WO2009012396A3 - Substrate processing apparatus with motors integral to chamber walls - Google Patents
Substrate processing apparatus with motors integral to chamber walls Download PDFInfo
- Publication number
- WO2009012396A3 WO2009012396A3 PCT/US2008/070346 US2008070346W WO2009012396A3 WO 2009012396 A3 WO2009012396 A3 WO 2009012396A3 US 2008070346 W US2008070346 W US 2008070346W WO 2009012396 A3 WO2009012396 A3 WO 2009012396A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- peripheral wall
- processing apparatus
- substrate processing
- chamber walls
- substrate transport
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
- H02K41/02—Linear motors; Sectional motors
- H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J11/00—Manipulators not otherwise provided for
- B25J11/0095—Manipulators transporting wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J9/00—Programme-controlled manipulators
- B25J9/0084—Programme-controlled manipulators comprising a plurality of manipulators
- B25J9/0087—Dual arms
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67196—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the transfer chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67745—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber characterized by movements or sequence of movements of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67748—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a single workpiece
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K2201/00—Specific aspects not provided for in the other groups of this subclass relating to the magnetic circuits
- H02K2201/18—Machines moving with multiple degrees of freedom
Abstract
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010517162A JP2011514652A (en) | 2007-07-17 | 2008-07-17 | Substrate processing apparatus with motor integrated in chamber wall |
KR1020237018304A KR20230079518A (en) | 2007-07-17 | 2008-07-17 | A substrate transport apparatus |
KR1020187002939A KR20180014247A (en) | 2007-07-17 | 2008-07-17 | Substrate processing apparatus with motors integral to chamber walls |
KR1020197018398A KR20190077134A (en) | 2007-07-17 | 2008-07-17 | A substrate transport apparatus |
KR1020217030740A KR102617936B1 (en) | 2007-07-17 | 2008-07-17 | A substrate transport apparatus |
KR1020157033830A KR101825595B1 (en) | 2007-07-17 | 2008-07-17 | Substrate processing apparatus with motors integral to chamber walls |
CN200880108254.8A CN101801817B (en) | 2007-07-17 | 2008-07-17 | Substrate processing apparatus with motors integral to chamber walls |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US95033107P | 2007-07-17 | 2007-07-17 | |
US60/950,331 | 2007-07-17 | ||
US12/175,278 | 2008-07-17 | ||
US12/175,278 US8008884B2 (en) | 2007-07-17 | 2008-07-17 | Substrate processing apparatus with motors integral to chamber walls |
Publications (3)
Publication Number | Publication Date |
---|---|
WO2009012396A2 WO2009012396A2 (en) | 2009-01-22 |
WO2009012396A3 true WO2009012396A3 (en) | 2009-03-05 |
WO2009012396A9 WO2009012396A9 (en) | 2009-04-23 |
Family
ID=40260379
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2008/070346 WO2009012396A2 (en) | 2007-07-17 | 2008-07-17 | Substrate processing apparatus with motors integral to chamber walls |
Country Status (5)
Country | Link |
---|---|
US (3) | US8008884B2 (en) |
JP (3) | JP2011514652A (en) |
KR (6) | KR101825595B1 (en) |
CN (1) | CN101801817B (en) |
WO (1) | WO2009012396A2 (en) |
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US8893642B2 (en) | 2010-03-24 | 2014-11-25 | Lam Research Corporation | Airflow management for low particulate count in a process tool |
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JP6708546B2 (en) * | 2013-11-13 | 2020-06-10 | ブルックス オートメーション インコーポレイテッド | Sealed robot drive |
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KR20210119580A (en) | 2021-10-05 |
JP6466386B2 (en) | 2019-02-06 |
US20090022571A1 (en) | 2009-01-22 |
JP2011514652A (en) | 2011-05-06 |
WO2009012396A2 (en) | 2009-01-22 |
JP6040182B2 (en) | 2016-12-07 |
JP2017022426A (en) | 2017-01-26 |
KR101825595B1 (en) | 2018-02-05 |
WO2009012396A9 (en) | 2009-04-23 |
US20120301261A1 (en) | 2012-11-29 |
KR20100056468A (en) | 2010-05-27 |
KR20190077134A (en) | 2019-07-02 |
KR20150140401A (en) | 2015-12-15 |
CN101801817A (en) | 2010-08-11 |
US8680803B2 (en) | 2014-03-25 |
JP2014123761A (en) | 2014-07-03 |
US8237391B2 (en) | 2012-08-07 |
KR20180014247A (en) | 2018-02-07 |
CN101801817B (en) | 2015-07-22 |
US20110316370A1 (en) | 2011-12-29 |
KR102617936B1 (en) | 2023-12-27 |
US8008884B2 (en) | 2011-08-30 |
KR20230079518A (en) | 2023-06-07 |
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