WO2007103302A3 - Weighting function of enhance measured diffraction signals in optical metrology - Google Patents

Weighting function of enhance measured diffraction signals in optical metrology Download PDF

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Publication number
WO2007103302A3
WO2007103302A3 PCT/US2007/005573 US2007005573W WO2007103302A3 WO 2007103302 A3 WO2007103302 A3 WO 2007103302A3 US 2007005573 W US2007005573 W US 2007005573W WO 2007103302 A3 WO2007103302 A3 WO 2007103302A3
Authority
WO
WIPO (PCT)
Prior art keywords
weighting function
measured diffraction
optical metrology
diffraction signals
diffraction signal
Prior art date
Application number
PCT/US2007/005573
Other languages
French (fr)
Other versions
WO2007103302A2 (en
Inventor
Vi Vuong
Junwei Bao
Shifang Li
Yan Chen
Original Assignee
Tokyo Electron Ltd
Vi Vuong
Junwei Bao
Shifang Li
Yan Chen
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd, Vi Vuong, Junwei Bao, Shifang Li, Yan Chen filed Critical Tokyo Electron Ltd
Priority to JP2008558331A priority Critical patent/JP2009529138A/en
Priority to KR1020087024628A priority patent/KR101387868B1/en
Priority to CN2007800082940A priority patent/CN101401080B/en
Publication of WO2007103302A2 publication Critical patent/WO2007103302A2/en
Publication of WO2007103302A3 publication Critical patent/WO2007103302A3/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F15/00—Digital computers in general; Data processing equipment in general

Abstract

A weighting function is obtained to enhance measured diffraction signals used in optical metrology. To obtain the weighting function, a measured diffraction signal is obtained. The measured diffraction signal was measured from a site on a wafer using a photometric device. A first weighting function is defined based on noise that exists in the measured diffraction signal. A second weighting function is defined based on accuracy of the measured diffraction signal. A third weighting function is defined based on sensitivity of the measured diffraction signal. A fourth weighting function is defined based on one or more of the first, second, and third weighting functions.
PCT/US2007/005573 2006-03-08 2007-03-05 Weighting function of enhance measured diffraction signals in optical metrology WO2007103302A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2008558331A JP2009529138A (en) 2006-03-08 2007-03-05 Weighting function to enhance the measured diffraction signal in optical measurement methods.
KR1020087024628A KR101387868B1 (en) 2006-03-08 2007-03-05 Method of obtaining and using a weighting function of enhance measured diffraction signals in optical metrology, and system to use the weighting function
CN2007800082940A CN101401080B (en) 2006-03-08 2007-03-05 Weighting function of enhance measured diffraction signals in optical metrology

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/371,752 US7523021B2 (en) 2006-03-08 2006-03-08 Weighting function to enhance measured diffraction signals in optical metrology
US11/371,752 2006-03-08

Publications (2)

Publication Number Publication Date
WO2007103302A2 WO2007103302A2 (en) 2007-09-13
WO2007103302A3 true WO2007103302A3 (en) 2008-08-28

Family

ID=38475463

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2007/005573 WO2007103302A2 (en) 2006-03-08 2007-03-05 Weighting function of enhance measured diffraction signals in optical metrology

Country Status (6)

Country Link
US (1) US7523021B2 (en)
JP (1) JP2009529138A (en)
KR (1) KR101387868B1 (en)
CN (1) CN101401080B (en)
TW (1) TWI375289B (en)
WO (1) WO2007103302A2 (en)

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US7525673B2 (en) * 2006-07-10 2009-04-28 Tokyo Electron Limited Optimizing selected variables of an optical metrology system
US7428044B2 (en) * 2006-11-16 2008-09-23 Tokyo Electron Limited Drift compensation for an optical metrology tool
US8275584B2 (en) * 2006-12-12 2012-09-25 Taiwan Semiconductor Manufacturing Company, Ltd. Unified model for process variations in integrated circuits
US7372583B1 (en) 2007-04-12 2008-05-13 Tokyo Electron Limited Controlling a fabrication tool using support vector machine
US7627392B2 (en) * 2007-08-30 2009-12-01 Tokyo Electron Limited Automated process control using parameters determined with approximation and fine diffraction models
US8069020B2 (en) * 2007-09-19 2011-11-29 Tokyo Electron Limited Generating simulated diffraction signal using a dispersion function relating process parameter to dispersion
US7636649B2 (en) * 2007-09-21 2009-12-22 Tokyo Electron Limited Automated process control of a fabrication tool using a dispersion function relating process parameter to dispersion
JP5637836B2 (en) * 2010-12-17 2014-12-10 株式会社キーエンス Optical displacement meter
US8381140B2 (en) * 2011-02-11 2013-02-19 Tokyo Electron Limited Wide process range library for metrology
US10354929B2 (en) * 2012-05-08 2019-07-16 Kla-Tencor Corporation Measurement recipe optimization based on spectral sensitivity and process variation
JP6353831B2 (en) 2012-06-26 2018-07-04 ケーエルエー−テンカー コーポレイション Algorithmic removal from scanning and diffraction optical measurements in angle-resolved reflectometry
US9490182B2 (en) * 2013-12-23 2016-11-08 Kla-Tencor Corporation Measurement of multiple patterning parameters
JP6269213B2 (en) * 2014-03-19 2018-01-31 アイシン精機株式会社 Distance measuring device and distance measuring method
NL2017857A (en) 2015-12-18 2017-06-26 Asml Netherlands Bv Process flagging and cluster detection without requiring reconstruction
CN108120371A (en) * 2016-11-30 2018-06-05 中国科学院福建物质结构研究所 Sub-wavelength dimensions microelectronic structure optical critical dimension method for testing and analyzing and device
IL253578B (en) 2017-07-19 2018-06-28 Nova Measuring Instr Ltd X-ray based measurements in patterned structure
US11422095B2 (en) * 2019-01-18 2022-08-23 Kla Corporation Scatterometry modeling in the presence of undesired diffraction orders

Citations (2)

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Publication number Priority date Publication date Assignee Title
US5525808A (en) * 1992-01-23 1996-06-11 Nikon Corporaton Alignment method and alignment apparatus with a statistic calculation using a plurality of weighted coordinate positions
US20040017575A1 (en) * 2002-07-25 2004-01-29 Raghu Balasubramanian Optimized model and parameter selection for optical metrology

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EP1257781A4 (en) * 2000-01-26 2006-12-13 Timbre Tech Inc Caching of intra-layer calculations for rapid rigorous coupled-wave analyses
US6943900B2 (en) * 2000-09-15 2005-09-13 Timbre Technologies, Inc. Generation of a library of periodic grating diffraction signals
US6785638B2 (en) * 2001-08-06 2004-08-31 Timbre Technologies, Inc. Method and system of dynamic learning through a regression-based library generation process
US7330279B2 (en) * 2002-07-25 2008-02-12 Timbre Technologies, Inc. Model and parameter selection for optical metrology
US20040267397A1 (en) * 2003-06-27 2004-12-30 Srinivas Doddi Optical metrology of structures formed on semiconductor wafer using machine learning systems
US7328126B2 (en) * 2003-09-12 2008-02-05 Tokyo Electron Limited Method and system of diagnosing a processing system using adaptive multivariate analysis

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5525808A (en) * 1992-01-23 1996-06-11 Nikon Corporaton Alignment method and alignment apparatus with a statistic calculation using a plurality of weighted coordinate positions
US20040017575A1 (en) * 2002-07-25 2004-01-29 Raghu Balasubramanian Optimized model and parameter selection for optical metrology

Also Published As

Publication number Publication date
CN101401080B (en) 2012-03-21
JP2009529138A (en) 2009-08-13
CN101401080A (en) 2009-04-01
KR20090009797A (en) 2009-01-23
US7523021B2 (en) 2009-04-21
WO2007103302A2 (en) 2007-09-13
TWI375289B (en) 2012-10-21
US20070211260A1 (en) 2007-09-13
KR101387868B1 (en) 2014-04-22
TW200746335A (en) 2007-12-16

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