WO2009041816A3 - A method of patterning a hard disk medium - Google Patents

A method of patterning a hard disk medium Download PDF

Info

Publication number
WO2009041816A3
WO2009041816A3 PCT/NL2008/050620 NL2008050620W WO2009041816A3 WO 2009041816 A3 WO2009041816 A3 WO 2009041816A3 NL 2008050620 W NL2008050620 W NL 2008050620W WO 2009041816 A3 WO2009041816 A3 WO 2009041816A3
Authority
WO
WIPO (PCT)
Prior art keywords
hard disk
patterning
disk medium
top layer
center point
Prior art date
Application number
PCT/NL2008/050620
Other languages
French (fr)
Other versions
WO2009041816A2 (en
Inventor
Jager Pieter Willem Herman De
Diederik Jan Maas
Jacob Frederik Friso Klinkhamer
Antonius Gerardus Theo Bastein
Sjoerd Oostrom
Original Assignee
Tno
Jager Pieter Willem Herman De
Diederik Jan Maas
Klinkhamer Jacob Frederik Fris
Antonius Gerardus Theo Bastein
Sjoerd Oostrom
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tno, Jager Pieter Willem Herman De, Diederik Jan Maas, Klinkhamer Jacob Frederik Fris, Antonius Gerardus Theo Bastein, Sjoerd Oostrom filed Critical Tno
Publication of WO2009041816A2 publication Critical patent/WO2009041816A2/en
Publication of WO2009041816A3 publication Critical patent/WO2009041816A3/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/855—Coating only part of a support with a magnetic layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/74—Record carriers characterised by the form, e.g. sheet shaped to wrap around a drum
    • G11B5/743—Patterned record carriers, wherein the magnetic recording layer is patterned into magnetic isolated data islands, e.g. discrete tracks
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/74—Record carriers characterised by the form, e.g. sheet shaped to wrap around a drum
    • G11B5/82—Disk carriers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/86—Re-recording, i.e. transcribing information from one magnetisable record carrier on to one or more similar or dissimilar record carriers
    • G11B5/865—Re-recording, i.e. transcribing information from one magnetisable record carrier on to one or more similar or dissimilar record carriers by contact "printing"

Abstract

The invention relates to a method of patterning a hard disk medium, comprising the step of applying a lithographic process to a resistive top layer of the hard disk medium, wherein the resistive top layer is exposed to a beam having multiple electron or optical beamlets. Preferably, foci of the multiple beamlets are arranged at different radial distances from a center point of the hard disk, more preferably substantially on a line extending from the center point of the hard disk to an edge of the hard disk.
PCT/NL2008/050620 2007-09-25 2008-09-25 A method of patterning a hard disk medium WO2009041816A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US97492707P 2007-09-25 2007-09-25
US60/974,927 2007-09-25

Publications (2)

Publication Number Publication Date
WO2009041816A2 WO2009041816A2 (en) 2009-04-02
WO2009041816A3 true WO2009041816A3 (en) 2009-05-22

Family

ID=39941818

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/NL2008/050620 WO2009041816A2 (en) 2007-09-25 2008-09-25 A method of patterning a hard disk medium

Country Status (1)

Country Link
WO (1) WO2009041816A2 (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5587223A (en) * 1992-10-19 1996-12-24 Board Of Trustees Leland Stanford, Jr. University High density magnetic information storage medium
US6133986A (en) * 1996-02-28 2000-10-17 Johnson; Kenneth C. Microlens scanner for microlithography and wide-field confocal microscopy
WO2004021083A1 (en) * 2002-08-27 2004-03-11 Obducat Ab Device for transferring a pattern to an object
US20050064297A1 (en) * 2003-09-22 2005-03-24 Koichi Wago Rotary apertured interferometric lithography (RAIL)
EP1801655A2 (en) * 2005-12-20 2007-06-27 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method using interferometric and maskless exposure units

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5587223A (en) * 1992-10-19 1996-12-24 Board Of Trustees Leland Stanford, Jr. University High density magnetic information storage medium
US6133986A (en) * 1996-02-28 2000-10-17 Johnson; Kenneth C. Microlens scanner for microlithography and wide-field confocal microscopy
WO2004021083A1 (en) * 2002-08-27 2004-03-11 Obducat Ab Device for transferring a pattern to an object
US20050064297A1 (en) * 2003-09-22 2005-03-24 Koichi Wago Rotary apertured interferometric lithography (RAIL)
EP1801655A2 (en) * 2005-12-20 2007-06-27 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method using interferometric and maskless exposure units

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
CHANG, MANKOS, LEE, MURAY: "Multiple electron-beam lithography", MICROELECTRONIC ENGINEERING, vol. 57-58, September 2001 (2001-09-01), pages 117 - 135, XP002503925 *

Also Published As

Publication number Publication date
WO2009041816A2 (en) 2009-04-02

Similar Documents

Publication Publication Date Title
WO2007142788A3 (en) Laser ablation resist
TW200604609A (en) Method for manufacturing a master, master, method for manufacturing optical elements and optical element
GB2450265B (en) Aberration evaluation pattern,aberration evaluation method,aberration correction method,electron beam drawing apparatus,electron microscope,master,stamper
WO2005094320A3 (en) Method of separating layers of material using a laser beam
SG131019A1 (en) Magnetic recording medium, method of manufacturing the same, and magnetic recording/reproducing apparatus
TW200639269A (en) Plating method
EP2200023B8 (en) Multichannel signal coding method and apparatus and program for the methods, and recording medium having program stored thereon.
WO2008022332A3 (en) System, method and kit for replicating a dna array
NO20063648L (en) Procedure for removing a coating
WO2007084540A3 (en) Electrode arrays and methods of fabrication thereof
WO2006063098A8 (en) Lift-off patterning processes employing energetically-stimulated local removal of solid-condensed-gas layers
WO2008084517A1 (en) System, method and program for generating route curve
WO2008140817A3 (en) Data type encoding for media independent handover
WO2008081555A1 (en) Manufacturing method for blaze type diffraction grating
JP2016534552A5 (en)
WO2009018217A3 (en) Non-covalently crosslinkable materials for photolithography processes
WO2007074153A3 (en) Method for relaxing a stressed thin film
WO2010002736A3 (en) Methods for fabricating line/space routing between c4 pads
WO2007050502A3 (en) Process for applying organophosphorus-based layers on substrates
IN2012DN02446A (en)
WO2008140553A3 (en) Mapk/erk kinase inhibitors
EA200801451A1 (en) METHOD FOR PRODUCING A PRODUCT IN A CONDENSED PHASE FROM ONE OR MULTIPLE GAS-PHASE REAGENTS
EP3975167A4 (en) Electronic musical instrument, control method for electronic musical instrument, and storage medium
WO2009041816A3 (en) A method of patterning a hard disk medium
EP1763023A3 (en) Information recording medium and optical disc apparatus

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08832912

Country of ref document: EP

Kind code of ref document: A2

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 08832912

Country of ref document: EP

Kind code of ref document: A2