WO2013002988A3 - Illumination control - Google Patents

Illumination control Download PDF

Info

Publication number
WO2013002988A3
WO2013002988A3 PCT/US2012/041273 US2012041273W WO2013002988A3 WO 2013002988 A3 WO2013002988 A3 WO 2013002988A3 US 2012041273 W US2012041273 W US 2012041273W WO 2013002988 A3 WO2013002988 A3 WO 2013002988A3
Authority
WO
WIPO (PCT)
Prior art keywords
illumination
objective
illumination control
conjugate plane
array devices
Prior art date
Application number
PCT/US2012/041273
Other languages
French (fr)
Other versions
WO2013002988A2 (en
Inventor
Amnon Manassen
Joel Seligson
Noam Sapiens
Original Assignee
Kla-Tencor Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kla-Tencor Corporation filed Critical Kla-Tencor Corporation
Priority to KR1020147002337A priority Critical patent/KR101982363B1/en
Priority to EP12803940.1A priority patent/EP2724361B1/en
Priority to JP2014518591A priority patent/JP6132838B2/en
Publication of WO2013002988A2 publication Critical patent/WO2013002988A2/en
Publication of WO2013002988A3 publication Critical patent/WO2013002988A3/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/0016—Technical microscopes, e.g. for inspection or measuring in industrial production processes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens
    • G02B21/08—Condensers
    • G02B21/082—Condensers for incident illumination only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
    • G02B21/365—Control or image processing arrangements for digital or video microscopes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching

Abstract

An optical system may include an objective, a source of illumination, an illumination system having illumination optics configured to direct the illumination onto the objective, and at least two dynamic optical array devices located at a pupil conjugate plane and a field conjugate plane, respectively in the illumination optics. The dynamic optical array devices are configured to control one or more properties of illumination coupled from the illumination system to the objective.
PCT/US2012/041273 2011-06-27 2012-06-07 Illumination control WO2013002988A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020147002337A KR101982363B1 (en) 2011-06-27 2012-06-07 Illumination control
EP12803940.1A EP2724361B1 (en) 2011-06-27 2012-06-07 Illumination control
JP2014518591A JP6132838B2 (en) 2011-06-27 2012-06-07 Lighting control

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/170,025 2011-06-27
US13/170,025 US8681413B2 (en) 2011-06-27 2011-06-27 Illumination control

Publications (2)

Publication Number Publication Date
WO2013002988A2 WO2013002988A2 (en) 2013-01-03
WO2013002988A3 true WO2013002988A3 (en) 2013-07-11

Family

ID=47361608

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2012/041273 WO2013002988A2 (en) 2011-06-27 2012-06-07 Illumination control

Country Status (6)

Country Link
US (1) US8681413B2 (en)
EP (1) EP2724361B1 (en)
JP (1) JP6132838B2 (en)
KR (1) KR101982363B1 (en)
TW (1) TWI564539B (en)
WO (1) WO2013002988A2 (en)

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US10438339B1 (en) 2016-09-12 2019-10-08 Apple Inc. Optical verification system and methods of verifying micro device transfer
US10732516B2 (en) * 2017-03-01 2020-08-04 Kla Tencor Corporation Process robust overlay metrology based on optical scatterometry
IL274148B2 (en) * 2017-11-07 2024-01-01 Asml Netherlands Bv Metrology apparatus and a method of determining a characteristic of interest
CN108279553B (en) * 2018-01-30 2019-06-21 中国科学院上海光学精密机械研究所 A kind of photo-etching machine illumination control test macro and method
EP3528047A1 (en) * 2018-02-14 2019-08-21 ASML Netherlands B.V. Method and apparatus for measuring a parameter of interest using image plane detection techniques
US10761031B1 (en) * 2018-03-20 2020-09-01 Kla-Tencor Corporation Arbitrary wavefront compensator for deep ultraviolet (DUV) optical imaging system
KR20210091803A (en) * 2018-12-31 2021-07-22 에이에스엠엘 네델란즈 비.브이. Method and apparatus for overlay metrology
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Also Published As

Publication number Publication date
US20120327503A1 (en) 2012-12-27
JP6132838B2 (en) 2017-05-24
TW201303258A (en) 2013-01-16
KR101982363B1 (en) 2019-05-27
KR20140053141A (en) 2014-05-07
JP2014521116A (en) 2014-08-25
EP2724361A4 (en) 2015-03-18
TWI564539B (en) 2017-01-01
EP2724361A2 (en) 2014-04-30
EP2724361B1 (en) 2023-12-27
WO2013002988A2 (en) 2013-01-03
US8681413B2 (en) 2014-03-25

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