WO2010062370A3 - Dispense system set-up and characterization - Google Patents

Dispense system set-up and characterization Download PDF

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Publication number
WO2010062370A3
WO2010062370A3 PCT/US2009/005931 US2009005931W WO2010062370A3 WO 2010062370 A3 WO2010062370 A3 WO 2010062370A3 US 2009005931 W US2009005931 W US 2009005931W WO 2010062370 A3 WO2010062370 A3 WO 2010062370A3
Authority
WO
WIPO (PCT)
Prior art keywords
characterization
systems
system set
dispense system
fluid dispensing
Prior art date
Application number
PCT/US2009/005931
Other languages
French (fr)
Other versions
WO2010062370A2 (en
Inventor
Jared L. Hodge
Van N. Truskett
Logan Simpson
Bharath Thiruvengadachari
Stephen C. Johnson
Philip D. Schumaker
Original Assignee
Molecular Imprints, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Molecular Imprints, Inc. filed Critical Molecular Imprints, Inc.
Publication of WO2010062370A2 publication Critical patent/WO2010062370A2/en
Publication of WO2010062370A3 publication Critical patent/WO2010062370A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Abstract

The present application describes methods and systems for setting up and characterizing fluid dispensing systems. The methods and systems characterize the fluid dispensing systems and associate the characterizations with the corresponding fluid dispensing systems.
PCT/US2009/005931 2008-11-03 2009-11-02 Dispense system set-up and characterization WO2010062370A2 (en)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
US11063008P 2008-11-03 2008-11-03
US61/110,630 2008-11-03
US11110908P 2008-11-04 2008-11-04
US61/111,109 2008-11-04
US14401609P 2009-01-12 2009-01-12
US61/144,016 2009-01-12
US12/608,494 US20100112220A1 (en) 2008-11-03 2009-10-29 Dispense system set-up and characterization
US12/608,494 2009-10-29

Publications (2)

Publication Number Publication Date
WO2010062370A2 WO2010062370A2 (en) 2010-06-03
WO2010062370A3 true WO2010062370A3 (en) 2010-10-28

Family

ID=42131769

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2009/005931 WO2010062370A2 (en) 2008-11-03 2009-11-02 Dispense system set-up and characterization

Country Status (3)

Country Link
US (1) US20100112220A1 (en)
TW (1) TW201023338A (en)
WO (1) WO2010062370A2 (en)

Families Citing this family (6)

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Publication number Priority date Publication date Assignee Title
US8215946B2 (en) 2006-05-18 2012-07-10 Molecular Imprints, Inc. Imprint lithography system and method
KR102201321B1 (en) 2014-07-25 2021-01-11 삼성전자주식회사 Method of fabricating aligned pattern on pattern formation area using imprint process
US11448958B2 (en) 2017-09-21 2022-09-20 Canon Kabushiki Kaisha System and method for controlling the placement of fluid resist droplets
US11036130B2 (en) * 2017-10-19 2021-06-15 Canon Kabushiki Kaisha Drop placement evaluation
US11927883B2 (en) 2018-03-30 2024-03-12 Canon Kabushiki Kaisha Method and apparatus to reduce variation of physical attribute of droplets using performance characteristic of dispensers
US20200096863A1 (en) * 2018-09-25 2020-03-26 Canon Kabushiki Kaisha Method of fluid droplet offset and apparatus for imprint lithography

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Publication number Priority date Publication date Assignee Title
EP0875379A2 (en) * 1997-04-30 1998-11-04 Hewlett-Packard Company Multiple cartridge printhead assembly for use in inkjet printing system
US20030149505A1 (en) * 1998-08-26 2003-08-07 Electronic Materials, L.L.C. Apparatus and method for creating flexible circuits
US20050045096A1 (en) * 2002-12-24 2005-03-03 Kenji Kojima Liquid droplet ejecting apparatus, electro-optical device, method of manufacturing the electro-optical device, and electronic apparatus
US20060007257A1 (en) * 2004-07-07 2006-01-12 Fuji Photo Film Co., Ltd. Image forming apparatus
WO2008066562A2 (en) * 2006-04-03 2008-06-05 Molecular Imprints, Inc. Imprint lithography method and system
KR100781997B1 (en) * 2006-08-21 2007-12-06 삼성전기주식회사 Calibration method and apparatus of inkjet head

Also Published As

Publication number Publication date
US20100112220A1 (en) 2010-05-06
TW201023338A (en) 2010-06-16
WO2010062370A2 (en) 2010-06-03

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