WO2010047789A3 - Double sidewall angle nano-imprint template - Google Patents

Double sidewall angle nano-imprint template Download PDF

Info

Publication number
WO2010047789A3
WO2010047789A3 PCT/US2009/005722 US2009005722W WO2010047789A3 WO 2010047789 A3 WO2010047789 A3 WO 2010047789A3 US 2009005722 W US2009005722 W US 2009005722W WO 2010047789 A3 WO2010047789 A3 WO 2010047789A3
Authority
WO
WIPO (PCT)
Prior art keywords
imprint template
sidewall angle
double sidewall
template
nano
Prior art date
Application number
PCT/US2009/005722
Other languages
French (fr)
Other versions
WO2010047789A2 (en
Inventor
Michael N. Miller
John Thomas Cowher
Cynthia B. Brooks
Dwayne L. Labrake
Original Assignee
Molecular Imprints, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Molecular Imprints, Inc. filed Critical Molecular Imprints, Inc.
Publication of WO2010047789A2 publication Critical patent/WO2010047789A2/en
Publication of WO2010047789A3 publication Critical patent/WO2010047789A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Abstract

The present application describes a template with feature profiles that have multiple sidewall angles. The multiple sidewall angles facilitate control over critical dimensions and reduce issues related to template release.
PCT/US2009/005722 2008-10-22 2009-10-21 Double sidewall angle nano-imprint template WO2010047789A2 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US10739008P 2008-10-22 2008-10-22
US61/107,390 2008-10-22
US12/582,471 US20100095862A1 (en) 2008-10-22 2009-10-20 Double Sidewall Angle Nano-Imprint Template
US12/582,471 2009-10-20

Publications (2)

Publication Number Publication Date
WO2010047789A2 WO2010047789A2 (en) 2010-04-29
WO2010047789A3 true WO2010047789A3 (en) 2010-08-26

Family

ID=42107604

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2009/005722 WO2010047789A2 (en) 2008-10-22 2009-10-21 Double sidewall angle nano-imprint template

Country Status (3)

Country Link
US (1) US20100095862A1 (en)
TW (1) TW201024075A (en)
WO (1) WO2010047789A2 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090148619A1 (en) * 2007-12-05 2009-06-11 Molecular Imprints, Inc. Controlling Thickness of Residual Layer
US8529778B2 (en) * 2008-11-13 2013-09-10 Molecular Imprints, Inc. Large area patterning of nano-sized shapes
CN103402908B (en) * 2010-10-13 2016-08-31 马克思-普朗克科学促进协会 Produce the nano-pillar of high-sequential or the method for nano-pore structure over a large area
WO2012061816A2 (en) 2010-11-05 2012-05-10 Molecular Imprints, Inc. Patterning of non-convex shaped nanostructures
US10435590B2 (en) * 2015-06-19 2019-10-08 3M Innovative Properties Company Segmented transfer tape and method of making and use thereof
US10991582B2 (en) 2016-12-21 2021-04-27 Canon Kabushiki Kaisha Template for imprint lithography including a recession, an apparatus of using the template, and a method of fabricating an article

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060192320A1 (en) * 2005-02-28 2006-08-31 Toshinobu Tokita Pattern transferring mold, pattern transferring apparatus and device manufacturing method using the same
US20080003818A1 (en) * 2006-06-30 2008-01-03 Robert Seidel Nano imprint technique with increased flexibility with respect to alignment and feature shaping
US20080121612A1 (en) * 2006-11-29 2008-05-29 Lg.Philips Lcd Co., Ltd. Method for fabricating an LCD device

Family Cites Families (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6873087B1 (en) * 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
EP2264523A3 (en) * 2000-07-16 2011-11-30 Board Of Regents, The University Of Texas System A method of forming a pattern on a substrate in imprint lithographic processes
KR101031528B1 (en) * 2000-10-12 2011-04-27 더 보드 오브 리전츠 오브 더 유니버시티 오브 텍사스 시스템 Template for room temperature, low pressure micro- and nano- imprint lithography
EP1258915A1 (en) * 2001-05-17 2002-11-20 Infineon Technologies SC300 GmbH & Co. KG Method of detecting defects on a semiconductor device in a processing tool and an arrangement therefore
US20050064344A1 (en) * 2003-09-18 2005-03-24 University Of Texas System Board Of Regents Imprint lithography templates having alignment marks
US7037639B2 (en) * 2002-05-01 2006-05-02 Molecular Imprints, Inc. Methods of manufacturing a lithography template
US7179079B2 (en) * 2002-07-08 2007-02-20 Molecular Imprints, Inc. Conforming template for patterning liquids disposed on substrates
US7077992B2 (en) * 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6932934B2 (en) * 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US6900881B2 (en) * 2002-07-11 2005-05-31 Molecular Imprints, Inc. Step and repeat imprint lithography systems
US7070405B2 (en) * 2002-08-01 2006-07-04 Molecular Imprints, Inc. Alignment systems for imprint lithography
US6916584B2 (en) * 2002-08-01 2005-07-12 Molecular Imprints, Inc. Alignment methods for imprint lithography
US7027156B2 (en) * 2002-08-01 2006-04-11 Molecular Imprints, Inc. Scatterometry alignment for imprint lithography
US6936194B2 (en) * 2002-09-05 2005-08-30 Molecular Imprints, Inc. Functional patterning material for imprint lithography processes
US20040065252A1 (en) * 2002-10-04 2004-04-08 Sreenivasan Sidlgata V. Method of forming a layer on a substrate to facilitate fabrication of metrology standards
US8349241B2 (en) * 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
US7179396B2 (en) * 2003-03-25 2007-02-20 Molecular Imprints, Inc. Positive tone bi-layer imprint lithography method
US7396475B2 (en) * 2003-04-25 2008-07-08 Molecular Imprints, Inc. Method of forming stepped structures employing imprint lithography
US7157036B2 (en) * 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
US7136150B2 (en) * 2003-09-25 2006-11-14 Molecular Imprints, Inc. Imprint lithography template having opaque alignment marks
US20050084804A1 (en) * 2003-10-16 2005-04-21 Molecular Imprints, Inc. Low surface energy templates
US20050098534A1 (en) * 2003-11-12 2005-05-12 Molecular Imprints, Inc. Formation of conductive templates employing indium tin oxide
US8076386B2 (en) * 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
US20050189676A1 (en) * 2004-02-27 2005-09-01 Molecular Imprints, Inc. Full-wafer or large area imprinting with multiple separated sub-fields for high throughput lithography
US20050230882A1 (en) * 2004-04-19 2005-10-20 Molecular Imprints, Inc. Method of forming a deep-featured template employed in imprint lithography
US7140861B2 (en) * 2004-04-27 2006-11-28 Molecular Imprints, Inc. Compliant hard template for UV imprinting
US7785526B2 (en) * 2004-07-20 2010-08-31 Molecular Imprints, Inc. Imprint alignment method, system, and template
US7309225B2 (en) * 2004-08-13 2007-12-18 Molecular Imprints, Inc. Moat system for an imprint lithography template
US7357876B2 (en) * 2004-12-01 2008-04-15 Molecular Imprints, Inc. Eliminating printability of sub-resolution defects in imprint lithography
US20060266916A1 (en) * 2005-05-25 2006-11-30 Molecular Imprints, Inc. Imprint lithography template having a coating to reflect and/or absorb actinic energy
US8850980B2 (en) * 2006-04-03 2014-10-07 Canon Nanotechnologies, Inc. Tessellated patterns in imprint lithography
US7906274B2 (en) * 2007-11-21 2011-03-15 Molecular Imprints, Inc. Method of creating a template employing a lift-off process
US8012394B2 (en) * 2007-12-28 2011-09-06 Molecular Imprints, Inc. Template pattern density doubling
US20090212012A1 (en) * 2008-02-27 2009-08-27 Molecular Imprints, Inc. Critical dimension control during template formation
US20100015270A1 (en) * 2008-07-15 2010-01-21 Molecular Imprints, Inc. Inner cavity system for nano-imprint lithography
US8877073B2 (en) * 2008-10-27 2014-11-04 Canon Nanotechnologies, Inc. Imprint lithography template
US9122148B2 (en) * 2008-11-03 2015-09-01 Canon Nanotechnologies, Inc. Master template replication

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060192320A1 (en) * 2005-02-28 2006-08-31 Toshinobu Tokita Pattern transferring mold, pattern transferring apparatus and device manufacturing method using the same
US20080003818A1 (en) * 2006-06-30 2008-01-03 Robert Seidel Nano imprint technique with increased flexibility with respect to alignment and feature shaping
US20080121612A1 (en) * 2006-11-29 2008-05-29 Lg.Philips Lcd Co., Ltd. Method for fabricating an LCD device

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
KAWATA H ET AL: "Silicon template fabrication for imprint process with good demolding characteristics", MICROELECTRONIC ENGINEERING, ELSEVIER PUBLISHERS BV., AMSTERDAM, NL, vol. 86, no. 4-6, 1 April 2009 (2009-04-01), pages 700 - 704, XP026106252, ISSN: 0167-9317, [retrieved on 20081203] *

Also Published As

Publication number Publication date
US20100095862A1 (en) 2010-04-22
WO2010047789A2 (en) 2010-04-29
TW201024075A (en) 2010-07-01

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