WO2008115606A3 - Method and apparatus for reducing the effects of window clouding on a viewport window in a reactive environment - Google Patents

Method and apparatus for reducing the effects of window clouding on a viewport window in a reactive environment Download PDF

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Publication number
WO2008115606A3
WO2008115606A3 PCT/US2008/005544 US2008005544W WO2008115606A3 WO 2008115606 A3 WO2008115606 A3 WO 2008115606A3 US 2008005544 W US2008005544 W US 2008005544W WO 2008115606 A3 WO2008115606 A3 WO 2008115606A3
Authority
WO
WIPO (PCT)
Prior art keywords
window
chamber
flow
viewport
gas
Prior art date
Application number
PCT/US2008/005544
Other languages
French (fr)
Other versions
WO2008115606A2 (en
Inventor
Kenneth C Harvery
Original Assignee
Verity Instr Inc
Kenneth C Harvery
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/726,958 external-priority patent/US20080233016A1/en
Priority claimed from US11/799,516 external-priority patent/US7630859B2/en
Application filed by Verity Instr Inc, Kenneth C Harvery filed Critical Verity Instr Inc
Priority to CN200880016054A priority Critical patent/CN101681802A/en
Priority to KR1020097022041A priority patent/KR101198205B1/en
Publication of WO2008115606A2 publication Critical patent/WO2008115606A2/en
Publication of WO2008115606A3 publication Critical patent/WO2008115606A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow

Abstract

Multichannel array for establishing viscous flow for preventing the flow of particulates causing window clouding. Process chamber for confining process pressure within a process volume with a viewport window along the chamber for viewing portion of process volume. Ingress port disposed in the process chamber for receiving flow of process gas and egress port for extracting flow rate of gas from the process volume. Multichannel array (MCA) disposed between viewport window and process volume of the process chamber. Window chamber separate viewport window from MCA with chamber window port for receiving gas. Viscous flow formed at window side of channels, prevents material from entering window chamber and adhering to window. Viscous flow established by increasing pressure in window chamber via chamber window port. Viscous flow rate substantially lower than rate of process gas flow into process volume.
PCT/US2008/005544 2007-03-21 2008-04-29 Method and apparatus for reducing the effects of window clouding on a viewport window in a reactive environment WO2008115606A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN200880016054A CN101681802A (en) 2007-03-21 2008-04-29 Method and apparatus for reducing the effects of window clouding on a viewport window in a reactive environment
KR1020097022041A KR101198205B1 (en) 2007-05-01 2008-04-29 Method and Apparatus for Reducing the Effects of Window Clouding on a Viewport Window in a Reactive Environment

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US11/726,958 2007-03-21
US11/726,958 US20080233016A1 (en) 2007-03-21 2007-03-21 Multichannel array as window protection
US11/799,516 2007-05-01
US11/799,516 US7630859B2 (en) 2007-05-01 2007-05-01 Method and apparatus for reducing the effects of window clouding on a viewport window in a reactive environment

Publications (2)

Publication Number Publication Date
WO2008115606A2 WO2008115606A2 (en) 2008-09-25
WO2008115606A3 true WO2008115606A3 (en) 2009-01-29

Family

ID=39766688

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2008/005544 WO2008115606A2 (en) 2007-03-21 2008-04-29 Method and apparatus for reducing the effects of window clouding on a viewport window in a reactive environment

Country Status (2)

Country Link
CN (1) CN101681802A (en)
WO (1) WO2008115606A2 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5456711B2 (en) * 2011-03-03 2014-04-02 住友重機械工業株式会社 Deposition equipment
CN103187225B (en) * 2011-12-28 2015-10-21 中微半导体设备(上海)有限公司 A kind of plasma processing apparatus of monitoring etching process
RU2521719C1 (en) * 2013-02-15 2014-07-10 Общество с ограниченной ответственностью "ВИНТЕЛ" Mercury monitor
CN107735672A (en) * 2015-04-10 2018-02-23 迈卡尔迪斯公司 Analysis system with escapement
CN106816393A (en) * 2015-11-27 2017-06-09 中微半导体设备(上海)有限公司 Processing method for substrate and equipment
CN106756865A (en) * 2016-12-14 2017-05-31 文晓斌 A kind of magnetron sputtering reaction atmosphere self feed back control system and its application method
CN207793418U (en) * 2018-01-30 2018-08-31 北京铂阳顶荣光伏科技有限公司 A kind of filming equipment
CN108623144A (en) * 2018-07-10 2018-10-09 长飞光纤光缆股份有限公司 A kind of VAD prepares the precipitation equipment of preform
CN108926083A (en) * 2018-09-14 2018-12-04 深圳市旭隆珠宝首饰有限公司 A kind of gem processing preventing atomization observation device based on heating member

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5188671A (en) * 1990-08-08 1993-02-23 Hughes Aircraft Company Multichannel plate assembly for gas source molecular beam epitaxy
US20050173375A1 (en) * 2002-09-30 2005-08-11 Tokyo Electron Limited Apparatus and method for use of optical system with a plasma processing system
US7074310B2 (en) * 2002-03-04 2006-07-11 William Marsh Rice University Method for separating single-wall carbon nanotubes and compositions thereof

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5188671A (en) * 1990-08-08 1993-02-23 Hughes Aircraft Company Multichannel plate assembly for gas source molecular beam epitaxy
US7074310B2 (en) * 2002-03-04 2006-07-11 William Marsh Rice University Method for separating single-wall carbon nanotubes and compositions thereof
US20050173375A1 (en) * 2002-09-30 2005-08-11 Tokyo Electron Limited Apparatus and method for use of optical system with a plasma processing system

Also Published As

Publication number Publication date
CN101681802A (en) 2010-03-24
WO2008115606A2 (en) 2008-09-25

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