WO2007132320A3 - Template having a varying thickness - Google Patents

Template having a varying thickness Download PDF

Info

Publication number
WO2007132320A3
WO2007132320A3 PCT/IB2007/001202 IB2007001202W WO2007132320A3 WO 2007132320 A3 WO2007132320 A3 WO 2007132320A3 IB 2007001202 W IB2007001202 W IB 2007001202W WO 2007132320 A3 WO2007132320 A3 WO 2007132320A3
Authority
WO
WIPO (PCT)
Prior art keywords
region
superimposition
distance
template
varying thickness
Prior art date
Application number
PCT/IB2007/001202
Other languages
French (fr)
Other versions
WO2007132320A2 (en
Inventor
Doublas J Resnick
Mario J Maissl
Byung-Jin Choi
Sidigata V Sreenivasan
Original Assignee
Molecular Imprints Inc
Doublas J Resnick
Mario J Maissl
Byung-Jin Choi
Sidigata V Sreenivasan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Molecular Imprints Inc, Doublas J Resnick, Mario J Maissl, Byung-Jin Choi, Sidigata V Sreenivasan filed Critical Molecular Imprints Inc
Priority to JP2009508538A priority Critical patent/JP5139421B2/en
Priority to KR1020087013900A priority patent/KR101494282B1/en
Priority to EP07734513.0A priority patent/EP2016613B1/en
Publication of WO2007132320A2 publication Critical patent/WO2007132320A2/en
Publication of WO2007132320A3 publication Critical patent/WO2007132320A3/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)

Abstract

A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region.
PCT/IB2007/001202 2006-05-11 2007-05-09 Template having a varying thickness WO2007132320A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2009508538A JP5139421B2 (en) 2006-05-11 2007-05-09 Template with varying thickness
KR1020087013900A KR101494282B1 (en) 2006-05-11 2007-05-09 Template having a varying thickness
EP07734513.0A EP2016613B1 (en) 2006-05-11 2007-05-09 Nanoimprint Lithography System

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US79949606P 2006-05-11 2006-05-11
US60/799,496 2006-05-11

Publications (2)

Publication Number Publication Date
WO2007132320A2 WO2007132320A2 (en) 2007-11-22
WO2007132320A3 true WO2007132320A3 (en) 2009-04-23

Family

ID=38694274

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB2007/001202 WO2007132320A2 (en) 2006-05-11 2007-05-09 Template having a varying thickness

Country Status (6)

Country Link
US (4) US20080160129A1 (en)
EP (1) EP2016613B1 (en)
JP (1) JP5139421B2 (en)
KR (1) KR101494282B1 (en)
TW (1) TWI388934B (en)
WO (1) WO2007132320A2 (en)

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