WO2012040374A3 - Superabrasive tools having substantially leveled particle tips and associated methods - Google Patents

Superabrasive tools having substantially leveled particle tips and associated methods Download PDF

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Publication number
WO2012040374A3
WO2012040374A3 PCT/US2011/052627 US2011052627W WO2012040374A3 WO 2012040374 A3 WO2012040374 A3 WO 2012040374A3 US 2011052627 W US2011052627 W US 2011052627W WO 2012040374 A3 WO2012040374 A3 WO 2012040374A3
Authority
WO
WIPO (PCT)
Prior art keywords
monolayer
associated methods
superabrasive
substantially leveled
superabrasive tools
Prior art date
Application number
PCT/US2011/052627
Other languages
French (fr)
Other versions
WO2012040374A2 (en
Inventor
Chien-Min Sung
Original Assignee
Ritedia Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=45874363&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=WO2012040374(A3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Ritedia Corporation filed Critical Ritedia Corporation
Priority to CN201180053648XA priority Critical patent/CN103221180A/en
Publication of WO2012040374A2 publication Critical patent/WO2012040374A2/en
Publication of WO2012040374A3 publication Critical patent/WO2012040374A3/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/373Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
    • H01L23/3733Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon having a heterogeneous or anisotropic structure, e.g. powder or fibres in a matrix, wire mesh, porous structures
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
    • B24D18/0072Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for using adhesives for bonding abrasive particles or grinding elements to a support, e.g. by gluing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/373Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
    • H01L23/3732Diamonds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Abstract

Superabrasive tools and methods for making and using the same are provided. In one aspect, for example, a CMP pad dresser includes a first monolayer of superabrasive particles disposed on and coupled to one side of a metal support layer and a second monolayer of superabrasive particles disposed on and coupled to the metal support layer on an opposite side from the first monolayer. The superabrasive particles of the second monolayer are positioned to have substantially the same distribution as the superabrasive particles of the first monolayer.
PCT/US2011/052627 2010-09-21 2011-09-21 Superabrasive tools having substantially leveled particle tips and associated methods WO2012040374A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201180053648XA CN103221180A (en) 2010-09-21 2011-09-21 Superabrasive tools having substantially leveled particle tips and associated methods

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US38497610P 2010-09-21 2010-09-21
US61/384,976 2010-09-21
US201161468917P 2011-03-29 2011-03-29
US61/468,917 2011-03-29

Publications (2)

Publication Number Publication Date
WO2012040374A2 WO2012040374A2 (en) 2012-03-29
WO2012040374A3 true WO2012040374A3 (en) 2012-07-05

Family

ID=45874363

Family Applications (2)

Application Number Title Priority Date Filing Date
PCT/US2011/052626 WO2012040373A2 (en) 2010-09-21 2011-09-21 Diamond particle mololayer heat spreaders and associated methods
PCT/US2011/052627 WO2012040374A2 (en) 2010-09-21 2011-09-21 Superabrasive tools having substantially leveled particle tips and associated methods

Family Applications Before (1)

Application Number Title Priority Date Filing Date
PCT/US2011/052626 WO2012040373A2 (en) 2010-09-21 2011-09-21 Diamond particle mololayer heat spreaders and associated methods

Country Status (4)

Country Link
US (4) US8531026B2 (en)
CN (2) CN103221180A (en)
TW (2) TWI464839B (en)
WO (2) WO2012040373A2 (en)

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US9221154B2 (en) 1997-04-04 2015-12-29 Chien-Min Sung Diamond tools and methods for making the same
US9238207B2 (en) 1997-04-04 2016-01-19 Chien-Min Sung Brazed diamond tools and methods for making the same
US9409280B2 (en) 1997-04-04 2016-08-09 Chien-Min Sung Brazed diamond tools and methods for making the same
US9868100B2 (en) 1997-04-04 2018-01-16 Chien-Min Sung Brazed diamond tools and methods for making the same
US9199357B2 (en) 1997-04-04 2015-12-01 Chien-Min Sung Brazed diamond tools and methods for making the same
US9463552B2 (en) 1997-04-04 2016-10-11 Chien-Min Sung Superbrasvie tools containing uniformly leveled superabrasive particles and associated methods
US8678878B2 (en) 2009-09-29 2014-03-25 Chien-Min Sung System for evaluating and/or improving performance of a CMP pad dresser
US9138862B2 (en) * 2011-05-23 2015-09-22 Chien-Min Sung CMP pad dresser having leveled tips and associated methods
US8622787B2 (en) 2006-11-16 2014-01-07 Chien-Min Sung CMP pad dressers with hybridized abrasive surface and related methods
US9724802B2 (en) 2005-05-16 2017-08-08 Chien-Min Sung CMP pad dressers having leveled tips and associated methods
US8393934B2 (en) 2006-11-16 2013-03-12 Chien-Min Sung CMP pad dressers with hybridized abrasive surface and related methods
US9011563B2 (en) 2007-12-06 2015-04-21 Chien-Min Sung Methods for orienting superabrasive particles on a surface and associated tools
US8531026B2 (en) 2010-09-21 2013-09-10 Ritedia Corporation Diamond particle mololayer heat spreaders and associated methods
CN103329253B (en) * 2011-05-23 2016-03-30 宋健民 There is the CMP pad dresser at planarization tip
JP2013115083A (en) * 2011-11-25 2013-06-10 Fujitsu Semiconductor Ltd Semiconductor device and method of manufacturing the same
TWI466347B (en) * 2012-07-13 2014-12-21 Nat Univ Chung Hsing A light-emitting element having a high heat dissipation characteristic, and a light-emitting element manufactured by the method
TWI530361B (en) * 2012-11-07 2016-04-21 中國砂輪企業股份有限公司 Chemical mechanical polishing conditioner and associated methods
TWI568538B (en) * 2013-03-15 2017-02-01 中國砂輪企業股份有限公司 Chemical mechanical polishing conditioner and manufacturing method thereof
CN104726735B (en) * 2013-12-23 2017-02-08 北京有色金属研究总院 Composite-structure highly-oriented heat conducting material and preparation method thereof
RU2552810C1 (en) * 2013-12-30 2015-06-10 Федеральное государственное бюджетное учреждение науки Институт физико-технических проблем Севера им. В.П. Ларионова Сибирского отделения Российской академии наук Alloy for diamond monocrystal connection with metals
CN105093776B (en) * 2014-05-13 2020-08-25 深圳光峰科技股份有限公司 Wavelength conversion device, light source system and projection system
TWI551400B (en) * 2014-10-23 2016-10-01 中國砂輪企業股份有限公司 Grinding tool and method of manufacturing the same
US9812375B2 (en) * 2015-02-05 2017-11-07 Ii-Vi Incorporated Composite substrate with alternating pattern of diamond and metal or metal alloy
US10695872B2 (en) * 2015-03-11 2020-06-30 Lockheed Martin Corporation Heat spreaders fabricated from metal nanoparticles
KR101927651B1 (en) * 2015-12-10 2018-12-10 가부시끼가이샤 아라이도 마테리아루 Grass Rip Wheel
TW201728411A (en) * 2016-02-01 2017-08-16 中國砂輪企業股份有限公司 Chemical mechanical polishing dresser and manufacturing method thereof capable of elaborating the effect of offsetting thermal stress to reduce the warp and deformation of the supporting layer
KR102164795B1 (en) 2018-09-06 2020-10-13 삼성전자주식회사 Fan-out semiconductor package
CN110052962A (en) * 2019-04-25 2019-07-26 西安奕斯伟硅片技术有限公司 A kind of polishing pad trimmer, processing unit (plant) and method

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US8531026B2 (en) 2013-09-10
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US8777699B2 (en) 2014-07-15
US20150072601A1 (en) 2015-03-12
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US20120241943A1 (en) 2012-09-27

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