WO2008054346A3 - Improved spectral metrology for high repetition rate gas discharge laser - Google Patents

Improved spectral metrology for high repetition rate gas discharge laser Download PDF

Info

Publication number
WO2008054346A3
WO2008054346A3 PCT/US2006/024464 US2006024464W WO2008054346A3 WO 2008054346 A3 WO2008054346 A3 WO 2008054346A3 US 2006024464 W US2006024464 W US 2006024464W WO 2008054346 A3 WO2008054346 A3 WO 2008054346A3
Authority
WO
WIPO (PCT)
Prior art keywords
bandwidth
laser
gas discharge
repetition rate
parameter
Prior art date
Application number
PCT/US2006/024464
Other languages
French (fr)
Other versions
WO2008054346A2 (en
Inventor
Robert J Rafac
Original Assignee
Cymer Inc
Robert J Rafac
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cymer Inc, Robert J Rafac filed Critical Cymer Inc
Priority to KR1020127016577A priority Critical patent/KR101280917B1/en
Priority to EP06851603A priority patent/EP1946054A4/en
Priority to JP2008542299A priority patent/JP5270363B2/en
Priority to KR1020087001729A priority patent/KR101364005B1/en
Publication of WO2008054346A2 publication Critical patent/WO2008054346A2/en
Publication of WO2008054346A3 publication Critical patent/WO2008054346A3/en

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12Generating the spectrum; Monochromators
    • G01J3/26Generating the spectrum; Monochromators using multiple reflection, e.g. Fabry-Perot interferometer, variable interference filters
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02Details
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02Details
    • G01J3/0202Mechanical elements; Supports for optical elements
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02Details
    • G01J3/0205Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G01J3/0237Adjustable, e.g. focussing
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02Details
    • G01J3/027Control of working procedures of a spectrometer; Failure detection; Bandwidth calculation
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02Details
    • G01J3/0286Constructional arrangements for compensating for fluctuations caused by temperature, humidity or pressure, or using cooling or temperature stabilization of parts of the device; Controlling the atmosphere inside a spectrometer, e.g. vacuum
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02Details
    • G01J3/0291Housings; Spectrometer accessories; Spatial arrangement of elements, e.g. folded path arrangements
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28Investigating the spectrum
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/46Measurement of colour; Colour measuring devices, e.g. colorimeters
    • G01J3/50Measurement of colour; Colour measuring devices, e.g. colorimeters using electric radiation detectors
    • G01J3/51Measurement of colour; Colour measuring devices, e.g. colorimeters using electric radiation detectors using colour filters

Abstract

A bandwidth meter apparatus and method for measuring the bandwidth of a spectrum of light emitted from a laser input to the bandwidth meter is disclosed which may comprise an optical bandwidth monitor providing a first output representative of a first parameter which is indicative of the bandwidth of the light emitted from the laser and a second output representative of a second parameter which is indicative of the bandwidth of the light emitted from the laser; and, an actual bandwidth calculation apparatus utilizing the first output and the second output as part of a multivariable equation employing predetermined calibration variables specific to the optical bandwidth monitor, to calculate an actual bandwidth parameter; the multivariable equation comprising a symmetry sensitive term.
PCT/US2006/024464 2005-06-27 2006-06-23 Improved spectral metrology for high repetition rate gas discharge laser WO2008054346A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020127016577A KR101280917B1 (en) 2005-06-27 2006-06-23 Improved spectral metrology for high repetition rate gas discharge laser
EP06851603A EP1946054A4 (en) 2005-06-27 2006-06-23 Improved spectral metrology for high repetition rate gas discharge laser
JP2008542299A JP5270363B2 (en) 2005-06-27 2006-06-23 Improved spectral measurements for high repetition rate gas discharge lasers.
KR1020087001729A KR101364005B1 (en) 2005-06-27 2006-06-23 Improved spectral metrology for high repetition rate gas discharge laser

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/169,202 2005-06-27
US11/169,202 US7317536B2 (en) 2005-06-27 2005-06-27 Spectral bandwidth metrology for high repetition rate gas discharge lasers

Publications (2)

Publication Number Publication Date
WO2008054346A2 WO2008054346A2 (en) 2008-05-08
WO2008054346A3 true WO2008054346A3 (en) 2008-10-09

Family

ID=37661374

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2006/024464 WO2008054346A2 (en) 2005-06-27 2006-06-23 Improved spectral metrology for high repetition rate gas discharge laser

Country Status (5)

Country Link
US (1) US7317536B2 (en)
EP (1) EP1946054A4 (en)
JP (2) JP5270363B2 (en)
KR (2) KR101364005B1 (en)
WO (1) WO2008054346A2 (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7822084B2 (en) * 2006-02-17 2010-10-26 Cymer, Inc. Method and apparatus for stabilizing and tuning the bandwidth of laser light
US7852889B2 (en) 2006-02-17 2010-12-14 Cymer, Inc. Active spectral control of DUV light source
US7659529B2 (en) * 2007-04-13 2010-02-09 Cymer, Inc. Method and apparatus for vibration reduction in laser system line narrowing unit wavelength selection optical element
US8520186B2 (en) * 2009-08-25 2013-08-27 Cymer, Llc Active spectral control of optical source
US8837536B2 (en) 2010-04-07 2014-09-16 Cymer, Llc Method and apparatus for controlling light bandwidth
US8599381B2 (en) 2011-01-19 2013-12-03 Massachusetts Institute Of Technology Gas detector for atmospheric species detection
US9207119B2 (en) 2012-04-27 2015-12-08 Cymer, Llc Active spectral control during spectrum synthesis
US9715180B2 (en) 2013-06-11 2017-07-25 Cymer, Llc Wafer-based light source parameter control
US9065248B2 (en) * 2013-11-20 2015-06-23 Cymer, Llc Systems and methods to more accurately estimate a fluorine concentration in a source laser
CN104316185B (en) * 2014-10-29 2017-12-19 中国科学院光电研究院 Method and apparatus that are a kind of while monitoring laser spectrum and spectral power distribution
US10288483B2 (en) 2017-04-09 2019-05-14 Cymer, Llc Recovering spectral shape from spatial output
JP6983633B2 (en) * 2017-11-24 2021-12-17 浜松ホトニクス株式会社 Wafer inspection method and wafer
CN111316512B (en) 2017-12-05 2022-10-21 极光先进雷射株式会社 Excimer laser apparatus and method for manufacturing electronic device
CN111175424B (en) * 2020-02-24 2022-04-08 大连依利特分析仪器有限公司 Diode array detector based on multi-stage signal calibration and calibration method

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5373515A (en) * 1987-07-17 1994-12-13 Kabushiki Kaisha Komatsu Seisakusho Laser wavelength controlling apparatus
US5978394A (en) * 1998-03-11 1999-11-02 Cymer, Inc. Wavelength system for an excimer laser
US6320663B1 (en) * 1999-01-22 2001-11-20 Cymer, Inc. Method and device for spectral measurements of laser beam
US20020163650A1 (en) * 2000-10-10 2002-11-07 Tunable Photonics Corporation Method and system for locking transmission wavelengths for lasers in a dense wavelength division multiplexer

Family Cites Families (60)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4223279A (en) 1977-07-18 1980-09-16 Mathematical Sciences Northwest, Inc. Pulsed electric discharge laser utilizing water dielectric blumlein transmission line
US4455658A (en) 1982-04-20 1984-06-19 Sutter Jr Leroy V Coupling circuit for use with a transversely excited gas laser
US5189678A (en) 1986-09-29 1993-02-23 The United States Of America As Represented By The United States Department Of Energy Coupling apparatus for a metal vapor laser
US5315611A (en) 1986-09-25 1994-05-24 The United States Of America As Represented By The United States Department Of Energy High average power magnetic modulator for metal vapor lasers
US4959840A (en) 1988-01-15 1990-09-25 Cymer Laser Technologies Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser
US5023884A (en) 1988-01-15 1991-06-11 Cymer Laser Technologies Compact excimer laser
US5025446A (en) 1988-04-01 1991-06-18 Laserscope Intra-cavity beam relay for optical harmonic generation
US5025445A (en) 1989-11-22 1991-06-18 Cymer Laser Technologies System for, and method of, regulating the wavelength of a light beam
US5471965A (en) 1990-12-24 1995-12-05 Kapich; Davorin D. Very high speed radial inflow hydraulic turbine
US5359620A (en) 1992-11-12 1994-10-25 Cymer Laser Technologies Apparatus for, and method of, maintaining a clean window in a laser
US5313481A (en) 1993-09-29 1994-05-17 The United States Of America As Represented By The United States Department Of Energy Copper laser modulator driving assembly including a magnetic compression laser
US5448580A (en) 1994-07-05 1995-09-05 The United States Of America As Represented By The United States Department Of Energy Air and water cooled modulator
US5863017A (en) 1996-01-05 1999-01-26 Cymer, Inc. Stabilized laser platform and module interface
JP3385898B2 (en) 1997-03-24 2003-03-10 安藤電気株式会社 Tunable semiconductor laser light source
US6128323A (en) 1997-04-23 2000-10-03 Cymer, Inc. Reliable modular production quality narrow-band high REP rate excimer laser
US5982800A (en) 1997-04-23 1999-11-09 Cymer, Inc. Narrow band excimer laser
EP0875743B1 (en) 1997-05-02 2001-09-19 Agilent Technologies Inc. a Delaware Corporation A wavemeter and an arrangement for the adjustment of the wavelength of an optical source
US6094448A (en) 1997-07-01 2000-07-25 Cymer, Inc. Grating assembly with bi-directional bandwidth control
US6192064B1 (en) 1997-07-01 2001-02-20 Cymer, Inc. Narrow band laser with fine wavelength control
US6330261B1 (en) 1997-07-18 2001-12-11 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate ArF excimer laser
US6018537A (en) 1997-07-18 2000-01-25 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate F2 laser
US5852621A (en) 1997-07-21 1998-12-22 Cymer, Inc. Pulse laser with pulse energy trimmer
US6671294B2 (en) 1997-07-22 2003-12-30 Cymer, Inc. Laser spectral engineering for lithographic process
US6757316B2 (en) 1999-12-27 2004-06-29 Cymer, Inc. Four KHz gas discharge laser
US5953360A (en) 1997-10-24 1999-09-14 Synrad, Inc. All metal electrode sealed gas laser
US6240117B1 (en) 1998-01-30 2001-05-29 Cymer, Inc. Fluorine control system with fluorine monitor
US6151349A (en) 1998-03-04 2000-11-21 Cymer, Inc. Automatic fluorine control system
US5978406A (en) 1998-01-30 1999-11-02 Cymer, Inc. Fluorine control system for excimer lasers
US6016325A (en) 1998-04-27 2000-01-18 Cymer, Inc. Magnetic modulator voltage and temperature timing compensation circuit
US6580517B2 (en) 2000-03-01 2003-06-17 Lambda Physik Ag Absolute wavelength calibration of lithography laser using multiple element or tandem see through hollow cathode lamp
US6477193B2 (en) 1998-07-18 2002-11-05 Cymer, Inc. Extreme repetition rate gas discharge laser with improved blower motor
US6208675B1 (en) 1998-08-27 2001-03-27 Cymer, Inc. Blower assembly for a pulsed laser system incorporating ceramic bearings
US6067311A (en) 1998-09-04 2000-05-23 Cymer, Inc. Excimer laser with pulse multiplier
US6208674B1 (en) 1998-09-18 2001-03-27 Cymer, Inc. Laser chamber with fully integrated electrode feedthrough main insulator
US6539046B2 (en) 1998-10-02 2003-03-25 Cymer, Inc. Wavemeter for gas discharge laser
US6359693B2 (en) 1999-02-04 2002-03-19 Cymer, Inc. Double pass double etalon spectrometer
US6219368B1 (en) 1999-02-12 2001-04-17 Lambda Physik Gmbh Beam delivery system for molecular fluorine (F2) laser
US6104735A (en) 1999-04-13 2000-08-15 Cymer, Inc. Gas discharge laser with magnetic bearings and magnetic reluctance centering for fan drive assembly
US6164116A (en) 1999-05-06 2000-12-26 Cymer, Inc. Gas module valve automated test fixture
US6414979B2 (en) 2000-06-09 2002-07-02 Cymer, Inc. Gas discharge laser with blade-dielectric electrode
US6882674B2 (en) 1999-12-27 2005-04-19 Cymer, Inc. Four KHz gas discharge laser system
US6625191B2 (en) 1999-12-10 2003-09-23 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6865210B2 (en) 2001-05-03 2005-03-08 Cymer, Inc. Timing control for two-chamber gas discharge laser system
US6801560B2 (en) 1999-05-10 2004-10-05 Cymer, Inc. Line selected F2 two chamber laser system
US6317448B1 (en) 1999-09-23 2001-11-13 Cymer, Inc. Bandwidth estimating technique for narrow band laser
US6667804B1 (en) * 1999-10-12 2003-12-23 Lambda Physik Ag Temperature compensation method for wavemeters
US6532247B2 (en) 2000-02-09 2003-03-11 Cymer, Inc. Laser wavelength control unit with piezoelectric driver
US6480275B2 (en) 2001-01-29 2002-11-12 Cymer, Inc. High resolution etalon-grating monochromator
US6693939B2 (en) 2001-01-29 2004-02-17 Cymer, Inc. Laser lithography light source with beam delivery
US6914919B2 (en) 2000-06-19 2005-07-05 Cymer, Inc. Six to ten KHz, or greater gas discharge laser system
JP2002148121A (en) * 2000-11-09 2002-05-22 Mitsubishi Electric Corp Wavelength monitor, wavelength-stabilized light source using the same, and method of detecting wavelength
US6538737B2 (en) 2001-01-29 2003-03-25 Cymer, Inc. High resolution etalon-grating spectrometer
US6690704B2 (en) 2001-04-09 2004-02-10 Cymer, Inc. Control system for a two chamber gas discharge laser
US6621580B2 (en) 2001-05-08 2003-09-16 Precision Photonics Corporation Single etalon wavelength locker
JP2003214958A (en) * 2002-01-21 2003-07-30 Gigaphoton Inc Wavelength detecting device, laser device, and wavelength detecting method
US6798812B2 (en) 2002-01-23 2004-09-28 Cymer, Inc. Two chamber F2 laser system with F2 pressure based line selection
US7304748B2 (en) * 2003-06-26 2007-12-04 Cymer, Inc. Method and apparatus for bandwidth measurement and bandwidth parameter calculation for laser light
US6952267B2 (en) 2003-07-07 2005-10-04 Cymer, Inc. Method and apparatus for measuring bandwidth of a laser output
TWI263412B (en) 2003-06-26 2006-10-01 Cymer Inc Improved bandwidth estimation
WO2005033626A1 (en) * 2003-09-30 2005-04-14 Cymer, Inc. Gas discharge mopa laser spectral analysis module

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5373515A (en) * 1987-07-17 1994-12-13 Kabushiki Kaisha Komatsu Seisakusho Laser wavelength controlling apparatus
US5978394A (en) * 1998-03-11 1999-11-02 Cymer, Inc. Wavelength system for an excimer laser
US6320663B1 (en) * 1999-01-22 2001-11-20 Cymer, Inc. Method and device for spectral measurements of laser beam
US20020163650A1 (en) * 2000-10-10 2002-11-07 Tunable Photonics Corporation Method and system for locking transmission wavelengths for lasers in a dense wavelength division multiplexer

Also Published As

Publication number Publication date
KR20120089350A (en) 2012-08-09
JP2009505116A (en) 2009-02-05
EP1946054A2 (en) 2008-07-23
KR101280917B1 (en) 2013-07-02
JP5270363B2 (en) 2013-08-21
WO2008054346A2 (en) 2008-05-08
US7317536B2 (en) 2008-01-08
EP1946054A4 (en) 2011-11-16
JP2012198235A (en) 2012-10-18
KR101364005B1 (en) 2014-02-17
US20070013913A1 (en) 2007-01-18
JP5553860B2 (en) 2014-07-16
KR20080081890A (en) 2008-09-10

Similar Documents

Publication Publication Date Title
WO2008054346A3 (en) Improved spectral metrology for high repetition rate gas discharge laser
WO2005008295A3 (en) Optical bandwidth meter for very narrow bandwidth laser emitted light
WO2005001523A3 (en) Improved bandwidth estimation
WO2008137169A3 (en) Calibration of a radiometric optical monitoring system used for fault detection and process monitoring
CN111122496B (en) Calibration-free gas concentration measuring device and method
JPWO2003073127A1 (en) Weather observation lidar system
EP1041373A3 (en) Method and apparatus for calibrating an optical spectrum analyzer
WO2009051222A1 (en) Ultraviolet protection effect evaluation method, evaluation device, evaluation program, and recording medium where the program is recorded
US9631983B2 (en) Optical fiber temperature distribution measuring device
CN101923162B (en) Raman lidar calibration device and calibration method thereof
JP2009510480A (en) Calibration of two-line gas spectroscopy
WO2006036717A3 (en) Optical feedback from mode-selective tuner
TW200735493A (en) Active spectral control of DUV laser light source
FR2966292B1 (en) METHOD AND DEVICE FOR LASER EMISSION FOR SPECTROSCOPIC ANALYSIS OF A SAMPLE
US20230003653A1 (en) Stimulated raman spectroscopy for real-time, high- resolution molecular analysis of gases in hollow core fibres
JP2009505116A5 (en)
TW200734619A (en) Optical signal measurement system
JP6097698B2 (en) Optical amplifier and optical amplifier control method
WO2009066370A1 (en) Method for measuring deterioration state of output mirror in laser oscillator, and laser processing apparatus
WO2012001633A3 (en) Apparatus for the measurement of the gas concentration in a sealed container
Austin et al. Fibre optical sensor for C2H2 gas using gas-filled photonic bandgap fibre reference cell
WO2007091036A3 (en) Radiation thermometer
WO2011064806A3 (en) Method and apparatus for measurements of luminous isotropic radiation as obtained by means of laser spectroscopy techniques, in particular for sub- micrometric particulate measurements
JP2007516417A5 (en)
KR20060054202A (en) Method and apparatus for measuring bandwidth of an optical spectrum output of a very small wavelength very narrow bandwidth high power laser

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 2008542299

Country of ref document: JP

NENP Non-entry into the national phase

Ref country code: DE

WWE Wipo information: entry into national phase

Ref document number: 2006851603

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 1020087001729

Country of ref document: KR

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 06851603

Country of ref document: EP

Kind code of ref document: A2

WWE Wipo information: entry into national phase

Ref document number: 1020127016577

Country of ref document: KR