WO2012121401A3 - Nanoimprinting method - Google Patents

Nanoimprinting method Download PDF

Info

Publication number
WO2012121401A3
WO2012121401A3 PCT/JP2012/056215 JP2012056215W WO2012121401A3 WO 2012121401 A3 WO2012121401 A3 WO 2012121401A3 JP 2012056215 W JP2012056215 W JP 2012056215W WO 2012121401 A3 WO2012121401 A3 WO 2012121401A3
Authority
WO
WIPO (PCT)
Prior art keywords
resin film
curable resin
coupling agent
silane coupling
coated
Prior art date
Application number
PCT/JP2012/056215
Other languages
French (fr)
Other versions
WO2012121401A2 (en
Inventor
Masafumi Yoshida
Original Assignee
Fujifilm Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corporation filed Critical Fujifilm Corporation
Publication of WO2012121401A2 publication Critical patent/WO2012121401A2/en
Publication of WO2012121401A3 publication Critical patent/WO2012121401A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Abstract

[Objective] To reduce generation of silane coupling agent aggregates in nanoimprinting that includes a step of processing a surface of a substrate by coating the surface with a silane coupling agent. [Constitution] In a nanoimprinting method, a silane coupling agent (3) having 1 or 2 alkyl groups adjacent to an Si atom is coated on the surface of a substrate (2). A curable resin that includes one of isobornyl acrylate, ethylene glycol acrylate, and a silicone monomer compound is coated on the surface which is coated with the silane coupling agent (3) to form a curable resin film (4). A mold is pressed against the curable resin film (4) with a pattern of protrusions and recesses (13) facing the curable resin film (4). The curable resin film (4) is cured, then the mold (1) is separated from the cured resin film (4).
PCT/JP2012/056215 2011-03-07 2012-03-06 Nanoimprinting method WO2012121401A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011-048908 2011-03-07
JP2011048908A JP2012183753A (en) 2011-03-07 2011-03-07 Nanoimprinting method

Publications (2)

Publication Number Publication Date
WO2012121401A2 WO2012121401A2 (en) 2012-09-13
WO2012121401A3 true WO2012121401A3 (en) 2012-11-08

Family

ID=45952596

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2012/056215 WO2012121401A2 (en) 2011-03-07 2012-03-06 Nanoimprinting method

Country Status (3)

Country Link
JP (1) JP2012183753A (en)
TW (1) TW201239538A (en)
WO (1) WO2012121401A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014087817A1 (en) * 2012-12-05 2014-06-12 独立行政法人科学技術振興機構 Resin for nanoimprinting, laminate containing resin for nanoimprinting, printed board containing resin for nanoimprinting, and method for producing nanoimprint substrate
EP2944446B1 (en) 2012-12-13 2024-01-24 Oji Holdings Corporation Mold for manufacturing optical element and production method for same
KR101667445B1 (en) * 2013-11-22 2016-10-18 롯데첨단소재(주) Silane based compound, method for preparing the same and polycarbonate resin composition comprising the same

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003041186A2 (en) * 2001-11-05 2003-05-15 3M Innovative Properties Company Organic thin film transistor with siloxane polymer interface
US20060046069A1 (en) * 2004-08-30 2006-03-02 Jung Gun Y Increasing adhesion in an imprinting procedure
US20070212494A1 (en) * 2005-07-22 2007-09-13 Molecular Imprints, Inc. Method for Imprint Lithography Utilizing an Adhesion Primer Layer

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5282510B2 (en) 2008-09-29 2013-09-04 大日本印刷株式会社 Manufacturing method of stamp for micro contact printing (μCP)
JP5556011B2 (en) 2008-12-26 2014-07-23 荒川化学工業株式会社 Pattern forming agent, pattern forming method, and substrate on which pattern is formed

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003041186A2 (en) * 2001-11-05 2003-05-15 3M Innovative Properties Company Organic thin film transistor with siloxane polymer interface
US20060046069A1 (en) * 2004-08-30 2006-03-02 Jung Gun Y Increasing adhesion in an imprinting procedure
US20070212494A1 (en) * 2005-07-22 2007-09-13 Molecular Imprints, Inc. Method for Imprint Lithography Utilizing an Adhesion Primer Layer

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
ZHEYUAN HUANG ET AL: "Selective Deposition of Conducting Polymers on Hydroxyl-Terminated Surfaces with Printed Monolayers of Alkylsiloxanes as Templates", LANGMUIR, vol. 13, no. 24, 1 November 1997 (1997-11-01), pages 6480 - 6484, XP055034632, ISSN: 0743-7463, DOI: 10.1021/la970537z *

Also Published As

Publication number Publication date
TW201239538A (en) 2012-10-01
JP2012183753A (en) 2012-09-27
WO2012121401A2 (en) 2012-09-13

Similar Documents

Publication Publication Date Title
PH12019500257A1 (en) Durable, heat resistant, erasable release coatings, release coated substrates, and their methods of manufacture
MY193339A (en) Transparent resin substrate
MX2016016345A (en) Acrylic polymers, curable film-forming compositions prepared therefrom, and method of mitigating dirt build-up on a substrate.
WO2009041533A1 (en) Hard coat film
WO2014008443A3 (en) High performance silicon based coating compositions
MX2015008378A (en) Actinic radiation and moisture dual curable composition.
WO2014026967A3 (en) Surface coatings
GB2510079A (en) Flexible scratch resistance film for display devices
PH12015500991B1 (en) Adhesive sheet
SG11201807157QA (en) Anticorrosion coating composition, anticorrosion coating film, substrate with anticorrosion coating film, and method of manufacturing same
JP2013532222A5 (en)
WO2011074871A3 (en) Polarizing plate, method for producing same and image display device comprising same
WO2014105350A3 (en) Coatings for enhancing glass strength
WO2013012587A3 (en) Semiconductor package resin composition and usage method thereof
RS54157B1 (en) Multistage process for coating steel prior to thermoforming
GB201114552D0 (en) A high performance coating composition
TW200621880A (en) Curable composition, cured product, and laminate
IN2015DN01999A (en)
MY182179A (en) Curable composition, method for producing curable composition, cured object, method for using curable composition, and optical device
GB2513037A (en) Precoating methods and compositions
WO2012121401A3 (en) Nanoimprinting method
IN2014DN09631A (en)
MY188623A (en) Curable composition, method for producing curable composition, cured object, method for using curable composition, and optical device
WO2015082408A3 (en) A method for coating an aged coating layer on a substrate, and a coating composition suitable for use in this method
MY175930A (en) Coating method using particle alignment and particle coated substrate manufactured thereby

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 12713799

Country of ref document: EP

Kind code of ref document: A2

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 12713799

Country of ref document: EP

Kind code of ref document: A2