WO2011160246A1 - Thin film solar cell with microcrystalline absorpber layer and passivation layer and method for manufacturing such a cell - Google Patents
Thin film solar cell with microcrystalline absorpber layer and passivation layer and method for manufacturing such a cell Download PDFInfo
- Publication number
- WO2011160246A1 WO2011160246A1 PCT/CH2011/000139 CH2011000139W WO2011160246A1 WO 2011160246 A1 WO2011160246 A1 WO 2011160246A1 CH 2011000139 W CH2011000139 W CH 2011000139W WO 2011160246 A1 WO2011160246 A1 WO 2011160246A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- layer
- silicon
- microcrystalline
- intrinsic
- passivation layer
- Prior art date
Links
- 238000002161 passivation Methods 0.000 title claims abstract description 38
- 238000000034 method Methods 0.000 title claims abstract description 24
- 239000010409 thin film Substances 0.000 title claims abstract description 14
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 21
- 238000000151 deposition Methods 0.000 claims abstract description 21
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 21
- 239000010703 silicon Substances 0.000 claims abstract description 21
- 229910021417 amorphous silicon Inorganic materials 0.000 claims abstract description 19
- 239000000758 substrate Substances 0.000 claims abstract description 19
- 229910021424 microcrystalline silicon Inorganic materials 0.000 claims abstract description 13
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 9
- 229910000077 silane Inorganic materials 0.000 claims description 9
- 239000001257 hydrogen Substances 0.000 claims description 8
- 229910052739 hydrogen Inorganic materials 0.000 claims description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 7
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims description 5
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 3
- 230000001747 exhibiting effect Effects 0.000 claims description 3
- 229910017875 a-SiN Inorganic materials 0.000 claims description 2
- 239000007789 gas Substances 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims description 2
- 150000003377 silicon compounds Chemical class 0.000 claims description 2
- 230000007547 defect Effects 0.000 description 12
- 230000008021 deposition Effects 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 2
- 230000001627 detrimental effect Effects 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000006798 recombination Effects 0.000 description 2
- 238000005215 recombination Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 238000001069 Raman spectroscopy Methods 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229920000136 polysorbate Polymers 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/075—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PIN type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/075—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PIN type
- H01L31/076—Multiple junction or tandem solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/072—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type
- H01L31/0745—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type comprising a AIVBIV heterojunction, e.g. Si/Ge, SiGe/Si or Si/SiC solar cells
- H01L31/0747—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type comprising a AIVBIV heterojunction, e.g. Si/Ge, SiGe/Si or Si/SiC solar cells comprising a heterojunction of crystalline and amorphous materials, e.g. heterojunction with intrinsic thin layer or HIT® solar cells; solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP11727629.5A EP2586066A1 (en) | 2010-06-25 | 2011-06-10 | Thin film solar cell with microcrystalline absorpber layer and passivation layer and method for manufacturing such a cell |
CN201180031493XA CN103038897A (en) | 2010-06-25 | 2011-06-10 | Thin film solar cell with microcrystalline absorpber layer and passivation layer and method for manufacturing such a cell |
KR1020137001316A KR20130036284A (en) | 2010-06-25 | 2011-06-10 | Thin film solar cell with microcrystalline absorber layer and passivation layer and method for manufacturing such a cell |
JP2013515651A JP2013533620A (en) | 2010-06-25 | 2011-06-10 | Thin-film solar cell having a microcrystalline absorption layer and a passivation layer and method for manufacturing the solar cell |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US35846910P | 2010-06-25 | 2010-06-25 | |
US61/358,469 | 2010-06-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2011160246A1 true WO2011160246A1 (en) | 2011-12-29 |
Family
ID=44627487
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/CH2011/000139 WO2011160246A1 (en) | 2010-06-25 | 2011-06-10 | Thin film solar cell with microcrystalline absorpber layer and passivation layer and method for manufacturing such a cell |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP2586066A1 (en) |
JP (1) | JP2013533620A (en) |
KR (1) | KR20130036284A (en) |
CN (1) | CN103038897A (en) |
WO (1) | WO2011160246A1 (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102938429A (en) * | 2012-12-21 | 2013-02-20 | 国电光伏(江苏)有限公司 | Antireflection heterojunction solar cell and preparation method thereof |
CN103280846A (en) * | 2013-03-27 | 2013-09-04 | 上海空间电源研究所 | Flexible photovoltaic integrated power supply system |
CN103606589A (en) * | 2013-07-25 | 2014-02-26 | 昆明铂阳远宏能源科技有限公司 | Amorphous silicon film solar cell and manufacturing method thereof |
CN104332512A (en) * | 2014-07-07 | 2015-02-04 | 河南科技大学 | Microcrystalline silicon thin film solar cell and preparing method thereof |
CN104538464A (en) * | 2014-12-24 | 2015-04-22 | 新奥光伏能源有限公司 | Silicon heterojunction solar cell and manufacturing method thereof |
EP2887406A1 (en) * | 2013-12-23 | 2015-06-24 | CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement | Semiconductor device and method for fabricating said semiconductor device |
US9178082B2 (en) | 2013-09-23 | 2015-11-03 | Siva Power, Inc. | Methods of forming thin-film photovoltaic devices with discontinuous passivation layers |
US10181537B2 (en) | 2012-08-16 | 2019-01-15 | Arianegroup Gmbh | Laser power converter |
US20200279968A1 (en) * | 2017-09-22 | 2020-09-03 | Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno | Interdigitated back-contacted solar cell with p-type conductivity |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104362184B (en) * | 2014-09-26 | 2016-05-11 | 中国科学院上海光学精密机械研究所 | Based on the thin film amorphous silicon solar cell of antireflection structure and guided mode resonance |
CN104716220B (en) * | 2015-02-10 | 2017-08-04 | 湖南共创光伏科技有限公司 | A kind of solar cell and method for making up the thin-film solar cells crystallite defect silicon for tying many laminations more |
CN105655433A (en) * | 2016-04-13 | 2016-06-08 | 黄广明 | Crystalline silicon/amorphous silicon two-section solar cell and production method thereof |
CN107068779B (en) * | 2017-02-28 | 2019-01-18 | 中山大学 | A kind of solar battery structure and preparation method thereof |
CN110473922A (en) * | 2019-09-11 | 2019-11-19 | 南京爱通智能科技有限公司 | A kind of crystalline silicon high-efficiency photovoltaic cell structure |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5977476A (en) * | 1996-10-16 | 1999-11-02 | United Solar Systems Corporation | High efficiency photovoltaic device |
US20090020154A1 (en) * | 2007-01-18 | 2009-01-22 | Shuran Sheng | Multi-junction solar cells and methods and apparatuses for forming the same |
US20100132774A1 (en) * | 2008-12-11 | 2010-06-03 | Applied Materials, Inc. | Thin Film Silicon Solar Cell Device With Amorphous Window Layer |
WO2011011301A2 (en) * | 2009-07-23 | 2011-01-27 | Applied Materials, Inc. | A mixed silicon phase film for high efficiency thin film silicon solar cells |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3754815B2 (en) * | 1997-02-19 | 2006-03-15 | キヤノン株式会社 | Photovoltaic element, photoelectric conversion element, method for producing photovoltaic element, and method for producing photoelectric conversion element |
JP2005244071A (en) * | 2004-02-27 | 2005-09-08 | Sharp Corp | Solar cell and its manufacturing method |
JP2006019481A (en) * | 2004-07-01 | 2006-01-19 | Sharp Corp | Thin-film solar cell manufacturing method and thin-film solar cell manufactured thereby |
CN101499496A (en) * | 2008-01-29 | 2009-08-05 | 东捷科技股份有限公司 | Silicon thin-film solar cell |
JP5131249B2 (en) * | 2008-06-25 | 2013-01-30 | 富士電機株式会社 | Thin film solar cell |
JP5314697B2 (en) * | 2008-10-14 | 2013-10-16 | 株式会社カネカ | Silicon-based thin film solar cell and method for manufacturing the same |
-
2011
- 2011-06-10 JP JP2013515651A patent/JP2013533620A/en active Pending
- 2011-06-10 CN CN201180031493XA patent/CN103038897A/en active Pending
- 2011-06-10 EP EP11727629.5A patent/EP2586066A1/en not_active Withdrawn
- 2011-06-10 WO PCT/CH2011/000139 patent/WO2011160246A1/en active Application Filing
- 2011-06-10 KR KR1020137001316A patent/KR20130036284A/en not_active Application Discontinuation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5977476A (en) * | 1996-10-16 | 1999-11-02 | United Solar Systems Corporation | High efficiency photovoltaic device |
US20090020154A1 (en) * | 2007-01-18 | 2009-01-22 | Shuran Sheng | Multi-junction solar cells and methods and apparatuses for forming the same |
US20100132774A1 (en) * | 2008-12-11 | 2010-06-03 | Applied Materials, Inc. | Thin Film Silicon Solar Cell Device With Amorphous Window Layer |
WO2011011301A2 (en) * | 2009-07-23 | 2011-01-27 | Applied Materials, Inc. | A mixed silicon phase film for high efficiency thin film silicon solar cells |
Non-Patent Citations (1)
Title |
---|
MIN-SUNG JEON ET AL: "Hydrogenated Amorphous Silicon Thin Films as Passivation Layers Deposited by Microwave Remote-PECVD for Heterojunction Solar Cells", TRANSACTIONS ON ELECTRICAL AND ELECTRONIC MATERIALS, vol. 10, no. 3, 25 June 2009 (2009-06-25), pages 75 - 79, XP055012800, ISSN: 1229-7607, DOI: 10.4313/TEEM.2009.10.3.075 * |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10181537B2 (en) | 2012-08-16 | 2019-01-15 | Arianegroup Gmbh | Laser power converter |
CN102938429A (en) * | 2012-12-21 | 2013-02-20 | 国电光伏(江苏)有限公司 | Antireflection heterojunction solar cell and preparation method thereof |
CN103280846A (en) * | 2013-03-27 | 2013-09-04 | 上海空间电源研究所 | Flexible photovoltaic integrated power supply system |
CN103606589A (en) * | 2013-07-25 | 2014-02-26 | 昆明铂阳远宏能源科技有限公司 | Amorphous silicon film solar cell and manufacturing method thereof |
US9178082B2 (en) | 2013-09-23 | 2015-11-03 | Siva Power, Inc. | Methods of forming thin-film photovoltaic devices with discontinuous passivation layers |
US9362423B2 (en) | 2013-09-23 | 2016-06-07 | Siva Power, Inc. | Methods of forming thin-film photovoltaic devices with discontinuous passivation layers |
US9748435B2 (en) | 2013-09-23 | 2017-08-29 | Siva Power, Inc. | Methods of forming thin-film photovoltaic devices with discontinuous passivation layers |
US9972741B2 (en) | 2013-09-23 | 2018-05-15 | Siva Power, Inc. | Methods of forming thin-film photovoltaic devices with discontinuous passivation layers |
EP2887406A1 (en) * | 2013-12-23 | 2015-06-24 | CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement | Semiconductor device and method for fabricating said semiconductor device |
CN104332512A (en) * | 2014-07-07 | 2015-02-04 | 河南科技大学 | Microcrystalline silicon thin film solar cell and preparing method thereof |
CN104538464A (en) * | 2014-12-24 | 2015-04-22 | 新奥光伏能源有限公司 | Silicon heterojunction solar cell and manufacturing method thereof |
US20200279968A1 (en) * | 2017-09-22 | 2020-09-03 | Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno | Interdigitated back-contacted solar cell with p-type conductivity |
Also Published As
Publication number | Publication date |
---|---|
JP2013533620A (en) | 2013-08-22 |
KR20130036284A (en) | 2013-04-11 |
CN103038897A (en) | 2013-04-10 |
EP2586066A1 (en) | 2013-05-01 |
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