WO2010106533A3 - A method and apparatus for accurate determination of parameters of a stack of thin films - Google Patents

A method and apparatus for accurate determination of parameters of a stack of thin films Download PDF

Info

Publication number
WO2010106533A3
WO2010106533A3 PCT/IL2010/000174 IL2010000174W WO2010106533A3 WO 2010106533 A3 WO2010106533 A3 WO 2010106533A3 IL 2010000174 W IL2010000174 W IL 2010000174W WO 2010106533 A3 WO2010106533 A3 WO 2010106533A3
Authority
WO
WIPO (PCT)
Prior art keywords
stack
parameters
accurate determination
thin films
films
Prior art date
Application number
PCT/IL2010/000174
Other languages
French (fr)
Other versions
WO2010106533A4 (en
WO2010106533A2 (en
Inventor
Moshe Finarov
Original Assignee
Brightview Systems Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Brightview Systems Ltd. filed Critical Brightview Systems Ltd.
Publication of WO2010106533A2 publication Critical patent/WO2010106533A2/en
Publication of WO2010106533A3 publication Critical patent/WO2010106533A3/en
Priority to IL214467A priority Critical patent/IL214467A0/en
Publication of WO2010106533A4 publication Critical patent/WO2010106533A4/en

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/30Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/303Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces using photoelectric detection means
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55Specular reflectivity
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/8422Investigating thin films, e.g. matrix isolation method

Abstract

A method for accurate determination of optical parameters of a stack of thin films with at least one of the films being an opaque film. The method includes measurement of the reflected or transmitted through the stack illumination and mutual correlation of the determined thin film parameters.
PCT/IL2010/000174 2009-03-14 2010-03-03 A method and apparatus for accurate determination of parameters of a stack of thin films WO2010106533A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
IL214467A IL214467A0 (en) 2009-03-14 2011-08-04 A method and apparatus for accurate determination of parameters of a stack of thin films

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US16029409P 2009-03-14 2009-03-14
US61/160,294 2009-03-14

Publications (3)

Publication Number Publication Date
WO2010106533A2 WO2010106533A2 (en) 2010-09-23
WO2010106533A3 true WO2010106533A3 (en) 2010-12-16
WO2010106533A4 WO2010106533A4 (en) 2011-12-01

Family

ID=42740069

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IL2010/000174 WO2010106533A2 (en) 2009-03-14 2010-03-03 A method and apparatus for accurate determination of parameters of a stack of thin films

Country Status (1)

Country Link
WO (1) WO2010106533A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11377728B2 (en) 2016-07-13 2022-07-05 Evatec Ag Broadband optical monitoring
CN113514011A (en) * 2021-06-15 2021-10-19 先导薄膜材料(广东)有限公司 Method for rapidly judging roughness of metal film

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4737896A (en) * 1985-07-23 1988-04-12 Canon Kabushiki Kaisha Illumination device
US7019650B2 (en) * 2003-03-03 2006-03-28 Caducys, L.L.C. Interrogator and interrogation system employing the same
US20080078444A1 (en) * 2006-06-05 2008-04-03 Translucent Photonics, Inc. Thin film solar cell

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4737896A (en) * 1985-07-23 1988-04-12 Canon Kabushiki Kaisha Illumination device
US7019650B2 (en) * 2003-03-03 2006-03-28 Caducys, L.L.C. Interrogator and interrogation system employing the same
US20080078444A1 (en) * 2006-06-05 2008-04-03 Translucent Photonics, Inc. Thin film solar cell

Also Published As

Publication number Publication date
WO2010106533A4 (en) 2011-12-01
WO2010106533A2 (en) 2010-09-23

Similar Documents

Publication Publication Date Title
MX2009006226A (en) Method and system for measuring an object.
NZ588399A (en) Authenticating a polymer film by measuring thickness using white light interferometry
WO2007087485A3 (en) Method and apparatus for photographic measurement
WO2012012265A3 (en) 3d microscope and methods of measuring patterned substrates
WO2009096592A3 (en) Information processing apparatus and method
GB2477251A (en) Method for measurement of the thickness of any deposit of material on inner wall of a pipeline
BRPI0509132B8 (en) colorimetric sensor, arrangement, device, and method for detecting the presence or absence of an analyte
WO2011029740A3 (en) Devices and methods for determining positions and measuring surfaces
WO2014019846A3 (en) Position measuring apparatus, position measuring method, lithographic apparatus and device manufacturing method
TW200834063A (en) Test data processing apparatus and test data processing method
ATE472114T1 (en) OPTICAL DETECTION DEVICE
WO2010030829A3 (en) Automated online measurement of glass part geometry
EP2397840A3 (en) Image inspecting apparatus, image inspecting method, image forming apparatus
MY161574A (en) Method and device for measuring optical properties of an optically variable marking applied to an object
WO2009131892A3 (en) Methods and apparatus for measuring substrate edge thickness during polishing
WO2012117353A3 (en) Method and apparatus for measuring the thickness of a transparent object in an automatic production line
EP1973782B8 (en) Method and apparatus for detecting presence of an ophthalmic lens in a package
WO2009007977A3 (en) Method and apparatus for duv transmission mapping
WO2010069409A8 (en) Device and method for the three-dimensional optical measurement of strongly reflective or transparent objects
WO2010075014A3 (en) Organic chemical sensor with microporous organosilicate material
WO2012110837A8 (en) Method and device for detecting an object with background suppression
WO2010106405A3 (en) Determination of notional signatures
TW200951540A (en) Optical display device manufacturing system and optical display device manufacturing method
WO2015063273A8 (en) Display system and method for producing same
GB2438944B (en) Method and apparatus for measurement of the thickness of thin films by means of a measurement probe

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 10753201

Country of ref document: EP

Kind code of ref document: A2

WWE Wipo information: entry into national phase

Ref document number: 214467

Country of ref document: IL

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 10753201

Country of ref document: EP

Kind code of ref document: A2