WO2010106533A3 - A method and apparatus for accurate determination of parameters of a stack of thin films - Google Patents
A method and apparatus for accurate determination of parameters of a stack of thin films Download PDFInfo
- Publication number
- WO2010106533A3 WO2010106533A3 PCT/IL2010/000174 IL2010000174W WO2010106533A3 WO 2010106533 A3 WO2010106533 A3 WO 2010106533A3 IL 2010000174 W IL2010000174 W IL 2010000174W WO 2010106533 A3 WO2010106533 A3 WO 2010106533A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- stack
- parameters
- accurate determination
- thin films
- films
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
- G01B11/303—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces using photoelectric detection means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/55—Specular reflectivity
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/8422—Investigating thin films, e.g. matrix isolation method
Abstract
A method for accurate determination of optical parameters of a stack of thin films with at least one of the films being an opaque film. The method includes measurement of the reflected or transmitted through the stack illumination and mutual correlation of the determined thin film parameters.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IL214467A IL214467A0 (en) | 2009-03-14 | 2011-08-04 | A method and apparatus for accurate determination of parameters of a stack of thin films |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US16029409P | 2009-03-14 | 2009-03-14 | |
US61/160,294 | 2009-03-14 |
Publications (3)
Publication Number | Publication Date |
---|---|
WO2010106533A2 WO2010106533A2 (en) | 2010-09-23 |
WO2010106533A3 true WO2010106533A3 (en) | 2010-12-16 |
WO2010106533A4 WO2010106533A4 (en) | 2011-12-01 |
Family
ID=42740069
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/IL2010/000174 WO2010106533A2 (en) | 2009-03-14 | 2010-03-03 | A method and apparatus for accurate determination of parameters of a stack of thin films |
Country Status (1)
Country | Link |
---|---|
WO (1) | WO2010106533A2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11377728B2 (en) | 2016-07-13 | 2022-07-05 | Evatec Ag | Broadband optical monitoring |
CN113514011A (en) * | 2021-06-15 | 2021-10-19 | 先导薄膜材料(广东)有限公司 | Method for rapidly judging roughness of metal film |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4737896A (en) * | 1985-07-23 | 1988-04-12 | Canon Kabushiki Kaisha | Illumination device |
US7019650B2 (en) * | 2003-03-03 | 2006-03-28 | Caducys, L.L.C. | Interrogator and interrogation system employing the same |
US20080078444A1 (en) * | 2006-06-05 | 2008-04-03 | Translucent Photonics, Inc. | Thin film solar cell |
-
2010
- 2010-03-03 WO PCT/IL2010/000174 patent/WO2010106533A2/en active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4737896A (en) * | 1985-07-23 | 1988-04-12 | Canon Kabushiki Kaisha | Illumination device |
US7019650B2 (en) * | 2003-03-03 | 2006-03-28 | Caducys, L.L.C. | Interrogator and interrogation system employing the same |
US20080078444A1 (en) * | 2006-06-05 | 2008-04-03 | Translucent Photonics, Inc. | Thin film solar cell |
Also Published As
Publication number | Publication date |
---|---|
WO2010106533A4 (en) | 2011-12-01 |
WO2010106533A2 (en) | 2010-09-23 |
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