WO2013010864A3 - Device and method for determining the vapour pressure of a starting substance vaporized in a carrier gas stream - Google Patents

Device and method for determining the vapour pressure of a starting substance vaporized in a carrier gas stream Download PDF

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Publication number
WO2013010864A3
WO2013010864A3 PCT/EP2012/063539 EP2012063539W WO2013010864A3 WO 2013010864 A3 WO2013010864 A3 WO 2013010864A3 EP 2012063539 W EP2012063539 W EP 2012063539W WO 2013010864 A3 WO2013010864 A3 WO 2013010864A3
Authority
WO
WIPO (PCT)
Prior art keywords
gas stream
carrier gas
starting substance
determining
vapour
Prior art date
Application number
PCT/EP2012/063539
Other languages
German (de)
French (fr)
Other versions
WO2013010864A2 (en
Inventor
Michael Long
Markus Gersdorff
Original Assignee
Aixtron Se
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aixtron Se filed Critical Aixtron Se
Publication of WO2013010864A2 publication Critical patent/WO2013010864A2/en
Publication of WO2013010864A3 publication Critical patent/WO2013010864A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/68—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using thermal effects
    • G01F1/684—Structural arrangements; Mounting of elements, e.g. in relation to fluid flow
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/68—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using thermal effects
    • G01F1/696—Circuits therefor, e.g. constant-current flow meters

Abstract

The invention relates to a method for producing a vapour, transported in a carrier gas, of a solid or liquid starting substance, comprising the steps of: heating a vaporizer (8), having an inlet opening (7) and an outlet opening (9); feeding an input gas stream, comprising a carrier gas, through the inlet opening (7) into the vaporizer (8); vaporizing the solid or liquid starting substance within the vaporizer (8); transporting the vapour produced in this way together with the carrier gas as an output gas stream through the outlet opening (9); determining a first value, assigned to the mass flow of the carrier gas in the input gas stream, by means of a first sensor (2); determining a second value, influenced both by the mass flow or partial pressure of the carrier gas and by the mass flow or partial pressure of the vapour in the output gas stream, by a second sensor (10); calculating the value corresponding to the partial pressure of the vapour transported in the output gas stream by establishing a relationship between the values determined by means of the two sensors (2, 10). The invention additionally relates to a device for vaporizing a liquid or solid starting substance in a heatable vaporizer.
PCT/EP2012/063539 2011-07-19 2012-07-11 Device and method for determining the vapour pressure of a starting substance vaporized in a carrier gas stream WO2013010864A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102011051931.9 2011-07-19
DE102011051931A DE102011051931A1 (en) 2011-07-19 2011-07-19 Apparatus and method for determining the vapor pressure of a starting material vaporized in a carrier gas stream

Publications (2)

Publication Number Publication Date
WO2013010864A2 WO2013010864A2 (en) 2013-01-24
WO2013010864A3 true WO2013010864A3 (en) 2013-11-07

Family

ID=46513756

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2012/063539 WO2013010864A2 (en) 2011-07-19 2012-07-11 Device and method for determining the vapour pressure of a starting substance vaporized in a carrier gas stream

Country Status (3)

Country Link
DE (1) DE102011051931A1 (en)
TW (1) TW201307606A (en)
WO (1) WO2013010864A2 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6142629B2 (en) * 2013-03-29 2017-06-07 東京エレクトロン株式会社 Source gas supply apparatus, film forming apparatus, and source gas supply method
DE102013106863A1 (en) 2013-07-01 2015-01-08 Aixtron Se Device for determining the mass flow of a vapor transported in a carrier gas
CN103528630B (en) * 2013-10-16 2016-06-08 国家电网公司 The method of calculation of high pressure reject steam spillage and attemperation water flow
DE102014101792A1 (en) * 2014-02-13 2015-08-13 Aixtron Se Device for determining the mass flow of a gas or gas mixture with nested tubular filament arrangements
DE102014101971A1 (en) 2014-02-17 2015-08-20 Aixtron Se Magnetic method for determining a vapor concentration and apparatus for carrying out the method
DE102014102484A1 (en) * 2014-02-26 2015-08-27 Aixtron Se Use of a QCM sensor to determine the vapor concentration in the OVPD process or in an OVPD coating system
DE102015104240A1 (en) * 2015-03-20 2016-09-22 Aixtron Se By heating to be cleaned QCM sensor and its use in an OVPD coating system
DE102015105404A1 (en) 2015-04-09 2016-10-27 Aixtron Se Apparatus and method for determining the concentration or partial pressure of a vapor having magnetic properties
US9960009B2 (en) * 2015-07-17 2018-05-01 Lam Research Corporation Methods and systems for determining a fault in a gas heater channel
DE102017123233A1 (en) 2017-10-06 2019-04-11 Aixtron Se Apparatus and method for generating a vapor transported in a carrier gas
DE102017126126A1 (en) * 2017-11-08 2019-05-09 Aixtron Se Method and device for generating a vapor by the use of control data obtained in a control mode
US10914717B2 (en) * 2018-05-09 2021-02-09 Mks Instruments, Inc. Method and apparatus for partial pressure detection

Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3650151A (en) * 1970-11-18 1972-03-21 Tylan Corp Fluid flow measuring system
US4341107A (en) * 1980-10-14 1982-07-27 Tylan Corporation Calibratable system for measuring fluid flow
US4363238A (en) * 1979-08-16 1982-12-14 Franz Willam Device for measuring the breath of patients
EP0370311A2 (en) * 1988-11-23 1990-05-30 Applied Materials, Inc. Chemical vapor deposition system and reactant delivery section therefor
US4996876A (en) * 1988-12-16 1991-03-05 Leybold Aktiengesellschaft Microrheoscopic detector for gas flows
US5000039A (en) * 1989-11-21 1991-03-19 Siemens-Bendix Automotive Electronics L.P. Mass air flow integrator
US5820678A (en) * 1997-05-30 1998-10-13 The Regents Of The University Of California Solid source MOCVD system
US20050147749A1 (en) * 2004-01-05 2005-07-07 Msp Corporation High-performance vaporizer for liquid-precursor and multi-liquid-precursor vaporization in semiconductor thin film deposition
US20060115589A1 (en) * 2004-11-29 2006-06-01 Tokyo Electron Limited Method and system for measuring a flow rate in a solid precursor delivery system
US7238389B2 (en) * 2004-03-22 2007-07-03 Eastman Kodak Company Vaporizing fluidized organic materials
DE102006026576A1 (en) * 2006-06-06 2008-01-10 Aixtron Ag Apparatus and method for evaporating a powdery organic starting material
US7322248B1 (en) * 2006-08-29 2008-01-29 Eastman Kodak Company Pressure gauge for organic materials
EP2034047A1 (en) * 2006-06-27 2009-03-11 Fujikin Incorporated Vaporizer/supplier of material and automatic pressure regulator for use therein

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3680377A (en) 1970-08-17 1972-08-01 Hewlett Packard Co Fluid flow meter
US4885211A (en) 1987-02-11 1989-12-05 Eastman Kodak Company Electroluminescent device with improved cathode
US4769292A (en) 1987-03-02 1988-09-06 Eastman Kodak Company Electroluminescent device with modified thin film luminescent zone
US4961348A (en) * 1988-12-16 1990-10-09 Ulrich Bonne Flowmeter fluid composition correction
GB8903744D0 (en) * 1989-02-18 1989-04-05 Endress & Hauser Ltd Flowmeter
JPH0795527B2 (en) * 1991-02-05 1995-10-11 株式会社リンテック Vaporizer for liquid raw materials
US5288325A (en) * 1991-03-29 1994-02-22 Nec Corporation Chemical vapor deposition apparatus
US7501152B2 (en) 2004-09-21 2009-03-10 Eastman Kodak Company Delivering particulate material to a vaporization zone
US7000463B1 (en) 2004-11-12 2006-02-21 Mks Instruments, Inc. Reynolds number correction function for mass flow rate sensor
US8027574B2 (en) 2007-08-06 2011-09-27 Global Oled Technology Llc Vaporization of thermally sensitive materials
DE102007062977B4 (en) * 2007-12-21 2018-07-19 Schott Ag Process for the production of process gases for the vapor phase separation

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3650151A (en) * 1970-11-18 1972-03-21 Tylan Corp Fluid flow measuring system
US4363238A (en) * 1979-08-16 1982-12-14 Franz Willam Device for measuring the breath of patients
US4341107A (en) * 1980-10-14 1982-07-27 Tylan Corporation Calibratable system for measuring fluid flow
EP0370311A2 (en) * 1988-11-23 1990-05-30 Applied Materials, Inc. Chemical vapor deposition system and reactant delivery section therefor
US4996876A (en) * 1988-12-16 1991-03-05 Leybold Aktiengesellschaft Microrheoscopic detector for gas flows
US5000039A (en) * 1989-11-21 1991-03-19 Siemens-Bendix Automotive Electronics L.P. Mass air flow integrator
US5820678A (en) * 1997-05-30 1998-10-13 The Regents Of The University Of California Solid source MOCVD system
US20050147749A1 (en) * 2004-01-05 2005-07-07 Msp Corporation High-performance vaporizer for liquid-precursor and multi-liquid-precursor vaporization in semiconductor thin film deposition
US7238389B2 (en) * 2004-03-22 2007-07-03 Eastman Kodak Company Vaporizing fluidized organic materials
US20060115589A1 (en) * 2004-11-29 2006-06-01 Tokyo Electron Limited Method and system for measuring a flow rate in a solid precursor delivery system
DE102006026576A1 (en) * 2006-06-06 2008-01-10 Aixtron Ag Apparatus and method for evaporating a powdery organic starting material
EP2034047A1 (en) * 2006-06-27 2009-03-11 Fujikin Incorporated Vaporizer/supplier of material and automatic pressure regulator for use therein
US7322248B1 (en) * 2006-08-29 2008-01-29 Eastman Kodak Company Pressure gauge for organic materials

Also Published As

Publication number Publication date
DE102011051931A1 (en) 2013-01-24
WO2013010864A2 (en) 2013-01-24
TW201307606A (en) 2013-02-16

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