WO2007120304A3 - Optical proximity correction on hardware or software platforms with graphical processing units - Google Patents

Optical proximity correction on hardware or software platforms with graphical processing units Download PDF

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Publication number
WO2007120304A3
WO2007120304A3 PCT/US2006/061518 US2006061518W WO2007120304A3 WO 2007120304 A3 WO2007120304 A3 WO 2007120304A3 US 2006061518 W US2006061518 W US 2006061518W WO 2007120304 A3 WO2007120304 A3 WO 2007120304A3
Authority
WO
WIPO (PCT)
Prior art keywords
hardware
processing units
optical proximity
proximity correction
software platforms
Prior art date
Application number
PCT/US2006/061518
Other languages
French (fr)
Other versions
WO2007120304A2 (en
Inventor
Ilhami H Torunoglu
Ahmet Karakas
Original Assignee
Gauda Inc
Ilhami H Torunoglu
Ahmet Karakas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gauda Inc, Ilhami H Torunoglu, Ahmet Karakas filed Critical Gauda Inc
Publication of WO2007120304A2 publication Critical patent/WO2007120304A2/en
Publication of WO2007120304A3 publication Critical patent/WO2007120304A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes

Abstract

Optical proximity correction techniques performed on one or more graphics processors improve the masks used for the printing of microelectronic circuit designs. Execution of OPC techniques on hardware or software platforms utilizing graphics processing units. GPUs may share the computation load with the system CPUs to efficiently and effectively execute the OPC method steps.
PCT/US2006/061518 2005-12-02 2006-12-01 Optical proximity correction on hardware or software platforms with graphical processing units WO2007120304A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US74168705P 2005-12-02 2005-12-02
US60/741,687 2005-12-02

Publications (2)

Publication Number Publication Date
WO2007120304A2 WO2007120304A2 (en) 2007-10-25
WO2007120304A3 true WO2007120304A3 (en) 2007-12-21

Family

ID=38609991

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2006/061518 WO2007120304A2 (en) 2005-12-02 2006-12-01 Optical proximity correction on hardware or software platforms with graphical processing units

Country Status (2)

Country Link
TW (1) TWI322953B (en)
WO (1) WO2007120304A2 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8578313B2 (en) * 2008-04-24 2013-11-05 Synopsys, Inc. Pattern-clip-based hotspot database system for layout verification
TWI448916B (en) * 2009-07-30 2014-08-11 United Microelectronics Corp Method for correcting layout pattern
TWI498698B (en) * 2014-03-27 2015-09-01 Genesis Technology Inc User interface and computer program product
US9772850B2 (en) 2014-11-14 2017-09-26 Intel Corporation Morton coordinate adjustment processors, methods, systems, and instructions
US9772849B2 (en) 2014-11-14 2017-09-26 Intel Corporation Four-dimensional morton coordinate conversion processors, methods, systems, and instructions
US9772848B2 (en) 2014-11-14 2017-09-26 Intel Corporation Three-dimensional morton coordinate conversion processors, methods, systems, and instructions

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5553274A (en) * 1995-04-17 1996-09-03 International Business Machines Corporation Vertex minimization in a smart optical proximity correction system
US5682323A (en) * 1995-03-06 1997-10-28 Lsi Logic Corporation System and method for performing optical proximity correction on macrocell libraries
US5723233A (en) * 1996-02-27 1998-03-03 Lsi Logic Corporation Optical proximity correction method and apparatus
US6467076B1 (en) * 1999-04-30 2002-10-15 Nicolas Bailey Cobb Method and apparatus for submicron IC design
US20050138594A1 (en) * 2003-12-17 2005-06-23 Mentor Graphics Corporation Mask creation with hierarchy management using cover cells
US20060242618A1 (en) * 2005-02-14 2006-10-26 Yao-Ting Wang Lithographic simulations using graphical processing units

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5682323A (en) * 1995-03-06 1997-10-28 Lsi Logic Corporation System and method for performing optical proximity correction on macrocell libraries
US5553274A (en) * 1995-04-17 1996-09-03 International Business Machines Corporation Vertex minimization in a smart optical proximity correction system
US5723233A (en) * 1996-02-27 1998-03-03 Lsi Logic Corporation Optical proximity correction method and apparatus
US6467076B1 (en) * 1999-04-30 2002-10-15 Nicolas Bailey Cobb Method and apparatus for submicron IC design
US20050138594A1 (en) * 2003-12-17 2005-06-23 Mentor Graphics Corporation Mask creation with hierarchy management using cover cells
US20060242618A1 (en) * 2005-02-14 2006-10-26 Yao-Ting Wang Lithographic simulations using graphical processing units

Also Published As

Publication number Publication date
TW200739377A (en) 2007-10-16
WO2007120304A2 (en) 2007-10-25
TWI322953B (en) 2010-04-01

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