion of the side circumference 6s with a tensile force that faces away from the product substrate receiving side 6o by a rigid carrier holder 12
- Abletteseite 6u is transferred to the carrier substrate 6.
- the support substrate 6 is released from the product substrate 2 fixed to a peripheral side portion of the product substrate 2 by a product substrate holder 9 on a holding side 2o facing away from the connection side 2u, by overcoming the adhesion force acting between the connection layer 5 and the release layer 4
- the tensile force to be applied in particular at the beginning, can be assisted by releasing the connection between the connecting layer 5 and the non-adhesive layer 4 in the region of application of the tensile force, ie from the side, in particular by mechanical separating means, for example a blade or a wedge, so that the traction can be further reduced.
- Both the carrier holder 12 and the product substrate holder 9 preferably work via suction paths 8, which form the product substrate 2
- the carrier substrate 6 as homogeneously as possible, in particular over the whole area, on the detachment side 6u of the carrier substrate 6 or the holding side 2o of the product substrate 2.
- a flexible, in particular elastic, carrier holder 12 ' is used for detaching the carrier substrate 6 from the product substrate 2, wherein the tensile force on detachment of the carrier substrate 6 on the carrier substrate 6 is applied predominantly centrally, so that the In contrast to the detachment according to FIG. 3, detachment does not start from the outside but from an inside 16i of the contact surface 16.
- the detachment is thus carried out concentrically from the inside, ie from the center, to the outside, wherein the bending of the carrier substrate 6 along the product substrate receiving side 6o by the elasticity and thickness of the carrier holder 12 'is adjustable.
- the suction webs 8 on the release side 6u of the carrier substrate 6 act as close as possible to the side circumference 6s of the carrier substrate 6, in particular on the rear side to the connecting surface section 13, around the
- the detachment is carried out by a detachment device 1, which consists of a fixed to supports 1 1 receptacle 10 for receiving the
- the detachment device 1 has a
- one or more of the following materials Si, glass, ceramic.
- one or more of the following materials are selected according to the invention: polymers, metals, low-viscosity materials, films.
Abstract
Description
Claims
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE112013000980.3T DE112013000980B4 (en) | 2012-02-16 | 2013-01-17 | Method for temporarily connecting a product substrate to a carrier substrate and a corresponding composite |
SG11201404960TA SG11201404960TA (en) | 2012-02-16 | 2013-01-17 | Method for temporary bonding of a product substrate to a carrier substrate |
KR1020147021338A KR102061369B1 (en) | 2012-02-16 | 2013-01-17 | Method for the temporary connection of a product substrate to a carrier substrate |
ATA9032/2013A AT517748B1 (en) | 2012-02-16 | 2013-01-17 | Process for temporarily connecting a product substrate to a carrier substrate |
CN201380009852.0A CN104115267B (en) | 2012-02-16 | 2013-01-17 | The method for temporarily connecting product substrate and base substrate |
US14/376,460 US9390956B2 (en) | 2012-02-16 | 2013-01-17 | Method for the temporary connection of a product substrate to a carrier substrate |
JP2014556963A JP6140194B2 (en) | 2012-02-16 | 2013-01-17 | Method for temporarily bonding a product substrate to a carrier substrate |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102012101237A DE102012101237A1 (en) | 2012-02-16 | 2012-02-16 | A method for temporarily connecting a product substrate to a carrier substrate |
DE102012101237.7 | 2012-02-16 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2013120648A1 true WO2013120648A1 (en) | 2013-08-22 |
Family
ID=47594741
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2013/050849 WO2013120648A1 (en) | 2012-02-16 | 2013-01-17 | Method for the temporary connection of a product substrate to a carrier substrate |
Country Status (8)
Country | Link |
---|---|
US (1) | US9390956B2 (en) |
JP (1) | JP6140194B2 (en) |
KR (1) | KR102061369B1 (en) |
CN (1) | CN104115267B (en) |
AT (1) | AT517748B1 (en) |
DE (2) | DE102012101237A1 (en) |
SG (1) | SG11201404960TA (en) |
WO (1) | WO2013120648A1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015106711A (en) * | 2013-11-29 | 2015-06-08 | エルジー ディスプレイ カンパニー リミテッド | Substrate separating device |
DE102016106351A1 (en) | 2016-04-07 | 2017-10-12 | Ev Group E. Thallner Gmbh | Method and device for bonding two substrates |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10978334B2 (en) * | 2014-09-02 | 2021-04-13 | Applied Materials, Inc. | Sealing structure for workpiece to substrate bonding in a processing chamber |
CN104916574B (en) * | 2015-04-22 | 2017-11-10 | 四川虹视显示技术有限公司 | A kind of flexible OLED device for removing scum |
TWI557831B (en) * | 2015-05-15 | 2016-11-11 | 友達光電股份有限公司 | Method for transferring micro device |
DE102015118742A1 (en) * | 2015-11-02 | 2017-05-04 | Ev Group E. Thallner Gmbh | Method for bonding and releasing substrates |
CN111048461B (en) * | 2018-10-12 | 2022-06-03 | 瀚宇彩晶股份有限公司 | Release front structure of electronic device and manufacturing method of electronic device |
WO2020178080A1 (en) * | 2019-03-05 | 2020-09-10 | Evatec Ag | Method for processing fragile substrates employing temporary bonding of the substrates to carriers |
FR3113771B1 (en) * | 2020-08-27 | 2022-10-21 | Commissariat Energie Atomique | Process for the manufacture of a substrate-handle intended for the temporary bonding of a substrate. |
Citations (8)
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US5863375A (en) * | 1995-10-31 | 1999-01-26 | Samsung Electronics Co., Ltd. | Apparatus and methods for wafer debonding using a liquid jet |
US6462415B1 (en) * | 2000-01-11 | 2002-10-08 | Fujitsu Limited | Semiconductor device as an object of thickness reduction |
JP2004288725A (en) * | 2003-03-19 | 2004-10-14 | Citizen Watch Co Ltd | Method of manufacturing semiconductor device, sealing member used for method, and feeder of sealing member |
EP1681713A1 (en) * | 2003-10-16 | 2006-07-19 | LINTEC Corporation | Surface-protecting sheet and semiconductor wafer lapping method |
WO2007099146A1 (en) * | 2006-03-01 | 2007-09-07 | Jakob + Richter Ip-Verwertungsgesellschaft Mbh | Method for processing, in particular, thin rear sides of a wafer, wafer-carrier arrangement and method for producing said type of wafer-carrier arrangement |
US20090017248A1 (en) * | 2007-07-13 | 2009-01-15 | 3M Innovative Properties Company | Layered body and method for manufacturing thin substrate using the layered body |
US7482249B2 (en) * | 2002-11-29 | 2009-01-27 | Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. | Method and device for machining a wafer, in addition to a wafer comprising a separation layer and a support layer |
EP2398040A1 (en) * | 2010-06-21 | 2011-12-21 | Brewer Science, Inc. | Method and apparatus for removing a reversibly mounted device wafer from a carrier substrate |
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JPH0828580B2 (en) * | 1993-04-21 | 1996-03-21 | 日本電気株式会社 | Wiring board structure and manufacturing method thereof |
DE4339604C2 (en) | 1993-11-20 | 1996-06-05 | Beiersdorf Ag | Use of a section of adhesive film for a detachable bond |
DE10140827B4 (en) | 2001-08-21 | 2004-07-29 | Infineon Technologies Ag | Device for debonding thin wafers |
JP2006086479A (en) * | 2004-09-17 | 2006-03-30 | Toshiba Corp | Thin film substrate holding method and semiconductor device manufacturing method |
DE102006000687B4 (en) * | 2006-01-03 | 2010-09-09 | Thallner, Erich, Dipl.-Ing. | Combination of a carrier and a wafer, device for separating the combination and methods for handling a carrier and a wafer |
GB0602410D0 (en) | 2006-02-07 | 2006-03-15 | Filtronic Compound Semiconduct | A method of bonding a semiconductor wafer to a support substrate |
JP2007214271A (en) | 2006-02-08 | 2007-08-23 | Zycube:Kk | Substrate bonding method and semiconductor device |
JP2006332686A (en) * | 2006-07-03 | 2006-12-07 | Matsushita Electric Ind Co Ltd | Solid-state imaging device |
JP5338250B2 (en) * | 2008-08-21 | 2013-11-13 | 株式会社東京精密 | Work separation method and cutting apparatus |
JP2010283097A (en) * | 2009-06-04 | 2010-12-16 | Lintec Corp | Double sided adhesive sheet |
US7975378B1 (en) * | 2010-01-06 | 2011-07-12 | Banpil Photonics, Inc. | Method of manufacturing high speed printed circuit board interconnects |
US7883991B1 (en) | 2010-02-18 | 2011-02-08 | Taiwan Semiconductor Manufacturing Company, Ltd. | Temporary carrier bonding and detaching processes |
-
2012
- 2012-02-16 DE DE102012101237A patent/DE102012101237A1/en not_active Withdrawn
-
2013
- 2013-01-17 AT ATA9032/2013A patent/AT517748B1/en active
- 2013-01-17 KR KR1020147021338A patent/KR102061369B1/en active IP Right Grant
- 2013-01-17 US US14/376,460 patent/US9390956B2/en active Active
- 2013-01-17 CN CN201380009852.0A patent/CN104115267B/en active Active
- 2013-01-17 JP JP2014556963A patent/JP6140194B2/en active Active
- 2013-01-17 DE DE112013000980.3T patent/DE112013000980B4/en active Active
- 2013-01-17 WO PCT/EP2013/050849 patent/WO2013120648A1/en active Application Filing
- 2013-01-17 SG SG11201404960TA patent/SG11201404960TA/en unknown
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US5863375A (en) * | 1995-10-31 | 1999-01-26 | Samsung Electronics Co., Ltd. | Apparatus and methods for wafer debonding using a liquid jet |
US6462415B1 (en) * | 2000-01-11 | 2002-10-08 | Fujitsu Limited | Semiconductor device as an object of thickness reduction |
US7482249B2 (en) * | 2002-11-29 | 2009-01-27 | Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. | Method and device for machining a wafer, in addition to a wafer comprising a separation layer and a support layer |
JP2004288725A (en) * | 2003-03-19 | 2004-10-14 | Citizen Watch Co Ltd | Method of manufacturing semiconductor device, sealing member used for method, and feeder of sealing member |
EP1681713A1 (en) * | 2003-10-16 | 2006-07-19 | LINTEC Corporation | Surface-protecting sheet and semiconductor wafer lapping method |
WO2007099146A1 (en) * | 2006-03-01 | 2007-09-07 | Jakob + Richter Ip-Verwertungsgesellschaft Mbh | Method for processing, in particular, thin rear sides of a wafer, wafer-carrier arrangement and method for producing said type of wafer-carrier arrangement |
US20090017248A1 (en) * | 2007-07-13 | 2009-01-15 | 3M Innovative Properties Company | Layered body and method for manufacturing thin substrate using the layered body |
EP2398040A1 (en) * | 2010-06-21 | 2011-12-21 | Brewer Science, Inc. | Method and apparatus for removing a reversibly mounted device wafer from a carrier substrate |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015106711A (en) * | 2013-11-29 | 2015-06-08 | エルジー ディスプレイ カンパニー リミテッド | Substrate separating device |
DE102016106351A1 (en) | 2016-04-07 | 2017-10-12 | Ev Group E. Thallner Gmbh | Method and device for bonding two substrates |
WO2017174570A1 (en) | 2016-04-07 | 2017-10-12 | Ev Group E. Thallner Gmbh | Method and device for bonding two substrates |
Also Published As
Publication number | Publication date |
---|---|
CN104115267A (en) | 2014-10-22 |
DE112013000980B4 (en) | 2020-09-24 |
AT517748A5 (en) | 2017-04-15 |
CN104115267B (en) | 2017-08-25 |
SG11201404960TA (en) | 2014-11-27 |
US20140374144A1 (en) | 2014-12-25 |
DE102012101237A1 (en) | 2013-08-22 |
JP2015507373A (en) | 2015-03-05 |
KR20140128976A (en) | 2014-11-06 |
US9390956B2 (en) | 2016-07-12 |
JP6140194B2 (en) | 2017-05-31 |
KR102061369B1 (en) | 2020-02-11 |
DE112013000980A5 (en) | 2014-11-27 |
AT517748B1 (en) | 2023-05-15 |
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