WO2008154582A3 - Semiconductor die coating and interconnection fixture and method - Google Patents

Semiconductor die coating and interconnection fixture and method Download PDF

Info

Publication number
WO2008154582A3
WO2008154582A3 PCT/US2008/066568 US2008066568W WO2008154582A3 WO 2008154582 A3 WO2008154582 A3 WO 2008154582A3 US 2008066568 W US2008066568 W US 2008066568W WO 2008154582 A3 WO2008154582 A3 WO 2008154582A3
Authority
WO
WIPO (PCT)
Prior art keywords
die
semiconductor die
die coating
fixture
fixtures
Prior art date
Application number
PCT/US2008/066568
Other languages
French (fr)
Other versions
WO2008154582A2 (en
Inventor
Scott Mcgrath
Terrence Caskey
Simon J S Mcelrea
Lawrence Douglas Andrews
Zongrong Liu
Original Assignee
Vertical Circuits Inc
Scott Mcgrath
Terrence Caskey
Simon J S Mcelrea
Lawrence Douglas Andrews
Zongrong Liu
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vertical Circuits Inc, Scott Mcgrath, Terrence Caskey, Simon J S Mcelrea, Lawrence Douglas Andrews, Zongrong Liu filed Critical Vertical Circuits Inc
Publication of WO2008154582A2 publication Critical patent/WO2008154582A2/en
Publication of WO2008154582A3 publication Critical patent/WO2008154582A3/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/50Multistep manufacturing processes of assemblies consisting of devices, each device being of a type provided for in group H01L27/00 or H01L29/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68372Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used to support a device or wafer when forming electrical connections thereto
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Formation Of Insulating Films (AREA)

Abstract

Fixtures for temporarily holding semiconductor die and for holding stacked die units, for application of a material such as electrical interconnection material to die edges, include a fixture frame, die or die stack supports, and a mask. Methods for applying material such as electrical interconnection material to die edges and to die stack units employ the fixtures using a mask lift-off step.
PCT/US2008/066568 2007-06-11 2008-06-11 Semiconductor die coating and interconnection fixture and method WO2008154582A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US94321107P 2007-06-11 2007-06-11
US60/943,211 2007-06-11

Publications (2)

Publication Number Publication Date
WO2008154582A2 WO2008154582A2 (en) 2008-12-18
WO2008154582A3 true WO2008154582A3 (en) 2009-02-19

Family

ID=40130481

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2008/066568 WO2008154582A2 (en) 2007-06-11 2008-06-11 Semiconductor die coating and interconnection fixture and method

Country Status (1)

Country Link
WO (1) WO2008154582A2 (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR940004952Y1 (en) * 1991-09-30 1994-07-23 주식회사 금성사 Jig for laser diode mirror coating
US5434745A (en) * 1994-07-26 1995-07-18 White Microelectronics Div. Of Bowmar Instrument Corp. Stacked silicon die carrier assembly
US5698895A (en) * 1994-06-23 1997-12-16 Cubic Memory, Inc. Silicon segment programming method and apparatus
US20050101039A1 (en) * 2002-10-30 2005-05-12 John Chen Apparatus and method for stacking laser bars for uniform facet coating
US20050230802A1 (en) * 2004-04-13 2005-10-20 Al Vindasius Stacked die BGA or LGA component assembly

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR940004952Y1 (en) * 1991-09-30 1994-07-23 주식회사 금성사 Jig for laser diode mirror coating
US5698895A (en) * 1994-06-23 1997-12-16 Cubic Memory, Inc. Silicon segment programming method and apparatus
US5434745A (en) * 1994-07-26 1995-07-18 White Microelectronics Div. Of Bowmar Instrument Corp. Stacked silicon die carrier assembly
US20050101039A1 (en) * 2002-10-30 2005-05-12 John Chen Apparatus and method for stacking laser bars for uniform facet coating
US20050230802A1 (en) * 2004-04-13 2005-10-20 Al Vindasius Stacked die BGA or LGA component assembly

Also Published As

Publication number Publication date
WO2008154582A2 (en) 2008-12-18

Similar Documents

Publication Publication Date Title
WO2009120344A3 (en) Methods for coating a substrate
WO2010010275A3 (en) Method of transferring a portion of a functional film
EP1950177A4 (en) Semiconductor thin film, method for producing same, and thin film transistor
HK1117270A1 (en) Substrate and method of fabricating the same, and semiconductor device and method of fabricating the same
EP2360701B8 (en) Substrate for super-conductive film formation, super-conductive wire material, and method for producing the same
EP2163595A4 (en) Fluorescent substance, method for production of the same, and light-emitting device using the same
WO2008089043A3 (en) Multi-junction solar cells and methods and apparatuses for forming the same
WO2008048232A3 (en) Nanostructure and photovoltaic cell implementing same
EP2068352A4 (en) Film for semiconductor, method for producing film for semiconductor, and semiconductor device
TWI372439B (en) Semiconductor wafer positioning method, and apparatus using the same
WO2010009268A3 (en) Methods of preparing photovoltaic modules
HK1150322A1 (en) Connecting film, and joined structure and method for producing the same
TWI351087B (en) Package substrate and method for fabricating the same
EP2139027A4 (en) Adhesive film for semiconductor, composite sheet, and method for producing semiconductor chip using them
EP1869520A4 (en) Antireflective coating for semiconductor devices and method for the same
EP2128088A4 (en) Apparatus and method for manufacturing silicon substrate, and silicon substrate
EP1797967A4 (en) Method for organic thin film formation, assistant for organic thin film formation, and solution for organic thin film formation
EP2296186A4 (en) Thin film photoelectric conversion device and method for manufacturing the same
EP2267090A4 (en) Pressure-sensitive adhesive film and back-grinding method using the same
EP2151883A4 (en) Photoelectrical cell, and coating agent for forming porous semiconductor film for the photoelectrical cell
EP3886161A4 (en) Semiconductor package substrate and method for producing same
EP3366817A4 (en) Base substrate, method for manufacturing base substrate, and method for manufacturing group 13 nitride crystal
GB2441701B (en) Method for forming organic semiconductor film, organic semiconductor film, and organic thin film transistor
EP3866186A4 (en) Silicon-based base, base substrate and manufacturing method therefor, and optoelectronic device
DK1858655T3 (en) Method and apparatus for removing paint and sealant

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08770717

Country of ref document: EP

Kind code of ref document: A2

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 08770717

Country of ref document: EP

Kind code of ref document: A2