WO2010002679A3 - Method of forming a microstructure - Google Patents

Method of forming a microstructure Download PDF

Info

Publication number
WO2010002679A3
WO2010002679A3 PCT/US2009/048571 US2009048571W WO2010002679A3 WO 2010002679 A3 WO2010002679 A3 WO 2010002679A3 US 2009048571 W US2009048571 W US 2009048571W WO 2010002679 A3 WO2010002679 A3 WO 2010002679A3
Authority
WO
WIPO (PCT)
Prior art keywords
surface region
structured surface
method includes
functional material
microstructure
Prior art date
Application number
PCT/US2009/048571
Other languages
French (fr)
Other versions
WO2010002679A2 (en
Inventor
Matthew S. Stay
Mikail L. Pekurovsky
Cristin E. Mora
Matthew H. Frey
Original Assignee
3M Innovative Properties Company
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Company filed Critical 3M Innovative Properties Company
Priority to JP2011516638A priority Critical patent/JP2011526844A/en
Priority to EP09774130.0A priority patent/EP2304078B1/en
Priority to US13/001,718 priority patent/US8703232B2/en
Priority to CN2009801328646A priority patent/CN102131958B/en
Publication of WO2010002679A2 publication Critical patent/WO2010002679A2/en
Publication of WO2010002679A3 publication Critical patent/WO2010002679A3/en
Priority to US14/217,667 priority patent/US20140199523A1/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B3/00Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form
    • B32B3/26Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer
    • B32B3/30Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer characterised by a layer formed with recesses or projections, e.g. hollows, grooves, protuberances, ribs
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/107Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by filling grooves in the support with conductive material
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/52Electrically conductive inks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/06Coating on selected surface areas, e.g. using masks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/08Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1603Process or apparatus coating on selected surface areas
    • C23C18/1607Process or apparatus coating on selected surface areas by direct patterning
    • C23C18/1608Process or apparatus coating on selected surface areas by direct patterning from pretreatment step, i.e. selective pre-treatment
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1258Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by using a substrate provided with a shape pattern, e.g. grooves, banks, resist pattern
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K9/00Screening of apparatus or components against electric or magnetic fields
    • H05K9/0073Shielding materials
    • H05K9/0094Shielding materials being light-transmitting, e.g. transparent, translucent
    • H05K9/0096Shielding materials being light-transmitting, e.g. transparent, translucent for television displays, e.g. plasma display panel
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating
    • C23C18/30Activating or accelerating or sensitising with palladium or other noble metal
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/15Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect
    • G02F1/153Constructional details
    • G02F1/155Electrodes
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00Materials and properties
    • G02F2202/22Antistatic materials or arrangements
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0284Details of three-dimensional rigid printed circuit boards
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09Shape and layout
    • H05K2201/09009Substrate related
    • H05K2201/09036Recesses or grooves in insulating substrate
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09Shape and layout
    • H05K2201/09818Shape or layout details not covered by a single group of H05K2201/09009 - H05K2201/09809
    • H05K2201/09827Tapered, e.g. tapered hole, via or groove
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/24612Composite web or sheet
    • Y10T428/2462Composite web or sheet with partial filling of valleys on outer surface

Abstract

The present disclosure describes an article and a method of forming a microstructure. The method includes providing a substrate having a structured surface region comprising one or more recessed features with recessed surfaces. The structured surface region is substantially free of plateaus. The method includes disposing a fluid composition comprising a functional material and a liquid onto the structured surface region. The method includes evaporating liquid from the fluid composition. The functional material collects on the recessed surfaces such that a remainder of the structured surface region is substantially free of the functional material.
PCT/US2009/048571 2008-06-30 2009-06-25 Method of forming a microstructure WO2010002679A2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2011516638A JP2011526844A (en) 2008-06-30 2009-06-25 Method for forming a microstructure
EP09774130.0A EP2304078B1 (en) 2008-06-30 2009-06-25 Method of forming a microstructure
US13/001,718 US8703232B2 (en) 2008-06-30 2009-06-25 Method of forming a microstructure
CN2009801328646A CN102131958B (en) 2008-06-30 2009-06-25 Method of forming microstructure
US14/217,667 US20140199523A1 (en) 2008-06-30 2014-03-18 Method of forming a microstructure

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US7673108P 2008-06-30 2008-06-30
US61/076,731 2008-06-30

Related Child Applications (2)

Application Number Title Priority Date Filing Date
US13/001,718 A-371-Of-International US8703232B2 (en) 2008-06-30 2009-06-25 Method of forming a microstructure
US14/217,667 Division US20140199523A1 (en) 2008-06-30 2014-03-18 Method of forming a microstructure

Publications (2)

Publication Number Publication Date
WO2010002679A2 WO2010002679A2 (en) 2010-01-07
WO2010002679A3 true WO2010002679A3 (en) 2010-06-03

Family

ID=41426242

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2009/048571 WO2010002679A2 (en) 2008-06-30 2009-06-25 Method of forming a microstructure

Country Status (6)

Country Link
US (2) US8703232B2 (en)
EP (3) EP2623632A3 (en)
JP (1) JP2011526844A (en)
KR (1) KR20110049777A (en)
CN (1) CN102131958B (en)
WO (1) WO2010002679A2 (en)

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2220917B1 (en) 2007-11-26 2013-01-30 S.D. Warren Company Methods for manufacturing electronic devices by tip printing and scrape coating
JP5319769B2 (en) 2008-06-30 2013-10-16 スリーエム イノベイティブ プロパティズ カンパニー Method for forming a patterned substrate
KR20110049777A (en) 2008-06-30 2011-05-12 쓰리엠 이노베이티브 프로퍼티즈 컴파니 Method of forming a microstructure
US8551386B2 (en) 2009-08-03 2013-10-08 S.D. Warren Company Imparting texture to cured powder coatings
US8941395B2 (en) 2010-04-27 2015-01-27 3M Innovative Properties Company Integrated passive circuit elements for sensing devices
KR20130109090A (en) 2010-06-11 2013-10-07 쓰리엠 이노베이티브 프로퍼티즈 컴파니 Positional touch sensor with force measurement
US9337362B2 (en) * 2010-10-19 2016-05-10 Air Products And Chemicals, Inc. Conductive composition and conductive feature formed at low temperatures
US20120186080A1 (en) * 2011-01-26 2012-07-26 S.D. Warren Company Creating conductivized traces for use in electronic devices
TWI598011B (en) 2011-02-02 2017-09-01 3M新設資產公司 Patterned substrates with darkened conductor traces
CN102983391B (en) * 2011-09-06 2016-09-07 数伦计算机技术(上海)有限公司 A kind of high light penetrability antenna
NL2007372C2 (en) * 2011-09-08 2013-03-11 Univ Delft Tech A process for the manufacture of a semiconductor device.
CN102312227A (en) * 2011-09-15 2012-01-11 武汉理工大学 Process for preparing metal silver micropattern on polymeric material surface
EP2766179A4 (en) * 2011-10-14 2015-06-17 Digital Sensing Ltd Arrays and methods of manufacture
CN103158227B (en) * 2011-12-15 2016-02-03 鸿富锦精密工业(深圳)有限公司 Complex and preparation method thereof
DE102011088793A1 (en) * 2011-12-16 2013-06-20 Tyco Electronics Amp Gmbh Electrical connector with microstructured contact element
WO2013119308A1 (en) 2012-02-10 2013-08-15 3M Innovative Properties Company Mesh patterns for touch sensor electrodes
CN102662305B (en) * 2012-05-28 2013-09-25 中国科学院上海微系统与信息技术研究所 Micro-lens mould structure and manufacturing method thereof
CN103064137B (en) * 2013-01-09 2015-07-08 西安交通大学 Electric field induction imprinting method of aspheric surface micro-lens array
JP6136517B2 (en) * 2013-04-18 2017-05-31 大日本印刷株式会社 Conductive mesh, conductive mesh sheet, touch panel device and image display device
US20140353012A1 (en) * 2013-05-30 2014-12-04 Nanchang O-Film Tech Co., Ltd. Transparent conductive film
JP6275482B2 (en) * 2013-06-03 2018-02-07 株式会社レグルス Method for forming circuit pattern on plastic molded article and coating liquid used therefor
US20160353578A1 (en) * 2013-11-26 2016-12-01 Jun Yang Printing Method for Fabrication of Printed Electronics
KR102107227B1 (en) * 2013-12-02 2020-05-07 에스케이하이닉스 주식회사 Structure and method for forming pattern using block copolymer, and method of fabricating semiconductor device using the same
JP6199820B2 (en) * 2014-07-04 2017-09-20 日本電信電話株式会社 Manufacturing method of spring for micro vibration element
US10224126B2 (en) * 2014-10-07 2019-03-05 Sharp Kabushiki Kaisha Transparent conductor, method for producing transparent conductor, and touch panel
JP6006822B2 (en) * 2015-03-19 2016-10-12 富士重工業株式会社 Resin member
US10564780B2 (en) 2015-08-21 2020-02-18 3M Innovative Properties Company Transparent conductors including metal traces and methods of making same
WO2017048633A1 (en) 2015-09-16 2017-03-23 3M Innovative Properties Company Overcoated patterned conductive layer and methods
CN105704273B (en) * 2016-03-31 2019-05-21 努比亚技术有限公司 A kind of mask frame and terminal
CN106373792B (en) * 2016-08-30 2021-06-08 南通万德科技有限公司 Composite material of high polymer material and metal and preparation process thereof
US10103056B2 (en) * 2017-03-08 2018-10-16 Lam Research Corporation Methods for wet metal seed deposition for bottom up gapfill of features
WO2019018585A1 (en) * 2017-07-18 2019-01-24 Q Umbono Llc Multi-layered lens and manufacture thereof
US10173558B1 (en) * 2017-08-25 2019-01-08 Ford Global Technologies, Llc Vehicle seat assembly with deployable airbag
AU2019226479A1 (en) * 2018-02-28 2020-09-03 Manufacturing Systems Limited Apparatus and method of catalysis
CN108957768A (en) * 2018-06-22 2018-12-07 张家港康得新光电材料有限公司 Realize the structure and method of naked eye 3D, 2D/3D switching
EP3815475A4 (en) * 2018-06-28 2022-03-30 3M Innovative Properties Company Methods of making metal patterns on flexible substrate
USD919327S1 (en) * 2018-09-19 2021-05-18 Damian Hagglund Massage mat
KR20200143254A (en) 2019-06-11 2020-12-23 에이에스엠 아이피 홀딩 비.브이. Method of forming an electronic structure using an reforming gas, system for performing the method, and structure formed using the method
WO2022046930A1 (en) * 2020-08-28 2022-03-03 Lumenco, Llc Antiviral and antimicrobial protective films with microstructure deterrents
CN114573240B (en) * 2022-02-24 2024-03-01 西安中易建科技有限公司 Front plate glass, preparation method thereof, photovoltaic module and photovoltaic curtain wall

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4403818A (en) * 1980-06-26 1983-09-13 General Motors Corporation Instrument panel for vehicles
US20050120902A1 (en) * 2001-04-25 2005-06-09 David Adams Edge transfer lithography
US20050121782A1 (en) * 2003-12-05 2005-06-09 Koichiro Nakamura Selectively adherent substrate and method for producing the same
US20060108062A1 (en) * 1999-01-11 2006-05-25 3M Innovative Properties Company Cube corner cavity based retroreflectors with transparent fill material

Family Cites Families (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3322053A (en) 1964-04-30 1967-05-30 Minnesota Mining & Mfg Treating surfaces with fluids
US4394223A (en) * 1981-10-06 1983-07-19 The United States Of America As Represented By The Secretary Of The Air Force Tin and gold plating process
JPH0694592B2 (en) 1986-04-22 1994-11-24 日産化学工業株式会社 Electroless plating method
US5137542A (en) 1990-08-08 1992-08-11 Minnesota Mining And Manufacturing Company Abrasive printed with an electrically conductive ink
US5254390B1 (en) 1990-11-15 1999-05-18 Minnesota Mining & Mfg Plano-convex base sheet for retroreflective articles
US5137611A (en) 1991-11-01 1992-08-11 Armco Inc. Electrolytic plating one surface of conductive sheet
US5300263A (en) 1992-10-28 1994-04-05 Minnesota Mining And Manufacturing Company Method of making a microlens array and mold
US5439621A (en) 1993-04-12 1995-08-08 Minnesota Mining And Manufacturing Company Method of making an array of variable focal length microlenses
US5382317A (en) 1994-02-18 1995-01-17 Minnesota Mining And Manufacturing Company Method of selectively applying a coating to a bilevel substrate
EP0753550B1 (en) * 1995-01-11 2001-04-25 Sekisui Chemical Co., Ltd. Conductive coating composition
US5657162A (en) * 1995-07-26 1997-08-12 Reflexite Corporation Retroreflective articles with multiple size prisms in multiple locations
US5917664A (en) 1996-02-05 1999-06-29 3M Innovative Properties Company Brightness enhancement film with soft cutoff
US5825543A (en) 1996-02-29 1998-10-20 Minnesota Mining And Manufacturing Company Diffusely reflecting polarizing element including a first birefringent phase and a second phase
US6461678B1 (en) * 1997-04-29 2002-10-08 Sandia Corporation Process for metallization of a substrate by curing a catalyst applied thereto
US6280063B1 (en) 1997-05-09 2001-08-28 3M Innovative Properties Company Brightness enhancement article
US6431695B1 (en) 1998-06-18 2002-08-13 3M Innovative Properties Company Microstructure liquid dispenser
US6290685B1 (en) 1998-06-18 2001-09-18 3M Innovative Properties Company Microchanneled active fluid transport devices
US6375871B1 (en) 1998-06-18 2002-04-23 3M Innovative Properties Company Methods of manufacturing microfluidic articles
US6077560A (en) 1997-12-29 2000-06-20 3M Innovative Properties Company Method for continuous and maskless patterning of structured substrates
JP4347521B2 (en) 1998-02-18 2009-10-21 スリーエム カンパニー Optical film
CA2329011A1 (en) 1998-04-29 1999-11-04 3M Innovative Properties Company Receptor sheet for inkjet printing having an embossed surface
US6037005A (en) 1998-05-12 2000-03-14 3M Innovative Properties Company Display substrate electrodes with auxiliary metal layers for enhanced conductivity
CN1170693C (en) 1999-06-01 2004-10-13 3M创新有限公司 Optically transmissive microembossed receptor media
AU5452500A (en) 1999-06-01 2000-12-18 3M Innovative Properties Company Random microembossed receptor media
US7223364B1 (en) 1999-07-07 2007-05-29 3M Innovative Properties Company Detection article having fluid control film
US6451191B1 (en) 1999-11-18 2002-09-17 3M Innovative Properties Company Film based addressable programmable electronic matrix articles and methods of manufacturing and using the same
US6632343B1 (en) 2000-08-30 2003-10-14 Micron Technology, Inc. Method and apparatus for electrolytic plating of surface metals
JP4232336B2 (en) 2000-11-22 2009-03-04 株式会社デンソー Semiconductor wafer surface treatment method
EP2315289A3 (en) 2001-05-23 2011-09-28 Plastic Logic Limited Laser patterning of devices
US20030108664A1 (en) 2001-10-05 2003-06-12 Kodas Toivo T. Methods and compositions for the formation of recessed electrical features on a substrate
RU2230391C2 (en) 2002-03-21 2004-06-10 Открытое акционерное общество "НИИ молекулярной электроники и завод "Микрон" Process of manufacture of self-aligned built-in copper metallization of in tegrated circuits
US7105809B2 (en) 2002-11-18 2006-09-12 3M Innovative Properties Company Microstructured polymeric substrate
US7245435B2 (en) 2002-12-16 2007-07-17 3M Innovative Properties Company Lens array sheet and molding method
JP2005012173A (en) 2003-05-28 2005-01-13 Seiko Epson Corp Film pattern forming method, device and its manufacturing method, electro-optical device, and electronic apparatus
US20050106360A1 (en) 2003-11-13 2005-05-19 Johnston Raymond P. Microstructured surface building assemblies for fluid disposition
US20050130422A1 (en) 2003-12-12 2005-06-16 3M Innovative Properties Company Method for patterning films
US7160583B2 (en) 2004-12-03 2007-01-09 3M Innovative Properties Company Microfabrication using patterned topography and self-assembled monolayers
US7384173B2 (en) 2004-12-30 2008-06-10 3M Innovative Properties Company Brightness enhancement article
JPWO2006100790A1 (en) 2005-03-22 2008-08-28 クラスターテクノロジー株式会社 Wiring board manufacturing method and wiring board
JP4237184B2 (en) 2005-03-31 2009-03-11 エルピーダメモリ株式会社 Manufacturing method of semiconductor device
US20070024994A1 (en) 2005-07-29 2007-02-01 3M Innovative Properties Company Structured optical film with interspersed pyramidal structures
US7777832B2 (en) 2005-11-18 2010-08-17 3M Innovative Properties Company Multi-function enhancement film
US20070134784A1 (en) 2005-12-09 2007-06-14 Halverson Kurt J Microreplicated microarrays
US20070235902A1 (en) * 2006-03-31 2007-10-11 3M Innovative Properties Company Microstructured tool and method of making same using laser ablation
US20070231541A1 (en) 2006-03-31 2007-10-04 3M Innovative Properties Company Microstructured tool and method of making same using laser ablation
US20080095988A1 (en) * 2006-10-18 2008-04-24 3M Innovative Properties Company Methods of patterning a deposit metal on a polymeric substrate
KR20110049777A (en) 2008-06-30 2011-05-12 쓰리엠 이노베이티브 프로퍼티즈 컴파니 Method of forming a microstructure

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4403818A (en) * 1980-06-26 1983-09-13 General Motors Corporation Instrument panel for vehicles
US20060108062A1 (en) * 1999-01-11 2006-05-25 3M Innovative Properties Company Cube corner cavity based retroreflectors with transparent fill material
US20050120902A1 (en) * 2001-04-25 2005-06-09 David Adams Edge transfer lithography
US20050121782A1 (en) * 2003-12-05 2005-06-09 Koichiro Nakamura Selectively adherent substrate and method for producing the same

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
HENDRIKS C E ET AL: "INVISIBLE SILVER TRACKS PRODUCED BY COMBINING HOT-EMBOSSING AND INKJET PRINTING", ADVANCED FUNCTIONAL MATERIALS, WILEY VCH, WIENHEIM, DE, vol. 18, no. 7, 11 April 2008 (2008-04-11), pages 1031 - 1038, XP001511807, ISSN: 1616-301X *

Also Published As

Publication number Publication date
EP2620523A3 (en) 2017-01-18
EP2620523A2 (en) 2013-07-31
US20140199523A1 (en) 2014-07-17
US8703232B2 (en) 2014-04-22
WO2010002679A2 (en) 2010-01-07
EP2623632A3 (en) 2017-01-18
EP2623632A2 (en) 2013-08-07
US20110111182A1 (en) 2011-05-12
EP2304078A2 (en) 2011-04-06
JP2011526844A (en) 2011-10-20
EP2304078B1 (en) 2015-04-15
EP2620523B1 (en) 2018-06-13
CN102131958A (en) 2011-07-20
CN102131958B (en) 2013-12-25
KR20110049777A (en) 2011-05-12

Similar Documents

Publication Publication Date Title
WO2010002679A3 (en) Method of forming a microstructure
WO2009130229A3 (en) An article and a method of making an article
WO2007118989A3 (en) Embossing device, such as a cylinder or a sleeve
WO2011037831A3 (en) Articles including a porous substrate having a conformal layer thereon
EP1728770B8 (en) Process for marking the surface of articles
WO2007064597A3 (en) Uniform surfaces for hybrid material substrates and methods for making and using same
WO2011086368A3 (en) Liquid repellent surfaces
EP2469327A3 (en) Touch panel
WO2010047755A3 (en) Gas environment for imprint lithography
WO2008060582A3 (en) Coated substrates, organometallic films and methods for applying organometallic films to substrates
WO2010112358A3 (en) Method for coating a surface of a component
WO2009111300A3 (en) Gradient coating for biomedical applications
WO2011032135A3 (en) Light-extraction graphics film
WO2007068760A3 (en) Article coated with a ultra high hydrophobic film and process for obtaining same
WO2011047840A3 (en) Device having reduced friction properties
WO2007146956A3 (en) Hydrophilized substrate and method for hydrophilizing a hydrophobic surface of a substrate
WO2009115192A3 (en) Ni-p layer system and process for its preparation
WO2009030802A3 (en) Substrates containing a polymer layer and preparation methods therefor
TW200610582A (en) Inkjet spray method and display device manufacturing method
WO2010132610A3 (en) Thermoplastic substrates with wrinkled metallic surfaces for chemical and biological sensing
ATE555643T1 (en) METHOD FOR FORMING A STRUCTURED SUBSTRATE
WO2008097337A3 (en) Methods and apparatus for multiple part missile
WO2008127289A3 (en) Materials coatings and methods for self-cleaning and self-decontamination of metal surfaces
TW200740949A (en) Masking tape for substrate
WO2008040322A3 (en) Deformable substrate with microstructured surface composed of applied material, and method for producing such a substrate

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 200980132864.6

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 09774130

Country of ref document: EP

Kind code of ref document: A2

WWE Wipo information: entry into national phase

Ref document number: 13001718

Country of ref document: US

NENP Non-entry into the national phase

Ref country code: DE

ENP Entry into the national phase

Ref document number: 2011516638

Country of ref document: JP

Kind code of ref document: A

ENP Entry into the national phase

Ref document number: 20117001734

Country of ref document: KR

Kind code of ref document: A

WWE Wipo information: entry into national phase

Ref document number: 2009774130

Country of ref document: EP