WO2013120648A1 - Method for the temporary connection of a product substrate to a carrier substrate - Google Patents

Method for the temporary connection of a product substrate to a carrier substrate Download PDF

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Publication number
WO2013120648A1
WO2013120648A1 PCT/EP2013/050849 EP2013050849W WO2013120648A1 WO 2013120648 A1 WO2013120648 A1 WO 2013120648A1 EP 2013050849 W EP2013050849 W EP 2013050849W WO 2013120648 A1 WO2013120648 A1 WO 2013120648A1
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WO
WIPO (PCT)
Prior art keywords
substrate
product substrate
layer
product
carrier substrate
Prior art date
Application number
PCT/EP2013/050849
Other languages
German (de)
French (fr)
Inventor
Jürgen Burggraf
Gerald MITTENDORFER
Original Assignee
Ev Group E. Thallner Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ev Group E. Thallner Gmbh filed Critical Ev Group E. Thallner Gmbh
Priority to DE112013000980.3T priority Critical patent/DE112013000980B4/en
Priority to SG11201404960TA priority patent/SG11201404960TA/en
Priority to KR1020147021338A priority patent/KR102061369B1/en
Priority to ATA9032/2013A priority patent/AT517748B1/en
Priority to CN201380009852.0A priority patent/CN104115267B/en
Priority to US14/376,460 priority patent/US9390956B2/en
Priority to JP2014556963A priority patent/JP6140194B2/en
Publication of WO2013120648A1 publication Critical patent/WO2013120648A1/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0213Electrical arrangements not otherwise provided for
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68309Auxiliary support including alignment aids
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68318Auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/6834Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used to protect an active side of a device or wafer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68381Details of chemical or physical process used for separating the auxiliary support from a device or wafer
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details

Definitions

  • the invention relates to a method according to claim 1 for temporarily connecting a product substrate to a carrier substrate.
  • Product substrates are often required in the semiconductor industry and may include mechanical and / or chemical or other processing steps (lithography, lacquering, coating, etc.) as well as transports of the product substrates from A to B.
  • Bonding known, such as the use of UV light, laser beams, temperature or solvent.
  • the thin substrates have little to no dimensional stability and typically curl without support material. While handling the mostly on back-thinned wafers based
  • Bonding layer before detachment of the product substrate some places continue to be adhesive and then lead to the destruction of the product wafer when peeling at these locations.
  • Peripheral edge of the product substrate more preferably in a region on the opposite side of the carrier substrate
  • Connection layer is provided.
  • the non-stick layer is dimensioned and designed so that when contacting with the bonding layer on the
  • Carrier substrate acts a sufficient for processing and transport of the product substrate adhesive force.
  • product substrate is a product substrate, for example a
  • Semiconductor wafer which is usually thinned to a thickness between 0.5 .mu.m and 250 .mu.m, is tended to become increasingly thinner product substrates.
  • the carrier used is, for example, a carrier substrate having a thickness of between 50 ⁇ m and 5,000 ⁇ m, in particular between 500 ⁇ m and 1000 ⁇ m.
  • Carrier substrate in particular in one, preferably for Product substrate receiving side concentric, ring portion, is arranged.
  • Carrier substrate in particular in a, preferably concentric, ring section, the product substrate is attached to the carrier substrate with the least possible effort and is just as easily detachable from this, without damaging the structures present on the product substrate.
  • the structures are at least partially, preferably completely, surrounded by the non-stick layer. In this way, the structures are at the same time protected from the outside by the non-stick layer
  • Carrier substrate acting tensile force takes place.
  • a release side in particular the entire surface, sucking, preferably flexible carrier holder.
  • a carrier holder is particularly suitable a chuck, in particular a spinner chuck for receiving the carrier substrate, in particular by means of negative pressure, for example
  • Suction pads, holes or suction cups Suction pads, holes or suction cups.
  • a mechanical recording for example by lateral brackets, conceivable.
  • the recording takes place
  • a flexible carrier holder is advantageous, so that the detachment of the product substrate can take place in a particularly gentle manner, while a rigid carrier holder is conceivable in the event of lateral detachment.
  • a product substrate holder is, in particular similar, preferably identical in construction, as the carrier holder designed and brings a the
  • this relates to the variant of the centric loading of the carrier substrate during detachment, in particular in conjunction with the flexible carrier holder. This is a particularly gentle, piece by piece evenly from
  • the adhesion force acting between the connecting layer and the non-stick layer lies between 0.1 mJ / m 2 and 10 J / m 2 , in particular between 1 mJ / m 2 and 1 J / m 2 , wherein the adjustment is made by the choice of material and the size of the contact surface.
  • Fig. 1 a schematic representation of an inventive
  • FIG. 2 shows a schematic side view of a product substrate connected to a carrier substrate according to the invention
  • Fig. 3 a schematic representation of the invention
  • Fig. 4 is a schematic representation of the invention
  • FIG. 1 describes a method sequence according to the invention for temporarily connecting one with structures 3, in particular one
  • Topography preferably at least partially consisting of chip-stocked product substrate 2, with a substrate substrate 6.
  • the process is in the plane of the drawing from left to right up to a finished product substrate-carrier substrate composite.
  • 7 In the supporting substrate 6, in a connecting surface portion 13 of a product substrate receiving side 6o of the supporting substrate 6, a ring-shaped concentric to the product substrate receiving side 6o is formed
  • Connecting layer 5 is applied, which extends from the side periphery 6s of the support substrate 6 inwardly.
  • the bonding layer 5 protrudes from the product substrate receiving side 6o.
  • Non-stick surface portion 15 applied an anti-adhesive layer 4.
  • the non-stick layer 4 extends from a side circumference 2s of the
  • the ring width 4b of the non-stick layer 4 approximately corresponds to the ring width 5b of the connecting layer 5.
  • the non-stick layer 4 also protrudes from the connecting side 2u.
  • the non-stick layer 4 surrounds, in particular encloses, at the same time the structures 3 applied on the connection side 2u.
  • the ring width 4b and / or ring width 5b is advantageously between 1 mm and 25 mm, in particular between 5 mm and 15 mm.
  • the product substrate 2 is rotated by 180 degrees, so to speak upside down, in order to mechanically and / or optically align the product substrate 2 with the non-stick layer 4 in a further step with respect to the carrier substrate 6 with its bonding layer 5. Subsequently, in a further process step, the
  • Non-stick layer 4 is temporarily connected to the connection layer 5 at a contact surface 16.
  • Non-stick layer 4 only on the edge, so peripherally and not over the entire surface of the product substrate 2 and / or the carrier substrate 6 to apply.
  • the structures 3, in particular dices of the product substrate 2, in particular a product wafer, are located within the annular non-stick layer 4.
  • a receiving space 14 for receiving the structures 3, in particular a sealing layer is formed by the product substrate 2 and the respective annular bonding layer 5 and adhesive layer 4 applied to the respective side perimeter 2s and 6s and the carrier substrate 6, the thickness 4d of the non-stick layer 4 and the thickness 5d of the connecting layer 5 together form the height H of the receiving space 14, which is higher according to the invention than that
  • the thickness 4d is advantageously greater than the thickness of a monolayer and less than 5 .mu.m, in particular less than 2 microns.
  • the thickness 5d is in an advantageous embodiment between 1 .mu.m and 1000 .mu.m, in particular between 5 .mu.m and 500 .mu.m, preferably between 10 .mu.m and 200 .mu.m.
  • the height H of the receiving space 14 can be adapted to the height of the structures 3.
  • the contact surface 16, which forms the temporary connection between the carrier substrate 6 and the product substrate 2 has a lot smaller area than in the previously known methods and peeling only those between the non-stick layer 4 and the
  • Bonding layer 5 acting adhesive forces are overcome, which are large enough, the product substrate 2 and the carrier substrate 6 during processing and during transport
  • FIG. 3 and FIG. 4 For detachment of the product substrate 2 from the carrier substrate 6 after carrying out corresponding processing steps or transport, two preferred embodiments according to the invention are shown in FIG. 3 and FIG. 4, which differ in particular in the position of introduction of the tensile force to overcome the adhesive force on the carrier substrate 6.
  • the detachment of the product substrate 2 from the carrier substrate 6 takes place at least predominantly on a peripheral portion of the side circumference 6s with a tensile force that faces away from the product substrate receiving side 6o by a rigid carrier holder 12
  • Abletteseite 6u is transferred to the carrier substrate 6.
  • the support substrate 6 is released from the product substrate 2 fixed to a peripheral side portion of the product substrate 2 by a product substrate holder 9 on a holding side 2o facing away from the connection side 2u, by overcoming the adhesion force acting between the connection layer 5 and the release layer 4
  • the tensile force to be applied in particular at the beginning, can be assisted by releasing the connection between the connecting layer 5 and the non-adhesive layer 4 in the region of application of the tensile force, ie from the side, in particular by mechanical separating means, for example a blade or a wedge, so that the traction can be further reduced.
  • Both the carrier holder 12 and the product substrate holder 9 preferably work via suction paths 8, which form the product substrate 2
  • the carrier substrate 6 as homogeneously as possible, in particular over the whole area, on the detachment side 6u of the carrier substrate 6 or the holding side 2o of the product substrate 2.
  • a flexible, in particular elastic, carrier holder 12 ' is used for detaching the carrier substrate 6 from the product substrate 2, wherein the tensile force on detachment of the carrier substrate 6 on the carrier substrate 6 is applied predominantly centrally, so that the In contrast to the detachment according to FIG. 3, detachment does not start from the outside but from an inside 16i of the contact surface 16.
  • the detachment is thus carried out concentrically from the inside, ie from the center, to the outside, wherein the bending of the carrier substrate 6 along the product substrate receiving side 6o by the elasticity and thickness of the carrier holder 12 'is adjustable.
  • the suction webs 8 on the release side 6u of the carrier substrate 6 act as close as possible to the side circumference 6s of the carrier substrate 6, in particular on the rear side to the connecting surface section 13, around the
  • the detachment is carried out by a detachment device 1, which consists of a fixed to supports 1 1 receptacle 10 for receiving the
  • the detachment device 1 has a
  • one or more of the following materials Si, glass, ceramic.
  • one or more of the following materials are selected according to the invention: polymers, metals, low-viscosity materials, films.

Abstract

The invention relates to a method for the temporary connection of a product substrate (2) to a carrier substrate (6), comprising the following method steps: - application of a connecting layer (5) onto a product substrate-accepting side (60) of the carrier substrate (6) in a connecting surface section (13) of the product substrate-accepting side (60), - application of an anti-adhesion layer (4) having a low adhesive force onto a connecting side (2u) of the product substrate (2) in an anti-adhesion surface section (15) of the connecting side (2u), the area of which at least partially, in particular predominantly, preferably substantially entirely corresponds to the area of the connecting surface section (13), wherein an accepting space (14) delimited by the connecting layer (5) and the carrier substrate (6) as well as the product substrate (2) and the anti-adhesive layer (4) is formed for receiving structures (3) that protrude from the connecting side (2u) and that are provided on the connecting side (2u) of the product substrate (2), - alignment of the product substrate (2) relative to the carrier substrate (6) and connection of the connecting layer (5) to the anti-adhesive layer (4) on a contact surface (16).

Description

Verfahren zum temporären Verbinden eines Produktsubstrats mit einem  Method for temporarily connecting a product substrate to a
Trägersubstrat  carrier substrate
B e s c h r e i b u n g Description
Die Erfindung betrifft ein Verfahren gemäß Anspruch 1 zum temporären Verbinden eines Produktsubstrats mit einem Trägersubstrat. The invention relates to a method according to claim 1 for temporarily connecting a product substrate to a carrier substrate.
Das Bearbeiten von mit Strukturen wie Chips bestückten Working with structures such as chips stocked
Produktsubstraten ist in der Halbleiterindustrie häufig erforderlich und kann mechanische und/oder chemische oder weitere Bearbeitungsschritte (Lithographie, Belackung, Beschichtung etc.) sowie Transporte der Produktsubstrate von A nach B umfassen. Product substrates are often required in the semiconductor industry and may include mechanical and / or chemical or other processing steps (lithography, lacquering, coating, etc.) as well as transports of the product substrates from A to B.
Daneben besteht ein enormer Miniaturisierungsdruck bei immer größeren Radien der Produktsubstrate (200mm, 300mm, ja bis zu 450mm), um die Bauteildichte weiter zu erhöhen. Es ist leicht vorstellbar, dass die Handhabung dieser hauchdünnen Produktsubstrate erhebliche technische Probleme bereitet. In addition, there is an enormous miniaturization pressure with ever larger radii of the product substrates (200mm, 300mm, yes up to 450mm) in order to further increase the component density. It is easy to imagine that Handling this extremely thin product substrates causes considerable technical problems.
In Abhängigkeit von den verwendeten Trägermaterialien und der Depending on the carrier materials used and the
verwendeten Verbindungsschicht zwischen Träger und Produktsubstrat sind verschiedene Verfahren zur Auflösung oder Zerstörung der used connecting layer between the carrier and the product substrate are various methods for dissolution or destruction of the
Verbindungsschicht bekannt, wie beispielsweise die Verwendung von UV-Licht, Laserstrahlen, Temperatureinwirkung oder Lösungsmittel. Bonding known, such as the use of UV light, laser beams, temperature or solvent.
Das Ablösen stellt sich zunehmend als einer der kritischsten The detachment is increasingly becoming one of the most critical
Prozessschritte dar, da die dünnen Substrate mit Substratdicken von wenigen μιη beim Ablösen/Abziehen leicht brechen oder durch die für den Vorgang des Ablösens notwendigen Kräfte Schaden erleiden. Process steps, since the thin substrates with substrate thicknesses of a few μιη easily break during peeling / peeling or suffer from the forces necessary for the process of detachment.
Darüber hinaus haben die dünnen Substrate kaum bis keine Formstabilität und rollen sich typischerweise ohne Stützmaterial ein. Während der Handhabung der meist auf rückgedünnten Wafern basierenden In addition, the thin substrates have little to no dimensional stability and typically curl without support material. While handling the mostly on back-thinned wafers based
Produktsubstrate ist mithin eine Fixierung und Unterstützung der Wafer praktisch unumgänglich.  Product substrates is therefore virtually a fixation and support of the wafer practically inevitable.
Bekannte Verfahren zum temporären Verbinden (temporary bonding) eines Produktsubstrats mit einem Trägersubstrat setzen zum leichten Ablösen des Wafers etwa auf doppelseitige adhäsive Filme, Flüssigkeiten, Wachs oder ähnliche Substanzen, damit das Produktsubstrat nach der Bearbeitung möglichst leicht und energiearm vom Trägersubstrat getrennt werden kann. Solche Verfahren sind in der US5,725,923, der Known methods for temporary bonding of a product substrate to a carrier substrate for easy detachment of the wafer, for example, on double-sided adhesive films, liquids, wax or similar substances, so that the product substrate can be separated as easily and low energy from the carrier substrate after processing. Such methods are disclosed in US Pat. No. 5,725,923
US2007/01 84630, EP1286385A2 und US5,863,375 gezeigt.  US2007 / 01 84630, EP1286385A2 and US5,863,375.
Folgende technische Probleme bestehen beim temporären Verbinden: 1. Hoher Materialverbrauch teilweise teurer Materialen. The following technical problems exist when temporarily connecting: 1. High material consumption partly expensive materials.
2. Hohe Temperaturen beim temporären Bonden und dadurch hoher Energiebedarf.  2. High temperatures for temporary bonding and therefore high energy requirements.
3. Zeitintensive Ablöseprozesse, insbesondere bei chemischer  3. Time-consuming removal processes, especially in chemical
Trennung/Auflösung der Verbindungsschicht, besonders bei nasschemischen Prozessen, die meist aufwendig, umweltschädlich und damit ineffizient sind. Beim chemischen Auflösen kommt es außerdem vor, dass durch nicht vollständiges Auflösen der  Separation / dissolution of the bonding layer, especially in wet-chemical processes, which are usually expensive, environmentally harmful and therefore inefficient. The chemical dissolution also happens that not completely dissolving the
Verbindungsschicht vor dem Ablösen des Produktsubstrats einige Stellen weiterhin haftend wirken und dann beim Ablösen an diesen Stellen zur Zerstörung des Produktwafers führen.  Bonding layer before detachment of the product substrate, some places continue to be adhesive and then lead to the destruction of the product wafer when peeling at these locations.
4. Reinigung des Produktsubstrats nach dem Ablösen notwendig.  4. Cleaning of the product substrate after peeling necessary.
Es ist daher die Aufgabe der vorliegenden Erfindung, ein Verfahren anzugeben, um ein Produktsubstrat möglichst zerstörungsfrei und mit geringstmöglichem Energieaufwand auf einem Trägersubstrat temporär zu bonden, und mit dem das Produktsubstrat auch wieder leicht von dem Trägersubstrat gelöst werden kann. It is therefore an object of the present invention to provide a method for bonding a product substrate as non-destructively as possible and with the least possible energy expenditure on a carrier substrate, and with which the product substrate can also be easily detached again from the carrier substrate.
Diese Aufgabe wird mit den Merkmalen des Anspruchs 1 gelöst. This object is achieved with the features of claim 1.
Vorteilhafte Weiterbildungen der Erfindung sind in den Unteransprüchen angegeben. In den Rahmen der Erfindung fallen auch sämtliche Advantageous developments of the invention are specified in the subclaims. The scope of the invention also includes all
Kombinationen aus zumindest zwei von in der Beschreibung, den Combinations of at least two of in the description, the
Ansprüchen und/oder den Figuren angegebenen Merkmalen. Bei angegebenen Wertebereichen sollen auch innerhalb der genannten Grenzen liegende Werte als Grenzwerte offenbart und in beliebiger Kombination beanspruchbar sein. Der Erfindung liegt der Gedanke zugrunde, eine Antihaftschicht statt am Trägersubstrat am Produktsubstrat aufzubringen, und zwar insbesondere in Bereichen, die nicht mit Chips besetzt sind, vorzugsweise am Claims and / or the figures given characteristics. For given value ranges, values lying within the stated limits should also be disclosed as limit values and be claimable in any combination. The invention is based on the idea to apply an anti-adhesion layer instead of the carrier substrate on the product substrate, in particular in areas which are not covered with chips, preferably on
Umfangsrand des Produktsubstrats, noch bevorzugter in einem Bereich, an dessen gegenüberliegender Seite am Trägersubstrat eine Peripheral edge of the product substrate, more preferably in a region on the opposite side of the carrier substrate
Verbindungsschicht vorgesehen ist. Connection layer is provided.
Auf diese Weise ist es erfindungsgemäß möglich, am Trägersubstrat durch die Verbindungsschicht und das Trägersubstrat einen In this way it is possible according to the invention, on the carrier substrate by the connecting layer and the carrier substrate a
Aufnahmeraum für die am Produktsubstrat vorgesehenen Strukturen, insbesondere Chips, zu bilden. To form receiving space for provided on the product substrate structures, in particular chips.
Die Antihaftschicht ist dabei erfindungsgemäß so dimensioniert und ausgebildet, dass bei Kontaktierung mit der Verbindungsschicht am According to the invention, the non-stick layer is dimensioned and designed so that when contacting with the bonding layer on the
Trägersubstrat eine zum Bearbeiten und Transport des Produktsubstrats ausreichende Adhäsionskraft wirkt. Carrier substrate acts a sufficient for processing and transport of the product substrate adhesive force.
Mit Produktsubstrat ist ein Produktsubstrat, beispielsweise ein With product substrate is a product substrate, for example a
Halbleiterwafer, gemeint, das üblicherweise auf eine Dicke zwischen 0,5 μm und 250 μm gedünnt ist/wird, wobei die Tendenz zu immer dünneren Produktsubstraten geht.  Semiconductor wafer, which is usually thinned to a thickness between 0.5 .mu.m and 250 .mu.m, is tended to become increasingly thinner product substrates.
Als Träger wird beispielsweise ein Trägersubstrat mit einer Dicke zwischen 50 μm und 5.000 μm, insbesondere zwischen 500 μm und 1000 μm verwendet. The carrier used is, for example, a carrier substrate having a thickness of between 50 μm and 5,000 μm, in particular between 500 μm and 1000 μm.
Gemäß einer bevorzugten Ausführungsform der Erfindung ist vorgesehen, dass der Verbindungsflächenabschnitt am Seitenumfang des According to a preferred embodiment of the invention it is provided that the connection surface portion on the side of the circumference
Trägersubstrats, insbesondere in einem, vorzugsweise zur Produktsubstrataufnahmeseite konzentrischen, Ringabschnitt, angeordnet ist. Durch homogene beziehungsweise gleichmäßig über die jeweiligen Oberflächen verteilte Aufbringung der Verbindungsschicht und/oder der Antihaftschicht am Seitenumfang des Produktsubstrats und/oder Carrier substrate, in particular in one, preferably for Product substrate receiving side concentric, ring portion, is arranged. By homogeneous or evenly distributed over the respective surfaces application of the bonding layer and / or the release layer on the side of the product substrate and / or
Trägersubstrats, insbesondere in einem, vorzugsweise konzentrischen, Ringabschnitt, wird das Produktsubstrat mit geringst möglichem Aufwand am Trägersubstrat angebracht und ist ebenso leicht wieder von diesem lösbar, ohne die auf dem Produktsubstrat vorhandenen Strukturen zu beschädigen. Carrier substrate, in particular in a, preferably concentric, ring section, the product substrate is attached to the carrier substrate with the least possible effort and is just as easily detachable from this, without damaging the structures present on the product substrate.
Mit Vorteil werden die Strukturen zumindest teilweise, vorzugsweise vollständig, von der Antihaftschicht umgeben. Auf diese Weise werden die Strukturen durch die Antihaftschicht gleichzeitig vor äußeren Advantageously, the structures are at least partially, preferably completely, surrounded by the non-stick layer. In this way, the structures are at the same time protected from the outside by the non-stick layer
Einflüssen geschützt. Protected influences.
Gemäß einer weiteren vorteilhaften Ausführungsform der Erfindung ist vorgesehen, dass ein Ablösen des Produktsubstrats vom Trägersubstrat durch Beaufschlagung des Trägersubstrats mit einer zumindest According to a further advantageous embodiment of the invention it is provided that a detachment of the product substrate from the carrier substrate by applying at least one of the carrier substrate
überwiegend zentrisch oder einer zumindest überwiegend seitlich an einer der Produktsubstrataufnahmeseite abgewandten Ablöseseite des  predominantly centric or at least predominantly laterally on a side of the product substrate receiving side facing away from the release side of the
Trägersubstrats wirkenden Zugkraft erfolgt.  Carrier substrate acting tensile force takes place.
Dabei ist es besonders vorteilhaft, wenn die Zugkraft mittels eines die Ablöseseite, insbesondere vollflächig, ansaugenden, vorzugsweise flexiblen Trägerhalters aufgebracht wird. Als Trägerhalter eignet sich besonders ein Chuck, insbesondere ein Spinner Chuck zur Aufnahme des Trägersubstrats, insbesondere mittels Unterdruck, beispielsweise It is particularly advantageous if the tensile force is applied by means of a release side, in particular the entire surface, sucking, preferably flexible carrier holder. As a carrier holder is particularly suitable a chuck, in particular a spinner chuck for receiving the carrier substrate, in particular by means of negative pressure, for example
Saugbahnen, Bohrungen oder Saugnäpfen. Alternativ ist eine mechanische Aufnahme, beispielsweise durch seitliche Klammern, denkbar. In einer weiteren, alternativen Ausgestaltung erfolgt die Aufnahme Suction pads, holes or suction cups. Alternatively, a mechanical recording, for example by lateral brackets, conceivable. In a further, alternative embodiment, the recording takes place
elektrostatisch. Besonders bei der temprischen Ablösung ist ein flexibler Trägerhalter von Vorteil, damit die Ablösung des Produktsubstrats auf besonders schonende Art und Weise erfolgen kann, während bei einer seitlichen Ablösung ein starrer Trägerhalter denkbar ist. electrostatically. Particularly in the case of temporary detachment, a flexible carrier holder is advantageous, so that the detachment of the product substrate can take place in a particularly gentle manner, while a rigid carrier holder is conceivable in the event of lateral detachment.
Ein Produktsubstrathalter ist, insbesondere gleichartig, vorzugsweise baugleich, wie der Trägerhalter ausgestaltet und bringt eine dem A product substrate holder is, in particular similar, preferably identical in construction, as the carrier holder designed and brings a the
Trägerhalter entgegengesetzte Kraft auf das Produktsubstrat, Carrier holder opposite force on the product substrate,
insbesondere vollflächig, auf. especially full surface, on.
Soweit das Ablösen konzentrisch von einer zum Aufnahmeraum As far as the detachment concentric from one to the receiving space
weisenden Innenseite der Kontaktfläche erfolgt, betrifft dies die Variante der zentrischen Beaufschlagung des Trägersubstrats beim Ablösen, insbesondere in Verbindung mit dem flexiblen Trägerhalter. Hierdurch wird ein besonders schonendes, Stück für Stück gleichmäßig vom facing inside of the contact surface, this relates to the variant of the centric loading of the carrier substrate during detachment, in particular in conjunction with the flexible carrier holder. This is a particularly gentle, piece by piece evenly from
Zentrum zum Umfang gerichtetes Ablösen erreicht. Center to the circumference peeling achieved.
Dagegen ist es erfindungsgemäß mit Vorteil denkbar, bei der Variante des überwiegend seitlichen Ablösens des Produktsubstrats vom Trägersubstrat oder umgekehrt des Trägersubstrats vom Produktsubstrat ein Anlösen durch mechanische Trennmittel vorzusehen, wodurch der Beginn des Ablösens weniger ruckartig und damit schonender für das Produktsubstrat erfolgt. By contrast, it is conceivable with advantage in the variant of the predominantly lateral detachment of the product substrate from the carrier substrate or vice versa of the carrier substrate from the product substrate to provide a release by mechanical release means, whereby the beginning of the detachment is less jerky and thus gentler for the product substrate.
Erfindungsgemäß ist mit Vorteil vorgesehen, dass die zwischen der Verbindungsschicht und der Antihaftschicht wirkende Adhäsionskraft zwischen 0, 1 mJ/m2 und 10 J/m2, insbesondere zwischen 1 mJ/m2 und 1 J/m2, liegt, wobei die Einstellung durch Materialwahl und die Größe der Kontaktfläche erfolgt. According to the invention, it is advantageously provided that the adhesion force acting between the connecting layer and the non-stick layer lies between 0.1 mJ / m 2 and 10 J / m 2 , in particular between 1 mJ / m 2 and 1 J / m 2 , wherein the adjustment is made by the choice of material and the size of the contact surface.
Weitere Vorteile, Merkmale und Einzelheiten der Erfindung ergeben sich aus der nachfolgenden Beschreibung bevorzugter Ausführungsbeispiele sowie anhand der Zeichnungen; diese zeigen in: Further advantages, features and details of the invention will become apparent from the following description of preferred embodiments and from the drawings; these show in:
Fig. 1 : eine schematische Darstellung eines erfindungsgemäßen Fig. 1: a schematic representation of an inventive
Verfahrensablaufs,  Process flow
Fig. 2: eine schematische Seitenansicht eines erfindungsgemäß mit einem Trägersubstrat verbundenen Produktsubstrats, 2 shows a schematic side view of a product substrate connected to a carrier substrate according to the invention,
Fig. 3 : eine schematische Darstellung des erfindungsgemäßen Fig. 3: a schematic representation of the invention
Ablösens des Produktsubstrats vom Trägersubstrat in einer ersten Ausführungsform,  Detaching the product substrate from the carrier substrate in a first embodiment,
Fig. 4 eine schematische Darstellung des erfindungsgemäßen Fig. 4 is a schematic representation of the invention
Ablösens des Produktsubstrats vom Trägersubstrat in einer zweiten Ausführungsform.  Detaching the product substrate from the carrier substrate in a second embodiment.
In den Figuren sind gleiche Bauteile und Bauteile mit der gleichen In the figures, the same components and components with the same
Funktion mit den gleichen Bezugszeichen gekennzeichnet.  Function marked with the same reference numerals.
Figur 1 beschreibt einen erfindungsgemäßen Verfahrensablauf zum temporären Verbinden eines mit Strukturen 3, insbesondere einer FIG. 1 describes a method sequence according to the invention for temporarily connecting one with structures 3, in particular one
Topografie, vorzugsweise zumindest teilweise bestehend aus Chips bestückten Produktsubstrats 2, mit einem Träger substrat 6. Der Ablauf ist in der Zeichnungsebene von links nach rechts bis zu einem fertigen Produktsubstrat-Trägersubstrat- Verbund 7. Beim Trägersubstrat 6 wird in einen Verbindungsflächenabschnitt 13 einer Produktsubstrataufnahmeseite 6o des Trägersubstrats 6 eine zur Produktsubstrataufnahmeseite 6o konzentrische, ringförmige Topography, preferably at least partially consisting of chip-stocked product substrate 2, with a substrate substrate 6. The process is in the plane of the drawing from left to right up to a finished product substrate-carrier substrate composite. 7 In the supporting substrate 6, in a connecting surface portion 13 of a product substrate receiving side 6o of the supporting substrate 6, a ring-shaped concentric to the product substrate receiving side 6o is formed
Verbindungsschicht 5 aufgebracht, die sich vom Seitenumfang 6s des Trägersubstrats 6 nach innen erstreckt. Die Verbindungsschicht 5 steht von der Produktsubstrataufnahmeseite 6o ab. Connecting layer 5 is applied, which extends from the side periphery 6s of the support substrate 6 inwardly. The bonding layer 5 protrudes from the product substrate receiving side 6o.
Insbesondere parallel hierzu, vorzugsweise gleichzeitig, wird auf eine Verbindungsseite 2u des Produktsubstrats 2 in einem In particular, parallel to this, preferably simultaneously, is applied to a connection side 2u of the product substrate 2 in a
Antihaftflächenabschnitt 15 eine Antihaftschicht 4 aufgebracht. Die Antihaftschicht 4 erstreckt sich von einem Seitenumfang 2s des Non-stick surface portion 15 applied an anti-adhesive layer 4. The non-stick layer 4 extends from a side circumference 2s of the
Produktsubstrats 2 nach innen und bildet einen konzentrischen Product substrate 2 inside, forming a concentric
Ringabschnitt. Die Ringbreite 4b der Antihaftschicht 4 entspricht in etwa der Ringbreite 5b der Verbindungsschicht 5. Die Antihaftschicht 4 steht ebenfalls von der Verbindungsseite 2u ab. Die Antihaftschicht 4 umgibt, insbesondere umschließt, gleichzeitig die auf der Verbindungsseite 2u aufgebrachten Strukturen 3. Ring section. The ring width 4b of the non-stick layer 4 approximately corresponds to the ring width 5b of the connecting layer 5. The non-stick layer 4 also protrudes from the connecting side 2u. The non-stick layer 4 surrounds, in particular encloses, at the same time the structures 3 applied on the connection side 2u.
Die Ringbreite 4b und/oder Ringbreite 5b liegt mit Vorteil zwischen 1mm und 25mm, insbesondere zwischen 5mm und 15mm. The ring width 4b and / or ring width 5b is advantageously between 1 mm and 25 mm, in particular between 5 mm and 15 mm.
Anschließend wird das Produktsubstrat 2 um 180 Grad gedreht, also quasi auf den Kopf gestellt, um das Produktsubstrat 2 mit der Antihaftschicht 4 in einem weiteren Schritt gegenüber dem Trägersubstrat 6 mit seiner Verbindungsschicht 5 mechanisch und/oder optisch auszurichten. Anschließend wird in einem weiteren Verfahrensschritt die Subsequently, the product substrate 2 is rotated by 180 degrees, so to speak upside down, in order to mechanically and / or optically align the product substrate 2 with the non-stick layer 4 in a further step with respect to the carrier substrate 6 with its bonding layer 5. Subsequently, in a further process step, the
Antihaftschicht 4 mit der Verbindungsschicht 5 an einer Kontaktfläche 16 temporär verbunden. Non-stick layer 4 is temporarily connected to the connection layer 5 at a contact surface 16.
Gemäß Figur 2 besteht die erfindungsgemäße Lösung darin, die According to Figure 2, the inventive solution is the,
Antihaftschicht 4 nur am Rand, also peripher und nicht über die gesamte Oberfläche des Produktsubstrats 2 und/oder des Trägersubstrats 6 aufzubringen. Die Strukturen 3, insbesondere Dices des Produktsubstrats 2, insbesondere eines Produktwafers, befinden sich innerhalb der ringförmigen Antihaftschicht 4. Die Verbindungsschicht 5 mit Non-stick layer 4 only on the edge, so peripherally and not over the entire surface of the product substrate 2 and / or the carrier substrate 6 to apply. The structures 3, in particular dices of the product substrate 2, in particular a product wafer, are located within the annular non-stick layer 4. The connecting layer 5 with
entsprechend starker adhäsiver Wirkung wird auf dem Trägersubstrat 6 ebenfalls peripher und korrespondierend zu der Antihaftschicht 4 aufgebracht. Nach dem Kontaktieren wird durch das Produktsubstrat 2 und die jeweils kreisringförmige, am jeweiligen Seitenumfang 2s und 6s aufgebrachte Verbindungsschicht 5 und die Haftschicht 4 sowie das Trägersubstrat 6 ein Aufnahmeraum 14 zur Aufnahme der Strukturen 3, insbesondere dichtend, gebildet, wobei die Dicke 4d der Antihaftschicht 4 und die Dicke 5d der Verbindungsschicht 5 gemeinsam die Höhe H des Aufnahmeraums 14 bilden, die erfindungsgemäß höher ist als die correspondingly strong adhesive action is also applied to the carrier substrate 6 peripherally and corresponding to the non-stick layer 4. After contacting, a receiving space 14 for receiving the structures 3, in particular a sealing layer, is formed by the product substrate 2 and the respective annular bonding layer 5 and adhesive layer 4 applied to the respective side perimeter 2s and 6s and the carrier substrate 6, the thickness 4d of the non-stick layer 4 and the thickness 5d of the connecting layer 5 together form the height H of the receiving space 14, which is higher according to the invention than that
Strukturen 3 auf dem Produktwafer 2, so dass die Strukturen 3 den  Structures 3 on the product wafer 2, so that the structures 3 the
Trägerwafer 6 nicht berühren. Die Dicke 4d ist mit Vorteil größer als die Dicke eines Monolayers und kleiner als 5 μm, insbesondere kleiner als 2 μm. Die Dicke 5d liegt in vorteilhafter Ausgestaltung zwischen 1 μm und 1000 μm, insbesondere zwischen 5 μm und 500 μm, vorzugsweise zwischen 10 μm und 200 μm. Durch Einstellung der Dicke 5d ist die Höhe H des Aufnahmeraums 14 an die Höhe der Strukturen 3 anpassbar.  Do not touch carrier wafer 6. The thickness 4d is advantageously greater than the thickness of a monolayer and less than 5 .mu.m, in particular less than 2 microns. The thickness 5d is in an advantageous embodiment between 1 .mu.m and 1000 .mu.m, in particular between 5 .mu.m and 500 .mu.m, preferably between 10 .mu.m and 200 .mu.m. By adjusting the thickness 5d, the height H of the receiving space 14 can be adapted to the height of the structures 3.
Die Kontaktfläche 16, die die temporäre Verbindung zwischen dem Trägersubstrat 6 und dem Produktsubstrat 2 bildet, besitzt eine viel kleinere Fläche als bei den bisher bekannten Verfahren und beim Ablösen müssen nur die zwischen der Antihaftschicht 4 und der The contact surface 16, which forms the temporary connection between the carrier substrate 6 and the product substrate 2, has a lot smaller area than in the previously known methods and peeling only those between the non-stick layer 4 and the
Verbindungsschicht 5 wirkenden Adhäsionskräfte überwunden werden, die groß genug sind, das Produktsubstrat 2 und das Trägersubstrat 6 während der Verarbeitung und während des Transports Bonding layer 5 acting adhesive forces are overcome, which are large enough, the product substrate 2 and the carrier substrate 6 during processing and during transport
zusammenzuhalten, jedoch mit relativ geringem Kraftaufwand wieder voneinander trennbar sind, insbesondere da die Kontaktfläche 16 nur einen geringen Teil der Gesamtfläche der Produktsubstrataufnahmeseite 6o und/oder der Verbindungsseite 2u einnimmt. hold together, but with relatively little effort again are separable, especially since the contact surface 16 occupies only a small part of the total area of the product substrate receiving side 6o and / or the connection side 2u.
Für das Ablösen des Produktsubstrats 2 von dem Trägersubstrat 6 nach Durchführen entsprechender Bearbeitungsschritte oder eines Transports sind erfindungsgemäß zwei bevorzugte Ausführungsformen in Figur 3 und Figur 4 dargestellt, die sich insbesondere in der Position der Einbringung der Zugkraft zur Überwindung der Adhäsionskraft auf das Trägersubstrat 6 unterscheiden. For detachment of the product substrate 2 from the carrier substrate 6 after carrying out corresponding processing steps or transport, two preferred embodiments according to the invention are shown in FIG. 3 and FIG. 4, which differ in particular in the position of introduction of the tensile force to overcome the adhesive force on the carrier substrate 6.
Bei der in Figur 3 gezeigten Ausführungsform erfolgt das Ablösen des Produktsubstrats 2 vom Trägersubstrat 6 durch Beaufschlagung des Trägersubstrats 6 zumindest überwiegend an einem Umfangsabschnitt des Seitenumfangs 6s mit einer Zugkraft, die durch einen starren Trägerhalter 12 an einer zur Produktsubstrataufnahmeseite 6o abgewandten In the embodiment shown in FIG. 3, the detachment of the product substrate 2 from the carrier substrate 6 takes place at least predominantly on a peripheral portion of the side circumference 6s with a tensile force that faces away from the product substrate receiving side 6o by a rigid carrier holder 12
Ablöseseite 6u auf das Trägersubstrat 6 übertragen wird. Hierdurch wird das Trägersubstrat 6 von dem durch einen Produktsubstrathalter 9 an einer zur Verbindungsseite 2u abgewandten Halteseite 2o fixierten Produktsubstrat 2 beginnend am Umfangsabschnitt des Produktsubstrats 2 gelöst, und zwar durch Überwinden der zwischen der Verbindungsschicht 5 und der Antihaftschicht 4 wirkenden Adhäsionskraft an der  Ablöseseite 6u is transferred to the carrier substrate 6. As a result, the support substrate 6 is released from the product substrate 2 fixed to a peripheral side portion of the product substrate 2 by a product substrate holder 9 on a holding side 2o facing away from the connection side 2u, by overcoming the adhesion force acting between the connection layer 5 and the release layer 4
Kontaktfläche 16 in diesem Umfangsabschnitt. Würde die Zugkraft bei Verwendung eines starren Trägerhalters 12 nicht seitlich, sondern vielmehr zentrisch aufgebracht werden, müsste die Adhäsionskraft an der gesamten Kontaktfläche 16 im wesentlichen gleichzeitig überwunden werden, was zu einer stärkeren Beanspruchung des Produktsubstrats 2 durch eine höhere Zugkraft führen würde. Die, insbesondere zu Beginn aufzubringende Zugkraft kann durch Anlösen der Verbindung zwischen der Verbindungsschicht 5 und der Antihaftschicht 4 im Bereich der Aufbringung der Zugkraft, also von der Seite her, insbesondere durch mechanische Trennmittel, beispielsweise eine Klinge oder einen Keil, unterstützt werden, so dass die Zugkraft weiter reduziert werden kann. Contact surface 16 in this peripheral portion. Would the traction at Using a rigid support holder 12 not laterally, but rather be applied centrally, the adhesion to the entire contact surface 16 would have to be overcome substantially simultaneously, which would lead to a greater stress on the product substrate 2 by a higher tensile force. The tensile force to be applied, in particular at the beginning, can be assisted by releasing the connection between the connecting layer 5 and the non-adhesive layer 4 in the region of application of the tensile force, ie from the side, in particular by mechanical separating means, for example a blade or a wedge, so that the traction can be further reduced.
Sowohl der Trägerhalter 12 als auch der Produktsubstrathalter 9 arbeiten vorzugsweise über Saugbahnen 8, die das Produktsubstrat 2 Both the carrier holder 12 and the product substrate holder 9 preferably work via suction paths 8, which form the product substrate 2
beziehungsweise das Trägersubstrat 6 möglichst homogen, insbesondere vollflächig, an der Ablöseseite 6u des Trägersubstrats 6 beziehungsweise der Halteseite 2o des Produktsubstrats 2 fixieren. or the carrier substrate 6 as homogeneously as possible, in particular over the whole area, on the detachment side 6u of the carrier substrate 6 or the holding side 2o of the product substrate 2.
In der erfindungsgemäß bevorzugten Ausführungsform des Ablösens gemäß Figur 4 wird ein flexibler, insbesondere elastischer, Trägerhalter 12' zum Ablösen des Trägersubstrats 6 von dem Produktsubstrat 2 verwendet, wobei die Zugkraft beim Ablösen des Trägersubstrats 6 am Trägersubstrat 6 überwiegend zentrisch aufgebracht wird, so dass das Ablösen im Gegensatz zu dem Ablösen gemäß Figur 3 nicht von außen beginnt, sondern von einer Innenseite 16i der Kontaktfläche 16. 4, a flexible, in particular elastic, carrier holder 12 'is used for detaching the carrier substrate 6 from the product substrate 2, wherein the tensile force on detachment of the carrier substrate 6 on the carrier substrate 6 is applied predominantly centrally, so that the In contrast to the detachment according to FIG. 3, detachment does not start from the outside but from an inside 16i of the contact surface 16.
Die Ablösung erfolgt damit konzentrisch von innen, also vom Zentrum, nach außen, wobei die Verbiegung des Trägersubstrats 6 entlang der Produktsubstrataufnahmeseite 6o durch die Elastizität und Dicke des Trägerhalter 12' einstellbar ist. Bei der in Figur 4 gezeigten Ausführungsform ist es besonders wichtig, dass die Saugbahnen 8 an der Ablöseseite 6u des Trägersubstrats 6 möglichst nahe am Seitenumfang 6s des Trägersubstrats 6, insbesondere rückseitig zum Verbindungsflächenabschnitt 13 , wirken, um das The detachment is thus carried out concentrically from the inside, ie from the center, to the outside, wherein the bending of the carrier substrate 6 along the product substrate receiving side 6o by the elasticity and thickness of the carrier holder 12 'is adjustable. In the embodiment shown in FIG. 4, it is particularly important that the suction webs 8 on the release side 6u of the carrier substrate 6 act as close as possible to the side circumference 6s of the carrier substrate 6, in particular on the rear side to the connecting surface section 13, around the
Trägersubstrat 6 während des Ablösens sicher am flexiblen Trägerhalter 12' zu fixieren. Carrier substrate 6 during the detachment securely on the flexible carrier holder 12 'to fix.
Das Ablösen erfolgt durch eine Ablösevorrichtung 1 , die aus einer auf Stützen 1 1 fixierten Aufnahme 10 zur Aufnahme des The detachment is carried out by a detachment device 1, which consists of a fixed to supports 1 1 receptacle 10 for receiving the
Produktsubstrathalters 9 und dem Produktsubstrathalter 9 sowie einer nicht gezeigten Vakuumeinrichtung zum Anschluss der Ansaugbahnen 8 gebildet ist. Weiterhin weist die Ablösevorrichtung 1 eine die Product substrate holder 9 and the product substrate holder 9 and a vacuum device, not shown, for connecting the suction paths 8 is formed. Furthermore, the detachment device 1 has a
Trägerhalter 12, 12' mit der beschriebenen Zugkraft beaufschlagende Robotik, insbesondere in Form eines Roboterarms, auf, die nicht dargestellt ist. Carrier holder 12, 12 'with the described tensile force acting on robotics, in particular in the form of a robot arm, on, which is not shown.
Als Hauptbestandteil für das Trägersubstrat wird mit Vorteil As a main component of the carrier substrate is advantageous
erfindungsgemäß eines oder mehrere der folgenden Materialien gewählt: Si, Glas, Keramik. Als Hauptbestandteil für die Antihaftschicht/Ver- bindungsschicht S wird erfindungsgemäß eines oder mehrere der folgenden Materialien gewählt: Polymere, Metalle, niedrigviskose Materialien, Folien. selected according to the invention one or more of the following materials: Si, glass, ceramic. As the main constituent of the non-stick layer / compound layer S, one or more of the following materials are selected according to the invention: polymers, metals, low-viscosity materials, films.
B ezu gszeichen l i s te License plate
1 Ablösevorrichtung 1 detachment device
2 Produktsubstrat 2 product substrate
2o Halteseite 2o holding side
2s Seitenumfang 2s page size
2u Verbindungsseite 2u connection side
3 Strukturen 3 structures
4 Antihaftschicht 4 non-stick coating
4b Ringbreite 4b ring width
4d Dicke 4d thickness
5 Verbindungsschicht 5 bonding layer
5b Ringbreite 5b ring width
5d Dicke 5d thickness
6 Trägersubstrat 6 carrier substrate
6o Produktsubstrataufnahmeseite 6o product substrate receiving side
6s Seitenumfang 6s page size
6u Ablöseseite 6u transfer page
7 Produktsubstrat-Trägersubstrat-Verbund 8 Saug struktur 7 Product substrate-carrier substrate composite 8 Suction structure
9 Produktsubstrathalter 9 product substrate holder
10 Aufnahme  10 recording
11 Stützen  11 columns
12, 12' Trägerhalter  12, 12 'carrier holder
13 Verbindungsflächenabschnitt  13 connecting surface section
14 Aufnahmeraum  14 recording room
15 Antihaftflächenabschnitt  15 non-stick surface section
16 Kontaktfläche  16 contact area
16i Innenseite  16i inside
H Höhe  H height

Claims

P a t e n t a n s p r ü c h e Patent claims
1. Verfahren zum temporären Verbinden eines Produktsubstrats (2) mit einem Trägersubstrat (6) mit folgenden Verfahrensschritten:1. A method for temporarily connecting a product substrate (2) to a carrier substrate (6) with the following method steps:
- Aufbringen einer Verbindungsschicht (5) auf eine - Applying a compound layer (5) on a
Produktsubstrataufnahmeseite (6o) des Trägersubstrats (6) in einem Verbindungsflächenabschnitt (13) der Produktsubstrataufnahmeseite (6o),  Product substrate receiving side (6o) of the supporting substrate (6) in a joining surface portion (13) of the product substrate receiving side (6o),
- Aufbringen einer Antihaftschicht (4) mit geringer Adhäsionskraft auf eine Verbindungsseite (2u) des Produktsubstrats (2) in einem mit dem Verbindungsflächenabschnitt (13) zumindest teilweise, insbesondere zumindest überwiegend, vorzugsweise im  - Applying a non-adhesive layer (4) with low adhesion force on a connection side (2u) of the product substrate (2) in one with the connection surface portion (13) at least partially, in particular at least predominantly, preferably in
Wesentlichen vollständig, flächenmäßig korrespondierenden Antihaftflächenabschnitt (15) der Verbindungsseite (2u), wobei ein von der Verbindungsschicht (5) und dem Trägersubstrat (6) sowie dem Produktsubstrat (2) und der Antihaftschicht (4) begrenzter Aufnahmeraum (14) zur Aufnahme von an der Verbindungsseite (2u) des Produktsubstrat (2) vorgesehenen, von der  Substantially completely, surfaceally corresponding non-adhesive surface portion (15) of the connection side (2u), wherein a of the connection layer (5) and the carrier substrate (6) and the product substrate (2) and the non-stick layer (4) limited receiving space (14) for receiving at the connection side (2u) of the product substrate (2) provided by the
Verbindungsseite (2u) abstehenden Strukturen (3) gebildet wird, Connecting side (2u) protruding structures (3) is formed,
- Ausrichten des Produktsubstrats (2) gegenüber dem Trägersubstrat (6) und Verbinden der Verbindungsschicht (5) mit der - Aligning the product substrate (2) relative to the carrier substrate (6) and connecting the connecting layer (5) with the
Antihaftschicht (4) an einer Kontaktfläche (16). Non-stick layer (4) on a contact surface (16).
2. Verfahren nach Anspruch 1 , bei dem ein Verbindungsflächenabschnitt (13) am Seitenumfang (6s) des Trägersubstrats (6), insbesondere in einem, vorzugsweise zur Produktsubstrataufnahme (6o) konzentrischen, Ringabschnitt, angeordnet ist. 2. The method of claim 1, wherein a connecting surface portion (13) on the side circumference (6s) of the carrier substrate (6), in particular in a, preferably to the product substrate receiving (6o) concentric, ring portion is arranged.
3. Verfahren nach einem der vorhergehenden Ansprüche, bei dem der Antihaftflächenabschnitt (15) am Seitenumfang (2s) des 3. The method according to any one of the preceding claims, wherein the non-stick surface portion (15) on the side circumference (2s) of the
Produktsubstrats (2), insbesondere in einem, vorzugsweise zum Antihaftflächenabschnitt (15) konzentrischen, Ringabschnitt, angeordnet ist.  Product substrate (2), in particular in a, preferably to the non-adhesive surface portion (15) concentric ring portion, is arranged.
4. Verfahren nach einem der vorhergehenden Ansprüche, bei dem die Strukturen (3) zumindest teilweise, vorzugsweise vollständig, von der Antihaftschicht (4) umgeben werden. 4. The method according to any one of the preceding claims, wherein the structures (3) at least partially, preferably completely, are surrounded by the non-stick layer (4).
5. Verfahren nach einem der vorhergehenden Ansprüche, bei dem ein Ablösen des Produktsubstrats (2) vom Trägersubstrat (6) durch Beaufschlagung des Trägersubstrats (6) mit einer zumindest überwiegend zentrisch oder einer zumindest überwiegend seitlich an einer der Produktsubstrataufnahmeseite (6o) abgewandten Ablöseseite (6u) des Trägersubstrats (6) wirkenden Zugkraft erfolgt. 5. The method according to any one of the preceding claims, wherein a detachment of the product substrate (2) from the carrier substrate (6) by acting on the carrier substrate (6) with an at least predominantly centric or at least predominantly laterally on one of the product substrate receiving side (6o) facing away from the release side ( 6u) of the carrier substrate (6) acting tensile force takes place.
6. Verfahren nach Anspruch 5, bei dem die Zugkraft mittels eines die Ablöseseite (6u), insbesondere vollflächig, ansaugenden, vorzugsweise flexiblen Trägerhalters (12, 12') aufgebracht wird. 6. The method according to claim 5, wherein the tensile force by means of the release side (6u), in particular full-surface, sucking, preferably flexible support holder (12, 12 ') is applied.
7. Verfahren nach einem der Ansprüche 5 oder 6, bei dem das Ablösen konzentrisch von einer zum Aufnahmeraum (14) weisenden 7. The method according to any one of claims 5 or 6, wherein the detachment concentrically facing from one to the receiving space (14)
Innenseite (16i) der Kontaktfläche (16) erfolgt.  Inside (16i) of the contact surface (16) takes place.
8. Verfahren nach Anspruch 5, bei dem beim Beginn des zumindest überwiegend seitlichen Ablösens ein Anlösen durch mechanische Trennmittel erfolgt. 8. The method according to claim 5, wherein at the beginning of the at least predominantly lateral detachment takes place by mechanical release agent.
9. Produktsubstrat-Trägersubstrat-Verbund (7), bestehend aus 9. product substrate-carrier substrate composite (7), consisting of
einem Trägersubstrat (6) mit einer auf eine Produktsubstrataufnahmeseite (6o) des Trägersubstrats (6) in einem Verbindungsflächenabschnitt (13) der Produktsubstrataufnahmeseite (6o) aufgebrachten Verbindungsschicht (5) sowie  a supporting substrate (6) having a connecting layer (5) applied to a product substrate receiving side (6o) of the supporting substrate (6) in a connecting surface portion (13) of the product substrate receiving side (6o);
einem mit dem Trägersubstrat (6) entlang einer Kontaktfläche (16) zwischen der Verbindungsschicht (5) und einer auf eine  one with the carrier substrate (6) along a contact surface (16) between the connecting layer (5) and one on a
Verbindungsseite (2u) des Produktsubstrats (2) in einem mit dem Verbindungsflächenabschnitt (13) zumindest teilweise  Connecting side (2u) of the product substrate (2) in one with the connection surface portion (13) at least partially
flächenmäßig korrespondierenden Antihaftflächenabschnitt (15) der Verbindungsseite (2u) aufgebrachten Antihaftschicht (4)  areal corresponding anti-adhesive surface portion (15) of the connecting side (2u) applied anti-adhesive layer (4)
verbundenen Produktsubstrat (2), wobei in einem von der  connected product substrate (2), wherein in one of the
Verbindungsschicht (5) und dem Trägersubstrat (6) sowie dem Produktsubstrat (2) und der Antihaftschicht (4) begrenzten  Connection layer (5) and the carrier substrate (6) and the product substrate (2) and the non-stick layer (4) limited
Aufnahmeraum (14) an der Verbindungsseite (2u) des  Receiving space (14) on the connecting side (2u) of
Produktsubstrats (2) vorgesehene, von der Verbindungsseite (2u) abstehende Strukturen aufgenommen sind.  Product substrate (2) provided, from the connection side (2u) protruding structures are accommodated.
PCT/EP2013/050849 2012-02-16 2013-01-17 Method for the temporary connection of a product substrate to a carrier substrate WO2013120648A1 (en)

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DE112013000980.3T DE112013000980B4 (en) 2012-02-16 2013-01-17 Method for temporarily connecting a product substrate to a carrier substrate and a corresponding composite
SG11201404960TA SG11201404960TA (en) 2012-02-16 2013-01-17 Method for temporary bonding of a product substrate to a carrier substrate
KR1020147021338A KR102061369B1 (en) 2012-02-16 2013-01-17 Method for the temporary connection of a product substrate to a carrier substrate
ATA9032/2013A AT517748B1 (en) 2012-02-16 2013-01-17 Process for temporarily connecting a product substrate to a carrier substrate
CN201380009852.0A CN104115267B (en) 2012-02-16 2013-01-17 The method for temporarily connecting product substrate and base substrate
US14/376,460 US9390956B2 (en) 2012-02-16 2013-01-17 Method for the temporary connection of a product substrate to a carrier substrate
JP2014556963A JP6140194B2 (en) 2012-02-16 2013-01-17 Method for temporarily bonding a product substrate to a carrier substrate

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DE112013000980B4 (en) 2020-09-24
AT517748A5 (en) 2017-04-15
CN104115267B (en) 2017-08-25
SG11201404960TA (en) 2014-11-27
US20140374144A1 (en) 2014-12-25
DE102012101237A1 (en) 2013-08-22
JP2015507373A (en) 2015-03-05
KR20140128976A (en) 2014-11-06
US9390956B2 (en) 2016-07-12
JP6140194B2 (en) 2017-05-31
KR102061369B1 (en) 2020-02-11
DE112013000980A5 (en) 2014-11-27
AT517748B1 (en) 2023-05-15

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