WO2009123721A3 - Large area roll-to-roll imprint lithography - Google Patents
Large area roll-to-roll imprint lithography Download PDFInfo
- Publication number
- WO2009123721A3 WO2009123721A3 PCT/US2009/002032 US2009002032W WO2009123721A3 WO 2009123721 A3 WO2009123721 A3 WO 2009123721A3 US 2009002032 W US2009002032 W US 2009002032W WO 2009123721 A3 WO2009123721 A3 WO 2009123721A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- roll
- imprint lithography
- droplets
- large area
- polymerizable material
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/04—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/32—Component parts, details or accessories; Auxiliary operations
- B29C43/44—Compression means for making articles of indefinite length
- B29C43/46—Rollers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
Abstract
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN200980112481.2A CN101990470B (en) | 2008-04-01 | 2009-04-01 | The imprint lithography of large area roller pair of rollers |
JP2011502956A JP5613658B2 (en) | 2008-04-01 | 2009-04-01 | Large area roll-to-roll imprint lithography |
KR1020107022385A KR101767966B1 (en) | 2008-04-01 | 2009-04-01 | Large area roll-to-roll imprint lithography |
EP09726571A EP2262592A4 (en) | 2008-04-01 | 2009-04-01 | Large area roll-to-roll imprint lithography |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US4126408P | 2008-04-01 | 2008-04-01 | |
US61/041,264 | 2008-04-01 | ||
US12/415,563 | 2009-03-31 | ||
US12/415,563 US8187515B2 (en) | 2008-04-01 | 2009-03-31 | Large area roll-to-roll imprint lithography |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2009123721A2 WO2009123721A2 (en) | 2009-10-08 |
WO2009123721A3 true WO2009123721A3 (en) | 2009-12-30 |
Family
ID=41115897
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2009/002032 WO2009123721A2 (en) | 2008-04-01 | 2009-04-01 | Large area roll-to-roll imprint lithography |
Country Status (8)
Country | Link |
---|---|
US (1) | US8187515B2 (en) |
EP (1) | EP2262592A4 (en) |
JP (1) | JP5613658B2 (en) |
KR (1) | KR101767966B1 (en) |
CN (1) | CN101990470B (en) |
MY (1) | MY152467A (en) |
TW (1) | TWI391233B (en) |
WO (1) | WO2009123721A2 (en) |
Families Citing this family (20)
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---|---|---|---|---|
US20080160129A1 (en) * | 2006-05-11 | 2008-07-03 | Molecular Imprints, Inc. | Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template |
DE602005022874D1 (en) * | 2004-06-03 | 2010-09-23 | Molecular Imprints Inc | FLUID AND DROP EXPOSURE AS REQUIRED FOR MANUFACTURE IN THE NANO AREA |
KR20100090046A (en) * | 2009-02-05 | 2010-08-13 | 엘지디스플레이 주식회사 | Thin film solar cell and the method for fabricating thereof |
JP5411557B2 (en) * | 2009-04-03 | 2014-02-12 | 株式会社日立ハイテクノロジーズ | Microstructure transfer device |
KR20110066793A (en) * | 2009-12-11 | 2011-06-17 | 엘지디스플레이 주식회사 | Pattrning apparatus |
US8691134B2 (en) | 2010-01-28 | 2014-04-08 | Molecular Imprints, Inc. | Roll-to-roll imprint lithography and purging system |
JP5828626B2 (en) * | 2010-10-04 | 2015-12-09 | キヤノン株式会社 | Imprint method |
JP2013064836A (en) * | 2011-09-16 | 2013-04-11 | Olympus Corp | Manufacturing method of mold for forming fine structure and optical element |
US9616614B2 (en) * | 2012-02-22 | 2017-04-11 | Canon Nanotechnologies, Inc. | Large area imprint lithography |
JP6412317B2 (en) | 2013-04-24 | 2018-10-24 | キヤノン株式会社 | Imprint method, imprint apparatus, and article manufacturing method |
KR102292465B1 (en) * | 2013-08-19 | 2021-08-20 | 보드 오브 레젼츠, 더 유니버시티 오브 텍사스 시스템 | Programmable deposition of thin films of a user-defined profile with nanometer scale accuracy |
US9718096B2 (en) | 2013-08-19 | 2017-08-01 | Board Of Regents, The University Of Texas System | Programmable deposition of thin films of a user-defined profile with nanometer scale accuracy |
JP6399839B2 (en) * | 2014-07-15 | 2018-10-03 | キヤノン株式会社 | Imprint apparatus and article manufacturing method |
CN107107525B (en) * | 2014-11-05 | 2019-04-26 | 鲍勃斯脱梅克斯股份有限公司 | The production method of negative knurling tool, negative knurling tool, and it is equipped with the embossing die group of the negative knurling tool |
IL258703B2 (en) * | 2015-10-15 | 2023-11-01 | Univ Texas | Versatile process for precision nanoscale manufacturing |
SG10201709153VA (en) * | 2016-12-12 | 2018-07-30 | Canon Kk | Fluid droplet methodology and apparatus for imprint lithography |
US11131923B2 (en) * | 2018-10-10 | 2021-09-28 | Canon Kabushiki Kaisha | System and method of assessing surface quality by optically analyzing dispensed drops |
US20220229361A1 (en) * | 2019-05-13 | 2022-07-21 | Board Of Regents, The University Of Texas System | Roll-to-roll nanoimprint lithography tools and processes |
US11562924B2 (en) * | 2020-01-31 | 2023-01-24 | Canon Kabushiki Kaisha | Planarization apparatus, planarization process, and method of manufacturing an article |
US11908711B2 (en) | 2020-09-30 | 2024-02-20 | Canon Kabushiki Kaisha | Planarization process, planarization system and method of manufacturing an article |
Citations (4)
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---|---|---|---|---|
US20050160934A1 (en) * | 2004-01-23 | 2005-07-28 | Molecular Imprints, Inc. | Materials and methods for imprint lithography |
US7060324B2 (en) * | 2000-10-12 | 2006-06-13 | Board Of Regents, The University Of Texas System | Method of creating a dispersion of a liquid on a substrate |
US20070141271A1 (en) * | 2004-09-23 | 2007-06-21 | Molecular Imprints, Inc. | Method for controlling distribution of fluid components on a body |
US20070264588A1 (en) * | 2000-07-16 | 2007-11-15 | Board Of Regents, The University Of Texas System | Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks |
Family Cites Families (28)
Publication number | Priority date | Publication date | Assignee | Title |
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EP0408283B1 (en) * | 1989-07-12 | 1995-09-27 | Canon Kabushiki Kaisha | Apparatus for producing substrate sheet for optical recording mediums and process for producing substrate sheet for optical recording mediums making use of it, apparatus for producing optical recording medium and process for producing optical recording medium making use of it. |
US6334960B1 (en) | 1999-03-11 | 2002-01-01 | Board Of Regents, The University Of Texas System | Step and flash imprint lithography |
AU2001277907A1 (en) | 2000-07-17 | 2002-01-30 | Board Of Regents, The University Of Texas System | Method and system of automatic fluid dispensing for imprint lithography processes |
US6926929B2 (en) | 2002-07-09 | 2005-08-09 | Molecular Imprints, Inc. | System and method for dispensing liquids |
US6908861B2 (en) | 2002-07-11 | 2005-06-21 | Molecular Imprints, Inc. | Method for imprint lithography using an electric field |
US7077992B2 (en) | 2002-07-11 | 2006-07-18 | Molecular Imprints, Inc. | Step and repeat imprint lithography processes |
US6900881B2 (en) | 2002-07-11 | 2005-05-31 | Molecular Imprints, Inc. | Step and repeat imprint lithography systems |
US7442336B2 (en) | 2003-08-21 | 2008-10-28 | Molecular Imprints, Inc. | Capillary imprinting technique |
US6932934B2 (en) | 2002-07-11 | 2005-08-23 | Molecular Imprints, Inc. | Formation of discontinuous films during an imprint lithography process |
US7071088B2 (en) | 2002-08-23 | 2006-07-04 | Molecular Imprints, Inc. | Method for fabricating bulbous-shaped vias |
US6929762B2 (en) | 2002-11-13 | 2005-08-16 | Molecular Imprints, Inc. | Method of reducing pattern distortions during imprint lithography processes |
US7641840B2 (en) * | 2002-11-13 | 2010-01-05 | Molecular Imprints, Inc. | Method for expelling gas positioned between a substrate and a mold |
US7365103B2 (en) | 2002-12-12 | 2008-04-29 | Board Of Regents, The University Of Texas System | Compositions for dark-field polymerization and method of using the same for imprint lithography processes |
US6871558B2 (en) | 2002-12-12 | 2005-03-29 | Molecular Imprints, Inc. | Method for determining characteristics of substrate employing fluid geometries |
US8211214B2 (en) | 2003-10-02 | 2012-07-03 | Molecular Imprints, Inc. | Single phase fluid imprint lithography method |
US7090716B2 (en) | 2003-10-02 | 2006-08-15 | Molecular Imprints, Inc. | Single phase fluid imprint lithography method |
US20050106321A1 (en) * | 2003-11-14 | 2005-05-19 | Molecular Imprints, Inc. | Dispense geometery to achieve high-speed filling and throughput |
KR100585951B1 (en) * | 2004-02-18 | 2006-06-01 | 한국기계연구원 | A construction/separation type individually actuating imprinting apparatus |
US8076386B2 (en) | 2004-02-23 | 2011-12-13 | Molecular Imprints, Inc. | Materials for imprint lithography |
US20050189676A1 (en) | 2004-02-27 | 2005-09-01 | Molecular Imprints, Inc. | Full-wafer or large area imprinting with multiple separated sub-fields for high throughput lithography |
US20050276919A1 (en) * | 2004-06-01 | 2005-12-15 | Molecular Imprints, Inc. | Method for dispensing a fluid on a substrate |
DE602005022874D1 (en) | 2004-06-03 | 2010-09-23 | Molecular Imprints Inc | FLUID AND DROP EXPOSURE AS REQUIRED FOR MANUFACTURE IN THE NANO AREA |
KR20070086766A (en) | 2004-12-01 | 2007-08-27 | 몰레큘러 임프린츠 인코퍼레이티드 | Methods of exposure for the purpose of thermal management for imprint lithography processes |
EP1863594B1 (en) * | 2005-03-09 | 2011-01-26 | 3M Innovative Properties Company | Apparatus and method for making microreplicated article |
JP5198282B2 (en) * | 2005-12-08 | 2013-05-15 | モレキュラー・インプリンツ・インコーポレーテッド | Method for exhausting a gas located between a substrate and a mold |
JP4778788B2 (en) * | 2005-12-28 | 2011-09-21 | 東芝機械株式会社 | Fine pattern sheet creating apparatus and fine pattern sheet creating method |
WO2007136832A2 (en) * | 2006-05-18 | 2007-11-29 | Molecular Imprints, Inc. | Method for expelling gas positioned between a substrate and a mold |
KR100804734B1 (en) * | 2007-02-22 | 2008-02-19 | 연세대학교 산학협력단 | Continuous lithography apparatus and method using ultraviolet roll nanoimprinting |
-
2009
- 2009-03-31 US US12/415,563 patent/US8187515B2/en active Active
- 2009-04-01 KR KR1020107022385A patent/KR101767966B1/en active IP Right Grant
- 2009-04-01 JP JP2011502956A patent/JP5613658B2/en active Active
- 2009-04-01 WO PCT/US2009/002032 patent/WO2009123721A2/en active Application Filing
- 2009-04-01 CN CN200980112481.2A patent/CN101990470B/en active Active
- 2009-04-01 TW TW098110869A patent/TWI391233B/en active
- 2009-04-01 MY MYPI20104027 patent/MY152467A/en unknown
- 2009-04-01 EP EP09726571A patent/EP2262592A4/en not_active Withdrawn
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070264588A1 (en) * | 2000-07-16 | 2007-11-15 | Board Of Regents, The University Of Texas System | Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks |
US7060324B2 (en) * | 2000-10-12 | 2006-06-13 | Board Of Regents, The University Of Texas System | Method of creating a dispersion of a liquid on a substrate |
US20050160934A1 (en) * | 2004-01-23 | 2005-07-28 | Molecular Imprints, Inc. | Materials and methods for imprint lithography |
US20070141271A1 (en) * | 2004-09-23 | 2007-06-21 | Molecular Imprints, Inc. | Method for controlling distribution of fluid components on a body |
Also Published As
Publication number | Publication date |
---|---|
KR20110004380A (en) | 2011-01-13 |
US20090243153A1 (en) | 2009-10-01 |
CN101990470B (en) | 2016-05-04 |
EP2262592A2 (en) | 2010-12-22 |
CN101990470A (en) | 2011-03-23 |
JP2011520641A (en) | 2011-07-21 |
TW200950958A (en) | 2009-12-16 |
KR101767966B1 (en) | 2017-08-14 |
TWI391233B (en) | 2013-04-01 |
EP2262592A4 (en) | 2012-07-11 |
WO2009123721A2 (en) | 2009-10-08 |
MY152467A (en) | 2014-10-15 |
US8187515B2 (en) | 2012-05-29 |
JP5613658B2 (en) | 2014-10-29 |
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