WO2011049357A2 - Polyamic acid solution, polyimide resin, and flexible copper clad laminate using same - Google Patents

Polyamic acid solution, polyimide resin, and flexible copper clad laminate using same Download PDF

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WO2011049357A2
WO2011049357A2 PCT/KR2010/007173 KR2010007173W WO2011049357A2 WO 2011049357 A2 WO2011049357 A2 WO 2011049357A2 KR 2010007173 W KR2010007173 W KR 2010007173W WO 2011049357 A2 WO2011049357 A2 WO 2011049357A2
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acid solution
copper foil
polyamic acid
dianhydride
polyimide resin
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French (fr)
Korean (ko)
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WO2011049357A3 (en
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김원겸
김형완
양동보
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주식회사 두산
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1042Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1067Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0346Organic insulating material consisting of one material containing N
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/022Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Laminated Bodies (AREA)

Abstract

The present invention relates to a polyamic acid solution comprising: (a) an aromatic tetracarboxylic acid dianhydride comprising 3,3',4,4'-biphenyltetracarboxylic acid dianhydride (BPDA) and pyromellitic dianhydride (PMDA); (b) an aromatic diamine; and (c) a solvent, and a polyimide resin prepared by imidization of the polyamic acid solution. A flexible copper clad laminate with excellent flexibility can be prepared by using the polyimide resin.

Description

폴리아믹산 용액, 폴리이미드 수지 및 이를 이용한 연성 동박 적층판Polyamic Acid Solution, Polyimide Resin, and Flexible Copper Foil Laminate Using the Same
본 발명은 연성 동박 적층판 제조에 사용되는 폴리이미드 수지 및 상기 폴리이미드 수지를 제조하기 위한 폴리아믹산 용액에 관한 것이다.The present invention relates to a polyimide resin used for producing a flexible copper foil laminate and a polyamic acid solution for producing the polyimide resin.
연성 동박 적층판(Flexible Copper Clad Laminate, FCCL)은 주로 연성 인쇄회로 기판(Flexible Printed Circuit Board, FPCB)의 기재로서 사용되며, 그 밖에 면 발열체 전자파 실드 재료, 플랫 케이블, 포장 재료 등에 사용된다.Flexible Copper Clad Laminate (FCCL) is mainly used as a substrate for flexible printed circuit boards (FPCBs), and is also used for surface heating element electromagnetic wave shielding materials, flat cables, and packaging materials.
이러한 연성 동박 적층판은 폴리이미드층과 동박층으로 이루어지는데, 폴리이미드층과 동박층 사이에 접착제층이 존재하는가에 따라서 접착형과 비접착형으로 나눌 수 있다.Such a flexible copper foil laminate consists of a polyimide layer and a copper foil layer, and can be classified into an adhesive type and a non-adhesive type depending on whether an adhesive layer exists between the polyimide layer and the copper foil layer.
즉, 접착형 연성 동박 적층판은 에폭시 수지 또는 아크릴계 수지로 이루어진 접착제를 사용하여 폴리이미드층과 동박층을 접착시킨 것이며, 비접착형 연성 동박 적층판은 동박 표면에 폴리이미드를 직접 접착시킨 것으로, 최근 소비형 전자제품의 경박단소(輕薄短小) 추세에 따라 접착형 연성 동박 적층판보다는 비접착형 연성 동박 적층판을 사용하는 쪽으로 발전하고 있다.That is, the adhesive flexible copper foil laminated plate is a polyimide layer and a copper foil layer adhered by using an adhesive made of an epoxy resin or an acrylic resin, and the non-adhesive flexible copper foil laminated plate is a polyimide bonded directly to the copper foil surface. In accordance with the trend of light and thin, small and thin electronic products, the development of the non-adhesive flexible copper foil laminate rather than the adhesive flexible copper foil laminate.
비접착형 연성 동박 적층판은 폴리아믹산 용액을 동박 표면에 도포한 후 가열하여 폴리아믹산 용액에 포함된 용매를 제거하고, 폴리아믹산을 이미드화시켜 동박 표면에 폴리이미드층을 형성시키는 과정으로 제조된다. 여기서, 제조된 동박 적층판은 여러 설비의 슬롯을 통과하여 후공정을 거쳐야 하기 때문에 평탄하여야 한다. 따라서, 종래에는 탈크, 마이카, 몬모릴로나이트 등과 같은 무기 충전제를 첨가하여 동박층과 폴리이미드층의 열팽창 계수 차이를 작게 함으로써 동박 적층판의 평탄성(Curl)을 개선하였다.The non-adhesive flexible copper foil laminate is manufactured by applying a polyamic acid solution to the surface of copper foil, followed by heating to remove the solvent contained in the polyamic acid solution, and imidating the polyamic acid to form a polyimide layer on the copper foil surface. Here, the manufactured copper foil laminate has to be flat because it must pass through the slots of various facilities and undergo a post-process. Therefore, conventionally, by adding an inorganic filler such as talc, mica, montmorillonite, and the like, the difference in thermal expansion coefficient between the copper foil layer and the polyimide layer is reduced, thereby improving flatness (Curl) of the copper foil laminate.
그런데, 무기 충전제를 첨가하여 동박 적층판의 평탄성을 개선함에 따라 동박 적층판의 생산성은 향상되지만 동박 적층판을 반복적으로 굴곡하였을 경우 폴리이미드층이 쉽게 파열되어 동박 적층판의 굴곡성이 떨어지는 문제점이 발생하게 되었다.However, as the flatness of the copper foil laminate is improved by adding an inorganic filler, the productivity of the copper foil laminate is improved, but when the copper foil laminate is repeatedly bent, the polyimide layer ruptures easily, resulting in a problem in that the copper foil laminate is inferior in flexibility.
본 발명은 상기한 문제점을 해결하기 위한 것으로, 연성 동박 적층판을 제조함에 있어서 동박층에 접착시 양호한 평탄성을 나타내면서도 제조된 동박 적층판이 우수한 굴곡성을 갖도록 할 수 있는 폴리이미드 수지 및 상기 폴리이미드 수지를 제조하기 위한 폴리아믹산 용액을 제공하는데 그 목적이 있다.The present invention is to solve the above problems, in the manufacture of a flexible copper foil laminated plate, a polyimide resin and the polyimide resin that can exhibit a good flatness when bonded to the copper foil layer and can be made to have excellent flexibility It is an object to provide a polyamic acid solution for the production.
본 발명은 (a) 3,3',4,4'-비페닐테트라카르복실릭 디안하이드라이드 (3,3',4,4'-biphenyltetracarboxylic acid dianhydride, BPDA)와 피로멜리틱 디안하이드라이드(pyromellitic dianhydride, PMDA)를 포함하는 방향족 테트라카르복실릭 디안하이드라이드(aromatic tetracarboxylic acid dianhydride); (b) 방향족 디아민(aromatic diamine); 및 (c) 용매를 포함하는 폴리아믹산 용액, 및 상기 폴리아믹산 용액을 이미드화하여 제조된 폴리이미드 수지를 제공한다.The present invention (a) 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (3,3', 4,4'-biphenyltetracarboxylic acid dianhydride, BPDA) and pyromellitic dianhydride ( aromatic tetracarboxylic acid dianhydride, including pyromellitic dianhydride (PMDA); (b) aromatic diamines; And (c) a polyamic acid solution comprising a solvent, and a polyimide resin prepared by imidating the polyamic acid solution.
또한, 본 발명은 동박층; 및 상기 동박층의 일면에 상기 폴리이미드 수지가 접착되어 형성된 폴리이미드 수지층을 포함하는 연성 동박 적층판, 및 이를 포함하는 인쇄 회로 기판을 제공한다.In addition, the present invention is a copper foil layer; And it provides a flexible copper foil laminate comprising a polyimide resin layer formed by bonding the polyimide resin to one surface of the copper foil layer, and a printed circuit board comprising the same.
이하, 본 발명을 상세히 설명한다.Hereinafter, the present invention will be described in detail.
<폴리아믹산 용액><Polyamic acid solution>
본 발명의 폴리아믹산 용액은 동박층에 폴리이미드 수지층을 형성시켜 연성 동박 적층판을 제조하기 위해 사용되는 것으로, (a) 3,3',4,4'-비페닐테트라카르복실릭 디안하이드라이드(3,3',4,4'-biphenyltetracarboxylic acid dianhydride, BPDA)와 피로멜리틱 디안하이드라이드(pyromellitic dianhydride, PMDA)를 포함하는 방향족 테트라카르복실릭 디안하이드라이드(aromatic tetracarboxylic acid dianhydride), (b) 방향족 디아민(aromatic diamine), (c) 용매를 포함한다.The polyamic acid solution of the present invention is used to form a flexible copper foil laminate by forming a polyimide resin layer on the copper foil layer, and (a) 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride. Aromatic tetracarboxylic acid dianhydride, including (3,3 ', 4,4'-biphenyltetracarboxylic acid dianhydride (BPDA)) and pyromellitic dianhydride (PMDA), (b ) Aromatic diamine, (c) solvent.
이러한 폴리아믹산 용액을 이용하여 동박층에 폴리이미드 수지층을 형성할 경우 무기 충전제 등의 첨가제를 사용하지 않아도 동박층과 열팽창계수(coefficient of thermal expansion, CTE) 차이가 최소화되어 양호한 평탄성(Curl)을 나타내면서도 제조된 연성 동박 적층판은 우수한 굴곡성을 가질 수 있다.When the polyimide resin layer is formed on the copper foil layer using the polyamic acid solution, even if an additive such as an inorganic filler is used, the difference between the copper foil layer and the coefficient of thermal expansion (CTE) is minimized, thereby achieving good curl. The flexible copper foil laminates produced while being shown may have excellent bendability.
특히, (a) 3,3',4,4'-비페닐테트라카르복실릭 디안하이드라이드(BPDA)와 피로멜리틱 디안하이드라이드(PMDA)를 포함하는 방향족 테트라카르복실릭 디안하이드라이드는 3,3',4,4'-비페닐테트라카르복실릭 디안하이드라이드(BPDA)와 피로멜리틱 디안하이드라이드(PMDA)의 혼합비율에 따라서 상기한 평탄성 및 굴곡성이 달라질 수 있다.In particular, (a) aromatic tetracarboxylic dianhydrides comprising 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA) and pyromellitic dianhydride (PMDA) The flatness and the flexibility may vary depending on the mixing ratio of, 3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA) and pyromellitic dianhydride (PMDA).
즉, 방향족 테트라카르복실릭 디안하이드라이드을 구성하는 3,3',4,4'-비페닐테트라카르복실릭 디안하이드라이드(BPDA)의 양이 많을수록 굴곡성은 향상되나 평탄성이 떨어질 수 있으며, 반대로 피로멜리틱 디안하이드라이드(PMDA)의 양이 많아지면 평탄성은 우수해지나 굴곡성이 떨어질 수 있는 것이다.That is, as the amount of 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA) constituting the aromatic tetracarboxylic dianhydride increases, the flexibility is improved, but the flatness may be deteriorated. If the amount of metician dianhydride (PMDA) is increased, the flatness may be excellent but the flexibility may be reduced.
따라서, 방향족 테트라카르복실릭 디안하이드라이드는 3,3',4,4'-비페닐테트라카르복실릭 디안하이드라이드(BPDA)와 피로멜리틱 디안하이드라이드(PMDA)이 60 ~ 90 : 40 ~ 10 범위의 mol% 비율로 포함된 것을 사용하는 것이 바람직하다. 이와 같은 범위의 비율로 3,3',4,4'-비페닐테트라카르복실릭 디안하이드라이드(BPDA)와 피로멜리틱 디안하이드라이드(PMDA)이 포함될 경우 평탄성 및 굴곡성뿐만 아니라 동박층에 형성되는 폴리이미드 수지층의 박리강도 또한 향상시킬 수 있다.Thus, aromatic tetracarboxylic dianhydrides have a 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA) and pyromellitic dianhydride (PMDA) of 60 to 90: 40 to 40 Preference is given to using what is included in a mol% proportion of 10. When 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA) and pyromellitic dianhydride (PMDA) are included in the range of this range, it forms in copper foil layer as well as flatness and flexibility. The peeling strength of the polyimide resin layer used can also be improved.
(b) 방향족 디아민(aromatic diamine)은 상기 방향족 테트라카르복실릭 디안하이드라이드와 이미드화 반응을 하여 폴리이미드 수지를 형성하는 것으로, 추후 폴리이미드 수지층이 양호한 평탄성을 나타내고 제조된 연성 동박 적층판이 우수한 굴곡성을 나타낼 수 있도록 p-페닐렌디아민(p-phenylenediamine, p-PDA)과 4,4'-옥시디아닐린(4,4'-oxydianiline, ODA)을 포함하는 것이 바람직하다.(b) Aromatic diamine is an imidization reaction with the aromatic tetracarboxylic dianhydride to form a polyimide resin, and the polyimide resin layer has a good flatness afterwards and is excellent in the flexible copper foil laminate produced. It is preferable to include p-phenylenediamine (p-PDA) and 4,4'-oxydianiline (4,4'-oxydianiline, ODA) to exhibit flexibility.
이때, 방향족 디아민을 구성하는 p-페닐렌디아민(p-PDA)과 4,4'-옥시디아닐린(ODA)의 혼합비율에 따라서도 평탄성, 굴곡성 및 박리강도 등이 달라질 수 있다. 따라서, 동박층에 형성되는 폴리이미드 수지층이 양호한 평탄성 및 우수한 굴곡성과 박리강도를 나타내기 위해서는 p-페닐렌디아민(p-PDA)과 4,4'-옥시디아닐린(ODA)이 60 ~ 80 : 40 ~ 20 범위의 mol% 비율로 포함된 방향족 디아민을 사용하는 것이 바람직하다.In this case, the flatness, flexibility and peel strength may also vary depending on the mixing ratio of p-phenylenediamine (p-PDA) and 4,4'-oxydianiline (ODA) constituting the aromatic diamine. Therefore, p-phenylenediamine (p-PDA) and 4,4'-oxydianiline (ODA) are 60 to 80 in order for the polyimide resin layer formed on the copper foil layer to exhibit good flatness, excellent flexibility, and peeling strength. 40 to 20 Preference is given to using aromatic diamines contained in the mol% ratio of the range.
즉, 방향족 디아민을 구성하는 4,4'-옥시디아닐린(ODA)의 양이 많을수록 굴곡성은 향상되나 평탄성이 떨어질 수 있으며, 반대로 p-페닐렌디아민(p-PDA)의 양이 많아지면 평탄성은 우수해지나 굴곡성이 떨어질 수 있기 때문에 p-페닐렌디아민(p-PDA)과 4,4'-옥시디아닐린(ODA)은 상기와 같은 비율로 포함되는 것이 바람직한 것이다.That is, as the amount of 4,4'-oxydianiline (ODA) constituting the aromatic diamine increases, the flexibility is improved, but the flatness may be decreased. On the contrary, when the amount of p-phenylenediamine (p-PDA) increases, the flatness It is preferable that p-phenylenediamine (p-PDA) and 4,4'-oxydianiline (ODA) are included in the above ratio because it may be excellent but the flexibility is poor.
한편, 방향족 디아민은 p-페닐렌디아민(p-PDA)과 4,4'-옥시디아닐린(ODA) 이외에도 m-페닐렌디아민(m-PDA), 2,2-비스(4-4[아미노페녹시]-페닐)프로판(BAPP), 2,2'-디메틸-4,4'-디아미노비페닐(m-TB-HG), 1,3-비스(4-아미노페녹시)벤젠(TPE-R), 2,2-비스(4-[3-아미노페녹시]페닐)술폰(m-BAPS), 4,4'-디아미노벤즈아닐라이드(DABA), 4,4'-비스(4-아미노페녹시)비페닐 중에서 선택된 1종 이상을 더 포함할 수 있다. On the other hand, in addition to p-phenylenediamine (p-PDA) and 4,4'-oxydianiline (ODA), aromatic diamine is m-phenylenediamine (m-PDA) and 2,2-bis (4-4 [amino] Phenoxy] -phenyl) propane (BAPP), 2,2'-dimethyl-4,4'-diaminobiphenyl (m-TB-HG), 1,3-bis (4-aminophenoxy) benzene (TPE -R), 2,2-bis (4- [3-aminophenoxy] phenyl) sulfone (m-BAPS), 4,4'-diaminobenzanilide (DABA), 4,4'-bis (4 It may further comprise one or more selected from -aminophenoxy) biphenyl.
본 발명의 폴리아믹산 용액은 방향족 테트라카르복실릭 디안하이드라이드(aromatic tetracarboxylic acid dianhydride)와 방향족 디아민(aromatic diamine)을 극성 비양자성 용매에 반응시켜 제조되는 것으로, 이때, 사용되는 (c) 용매의 비제한적인 예로는 N-메틸피롤리디논(NMP), N,N-디메틸아세트아미드(DMAc), 테트라하이드로퓨란(THF), N,N-디메틸포름아미드(DMF), 디메틸설폭시드(DMSO), 시클로헥산, 아세토니트릴 또는 이들을 하나 또는 둘 이상이 혼합한 혼합물을 들 수 있다.The polyamic acid solution of the present invention is prepared by reacting an aromatic tetracarboxylic acid dianhydride and an aromatic diamine with a polar aprotic solvent, wherein the ratio of the solvent (c) used Restrictive examples include N-methylpyrrolidinone (NMP), N, N-dimethylacetamide (DMAc), tetrahydrofuran (THF), N, N-dimethylformamide (DMF), dimethyl sulfoxide (DMSO), Cyclohexane, acetonitrile or a mixture of one or two or more thereof.
여기서, 극성 비양자성 용매에 방향족 테트라카르복실릭 디안하이드라이드와 방향족 디아민을 반응시키는 조건은 질소가스 등의 불활성 분위기 하에 0 ~ 90℃, 바람직하게는 5 ~ 50℃ 범위의 온도에서 2 ~ 24시간 정도 반응시키는 것이 좋다.Here, the conditions for reacting the aromatic tetracarboxylic dianhydride and the aromatic diamine in the polar aprotic solvent are 2 to 24 hours at a temperature in the range of 0 to 90 ° C, preferably 5 to 50 ° C, under an inert atmosphere such as nitrogen gas. It is good to react to a degree.
이상에서 설명한 본 발명의 폴리아믹산 용액은, 폴리아믹산 용액 전체 중량 100을 기준으로, (a) 방향족 테트라카르복실릭 디안하이드라이드 5 ~ 15중량부; (b) 방향족 디아민 5 ~ 15 중량부; 및 (c) 용매 70 ~ 90 중량부를 포함하는 것이 바람직하다. 폴리아믹산 용액에 포함되는 방향족 테트라카르복실릭 디안하이드라이드, 방향족 디아민 및 용매의 함량 범위가 상기 범위 미만일 경우에는 폴리아믹산 용액의 점도가 너무 낮아질 수 있으며, 반대로 상기 범위를 초과할 경우에는 폴리아믹산 용액의 점도가 너무 높아질 수 있기 때문이다.The polyamic acid solution of the present invention described above, based on the total weight 100 of the polyamic acid solution, (a) 5 to 15 parts by weight of aromatic tetracarboxylic dianhydride; (b) 5 to 15 parts by weight of aromatic diamine; And (c) 70 to 90 parts by weight of the solvent. If the content range of the aromatic tetracarboxylic dianhydride, aromatic diamine and the solvent contained in the polyamic acid solution is less than the above range, the viscosity of the polyamic acid solution may be too low, on the contrary, if the above range is exceeded, the polyamic acid solution This is because the viscosity may be too high.
이러한 본 발명의 폴리아믹산 용액은 약 3,000 내지 50,000 cps, 바람직하게는 약 15,000 내지 40,000 cps 범위의 점도를 가질 수 있다. 폴리아믹산 용액의 점도가 3,000 cps 미만일 경우에는 동박층에 폴리아믹산 용액 코팅시 두께 조절이 어려울 수 있으며, 50,000 cps를 초과할 경우에는 동박층에 폴리아믹산 용액 코팅시 코팅 표면이 불균일해질 수 있기 때문에 상기와 같은 범위의 점도를 갖는 것이 바람직하다.Such polyamic acid solutions of the present invention may have a viscosity in the range of about 3,000 to 50,000 cps, preferably about 15,000 to 40,000 cps. If the viscosity of the polyamic acid solution is less than 3,000 cps, it may be difficult to control the thickness when the polyamic acid solution is coated on the copper foil layer. If the polyamic acid solution exceeds 50,000 cps, the coating surface may become uneven when the polyamic acid solution is coated on the copper foil layer. It is preferable to have a viscosity in the range of.
또한, 본 발명의 폴리아믹산 용액은 필요에 따라 본 발명의 목적과 효과를 현저히 손상시키지 않는 범위 내에서 가소제, 산화방지제, 난연화제, 분산제, 점도 조절제, 레벨링제 등의 첨가제를 소량 포함할 수 있다.In addition, the polyamic acid solution of the present invention may contain a small amount of additives such as plasticizers, antioxidants, flame retardants, dispersants, viscosity regulators, leveling agents and the like within the range that does not significantly impair the object and effect of the present invention if necessary. .
<폴리이미드 수지><Polyimide resin>
본 발명은 상기한 폴리아믹산 용액이 이미드화됨으로써 랜덤 공중합체(random copolymer)나 블록 공중합체(block copolymer) 형태인 폴리이미드 수지가 제조될 수 있다. 이때, 제조된 폴리이미드 수지는 이미드(imide) 고리를 함유하는 고분자 물질로서, 내열성, 내화학성, 내마모성 및 전기적 특성이 우수할 뿐만 아니라 굴곡성이 뛰어나다. 따라서, 이러한 폴리이미드 수지를 동박층의 일면에 접착하여 연성 동박 적층판을 제조할 경우 연성 동박 적층판은 우수한 굴곡성을 가질 수 있다.In the present invention, the polyamic acid solution may be imidized to prepare a polyimide resin in the form of a random copolymer or a block copolymer. In this case, the prepared polyimide resin is a polymer material containing an imide ring, and is excellent in heat resistance, chemical resistance, abrasion resistance, and electrical properties, as well as excellent in flexibility. Therefore, when the flexible copper foil laminate is manufactured by attaching the polyimide resin to one surface of the copper foil layer, the flexible copper foil laminate may have excellent bendability.
한편, 본 발명의 폴리아믹산 용액을 이미드화 반응시켜 폴리이미드 수지를 제조함에 있어서 반응 온도는 약 250 ~ 400℃, 반응 시간은 약 5 ~ 60분인 것이 바람직하다. On the other hand, in preparing the polyimide resin by imidating the polyamic acid solution of the present invention, the reaction temperature is preferably about 250 to 400 ° C, and the reaction time is about 5 to 60 minutes.
<연성 동박 적층판><Flexible Copper Foil Laminates>
본 발명의 연성 동박 적층판은 동박층 및 동박층의 일면에 상기에서 설명한 폴리이미드 수지가 접착된 폴리이미드 수지층을 포함한다. 구체적으로, 본 발명의 연성 동박 적층판은 동박층의 일면에 상기에서 설명한 폴리아믹산 용액을 도포한 후 이미드화 반응시켜 폴리이미드 수지층을 형성시킴으로써 제조될 수 있다.The flexible copper foil laminated board of this invention contains the polyimide resin layer to which the polyimide resin demonstrated above was adhere | attached on the copper foil layer and one surface of the copper foil layer. Specifically, the flexible copper foil laminate of the present invention may be prepared by applying the polyamic acid solution described above to one surface of the copper foil layer and then imidizing to form a polyimide resin layer.
상기 동박층으로는 경제성 및 생산성을 고려하여 압연 동박 또는 전해 동박을 사용할 수 있으며, 두께는 특별히 한정되지 않으나 8 ~ 35㎛, 바람직하게는 9 ~ 18㎛인 것이 좋다.As the copper foil layer, a rolled copper foil or an electrolytic copper foil may be used in consideration of economical efficiency and productivity, and the thickness is not particularly limited, but is preferably 8 to 35 μm, preferably 9 to 18 μm.
이때, 본 발명은 동박층을 포함하는 연성 동박 적층판을 기재하였지만 동박층 이외에 도전성 및 연성을 띠는 금속박층(예를 들어, 주석, 금, 은 등)에 본 발명에서 설명한 폴리아믹산 용액을 이미드화하여 폴리이미드 수지층을 형성함으로써 연성 금속박 적층판을 제조할 수 있으며, 이 또한 본 발명의 범주에 속할 것이다.In this case, the present invention describes a flexible copper foil laminate comprising a copper foil layer, but imidates the polyamic acid solution described in the present invention on a metal foil layer (eg, tin, gold, silver, etc.) that exhibits conductivity and ductility in addition to the copper foil layer. By forming a polyimide resin layer can be produced a flexible metal foil laminate, this will also fall within the scope of the present invention.
한편, 동박층의 일면에 접착되는 폴리이미드 수지층의 두께 또한 특별히 한정되지 않으나 2 ~ 60㎛, 바람직하게는 3 ~ 30㎛인 것이 좋다. 이러한 폴리이미드 수지층은 10 ~ 30ppm/℃ 범위의 열팽창계수(CTE)를 나타냄에 따라 동박층과 열팽창계수 차이가 작아 동박층에 접착시 양호한 평탄성을 나타낼 수 있다. On the other hand, the thickness of the polyimide resin layer adhered to one surface of the copper foil layer is not particularly limited, but is preferably 2 to 60 µm, preferably 3 to 30 µm. Such a polyimide resin layer exhibits a thermal expansion coefficient (CTE) in the range of 10 to 30 ppm / ° C., so that the difference between the copper foil layer and the thermal expansion coefficient is small, so that the polyimide resin layer may exhibit good flatness upon adhesion to the copper foil layer.
이외에도 본 발명은 상기한 연성 동박 적층판을 구비하는 인쇄 회로 기판을 제공할 수 있다. 인쇄 회로 기판의 구체적인 예로는 다층 연성 인쇄 회로 기판 또는 리지드 플렉시블 인쇄 회로 기판일 수 있다. 이러한 인쇄 회로 기판은 상기 연성 동박 적층판 중 폴리이미드 수지층에서 기인하는 우수한 내열성, 내화학성, 내절연성 및 굴곡성 등의 제반 성능이 지속적으로 발휘되므로, 각종 전자기기 등의 고기능화 및 장수화에 공헌할 수 있다.In addition, this invention can provide the printed circuit board provided with said flexible copper foil laminated board. Specific examples of the printed circuit board may be a multilayer flexible printed circuit board or a rigid flexible printed circuit board. Since the printed circuit board continuously exhibits excellent performances such as heat resistance, chemical resistance, insulation resistance, and bendability due to the polyimide resin layer in the flexible copper foil laminate, it can contribute to high functionalization and long life of various electronic devices. have.
이하, 실시예를 들어 본 발명을 보다 자세히 설명한다. 다만, 하기의 실시예는 본 발명의 바람직한 실시예일뿐, 본 발명이 하기 실시예로 한정되는 것은 아니다.Hereinafter, the present invention will be described in more detail with reference to Examples. However, the following examples are only preferred examples of the present invention, and the present invention is not limited to the following examples.
[실시예 1] Example 1
1-1. 폴리아믹산 용액의 제조1-1. Preparation of Polyamic Acid Solution
온도계, 교반기 및 질소흡입구와 분말 투입구(Powder dispensing funnel)를 설치한 4구 반응용기에 166ml의 N-메틸피롤리돈(NMP)를 가하고 교반하였다. 이 용액에 7.10g(0.0657mol)의 p-페닐렌디아민(p-PDA) 그리고 3.37g(0.0168mol)의 4,4'-옥시디아닐린(ODA)을 가하고 25℃에서 교반하여 완전히 용해시켰다. 이 용액에 21.74g(0.0739mol)의 3,3',4,4'-비페닐테트라카르복실릭 디안하이드라이드(BPDA)와 피로멜리틱 디안하이드라이드(PMDA) 1.79g(0.0082mol)을 서서히 가하고 10hr 교반하면서 중합하여, 점도 27,000cps의 폴리믹산 용액을 얻었다.166 ml of N-methylpyrrolidone (NMP) was added to a four-necked reaction vessel equipped with a thermometer, agitator, nitrogen inlet, and powder dispensing funnel, and stirred. To this solution was added 7.10 g (0.0657 mol) of p-phenylenediamine (p-PDA) and 3.37 g (0.0168 mol) of 4,4'-oxydianiline (ODA), which was stirred at 25 ° C to completely dissolve. To this solution was slowly added 21.74 g (0.0739 mol) of 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA) and pyromellitic dianhydride (PMDA) 1.79 g (0.0082 mol). It superposed | polymerized with addition and stirring for 10 hours, and obtained the polymic acid solution of 27,000 cps of viscosity.
1-2. 연성 동박 적층판 제조1-2. Flexible Copper Clad Laminate Manufacturing
캐스팅법(casting method)을 이용하여 두께 12㎛의 전해 동박(일진소재의 EDI-12) 표면에 상기 제조된 폴리아믹산 용액을 코팅하였다. 이때, 코팅된 두께는 경화과정이 끝난 후의 최종 폴리이미드 수지층이 20㎛ 두께가 되도록 조절하였다. 이후, 코팅된 폴리아믹산 용액을 200℃ 이하의 온도에서 여러 단계를 거쳐서 약 20분간 건조하였다. 다음으로, 온도를 400℃까지 승온시켜 이미드화 반응을 진행하여 폴리이미드층이 형성된 연성 동박 적층판을 제조하였다.The polyamic acid solution prepared above was coated on the surface of an electrolytic copper foil (EDI-12 of Iljin Material) having a thickness of 12 μm by using a casting method. At this time, the coated thickness was adjusted so that the final polyimide resin layer after the curing process is 20㎛ thickness. The coated polyamic acid solution was then dried for about 20 minutes at several temperatures below 200 ° C. through several steps. Next, the temperature was raised to 400 degreeC, the imidation reaction was advanced, and the flexible copper foil laminated board with a polyimide layer was produced.
[실시예 2 내지 5] [Examples 2 to 5]
BPDA, PMDA, p-PDA, ODA의 함량을 하기 표1과 같이 조절하여 상기 실시예 1의 폴리아믹산 용액 제조과정과 동일하게 폴리아믹산 용액을 제조한 후 상기 실시예 1의 연성 동박 적층판의 제조과정과 동일하게 하여 실시예 2 내지 5의 연성 동박 적층판을 제조하였다.After adjusting the content of BPDA, PMDA, p-PDA, ODA as shown in Table 1 below to prepare a polyamic acid solution in the same manner as the polyamic acid solution of Example 1 manufacturing process of the flexible copper foil laminate of Example 1 In the same manner as in the flexible copper foil laminate of Examples 2 to 5 were prepared.
표 1
Figure PCTKR2010007173-appb-T000001
Table 1
Figure PCTKR2010007173-appb-T000001
[비교예 1 내지 6] [Comparative Examples 1 to 6]
BPDA, PMDA, p-PDA, ODA 및 첨가제(Talc)의 함량을 하기 표2와 같이 조절하여 상기 실시예 1의 폴리아믹산 용액 제조과정과 동일하게 폴리아믹산 용액을 제조한 후 상기 실시예 1의 연성 동박 적층판의 제조과정과 동일하게 하여 비교예 1 내지 6의 연성 동박 적층판을 제조하였다.After adjusting the content of BPDA, PMDA, p-PDA, ODA and additives (Talc) as shown in Table 2 below to prepare a polyamic acid solution in the same manner as the polyamic acid solution of Example 1, the ductility of Example 1 In the same manner as the manufacturing process of the copper foil laminate, the flexible copper foil laminates of Comparative Examples 1 to 6 were prepared.
표 2
  비교예1 비교예2 비교예3 비교예4 비교예5 비교예6
BPDA 23.72g 23.72g 23.72g - 20.62g 12.73g
0.0806mol 0.0806mol 0.0806mol 0.0701 mol 0.0433mol
PMDA - - - 21.45g 1.70g 9.44g
0.0983mol 0.0078mol 0.0433mol
p-PDA 6.97g 6.97g 6.97g 8.51g 4.63g 6.55g
0.0645mol 0.0645mol 0.0645mol 0.0787mol 0.0428mol 0.0606mol
ODA 3.31g 3.31g 3.31g 4.04g 7.05g 5.28g
0.0165mol 0.0165mol 0.0165mol 0.0202mol 0.0352mol 0.0264mol
Talc 0.00% 0.00% 6.80g 0.00% 0.00% 0.00%
20.0%
NMP 166 166 166 166 166 166
고체함량 17.00% 17.00% 19.73% 17.00% 17.00% 17.00%
동박 전해 압연 전해 전해 전해 전해
TABLE 2
Comparative Example 1 Comparative Example 2 Comparative Example 3 Comparative Example 4 Comparative Example 5 Comparative Example 6
BPDA 23.72g 23.72g 23.72g - 20.62 g 12.73 g
0.0806mol 0.0806mol 0.0806mol 0.0701 mol 0.0433mol
PMDA - - - 21.45 g 1.70 g 9.44 g
0.0983mol 0.0078mol 0.0433mol
p-PDA 6.97 g 6.97 g 6.97 g 8.51 g 4.63 g 6.55 g
0.0645mol 0.0645mol 0.0645mol 0.0787mol 0.0428mol 0.0606mol
ODA 3.31 g 3.31 g 3.31 g 4.04g 7.05 g 5.28g
0.0165mol 0.0165mol 0.0165mol 0.0202mol 0.0352mol 0.0264mol
Talc 0.00% 0.00% 6.80 g 0.00% 0.00% 0.00%
20.0%
NMP 166 166 166 166 166 166
Solid content 17.00% 17.00% 19.73% 17.00% 17.00% 17.00%
Copper foil the year before Rolling the year before the year before the year before the year before
[시험예] 연성 동박 적층판의 특성 평가[Test Example] Evaluation of Characteristics of Flexible Copper Clad Laminates
실시예 1 내지 5 및 비교예 1 내지 6에서 제조된 연성 동박 적층판의 특성을 평가하기 위해 하기와 같은 측정방법으로 실험을 실시하였으며, 그 결과를 표3에 나타내었다.In order to evaluate the properties of the flexible copper foil laminates prepared in Examples 1 to 5 and Comparative Examples 1 to 6, the experiment was conducted by the following measuring method, and the results are shown in Table 3.
1. 동박 Peel StrengthCopper Foil Peel Strength
IPC-TM-650 No.2,4,9에 준거하여, 제조된 연성 동박 적층판에 패턴 폭 1mm의 회로를 형성한 후 25℃의 온도 조건하에서 동박층을 상기 적층판의 면에 대하여 90도 방향으로 50mm/min의 속도로 박리하는데 소요되는 힘의 최저값을 측정하고, 이를 동박 박리강도로서 나타내었다.In accordance with IPC-TM-650 No. 2, 4, 9, a circuit having a pattern width of 1 mm was formed on the manufactured flexible copper foil laminate, and then the copper foil layer was formed at 90 degrees with respect to the surface of the laminate under a temperature of 25 ° C. The minimum value of the force required for peeling at a rate of 50 mm / min was measured and expressed as copper foil peel strength.
2. 납조 내열성2. Lead bath heat resistance
IPC-TM-650 No.2.4.13에 준거하여 제조된 연성 동박 적층판을 300℃, 90sec 납조에 띄운 후 그 외관 상태를 확인하였다.The flexible copper foil laminated sheet manufactured according to IPC-TM-650 No.2.4.13 was floated in 300 degreeC and 90 sec solder tank, and the appearance condition was confirmed.
3. 접동 굴곡 횟수(MIT)3. Number of sliding bends (MIT)
제조된 연성 동박 적층판의 회로가 형성되는 표면에 커버레이(Coverlay)(PI Film12㎛, 접착제 25㎛)를 접합하여 굴곡 시험 시편을 제작하였다. 제작된 시편을 MIT 굴곡 시험 장치에 장착한 후 초기에 0.5Kgf의 힘으로 잡아 당긴 상태에서 0.38R의 곡률 반경을 가진 치구를 175rpm의 속도로 하여 장착된 시편이 단선되기까지의 횟수를 측정하였다.A cover test (PI Film 12 μm, adhesive 25 μm) was bonded to the surface on which the circuit of the manufactured flexible copper foil laminate was formed to prepare a bending test specimen. After mounting the fabricated specimen in the MIT bending test apparatus, the number of times until the mounted specimen was disconnected was measured at a speed of 175 rpm with a jig with a radius of curvature of 0.38 R while being initially pulled with a force of 0.5 Kgf.
4. 슬라이드 내구성4. Slide durable
제조된 연성 동박 적층판에 패턴 폭 0.1mm의 회로를 형성한 후 회로가 형성되는 표면에 커버레이(Coverlay)(PI Film 12㎛, 접착제 25㎛)를 접합하여 슬라이드 내구성 시험 시편을 제작하였다. 제작된 시편을 곡률 반경 0.65R을 가진 치구에 장착한 후 60rpm의 속도로 하여 장착된 시편의 저항값이 10% 범위를 벗어날 때까지의 횟수를 측정하였다.After forming a circuit having a pattern width of 0.1 mm on the manufactured flexible copper foil laminate, a coverlay (PI Film 12 μm, adhesive 25 μm) was bonded to the surface on which the circuit was formed to prepare a slide durability test specimen. The fabricated specimen was mounted on a jig with a radius of curvature of 0.65R, and the number of times until the resistance value of the mounted specimen was out of the 10% range was measured at a speed of 60 rpm.
5. 평탄성(Curl) : 제품의 휘어짐 상태(Curl) 검사5. Curling: Curling of the product
제조된 연성 동박 적층판을 100X100mm 절단 후 바닥에서의 모서리 최고점을 측정한 후 25mm 이상이면 나쁨, 15~25mm 범위는 보통, 15mm 이하는 좋음으로 한다.After cutting the flexible copper foil laminate produced 100X100mm after measuring the corner peak at the bottom is bad if more than 25mm, 15-25mm range is usually 15mm or less is good.
표 3
동박 Peel Strength(kgf/cm) 납조 내열성 접동 굴곡 횟수(MIT) 슬라이드 내구성 평탄성(Curl)
실시예 1 0.95 변화없음 9,000회 200,000 회 보통
실시예 2 1.10 변화없음 9,500회 260,000 회 보통
실시예 3 1.15 변화없음 9,000회 230,000 회 좋음
실시예 4 1.05 변화없음 7,500회 190,000 회 좋음
실시예 5 1.05 변화없음 7,000회 160,000 회 좋음
비교예 1 0.90 변화없음 9,500회 230,000 회 나쁨
비교예 2 0.70 변화없음 12,000회 340,000 회 나쁨
비교예 3 1.30 변화없음 6,500회 100,000 회 좋음
비교예 4 0.70 변화없음 4,000회 90,000 회 좋음
비교예 5 1.20 변화없음 10,500회 210,000 회 나쁨
비교예 6 0.80 변화없음 6,000회 120,000 회 좋음
TABLE 3
Copper Peel Strength (kgf / cm) Lead bath heat resistance Sliding bends (MIT) Slide durability Flatness (Curl)
Example 1 0.95 No change 9,000 times 200,000 times usually
Example 2 1.10 No change 9,500 260,000 times usually
Example 3 1.15 No change 9,000 times 230,000 times good
Example 4 1.05 No change 7,500 times 190,000 times good
Example 5 1.05 No change 7,000 times 160,000 times good
Comparative Example 1 0.90 No change 9,500 230,000 times Bad
Comparative Example 2 0.70 No change 12,000 times 340,000 times Bad
Comparative Example 3 1.30 No change 6,500 100,000 times good
Comparative Example 4 0.70 No change 4,000 times 90,000 times good
Comparative Example 5 1.20 No change 10,500 times 210,000 times Bad
Comparative Example 6 0.80 No change 6,000 times 120,000 times good
표3을 살펴보면, 본 발명의 실시예 1 내지 5는 비교예 1 내지 6보다 평탄성이 좋으면서도 접동 굴곡 횟수가 약 9000회 이상(종래에는 7000회 이상이면 우수하였음)으로 높아 굴곡성이 우수한 것을 확인할 수 있었다. 특히, 3,3',4,4'-비페닐테트라카르복실릭 디안하이드라이드(BPDA)와 피로멜리틱 디안하이드라이드(PMDA)의 함량을 적절히 조절한 실시예 3은 평탄성이 좋으면서도 높은 접동 굴곡 횟수를 나타내는 것을 알 수 있었다.Looking at Table 3, Examples 1 to 5 of the present invention can be confirmed that the flatness is better than Comparative Examples 1 to 6, but the number of sliding bends is about 9000 or more times (in the past, 7,000 or more times was excellent) excellent flexibility. there was. In particular, Example 3, in which the content of 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA) and pyromellitic dianhydride (PMDA) is properly adjusted, has good flatness and high sliding. It can be seen that the number of bending.
그러나, 3,3',4,4'-비페닐테트라카르복실릭 디안하이드라이드(BPDA)만을 사용한 비교예 1 및 2는 접동 굴곡 횟수가 높아 굴곡성은 양호하지만 평탄성이 떨어짐을 알 수 있었고, 피로멜리틱 디안하이드라이드(PMDA)만을 사용한 비교예 4는 평탄성은 좋으나 접동 굴곡 횟수가 적어 굴곡성이 떨어짐을 확인할 수 있었다.However, Comparative Examples 1 and 2 using only 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA) had a high number of sliding bends, indicating good flexibility but poor flatness. Comparative Example 4 using only metician dianhydride (PMDA) was good in flatness, but it was confirmed that the flexibility is less because the number of sliding bends.
또한, 상대적으로 3,3',4,4'-비페닐테트라카르복실릭 디안하이드라이드(BPDA)와 4,4'-옥시디아닐린(ODA)의 함유량이 본 발명의 범위를 벗어나는 비교예 5는 접동 굴곡 횟수가 높아 굴곡성은 좋지만 평탄성이 나쁨을 확인할 수 있었고, 반대로 피로멜리틱 디안하이드라이드(PMDA)와 p-페닐렌디아민(p-PDA)의 함유량이 본 발명의 범위를 벗어나는 비교예 6은 평탄성은 좋으나 접동 굴곡 횟수가 적어 굴곡성이 떨어짐을 확인할 수 있었다.In addition, Comparative Example 5 in which the contents of 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA) and 4,4'-oxydianiline (ODA) are relatively out of the scope of the present invention. Has a high number of sliding bends, good flexibility but poor flatness, on the contrary, Comparative Example 6 in which the content of pyromellitic dianhydride (PMDA) and p-phenylenediamine (p-PDA) is outside the scope of the present invention. The flatness was good, but the number of sliding bends was low, and the flexibility was confirmed to be inferior.
이외에도 무기 충전제를 함유한 비교예 3은 평탄성을 좋으나 접동 굴곡 횟수가 적어 굴곡성이 떨어짐을 확인할 수 있었다.In addition, Comparative Example 3 containing an inorganic filler had good flatness, but it was confirmed that the flexibility was inferior due to the small number of sliding bends.
본 발명에 따른 폴리아믹산 용액은 3,3',4,4'-비페닐테트라카르복실릭 디안하이드라이드(BPDA)와 피로멜리틱 디안하이드라이드(PMDA)의 함유량을 조절한 방향족 테트라카르복실릭 디안하이드라이드를 사용하기 때문에 내열성, 내화학성, 전기적 특성뿐만 아니라 굴곡성 또한 우수한 폴리이미드 수지를 제조할 수 있다.The polyamic acid solution according to the present invention is an aromatic tetracarboxylic with a controlled content of 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA) and pyromellitic dianhydride (PMDA). Since dianhydride is used, it is possible to prepare a polyimide resin having excellent heat resistance, chemical resistance, and electrical properties as well as flexibility.
또한, 상기한 폴리이미드 수지는 동박과의 열팽창 계수 차이가 적어 이러한 폴리이미드 수지를 이용하여 연성 동박 적층판을 제조할 경우 평탄성(Curl)이 양호하기 때문에 연성 동박 적층판의 생산성을 향상시킬 수 있고, 굴곡성이 우수한 폴리이미드 수지를 이용하기 때문에 제조되는 연성 동박 적층판의 굴곡성 또한 우수해질 수 있다.In addition, the polyimide resin described above has a small difference in coefficient of thermal expansion with copper foil, and thus, when the flexible copper foil laminate is manufactured using the polyimide resin, the flatness (Curl) is good, so that the productivity of the flexible copper foil laminate may be improved, and the flexibility may be improved. Since the excellent polyimide resin is used, the flexibility of the flexible copper foil laminate produced can also be excellent.

Claims (9)

  1. (a) 3,3',4,4'-비페닐테트라카르복실릭 디안하이드라이드(3,3',4,4'-biphenyltetracarboxylic acid dianhydride, BPDA)와 피로멜리틱 디안하이드라이드(pyromellitic dianhydride, PMDA)를 포함하는 방향족 테트라카르복실릭 디안하이드라이드(aromatic tetracarboxylic acid dianhydride);(a) 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (3,3', 4,4'-biphenyltetracarboxylic acid dianhydride (BPDA) and pyromellitic dianhydride, Aromatic tetracarboxylic acid dianhydride including PMDA);
    (b) 방향족 디아민(aromatic diamine); 및(b) aromatic diamines; And
    (c) 유기 용매를 포함하는 폴리아믹산 용액.(c) A polyamic acid solution comprising an organic solvent.
  2. 제1항에 있어서,The method of claim 1,
    상기 방향족 테르라카르복실릭 디안하이드라이드(a)는 상기 3,3',4,4'-비페닐테트라카르복실릭 디안하이드라이드(BPDA)와 피로멜리틱 디안하이드라이드(PMDA)를 60 ~ 90 : 40 ~ 10 범위의 mol% 비율로 포함하는 것을 특징으로 하는 폴리아믹산 용액.The aromatic terracarboxylic dianhydride (a) is 60 to 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA) and pyromellitic dianhydride (PMDA). 90: polyamic acid solution, characterized in that it comprises in a mol% ratio of 40 to 10 range.
  3. 제1항에 있어서,The method of claim 1,
    상기 방향족 디아민(b)은 p-페닐렌디아민(p-phenylenediamine, p-PDA)과 4,4'-옥시디아닐린(4,4'-oxydianiline, ODA)을 포함하는 것을 특징으로 하는 폴리아믹산 용액.The aromatic diamine (b) is a polyamic acid solution comprising p-phenylenediamine (p-PDA) and 4,4'-oxydianiline (4,4'-oxydianiline, ODA) .
  4. 제3항에 있어서,The method of claim 3,
    상기 방향족 디아민(b)은 p-페닐렌디아민(p-PDA)과 4,4'-옥시디아닐린(ODA)을 60 ~ 80 : 40 ~ 20 범위의 mol% 비율로 포함하는 것을 특징으로 하는 폴리아믹산 용액.The aromatic diamine (b) is a polya comprising p-phenylenediamine (p-PDA) and 4,4'-oxydianiline (ODA) in a mol% ratio ranging from 60 to 80:40 to 20. Mic acid solution.
  5. 제3항에 있어서,The method of claim 3,
    상기 방향족 디아민(b)는 m-페닐렌디아민(m-PDA), 2,2-비스(4-4[아미노페녹시]-페닐)프로판(BAPP), 2,2'-디메틸-4,4'-디아미노비페닐(m-TB-HG), 1,3-비스(4-아미노페녹시)벤젠(TPE-R), 2,2-비스(4-[3-아미노페녹시]페닐)술폰(m-BAPS), 4,4'-디아미노벤즈아닐라이드(DABA), 4,4'-비스(4-아미노페녹시)비페닐 중에서 선택된 1종 이상을 더 포함하는 것을 특징으로 하는 폴리아믹산 용액.The aromatic diamine (b) is m-phenylenediamine (m-PDA), 2,2-bis (4-4 [aminophenoxy] -phenyl) propane (BAPP), 2,2'-dimethyl-4,4 '-Diaminobiphenyl (m-TB-HG), 1,3-bis (4-aminophenoxy) benzene (TPE-R), 2,2-bis (4- [3-aminophenoxy] phenyl) Polya further comprising at least one selected from sulfone (m-BAPS), 4,4'-diaminobenzanilide (DABA), 4,4'-bis (4-aminophenoxy) biphenyl Mic acid solution.
  6. 제1항에 있어서,The method of claim 1,
    폴리아믹산 용액 전체 중량 100을 기준으로,Based on the total weight of the polyamic acid solution 100,
    (a) 방향족 테트라카르복실릭 디안하이드라이드(aromatic tetracarboxylic acid dianhydride) 5 ~ 15 중량부;(a) 5 to 15 parts by weight of aromatic tetracarboxylic acid dianhydride;
    (b) 방향족 디아민(aromatic diamine) 5 ~ 15 중량부; 및(b) 5 to 15 parts by weight of aromatic diamine; And
    (c) 용매 70 ~ 90 중량부를 포함하는 것을 특징으로 하는 폴리아믹산 용액.(c) a polyamic acid solution comprising 70 to 90 parts by weight of the solvent.
  7. 제1항 내지 제6항 중 어느 한 항에 기재된 폴리아믹산 용액을 이미드화하여 제조된 폴리이미드 수지.The polyimide resin manufactured by imidating the polyamic-acid solution in any one of Claims 1-6.
  8. 동박층; 및Copper foil layer; And
    상기 동박층의 일면에 제7항의 폴리이미드 수지가 접착되어 형성된 폴리이미드 수지층을 포함하는 연성 동박 적층판.The flexible copper foil laminated board containing the polyimide resin layer which the polyimide resin of Claim 7 adhere | attached on one surface of the said copper foil layer.
  9. 제8항의 연성 동박 적층판을 포함하는 인쇄 회로 기판.The printed circuit board containing the flexible copper foil laminated board of Claim 8.
PCT/KR2010/007173 2009-10-20 2010-10-20 Polyamic acid solution, polyimide resin, and flexible copper clad laminate using same WO2011049357A2 (en)

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CN112689454A (en) * 2020-12-23 2021-04-20 宁波今山新材料有限公司 Method for manufacturing shielding material
CN113637449A (en) * 2021-08-25 2021-11-12 湖北恒驰电子科技有限公司 High-frequency adhesive and protective film prepared from same and used for high-frequency copper-clad plate
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KR102171061B1 (en) * 2018-09-12 2020-10-28 피아이첨단소재 주식회사 Polyimide Film with Improved Surface Property and Method for Preparing the Same
KR102162628B1 (en) * 2019-07-17 2020-10-07 피아이첨단소재 주식회사 Flexible Metal Foil Clad Laminate

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CN107207725A (en) * 2015-02-11 2017-09-26 可隆工业株式会社 Polyamic acid, polyimide resin and Kapton
CN112689454A (en) * 2020-12-23 2021-04-20 宁波今山新材料有限公司 Method for manufacturing shielding material
CN113637449A (en) * 2021-08-25 2021-11-12 湖北恒驰电子科技有限公司 High-frequency adhesive and protective film prepared from same and used for high-frequency copper-clad plate
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