WO2009063824A1 - Method of drying coating film and process for producing lithographic printing plate precursor - Google Patents

Method of drying coating film and process for producing lithographic printing plate precursor Download PDF

Info

Publication number
WO2009063824A1
WO2009063824A1 PCT/JP2008/070402 JP2008070402W WO2009063824A1 WO 2009063824 A1 WO2009063824 A1 WO 2009063824A1 JP 2008070402 W JP2008070402 W JP 2008070402W WO 2009063824 A1 WO2009063824 A1 WO 2009063824A1
Authority
WO
WIPO (PCT)
Prior art keywords
coating film
solvent
drying
vapor
printing plate
Prior art date
Application number
PCT/JP2008/070402
Other languages
French (fr)
Japanese (ja)
Inventor
Kenji Hayashi
Takao Taguchi
Manabu Hashigaya
Original Assignee
Fujifilm Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corporation filed Critical Fujifilm Corporation
Priority to JP2009541124A priority Critical patent/JPWO2009063824A1/en
Priority to EP08850629A priority patent/EP2218519A4/en
Priority to CN200880115925A priority patent/CN101855026A/en
Publication of WO2009063824A1 publication Critical patent/WO2009063824A1/en

Links

Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26DRYING
    • F26BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B21/00Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
    • F26B21/14Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects using gases or vapours other than air or steam, e.g. inert gases
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0209Multistage baking
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B05D3/0466Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a non-reacting gas
    • B05D3/0473Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a non-reacting gas for heating, e.g. vapour heating
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26DRYING
    • F26BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B13/00Machines and apparatus for drying fabrics, fibres, yarns, or other materials in long lengths, with progressive movement
    • F26B13/10Arrangements for feeding, heating or supporting materials; Controlling movement, tension or position of materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2202/00Metallic substrate
    • B05D2202/20Metallic substrate based on light metals
    • B05D2202/25Metallic substrate based on light metals based on Al
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2252/00Sheets
    • B05D2252/02Sheets of indefinite length
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0218Pretreatment, e.g. heating the substrate
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254After-treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254After-treatment
    • B05D3/0263After-treatment with IR heaters
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B05D3/0406Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being air
    • B05D3/0413Heating with air
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/10Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1083Mechanical aspects of off-press plate preparation

Abstract

A method of drying a coating film. The method is intended to inhibit the surface of a product from having any appearance abnormality or performance failure in the case where drying for removing a solvent from a coating fluid is conducted in a drying box while blowing the vapor of a solvent having a lower boiling point than that solvent against the coating film with a vapor-blowing nozzle. In the method, a coating film formed by applying a coating fluid containing a high-boiling solvent to a substrate which is being conveyed is dried to a drying point and then subjected in a drying box to the removal of the high-boiling solvent while blowing the vapor of a solvent having a lower boiling point than the high-boiling solvent against the coating film with a vapor-blowing nozzle. This method is characterized in that the substrate is conveyed in the drying box while being heated at a given temperature (T).
PCT/JP2008/070402 2007-11-14 2008-11-10 Method of drying coating film and process for producing lithographic printing plate precursor WO2009063824A1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2009541124A JPWO2009063824A1 (en) 2007-11-14 2008-11-10 Method for drying coating film and method for producing lithographic printing plate precursor
EP08850629A EP2218519A4 (en) 2007-11-14 2008-11-10 Method of drying coating film and process for producing lithographic printing plate precursor
CN200880115925A CN101855026A (en) 2007-11-14 2008-11-10 Method of drying coating film and process for producing lithographic printing plate precursor

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-295319 2007-11-14
JP2007295319 2007-11-14

Publications (1)

Publication Number Publication Date
WO2009063824A1 true WO2009063824A1 (en) 2009-05-22

Family

ID=40638673

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/070402 WO2009063824A1 (en) 2007-11-14 2008-11-10 Method of drying coating film and process for producing lithographic printing plate precursor

Country Status (4)

Country Link
EP (1) EP2218519A4 (en)
JP (1) JPWO2009063824A1 (en)
CN (1) CN101855026A (en)
WO (1) WO2009063824A1 (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011040114A1 (en) * 2009-09-29 2011-04-07 富士フイルム株式会社 Method for producing planographic printing plate precursor
JP2014132213A (en) * 2012-12-04 2014-07-17 Toda Kogyo Corp Continuous superheated steam heat treatment device, and forming method of electroconductive coating
JP2015199032A (en) * 2014-04-08 2015-11-12 株式会社康井精機 Lamination sheet manufacturing device
JP2016097323A (en) * 2014-11-18 2016-05-30 株式会社トッパン・コスモ Coating method and coating device
JP2019039583A (en) * 2017-08-23 2019-03-14 大日本印刷株式会社 Dryer and drying method
CN111479663A (en) * 2017-12-19 2020-07-31 汉高股份有限及两合公司 Device and method for producing plastic parts, in particular for applying adhesive
TWI765796B (en) * 2021-08-04 2022-05-21 塑華科技有限公司 Film drying oven
CN116493228A (en) * 2023-04-14 2023-07-28 福建宝士嘉印刷器材有限公司 Oven device of CTP edition material
TWI823244B (en) * 2022-01-27 2023-11-21 黃乃為 Hot and cold dual-airflow drying system

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9851144B2 (en) * 2011-08-01 2017-12-26 Fmp Technology Gmbh Fluid Measurements & Projects Method and device for drying a fluid film applied to a substrate
JP5871646B2 (en) * 2012-02-13 2016-03-01 東レエンジニアリング株式会社 Vacuum drying apparatus and vacuum drying method
CN106079914B (en) * 2016-06-23 2017-11-17 成都新图新材料股份有限公司 Galley coating layer processing system based on aluminum plate foundation
EP3544821A4 (en) * 2016-11-28 2020-09-09 Shenzhen Zhong Chuang Green Plate Technology Co., Ltd. Treatment methods for printing plates
CN111167683A (en) * 2018-11-13 2020-05-19 耿晋 Air inlet device and drying unit
KR102638364B1 (en) 2019-03-29 2024-02-19 제이에프이 스틸 가부시키가이샤 Drying system and manufacturing method of painted metal plate
CN110173969A (en) * 2019-05-23 2019-08-27 海盐维博雅针织制衣有限公司 A kind of drying bellows of the textile manufacturing with dustproof function
CN111750652B (en) * 2019-11-22 2021-09-10 南通市上午家纺设计有限公司 Case is placed to fabrics with stoving function
JP7072623B1 (en) * 2020-11-11 2022-05-20 芝浦機械株式会社 Extraction drying device

Citations (174)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB434875A (en) 1933-02-08 1935-09-05 Bela Gasper An improved method of producing multi-colour photographic images on coloured and differently sensitized multi-layer photographic material
DE854890C (en) 1949-07-23 1952-12-18 Kalle & Co Ag Process for the production of copies, especially printing forms, with the aid of diazo compounds
US2797213A (en) 1954-08-20 1957-06-25 Gen Aniline & Film Corp Rosin derivatives of diazonaphthol-and diazophenol-sulfonamides
US2833827A (en) 1955-01-17 1958-05-06 Bayer Ag Tri (3, 5-di lower alkyl-4-hydroxy phenyl)-sulfonium chlorides and method of preparing same
US3046120A (en) 1950-10-31 1962-07-24 Azoplate Corp Light-sensitive layers for photomechanical reproduction
US3188210A (en) 1959-01-21 1965-06-08 Azoplate Corp Naphthoquinone (1, 2)-diazide-sulfonic acid derivatives and process of producing printing plates therefrom
US3454400A (en) 1964-08-05 1969-07-08 Algraphy Ltd Light-sensitive naphthoquinone diazide ester compounds and printing plates made therefrom
JPS459610B1 (en) 1965-07-19 1970-04-07
US3544323A (en) 1966-12-12 1970-12-01 Sumner Williams Inc Diazo compound for lithographic plates
US3573917A (en) 1968-07-12 1971-04-06 Takashi Okamoto Light-sensitive printing plate composition
GB1227602A (en) 1967-11-24 1971-04-07
GB1251345A (en) 1967-11-21 1971-10-27
JPS4643946B1 (en) 1967-11-09 1971-12-27
GB1267005A (en) 1969-06-16 1972-03-15
US3674495A (en) 1969-05-30 1972-07-04 Okamoto Chem Ind Co Ltd Sensitizing layer
JPS475303U (en) 1971-02-10 1972-09-16
JPS4813354B1 (en) 1969-12-01 1973-04-26
JPS4864183A (en) 1971-12-09 1973-09-05
JPS4863802A (en) 1971-12-13 1973-09-05
JPS4863803A (en) 1971-12-13 1973-09-05
GB1329888A (en) 1970-09-16 1973-09-12 Konishiroku Photo Ind Phenolic resin compositions containing it
GB1330932A (en) 1970-09-16 1973-09-19 Konishiroku Photo Ind Phenolic resin condensation product and light-sensitive compositions containing it
JPS4841708B1 (en) 1970-01-13 1973-12-07
JPS4896575A (en) 1972-02-22 1973-12-10
US3785825A (en) 1971-07-19 1974-01-15 Polychrome Corp Light-sensitive quinone diazide compounds,compositions,and presensitized lithographic plate
JPS4938701A (en) 1972-08-18 1974-04-11
JPS4917481B1 (en) 1970-02-17 1974-05-01
JPS4943191B1 (en) 1969-07-11 1974-11-19
JPS5036209A (en) 1973-06-20 1975-04-05
US3881924A (en) 1971-08-25 1975-05-06 Matsushita Electric Ind Co Ltd Organic photoconductive layer sensitized with trimethine compound
US3902114A (en) 1967-10-20 1975-08-26 Gunther Alich Method of and apparatus for measuring the distance between cooperating rollers of a rolling mill
JPS5137193A (en) 1974-09-25 1976-03-29 Toyo Boseki
JPS5147334B1 (en) 1970-11-02 1976-12-14
US4026705A (en) 1975-05-02 1977-05-31 General Electric Company Photocurable compositions and methods
JPS5230490B2 (en) 1972-03-21 1977-08-09
US4069055A (en) 1974-05-02 1978-01-17 General Electric Company Photocurable epoxy compositions containing group Va onium salts
US4069056A (en) 1974-05-02 1978-01-17 General Electric Company Photopolymerizable composition containing group Va aromatic onium salts
JPS538128A (en) 1976-07-09 1978-01-25 Fuji Photo Film Co Ltd Photosolubilizable composition
JPS5336223A (en) 1976-09-13 1978-04-04 Hoechst Ag Photosensitive composition
US4115128A (en) 1975-12-26 1978-09-19 Fuji Photo Film Co., Ltd. Positive image forming radiation sensitive compositions containing diazide compound and organic cyclic anhydride
GB1539192A (en) 1975-01-27 1979-01-31 Ici Ltd Photopolymerisable compositions
JPS5474728A (en) 1977-11-28 1979-06-15 Fuji Photo Film Co Ltd Photosensitive composition
JPS5492723A (en) 1977-12-30 1979-07-23 Somar Mfg Photosensitive material and use
DE2904626A1 (en) 1978-02-08 1979-08-09 Minnesota Mining & Mfg TRIARYLSULFONIUM COMPLEX SALTS, METHOD FOR THE PRODUCTION THEREOF AND PHOTOPOLYMERIZABLE MIXTURES CONTAINING THESE SALTS
JPS5425957B2 (en) 1974-10-04 1979-08-31
JPS5434327B1 (en) 1970-12-28 1979-10-26
JPS5617654B2 (en) 1970-12-28 1981-04-23
US4283475A (en) 1979-08-21 1981-08-11 Fuji Photo Film Co., Ltd. Pentamethine thiopyrylium salts, process for production thereof, and photoconductive compositions containing said salts
US4327169A (en) 1981-01-19 1982-04-27 Eastman Kodak Company Infrared sensitive photoconductive composition, elements and imaging method using trimethine thiopyrylium dye
JPS57196231A (en) 1981-05-20 1982-12-02 Hoechst Ag Mixture able to be polymerized by radiation and copying material mainly composed thereof
JPS5812577B2 (en) 1973-12-21 1983-03-09 ヘキスト アクチエンゲゼルシヤフト Photopolymerizable copying material
JPS58112793A (en) 1981-12-28 1983-07-05 Ricoh Co Ltd Optical information recording medium
JPS58112792A (en) 1981-12-28 1983-07-05 Ricoh Co Ltd Optical information recording medium
JPS58125246A (en) 1982-01-22 1983-07-26 Ricoh Co Ltd Laser recording medium
JPS58173696A (en) 1982-04-06 1983-10-12 Canon Inc Optical recording medium
JPS58181051A (en) 1982-04-19 1983-10-22 Canon Inc Organic photoconductor
JPS58181690A (en) 1982-04-19 1983-10-24 Canon Inc Optical recording medium
JPS5849860B2 (en) 1973-12-07 1983-11-07 ヘキスト アクチェンゲゼルシャフト Kouji Yugosei Fuchsia Yazairiyo
JPS58194595A (en) 1982-05-10 1983-11-12 Canon Inc Optical recording medium
JPS58220143A (en) 1982-06-16 1983-12-21 Canon Inc Organic film
JPS58224791A (en) 1982-06-23 1983-12-27 Konishiroku Photo Ind Co Ltd Optical information recording medium
JPS58224793A (en) 1982-06-25 1983-12-27 Nec Corp Optical recording medium
JPS595240A (en) 1982-06-21 1984-01-12 ヘキスト・アクチエンゲゼルシヤフト Radiation polymerizable mixture
JPS595241A (en) 1982-06-21 1984-01-12 ヘキスト・アクチエンゲゼルシヤフト Radiation polymerizable mixture
JPS5941363A (en) 1982-08-31 1984-03-07 Canon Inc Pyrylium dye, thiopyrylium dye and its preparation
JPS5944615A (en) 1982-09-07 1984-03-13 Furuno Electric Co Ltd Gyro device
JPS5948187A (en) 1982-09-10 1984-03-19 Nec Corp Photo recording medium
EP0104143A1 (en) 1982-09-18 1984-03-28 Ciba-Geigy Ag Photopolymerizable compositions containing diaryliodosyl salts
JPS5953836A (en) 1982-09-21 1984-03-28 Fuji Photo Film Co Ltd Photosensitive lithographic plate
JPS5971048A (en) 1982-10-18 1984-04-21 Mitsubishi Chem Ind Ltd Photopolymerizable photosensitive composition
JPS5973996A (en) 1982-10-22 1984-04-26 Nec Corp Optical recording medium
JPS5984248A (en) 1982-11-05 1984-05-15 Canon Inc Organic coat
JPS5984249A (en) 1982-11-05 1984-05-15 Canon Inc Organic coat
JPS5984356A (en) 1982-11-05 1984-05-16 Ricoh Co Ltd Manufacture of optical disk master
JPS59121044A (en) 1982-12-27 1984-07-12 Fuji Photo Film Co Ltd Photosolubilizable composition
JPS59146061A (en) 1983-02-09 1984-08-21 Canon Inc Organic film
JPS59146063A (en) 1983-02-09 1984-08-21 Canon Inc Organic film
JPS59202829A (en) 1983-05-04 1984-11-16 Sanpo Gokin Kogyo Kk Mold for injection molding synthetic resin product
JPS59216146A (en) 1983-05-24 1984-12-06 Sony Corp Electrophotographic sensitive material
US4491628A (en) 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
JPS603626A (en) 1983-06-22 1985-01-10 Fuji Photo Film Co Ltd Photosensitive composition
EP0133216A1 (en) 1983-07-11 1985-02-20 Hoechst Aktiengesellschaft Process for obtaining negative copies using a 1,2-quinone diazide material
JPS6052940A (en) 1983-09-02 1985-03-26 Nec Corp Optical recording medium
JPS6063744A (en) 1983-08-23 1985-04-12 Nec Corp Optical information recording medium
JPS6078787A (en) 1983-10-07 1985-05-04 Ricoh Co Ltd Optical information recording medium
JPS6088942A (en) 1983-10-21 1985-05-18 Fuji Photo Film Co Ltd Photosensitive composition
JPS6122048A (en) 1984-06-08 1986-01-30 ヘキスト・アクチエンゲゼルシヤフト Polymerizable compound, manufacture and radiation sensitive copying layer
JPS61143748A (en) 1984-12-17 1986-07-01 Fuji Photo Film Co Ltd Photosensitive composition
JPS61151644A (en) 1984-12-26 1986-07-10 Fuji Photo Film Co Ltd Photosensitive composition
EP0212482A2 (en) 1985-08-12 1987-03-04 Hoechst Celanese Corporation Process for obtaining negative images from positive photoresists
DE3604581A1 (en) 1986-02-14 1987-08-20 Basf Ag 4-Acylbenzylsulphonium salts, their preparation, and photocurable mixtures and recording materials containing these compounds
DE3604580A1 (en) 1986-02-14 1987-08-20 Basf Ag CURABLE MIXTURES CONTAINING N-SULFONYLAMINOSULFONIUM SALTS AS CATIONICALLY EFFECTIVE CATALYSTS
JPS6239417B2 (en) 1978-05-20 1987-08-22 Hoechst Ag
JPS6239418B2 (en) 1978-05-20 1987-08-22 Hoechst Ag
JPS62251740A (en) 1986-04-24 1987-11-02 Fuji Photo Film Co Ltd Positive type photosensitive composition
JPS62293247A (en) 1986-06-12 1987-12-19 Fuji Photo Film Co Ltd Photosensitive printing plate
JPS6358440A (en) 1986-08-29 1988-03-14 Fuji Photo Film Co Ltd Photosensitive composition
DE3634671A1 (en) 1986-10-09 1988-05-19 Hans Prof Dr Dr Kroeger Antirheumatic agents with reduced toxicity
US4756993A (en) 1986-01-27 1988-07-12 Fuji Photo Film Co., Ltd. Electrophotographic photoreceptor with light scattering layer or light absorbing layer on support backside
US4760013A (en) 1987-02-17 1988-07-26 International Business Machines Corporation Sulfonium salt photoinitiators
DE3711264A1 (en) 1987-04-03 1988-10-13 Hoechst Ag LIGHT SENSITIVE MIXTURE AND LIGHT SENSITIVE COPY MATERIAL MADE THEREOF
JPS63260909A (en) 1987-03-28 1988-10-27 ヘキスト・アクチエンゲゼルシヤフト Photopolymerizable mixture and recording material produced therefrom
JPS63277653A (en) 1987-03-28 1988-11-15 ヘキスト・アクチエンゲゼルシヤフト Polymerizable compound, radiation polymerizable mixture and radiation polymerizable recording material
JPS63287944A (en) 1987-05-21 1988-11-25 Fuji Photo Film Co Ltd Photosensitive composition
JPS63287947A (en) 1987-05-21 1988-11-25 Fuji Photo Film Co Ltd Photosensitive composition
EP0297442A1 (en) 1987-07-01 1989-01-04 BASF Aktiengesellschaft Sulfonium salts comprising groups which are labile in acid environment
EP0297443A2 (en) 1987-07-01 1989-01-04 BASF Aktiengesellschaft Light sensitive mixture for light sensitive coating materials
JPH01105238A (en) 1987-03-28 1989-04-21 Hoechst Ag Photopolymerizable mixture and photopolymerizable material
JPH01165613A (en) 1987-11-16 1989-06-29 Hoechst Ag Polymerizable compound, radiation polymerizable mixture thereof and radiation polymerized recording material
JPH0140336B2 (en) 1979-12-29 1989-08-28 Hoechst Ag
JPH0140337B2 (en) 1979-12-29 1989-08-28 Hoechst Ag
JPH01271741A (en) 1988-04-25 1989-10-30 Fuji Photo Film Co Ltd Photosensitive composition
JPH0225493A (en) 1988-05-21 1990-01-26 Hoechst Ag Alkenylphosphonic ester and alkenylphoshinic ester, production thereof, radiation polymerizable mixture containing the same and recording material
JPH0296755A (en) 1988-10-03 1990-04-09 Konica Corp Photosensitive composition
JPH02100054A (en) 1988-10-07 1990-04-12 Fuji Photo Film Co Ltd Positive type photosensitive composition
JPH02100055A (en) 1988-10-07 1990-04-12 Fuji Photo Film Co Ltd Positive type photosensitive composition
JPH0216765B2 (en) 1980-09-29 1990-04-18 Hoechst Ag
EP0370693A2 (en) 1988-11-21 1990-05-30 Eastman Kodak Company Novel onium salts and the use thereof as photoinitiators
JPH02150848A (en) 1988-12-02 1990-06-11 Hitachi Ltd Photofadable and radiation sensitive composition and pattern forming method by using this composition
US4933377A (en) 1988-02-29 1990-06-12 Saeva Franklin D Novel sulfonium salts and the use thereof as photoinitiators
JPH0232293B2 (en) 1980-12-22 1990-07-19 Hoechst Ag
JPH02226149A (en) 1988-12-22 1990-09-07 Hoechst Ag Photopolymerizing compound, photopolymerizing mixture containing the same and photopolymerizing copying material manufactured therefrom
JPH02296514A (en) 1989-05-12 1990-12-07 Matsushita Electric Ind Co Ltd Suspension controller for vehicle
JPH03140140A (en) 1989-10-27 1991-06-14 Hitachi Ltd Area extracting method
US5041358A (en) 1989-04-17 1991-08-20 International Business Machines Corporation Negative photoresist and use thereof
JPH03208514A (en) 1990-01-04 1991-09-11 Nippon Steel Corp Method for cutting pained steel plate
JPH0413149A (en) 1990-05-02 1992-01-17 Fuji Photo Film Co Ltd Photosensitive composition
US5156938A (en) 1989-03-30 1992-10-20 Graphics Technology International, Inc. Ablation-transfer imaging/recording
JPH0513514B2 (en) 1985-09-10 1993-02-22 Fuji Photo Film Co Ltd
JPH0519702B2 (en) 1985-09-05 1993-03-17 Fuji Photo Film Co Ltd
JPH05158230A (en) 1991-12-10 1993-06-25 Fuji Photo Film Co Ltd Positive type photosensitive composition
JPH06502260A (en) 1990-11-26 1994-03-10 ミネソタ・マイニング・アンド・マニュファクチュアリング・カンパニー photosensitive material
JPH0712004B2 (en) 1988-10-19 1995-02-08 日本電装株式会社 Bobbin for coil
EP0652483A1 (en) 1993-11-04 1995-05-10 Minnesota Mining And Manufacturing Company Lithographic printing plates
JPH07306528A (en) 1994-03-15 1995-11-21 Fuji Photo Film Co Ltd Negative image recording material
JPH07120042B2 (en) 1987-05-21 1995-12-20 富士写真フイルム株式会社 Photosensitive composition
JPH07120041B2 (en) 1987-05-21 1995-12-20 富士写真フイルム株式会社 Photosensitive composition
JPH0812424B2 (en) 1987-11-19 1996-02-07 富士写真フイルム株式会社 Photosensitive composition
JPH08276558A (en) 1995-02-06 1996-10-22 Fuji Photo Film Co Ltd Negative image recording material
WO1996034316A1 (en) 1995-04-27 1996-10-31 Minnesota Mining And Manufacturing Company Negative-acting no-process printing plates
JPH09502252A (en) 1993-08-26 1997-03-04 ヒート‐ウィン、リミテッド Continuous drying method and apparatus in superheated steam
JPH1039509A (en) 1996-07-22 1998-02-13 Fuji Photo Film Co Ltd Negative type image recording material
JPH10203037A (en) 1997-01-20 1998-08-04 Fuji Photo Film Co Ltd Negative image recording material
JPH10282672A (en) 1997-02-10 1998-10-23 Fuji Photo Film Co Ltd Heat-sensitive image forming material and lithographic printing master plate
JPH1144956A (en) 1997-07-28 1999-02-16 Fuji Photo Film Co Ltd Positive photosensitive composition for ir laser
JPH1195421A (en) 1997-07-24 1999-04-09 Fuji Photo Film Co Ltd Laser direct lithography type planographic printing plate material
JPH11143064A (en) 1997-11-04 1999-05-28 Fuji Photo Film Co Ltd Positive image recording material
JPH11160860A (en) 1997-11-28 1999-06-18 Fuji Photo Film Co Ltd Positive image forming material
JPH11190903A (en) 1997-08-13 1999-07-13 Mitsubishi Chemical Corp Positive photosensitive composition, lithographic printing plate using the same, and positive image forming method
JPH11288093A (en) 1998-04-06 1999-10-19 Fuji Photo Film Co Ltd Positive type photosensitive composition for infrared laser
EP0950517A1 (en) 1998-04-15 1999-10-20 Agfa-Gevaert N.V. A heat mode sensitive imaging element for making positive working printing plates
JPH11352691A (en) 1998-04-09 1999-12-24 Fuji Photo Film Co Ltd Production of planographic printing plate, planographic original printing plate for laser scanning exposure and photopolymerizable composition
JP2000105454A (en) 1997-12-02 2000-04-11 Mitsubishi Chemicals Corp Positive type photosensitive composition and positive type photosensitive planographic printing plate
JP2000187318A (en) 1998-12-22 2000-07-04 Fuji Photo Film Co Ltd Positive photosensitive composition for infrared laser beam
US6117913A (en) 1996-07-01 2000-09-12 Taiko Pharmaceutical Co., Ltd. Intestinal juice level regulator
JP2001006326A (en) 1999-06-18 2001-01-12 Sony Corp Information processor and editing method
JP2001027742A (en) 1999-07-14 2001-01-30 Tega Seiko Co Ltd Connecting member for spectacle frame
JP2001133969A (en) 1999-11-01 2001-05-18 Fuji Photo Film Co Ltd Negative type original plate of planographic printing plate
JP2001133696A (en) 1999-11-02 2001-05-18 Olympus Optical Co Ltd Microscope device for surgery
JP2001142230A (en) 1999-11-11 2001-05-25 Fuji Photo Film Co Ltd Plate making method for planographic printing plate, heating device and recording medium
JP2001237840A (en) 2000-02-22 2001-08-31 Hitachi Telecom Technol Ltd Minimum cell interval control method and minimum cell interval controller for atm unit
JP2002019310A (en) 2000-07-08 2002-01-23 Asahi Kosoku Insatsu Kk Method and apparatus for printing
JP2002333275A (en) 2001-05-11 2002-11-22 Econos Japan Co Ltd Method and apparatus for superheated vapor drying
JP2003167343A (en) 2001-12-03 2003-06-13 Fuji Photo Film Co Ltd Infrared radiation sensitive composition
JP2004117546A (en) 2002-09-24 2004-04-15 Fuji Photo Film Co Ltd Image forming material
JP2004360961A (en) * 2003-06-03 2004-12-24 Fuji Photo Film Co Ltd Drying method and drying device of coating film
JP2005099685A (en) 2003-08-29 2005-04-14 Fuji Photo Film Co Ltd Image recording material and planographic printing plate
JP2005115357A (en) * 2003-09-17 2005-04-28 Fuji Photo Film Co Ltd Photosensitive planographic printing plate and method of manufacturing the same
JP2006258979A (en) 2005-03-15 2006-09-28 Fuji Photo Film Co Ltd Positive planographic printing original plate
JP2006293162A (en) 2005-04-13 2006-10-26 Fuji Photo Film Co Ltd Lithographic printing original plate
JP2007010768A (en) * 2005-06-28 2007-01-18 Sharp Corp Method for partially forming thin film, thin film forming material, method for restoring partial defect of thin film, color filter for liquid crystal panel and device for restoring defect of thin film
JP2007078246A (en) * 2005-09-14 2007-03-29 Oji Paper Co Ltd Sheet drying method and device, and method of manufacturing coated sheet
JP2007222837A (en) * 2006-02-27 2007-09-06 Matsushita Electric Ind Co Ltd Method of producing coating film and coating apparatus using the same
JP4328403B2 (en) 1999-02-16 2009-09-09 キヤノン株式会社 Camera and interchangeable lens

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4007304A (en) * 1972-03-23 1977-02-08 The Dow Chemical Company Method for coating surfaces
NL1022165C2 (en) * 2002-12-13 2004-07-15 Tno Muffle method and device.
KR101309055B1 (en) * 2006-05-18 2013-09-16 후지필름 가부시키가이샤 Method and apparatus for drying substance to be dried

Patent Citations (177)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB434875A (en) 1933-02-08 1935-09-05 Bela Gasper An improved method of producing multi-colour photographic images on coloured and differently sensitized multi-layer photographic material
DE854890C (en) 1949-07-23 1952-12-18 Kalle & Co Ag Process for the production of copies, especially printing forms, with the aid of diazo compounds
US3046120A (en) 1950-10-31 1962-07-24 Azoplate Corp Light-sensitive layers for photomechanical reproduction
US2797213A (en) 1954-08-20 1957-06-25 Gen Aniline & Film Corp Rosin derivatives of diazonaphthol-and diazophenol-sulfonamides
US2833827A (en) 1955-01-17 1958-05-06 Bayer Ag Tri (3, 5-di lower alkyl-4-hydroxy phenyl)-sulfonium chlorides and method of preparing same
US3188210A (en) 1959-01-21 1965-06-08 Azoplate Corp Naphthoquinone (1, 2)-diazide-sulfonic acid derivatives and process of producing printing plates therefrom
US3454400A (en) 1964-08-05 1969-07-08 Algraphy Ltd Light-sensitive naphthoquinone diazide ester compounds and printing plates made therefrom
JPS459610B1 (en) 1965-07-19 1970-04-07
US3544323A (en) 1966-12-12 1970-12-01 Sumner Williams Inc Diazo compound for lithographic plates
US3902114A (en) 1967-10-20 1975-08-26 Gunther Alich Method of and apparatus for measuring the distance between cooperating rollers of a rolling mill
JPS4643946B1 (en) 1967-11-09 1971-12-27
GB1251345A (en) 1967-11-21 1971-10-27
GB1227602A (en) 1967-11-24 1971-04-07
US3573917A (en) 1968-07-12 1971-04-06 Takashi Okamoto Light-sensitive printing plate composition
US3674495A (en) 1969-05-30 1972-07-04 Okamoto Chem Ind Co Ltd Sensitizing layer
GB1267005A (en) 1969-06-16 1972-03-15
JPS4943191B1 (en) 1969-07-11 1974-11-19
JPS4813354B1 (en) 1969-12-01 1973-04-26
JPS4841708B1 (en) 1970-01-13 1973-12-07
JPS4917481B1 (en) 1970-02-17 1974-05-01
GB1329888A (en) 1970-09-16 1973-09-12 Konishiroku Photo Ind Phenolic resin compositions containing it
GB1330932A (en) 1970-09-16 1973-09-19 Konishiroku Photo Ind Phenolic resin condensation product and light-sensitive compositions containing it
JPS5147334B1 (en) 1970-11-02 1976-12-14
JPS5617654B2 (en) 1970-12-28 1981-04-23
JPS5434327B1 (en) 1970-12-28 1979-10-26
JPS475303U (en) 1971-02-10 1972-09-16
US3785825A (en) 1971-07-19 1974-01-15 Polychrome Corp Light-sensitive quinone diazide compounds,compositions,and presensitized lithographic plate
US3881924A (en) 1971-08-25 1975-05-06 Matsushita Electric Ind Co Ltd Organic photoconductive layer sensitized with trimethine compound
JPS4864183A (en) 1971-12-09 1973-09-05
JPS4863803A (en) 1971-12-13 1973-09-05
JPS4863802A (en) 1971-12-13 1973-09-05
JPS4896575A (en) 1972-02-22 1973-12-10
JPS5230490B2 (en) 1972-03-21 1977-08-09
JPS4938701A (en) 1972-08-18 1974-04-11
JPS5036209A (en) 1973-06-20 1975-04-05
JPS5849860B2 (en) 1973-12-07 1983-11-07 ヘキスト アクチェンゲゼルシャフト Kouji Yugosei Fuchsia Yazairiyo
JPS5812577B2 (en) 1973-12-21 1983-03-09 ヘキスト アクチエンゲゼルシヤフト Photopolymerizable copying material
US4069056A (en) 1974-05-02 1978-01-17 General Electric Company Photopolymerizable composition containing group Va aromatic onium salts
US4069055A (en) 1974-05-02 1978-01-17 General Electric Company Photocurable epoxy compositions containing group Va onium salts
JPS5137193A (en) 1974-09-25 1976-03-29 Toyo Boseki
JPS5425957B2 (en) 1974-10-04 1979-08-31
GB1539192A (en) 1975-01-27 1979-01-31 Ici Ltd Photopolymerisable compositions
US4026705A (en) 1975-05-02 1977-05-31 General Electric Company Photocurable compositions and methods
US4115128A (en) 1975-12-26 1978-09-19 Fuji Photo Film Co., Ltd. Positive image forming radiation sensitive compositions containing diazide compound and organic cyclic anhydride
JPS538128A (en) 1976-07-09 1978-01-25 Fuji Photo Film Co Ltd Photosolubilizable composition
JPS5336223A (en) 1976-09-13 1978-04-04 Hoechst Ag Photosensitive composition
JPS5474728A (en) 1977-11-28 1979-06-15 Fuji Photo Film Co Ltd Photosensitive composition
JPS5492723A (en) 1977-12-30 1979-07-23 Somar Mfg Photosensitive material and use
DE2904626A1 (en) 1978-02-08 1979-08-09 Minnesota Mining & Mfg TRIARYLSULFONIUM COMPLEX SALTS, METHOD FOR THE PRODUCTION THEREOF AND PHOTOPOLYMERIZABLE MIXTURES CONTAINING THESE SALTS
JPS6239418B2 (en) 1978-05-20 1987-08-22 Hoechst Ag
JPS6239417B2 (en) 1978-05-20 1987-08-22 Hoechst Ag
US4283475A (en) 1979-08-21 1981-08-11 Fuji Photo Film Co., Ltd. Pentamethine thiopyrylium salts, process for production thereof, and photoconductive compositions containing said salts
JPH0140337B2 (en) 1979-12-29 1989-08-28 Hoechst Ag
JPH0140336B2 (en) 1979-12-29 1989-08-28 Hoechst Ag
JPH0216765B2 (en) 1980-09-29 1990-04-18 Hoechst Ag
JPH0232293B2 (en) 1980-12-22 1990-07-19 Hoechst Ag
JPS57142645A (en) 1981-01-19 1982-09-03 Eastman Kodak Co Infrared sensitive photoconductive element
US4327169A (en) 1981-01-19 1982-04-27 Eastman Kodak Company Infrared sensitive photoconductive composition, elements and imaging method using trimethine thiopyrylium dye
JPS57196231A (en) 1981-05-20 1982-12-02 Hoechst Ag Mixture able to be polymerized by radiation and copying material mainly composed thereof
JPS58112792A (en) 1981-12-28 1983-07-05 Ricoh Co Ltd Optical information recording medium
JPS58112793A (en) 1981-12-28 1983-07-05 Ricoh Co Ltd Optical information recording medium
JPS58125246A (en) 1982-01-22 1983-07-26 Ricoh Co Ltd Laser recording medium
JPS58173696A (en) 1982-04-06 1983-10-12 Canon Inc Optical recording medium
JPS58181690A (en) 1982-04-19 1983-10-24 Canon Inc Optical recording medium
JPS58181051A (en) 1982-04-19 1983-10-22 Canon Inc Organic photoconductor
JPS58194595A (en) 1982-05-10 1983-11-12 Canon Inc Optical recording medium
JPS58220143A (en) 1982-06-16 1983-12-21 Canon Inc Organic film
JPS595241A (en) 1982-06-21 1984-01-12 ヘキスト・アクチエンゲゼルシヤフト Radiation polymerizable mixture
JPS595240A (en) 1982-06-21 1984-01-12 ヘキスト・アクチエンゲゼルシヤフト Radiation polymerizable mixture
JPS58224791A (en) 1982-06-23 1983-12-27 Konishiroku Photo Ind Co Ltd Optical information recording medium
JPS58224793A (en) 1982-06-25 1983-12-27 Nec Corp Optical recording medium
US4491628A (en) 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
JPS5941363A (en) 1982-08-31 1984-03-07 Canon Inc Pyrylium dye, thiopyrylium dye and its preparation
JPS5944615A (en) 1982-09-07 1984-03-13 Furuno Electric Co Ltd Gyro device
JPS5948187A (en) 1982-09-10 1984-03-19 Nec Corp Photo recording medium
EP0104143A1 (en) 1982-09-18 1984-03-28 Ciba-Geigy Ag Photopolymerizable compositions containing diaryliodosyl salts
JPS5953836A (en) 1982-09-21 1984-03-28 Fuji Photo Film Co Ltd Photosensitive lithographic plate
JPS5971048A (en) 1982-10-18 1984-04-21 Mitsubishi Chem Ind Ltd Photopolymerizable photosensitive composition
JPS5973996A (en) 1982-10-22 1984-04-26 Nec Corp Optical recording medium
JPS5984249A (en) 1982-11-05 1984-05-15 Canon Inc Organic coat
JPS5984248A (en) 1982-11-05 1984-05-15 Canon Inc Organic coat
JPS5984356A (en) 1982-11-05 1984-05-16 Ricoh Co Ltd Manufacture of optical disk master
JPS59121044A (en) 1982-12-27 1984-07-12 Fuji Photo Film Co Ltd Photosolubilizable composition
JPS59146061A (en) 1983-02-09 1984-08-21 Canon Inc Organic film
JPS59146063A (en) 1983-02-09 1984-08-21 Canon Inc Organic film
JPS59202829A (en) 1983-05-04 1984-11-16 Sanpo Gokin Kogyo Kk Mold for injection molding synthetic resin product
JPS59216146A (en) 1983-05-24 1984-12-06 Sony Corp Electrophotographic sensitive material
JPS603626A (en) 1983-06-22 1985-01-10 Fuji Photo Film Co Ltd Photosensitive composition
EP0133216A1 (en) 1983-07-11 1985-02-20 Hoechst Aktiengesellschaft Process for obtaining negative copies using a 1,2-quinone diazide material
JPS6063744A (en) 1983-08-23 1985-04-12 Nec Corp Optical information recording medium
JPS6052940A (en) 1983-09-02 1985-03-26 Nec Corp Optical recording medium
JPS6078787A (en) 1983-10-07 1985-05-04 Ricoh Co Ltd Optical information recording medium
JPS6088942A (en) 1983-10-21 1985-05-18 Fuji Photo Film Co Ltd Photosensitive composition
JPS6122048A (en) 1984-06-08 1986-01-30 ヘキスト・アクチエンゲゼルシヤフト Polymerizable compound, manufacture and radiation sensitive copying layer
JPS61143748A (en) 1984-12-17 1986-07-01 Fuji Photo Film Co Ltd Photosensitive composition
JPS61151644A (en) 1984-12-26 1986-07-10 Fuji Photo Film Co Ltd Photosensitive composition
EP0212482A2 (en) 1985-08-12 1987-03-04 Hoechst Celanese Corporation Process for obtaining negative images from positive photoresists
JPH0519702B2 (en) 1985-09-05 1993-03-17 Fuji Photo Film Co Ltd
JPH0513514B2 (en) 1985-09-10 1993-02-22 Fuji Photo Film Co Ltd
US4756993A (en) 1986-01-27 1988-07-12 Fuji Photo Film Co., Ltd. Electrophotographic photoreceptor with light scattering layer or light absorbing layer on support backside
US4734444A (en) 1986-02-14 1988-03-29 Basf Aktiengesellschaft Curable mixtures containing N-sulfonylaminosulfonium salts as cationically active catalysts
DE3604581A1 (en) 1986-02-14 1987-08-20 Basf Ag 4-Acylbenzylsulphonium salts, their preparation, and photocurable mixtures and recording materials containing these compounds
EP0233567A2 (en) 1986-02-14 1987-08-26 BASF Aktiengesellschaft Curable compositions containing N-sulfonylaminosulfonium salts as cationically active catalysts
DE3604580A1 (en) 1986-02-14 1987-08-20 Basf Ag CURABLE MIXTURES CONTAINING N-SULFONYLAMINOSULFONIUM SALTS AS CATIONICALLY EFFECTIVE CATALYSTS
JPS62251740A (en) 1986-04-24 1987-11-02 Fuji Photo Film Co Ltd Positive type photosensitive composition
JPS62293247A (en) 1986-06-12 1987-12-19 Fuji Photo Film Co Ltd Photosensitive printing plate
JPS6358440A (en) 1986-08-29 1988-03-14 Fuji Photo Film Co Ltd Photosensitive composition
DE3634671A1 (en) 1986-10-09 1988-05-19 Hans Prof Dr Dr Kroeger Antirheumatic agents with reduced toxicity
US4760013A (en) 1987-02-17 1988-07-26 International Business Machines Corporation Sulfonium salt photoinitiators
JPS63260909A (en) 1987-03-28 1988-10-27 ヘキスト・アクチエンゲゼルシヤフト Photopolymerizable mixture and recording material produced therefrom
JPS63277653A (en) 1987-03-28 1988-11-15 ヘキスト・アクチエンゲゼルシヤフト Polymerizable compound, radiation polymerizable mixture and radiation polymerizable recording material
JPH01105238A (en) 1987-03-28 1989-04-21 Hoechst Ag Photopolymerizable mixture and photopolymerizable material
DE3711264A1 (en) 1987-04-03 1988-10-13 Hoechst Ag LIGHT SENSITIVE MIXTURE AND LIGHT SENSITIVE COPY MATERIAL MADE THEREOF
JPH07120041B2 (en) 1987-05-21 1995-12-20 富士写真フイルム株式会社 Photosensitive composition
JPH07120042B2 (en) 1987-05-21 1995-12-20 富士写真フイルム株式会社 Photosensitive composition
JPS63287947A (en) 1987-05-21 1988-11-25 Fuji Photo Film Co Ltd Photosensitive composition
JPS63287944A (en) 1987-05-21 1988-11-25 Fuji Photo Film Co Ltd Photosensitive composition
EP0297443A2 (en) 1987-07-01 1989-01-04 BASF Aktiengesellschaft Light sensitive mixture for light sensitive coating materials
EP0297442A1 (en) 1987-07-01 1989-01-04 BASF Aktiengesellschaft Sulfonium salts comprising groups which are labile in acid environment
JPH01165613A (en) 1987-11-16 1989-06-29 Hoechst Ag Polymerizable compound, radiation polymerizable mixture thereof and radiation polymerized recording material
JPH0812424B2 (en) 1987-11-19 1996-02-07 富士写真フイルム株式会社 Photosensitive composition
US4933377A (en) 1988-02-29 1990-06-12 Saeva Franklin D Novel sulfonium salts and the use thereof as photoinitiators
JPH01271741A (en) 1988-04-25 1989-10-30 Fuji Photo Film Co Ltd Photosensitive composition
JPH0225493A (en) 1988-05-21 1990-01-26 Hoechst Ag Alkenylphosphonic ester and alkenylphoshinic ester, production thereof, radiation polymerizable mixture containing the same and recording material
JPH0296755A (en) 1988-10-03 1990-04-09 Konica Corp Photosensitive composition
JPH02100054A (en) 1988-10-07 1990-04-12 Fuji Photo Film Co Ltd Positive type photosensitive composition
JPH02100055A (en) 1988-10-07 1990-04-12 Fuji Photo Film Co Ltd Positive type photosensitive composition
JPH0712004B2 (en) 1988-10-19 1995-02-08 日本電装株式会社 Bobbin for coil
EP0370693A2 (en) 1988-11-21 1990-05-30 Eastman Kodak Company Novel onium salts and the use thereof as photoinitiators
JPH02150848A (en) 1988-12-02 1990-06-11 Hitachi Ltd Photofadable and radiation sensitive composition and pattern forming method by using this composition
JPH02226149A (en) 1988-12-22 1990-09-07 Hoechst Ag Photopolymerizing compound, photopolymerizing mixture containing the same and photopolymerizing copying material manufactured therefrom
US5156938A (en) 1989-03-30 1992-10-20 Graphics Technology International, Inc. Ablation-transfer imaging/recording
US5041358A (en) 1989-04-17 1991-08-20 International Business Machines Corporation Negative photoresist and use thereof
JPH02296514A (en) 1989-05-12 1990-12-07 Matsushita Electric Ind Co Ltd Suspension controller for vehicle
JPH03140140A (en) 1989-10-27 1991-06-14 Hitachi Ltd Area extracting method
JPH03208514A (en) 1990-01-04 1991-09-11 Nippon Steel Corp Method for cutting pained steel plate
JPH0413149A (en) 1990-05-02 1992-01-17 Fuji Photo Film Co Ltd Photosensitive composition
JPH06502260A (en) 1990-11-26 1994-03-10 ミネソタ・マイニング・アンド・マニュファクチュアリング・カンパニー photosensitive material
JPH05158230A (en) 1991-12-10 1993-06-25 Fuji Photo Film Co Ltd Positive type photosensitive composition
JPH09502252A (en) 1993-08-26 1997-03-04 ヒート‐ウィン、リミテッド Continuous drying method and apparatus in superheated steam
EP0652483A1 (en) 1993-11-04 1995-05-10 Minnesota Mining And Manufacturing Company Lithographic printing plates
JPH07306528A (en) 1994-03-15 1995-11-21 Fuji Photo Film Co Ltd Negative image recording material
JPH08276558A (en) 1995-02-06 1996-10-22 Fuji Photo Film Co Ltd Negative image recording material
WO1996034316A1 (en) 1995-04-27 1996-10-31 Minnesota Mining And Manufacturing Company Negative-acting no-process printing plates
US6117913A (en) 1996-07-01 2000-09-12 Taiko Pharmaceutical Co., Ltd. Intestinal juice level regulator
JPH1039509A (en) 1996-07-22 1998-02-13 Fuji Photo Film Co Ltd Negative type image recording material
JPH10203037A (en) 1997-01-20 1998-08-04 Fuji Photo Film Co Ltd Negative image recording material
JPH10282672A (en) 1997-02-10 1998-10-23 Fuji Photo Film Co Ltd Heat-sensitive image forming material and lithographic printing master plate
JPH1195421A (en) 1997-07-24 1999-04-09 Fuji Photo Film Co Ltd Laser direct lithography type planographic printing plate material
JPH1144956A (en) 1997-07-28 1999-02-16 Fuji Photo Film Co Ltd Positive photosensitive composition for ir laser
JPH11190903A (en) 1997-08-13 1999-07-13 Mitsubishi Chemical Corp Positive photosensitive composition, lithographic printing plate using the same, and positive image forming method
JPH11143064A (en) 1997-11-04 1999-05-28 Fuji Photo Film Co Ltd Positive image recording material
JPH11160860A (en) 1997-11-28 1999-06-18 Fuji Photo Film Co Ltd Positive image forming material
JP2000105454A (en) 1997-12-02 2000-04-11 Mitsubishi Chemicals Corp Positive type photosensitive composition and positive type photosensitive planographic printing plate
JPH11288093A (en) 1998-04-06 1999-10-19 Fuji Photo Film Co Ltd Positive type photosensitive composition for infrared laser
JPH11352691A (en) 1998-04-09 1999-12-24 Fuji Photo Film Co Ltd Production of planographic printing plate, planographic original printing plate for laser scanning exposure and photopolymerizable composition
EP0950517A1 (en) 1998-04-15 1999-10-20 Agfa-Gevaert N.V. A heat mode sensitive imaging element for making positive working printing plates
JP2000187318A (en) 1998-12-22 2000-07-04 Fuji Photo Film Co Ltd Positive photosensitive composition for infrared laser beam
JP4328403B2 (en) 1999-02-16 2009-09-09 キヤノン株式会社 Camera and interchangeable lens
JP2001006326A (en) 1999-06-18 2001-01-12 Sony Corp Information processor and editing method
JP2001027742A (en) 1999-07-14 2001-01-30 Tega Seiko Co Ltd Connecting member for spectacle frame
JP2001133969A (en) 1999-11-01 2001-05-18 Fuji Photo Film Co Ltd Negative type original plate of planographic printing plate
JP2001133696A (en) 1999-11-02 2001-05-18 Olympus Optical Co Ltd Microscope device for surgery
JP2001142230A (en) 1999-11-11 2001-05-25 Fuji Photo Film Co Ltd Plate making method for planographic printing plate, heating device and recording medium
JP2001237840A (en) 2000-02-22 2001-08-31 Hitachi Telecom Technol Ltd Minimum cell interval control method and minimum cell interval controller for atm unit
JP2002019310A (en) 2000-07-08 2002-01-23 Asahi Kosoku Insatsu Kk Method and apparatus for printing
JP2002333275A (en) 2001-05-11 2002-11-22 Econos Japan Co Ltd Method and apparatus for superheated vapor drying
JP2003167343A (en) 2001-12-03 2003-06-13 Fuji Photo Film Co Ltd Infrared radiation sensitive composition
JP2004117546A (en) 2002-09-24 2004-04-15 Fuji Photo Film Co Ltd Image forming material
JP2004360961A (en) * 2003-06-03 2004-12-24 Fuji Photo Film Co Ltd Drying method and drying device of coating film
JP2005099685A (en) 2003-08-29 2005-04-14 Fuji Photo Film Co Ltd Image recording material and planographic printing plate
JP2005115357A (en) * 2003-09-17 2005-04-28 Fuji Photo Film Co Ltd Photosensitive planographic printing plate and method of manufacturing the same
JP2006258979A (en) 2005-03-15 2006-09-28 Fuji Photo Film Co Ltd Positive planographic printing original plate
JP2006293162A (en) 2005-04-13 2006-10-26 Fuji Photo Film Co Ltd Lithographic printing original plate
JP2007010768A (en) * 2005-06-28 2007-01-18 Sharp Corp Method for partially forming thin film, thin film forming material, method for restoring partial defect of thin film, color filter for liquid crystal panel and device for restoring defect of thin film
JP2007078246A (en) * 2005-09-14 2007-03-29 Oji Paper Co Ltd Sheet drying method and device, and method of manufacturing coated sheet
JP2007222837A (en) * 2006-02-27 2007-09-06 Matsushita Electric Ind Co Ltd Method of producing coating film and coating apparatus using the same

Non-Patent Citations (16)

* Cited by examiner, † Cited by third party
Title
C. S. WEN ET AL., TEH, PROC. CONF. RAD. CURING ASIA, October 1988 (1988-10-01), pages 478
CHEM. & ENG. NEWS, 28 November 1988 (1988-11-28), pages 31
D. C. NECKER ET AL., MACROMOLECULES, vol. 17, 1984, pages 2468
J. V. CRIVELLO ET AL., J. ORG. CHEM., vol. 43, 1978, pages 3055
J. V. CRIVELLO ET AL., J. POLYMER SCI., POLYMER CHEM. ED., vol. 17, 1979, pages 1047
J. V. CRIVELLO ET AL., J. POLYMER SCI., POLYMER CHEM. ED., vol. 17, 1979, pages 2877
J. V. CRIVELLO ET AL., MACOMORECULES, vol. 10, no. 6, 1977, pages 1307
J. V. CRIVELLO ET AL., MACROMORECULES, vol. 10, no. 6, 1977, pages 1307
J. V. CRIVELLO ET AL., MACROMORECULES, vol. 14, no. 5, 1981, pages 1141
J. V. CRIVELLO ET AL., POLYMER BULL., vol. 14, 1985, pages 279
J. V. CRIVELLO ET AL., POLYMER J., vol. 17, 1985, pages 73
NIPPON SECCHAKU KYOKAISHI, vol. 20, no. 7, 1984, pages 300 - 308
S. I. SCHLESINGER, PHOTOGR. SCI. ENG., vol. 18, 1974, pages 387
See also references of EP2218519A4 *
T. S. BAL ET AL., POLYMER, vol. 21, 1980, pages 423
W. R. WATT ET AL., J. POLYMER SCI., POLYMER CHEM. ED., vol. 22, 1984, pages 1789

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011040114A1 (en) * 2009-09-29 2011-04-07 富士フイルム株式会社 Method for producing planographic printing plate precursor
JP2011073211A (en) * 2009-09-29 2011-04-14 Fujifilm Corp Method of manufacturing original planographic printing plate
CN102548770A (en) * 2009-09-29 2012-07-04 富士胶片株式会社 Method for producing planographic printing plate precursor
US20120183901A1 (en) * 2009-09-29 2012-07-19 Takanori Mori Method for producing lithographic printing plate precursor
EP2484536A1 (en) * 2009-09-29 2012-08-08 FUJIFILM Corporation Method for producing planographic printing plate precursor
EP2484536A4 (en) * 2009-09-29 2013-08-28 Fujifilm Corp Method for producing planographic printing plate precursor
JP2014132213A (en) * 2012-12-04 2014-07-17 Toda Kogyo Corp Continuous superheated steam heat treatment device, and forming method of electroconductive coating
JP2015199032A (en) * 2014-04-08 2015-11-12 株式会社康井精機 Lamination sheet manufacturing device
JP2016097323A (en) * 2014-11-18 2016-05-30 株式会社トッパン・コスモ Coating method and coating device
JP2019039583A (en) * 2017-08-23 2019-03-14 大日本印刷株式会社 Dryer and drying method
CN111479663A (en) * 2017-12-19 2020-07-31 汉高股份有限及两合公司 Device and method for producing plastic parts, in particular for applying adhesive
US11780117B2 (en) 2017-12-19 2023-10-10 Henkel Ag & Co., Kgaa Device and method for the production of plastic parts with drying and dessicant feed devices
TWI765796B (en) * 2021-08-04 2022-05-21 塑華科技有限公司 Film drying oven
TWI823244B (en) * 2022-01-27 2023-11-21 黃乃為 Hot and cold dual-airflow drying system
CN116493228A (en) * 2023-04-14 2023-07-28 福建宝士嘉印刷器材有限公司 Oven device of CTP edition material
CN116493228B (en) * 2023-04-14 2024-03-29 福建宝士嘉印刷器材有限公司 Oven device of CTP edition material

Also Published As

Publication number Publication date
EP2218519A4 (en) 2012-03-21
JPWO2009063824A1 (en) 2011-03-31
CN101855026A (en) 2010-10-06
EP2218519A1 (en) 2010-08-18

Similar Documents

Publication Publication Date Title
WO2009063824A1 (en) Method of drying coating film and process for producing lithographic printing plate precursor
WO2008141158A3 (en) Substrate surface structures and processes for forming the same
CN103419521B (en) Aluminum plate heat transfer printing method
TW201129656A (en) Large area deposition of graphene on substrates, and products including the same
JP2012519950A5 (en)
WO2011090262A3 (en) Lithography method using tilted evaporation
EP1543888A4 (en) Method of coating substrate, substrate, coating unit, process for producing laminate and laminate
WO2009028455A1 (en) Releasable adhesive sheet and method for protecting incompletely cured coating film
JP2008524833A5 (en)
WO2016153966A3 (en) Method of inkjet printing decorations on substrates
CN103707593B (en) A kind of laser printing film and manufacture craft thereof
WO2010030971A3 (en) Process for the production of a dark-color multi-layer coating
HRP20191575T1 (en) Method for the manufacture of digitally printed substrates
WO2010082724A3 (en) Surface-treated substrate for an inkjet printer
CN102975461B (en) Method for manufacturing novel environment-friendly vacuum reflection material paper
TW200746971A (en) Flexible laminate board, process for manufacture of the board, and flexible print wiring board
MX2020005591A (en) Process for producing a printed, coated panel.
CN102765271A (en) Ink hot pressing transfer carrier membrane and manufacture method of ink hot pressing transfer carrier membrane
WO2007140477A3 (en) Polyimide insulative layers in multi-layered printed electronic features
WO2008129738A1 (en) Patterning method and method for fabricating electronic element
CN104057744A (en) Thermal transfer printing method of large-area metal sheet material
WO2008015576A3 (en) Enhancement of inkjet-printed elements using photolithographic techniques
WO2013171297A3 (en) Process for manufacturing a composite material
EP2042926A3 (en) Method for manufacturing original plate of planographic printing plate and original plate of planographic printing plate
CN109677176A (en) A kind of pad pasting cover board and its manufacturing method

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 200880115925.3

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08850629

Country of ref document: EP

Kind code of ref document: A1

WWE Wipo information: entry into national phase

Ref document number: 2009541124

Country of ref document: JP

WWE Wipo information: entry into national phase

Ref document number: 2008850629

Country of ref document: EP

NENP Non-entry into the national phase

Ref country code: DE