WO2010047788A3 - Imprint lithography system and method - Google Patents

Imprint lithography system and method Download PDF

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Publication number
WO2010047788A3
WO2010047788A3 PCT/US2009/005721 US2009005721W WO2010047788A3 WO 2010047788 A3 WO2010047788 A3 WO 2010047788A3 US 2009005721 W US2009005721 W US 2009005721W WO 2010047788 A3 WO2010047788 A3 WO 2010047788A3
Authority
WO
WIPO (PCT)
Prior art keywords
imprint lithography
lithography system
substrate
template
wave formation
Prior art date
Application number
PCT/US2009/005721
Other languages
French (fr)
Other versions
WO2010047788A2 (en
Inventor
Mahadevan Ganapathisubramanian
Byung-Jin Choi
Mario Johannes Meissl
Original Assignee
Molecular Imprints, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Molecular Imprints, Inc. filed Critical Molecular Imprints, Inc.
Priority to JP2011533171A priority Critical patent/JP5289577B2/en
Priority to CN2009801427660A priority patent/CN102203672B/en
Publication of WO2010047788A2 publication Critical patent/WO2010047788A2/en
Publication of WO2010047788A3 publication Critical patent/WO2010047788A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Abstract

System, method and process for imprinting a substrate using controlled deformation of a substrate and/or a template. The substrate and/or template may be positioned in single wave formation or double wave formation during an imprint lithography process.
PCT/US2009/005721 2008-10-23 2009-10-21 Imprint lithography system and method WO2010047788A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2011533171A JP5289577B2 (en) 2008-10-23 2009-10-21 Equipment with vacuum chuck for imprint lithography equipment
CN2009801427660A CN102203672B (en) 2008-10-23 2009-10-21 Imprint lithography system and method

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US10772908P 2008-10-23 2008-10-23
US61/107,729 2008-10-23
US10864008P 2008-10-27 2008-10-27
US61/108,640 2008-10-27
US12/582,091 US8215946B2 (en) 2006-05-18 2009-10-20 Imprint lithography system and method
US12/582,091 2009-10-20

Publications (2)

Publication Number Publication Date
WO2010047788A2 WO2010047788A2 (en) 2010-04-29
WO2010047788A3 true WO2010047788A3 (en) 2010-11-04

Family

ID=42036819

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2009/005721 WO2010047788A2 (en) 2008-10-23 2009-10-21 Imprint lithography system and method

Country Status (6)

Country Link
US (1) US8215946B2 (en)
JP (2) JP5289577B2 (en)
CN (1) CN102203672B (en)
MY (1) MY165977A (en)
SG (1) SG195597A1 (en)
WO (1) WO2010047788A2 (en)

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