WO2008024480A3 - Method for cleaning diffraction gratings - Google Patents

Method for cleaning diffraction gratings Download PDF

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Publication number
WO2008024480A3
WO2008024480A3 PCT/US2007/018763 US2007018763W WO2008024480A3 WO 2008024480 A3 WO2008024480 A3 WO 2008024480A3 US 2007018763 W US2007018763 W US 2007018763W WO 2008024480 A3 WO2008024480 A3 WO 2008024480A3
Authority
WO
WIPO (PCT)
Prior art keywords
grating surface
rinsing
remove
ionized water
cleaning
Prior art date
Application number
PCT/US2007/018763
Other languages
French (fr)
Other versions
WO2008024480A2 (en
Inventor
Jerald A Britten
Hoang T Nguyen
Original Assignee
Univ California
Jerald A Britten
Hoang T Nguyen
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ California, Jerald A Britten, Hoang T Nguyen filed Critical Univ California
Publication of WO2008024480A2 publication Critical patent/WO2008024480A2/en
Publication of WO2008024480A3 publication Critical patent/WO2008024480A3/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

A method of cleaning a diffraction grating preferably includes exposing the grating surface to an aqueous base to remove an organic photoresist mask thereon; rinsing the grating surface with de-ionized water; oxidizing acid solution (such as Nanostrip™ or Nanostrip™ 2X) to remove metallic contaminants and residue organic compounds; rinsing the grating surface with de-ionized water; exposing the grating surface to an oxygen plasma ashing process using reactive oxygen species to oxidize and remove fluorinated hydrocarbon residue; exposing the grating surface again to an oxidizing acid solution to remove metallic contaminants and residue organic compounds; and rinsing the grating surface with de-ionized water.
PCT/US2007/018763 2006-08-23 2007-08-23 Method for cleaning diffraction gratings WO2008024480A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US83975306P 2006-08-23 2006-08-23
US60/839,753 2006-08-23

Publications (2)

Publication Number Publication Date
WO2008024480A2 WO2008024480A2 (en) 2008-02-28
WO2008024480A3 true WO2008024480A3 (en) 2008-06-19

Family

ID=39107441

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2007/018763 WO2008024480A2 (en) 2006-08-23 2007-08-23 Method for cleaning diffraction gratings

Country Status (2)

Country Link
US (1) US20080047584A1 (en)
WO (1) WO2008024480A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009135102A2 (en) * 2008-05-01 2009-11-05 Advanced Technology Materials, Inc. Low ph mixtures for the removal of high density implanted resist

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4740410A (en) * 1987-05-28 1988-04-26 The Regents Of The University Of California Micromechanical elements and methods for their fabrication
EP1402963A2 (en) * 2002-09-24 2004-03-31 Air Products And Chemicals, Inc. Processing of semiconductor components with dense processing fluids and ultrasonic energy

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8701759D0 (en) * 1987-01-27 1987-03-04 Laporte Industries Ltd Processing of semi-conductor materials
US5464480A (en) * 1993-07-16 1995-11-07 Legacy Systems, Inc. Process and apparatus for the treatment of semiconductor wafers in a fluid
JP3649771B2 (en) * 1995-05-15 2005-05-18 栗田工業株式会社 Cleaning method
US5989354A (en) * 1997-12-22 1999-11-23 Lucent Technologies, Inc. Method for removing thin, organic materials from semiconductor dies and micro-lenses
EP1194022B1 (en) * 1999-06-02 2006-11-02 Ibiden Co., Ltd. Multilayer printed wiring board and method of manufacturing multilayer printed wiring board
US6348100B1 (en) * 1999-07-01 2002-02-19 International Business Machines Corporation Resist bowl cleaning
AU4308101A (en) * 1999-12-02 2001-06-12 Cfmt, Inc. Apparatus for providing ozonated process fluid and methods for using same
US20040244423A1 (en) * 2003-03-28 2004-12-09 Hoya Corporation Method of manufacturing an optical glass element

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4740410A (en) * 1987-05-28 1988-04-26 The Regents Of The University Of California Micromechanical elements and methods for their fabrication
EP1402963A2 (en) * 2002-09-24 2004-03-31 Air Products And Chemicals, Inc. Processing of semiconductor components with dense processing fluids and ultrasonic energy

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
KECK J ET. AL.: "Manufacture and development of multilayer diffraction gratings", PROCEEDINGS OF SPIE, LASER-INDUCED DAMAGE IN OPTICAL MATERIALS, vol. 5991, 2005, Boulder, CO, United States, pages 59911G-1 - 59911G-6, XP002473850 *

Also Published As

Publication number Publication date
WO2008024480A2 (en) 2008-02-28
US20080047584A1 (en) 2008-02-28

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