WO2007097046A1 - シリコン粒子の処理方法及び装置 - Google Patents
シリコン粒子の処理方法及び装置 Download PDFInfo
- Publication number
- WO2007097046A1 WO2007097046A1 PCT/JP2006/308613 JP2006308613W WO2007097046A1 WO 2007097046 A1 WO2007097046 A1 WO 2007097046A1 JP 2006308613 W JP2006308613 W JP 2006308613W WO 2007097046 A1 WO2007097046 A1 WO 2007097046A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- filter
- filter cloth
- silicon particles
- tank
- mixed solution
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/037—Purification
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D24/00—Filters comprising loose filtering material, i.e. filtering material without any binder between the individual particles or fibres thereof
- B01D24/38—Feed or discharge devices
- B01D24/44—Feed or discharge devices for discharging filter cake, e.g. chutes
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Silicon Compounds (AREA)
- Filtration Of Liquid (AREA)
Abstract
Description
Claims
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/280,169 US20090274596A1 (en) | 2006-02-24 | 2006-04-25 | Method and apparatus for processing silicon particles |
KR1020087022682A KR101323765B1 (ko) | 2006-02-24 | 2006-04-25 | 실리콘입자의 처리방법 및 장치 |
JP2008501601A JPWO2007097046A1 (ja) | 2006-02-24 | 2006-04-25 | シリコン粒子の処理方法及び装置 |
CN2006800543209A CN101426723B (zh) | 2006-02-24 | 2006-04-25 | 硅粒的处理方法和装置 |
HK09107584.8A HK1129649A1 (en) | 2006-02-24 | 2009-08-18 | Method and apparatus for treating silicon particle |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006-048905 | 2006-02-24 | ||
JP2006048905 | 2006-02-24 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2007097046A1 true WO2007097046A1 (ja) | 2007-08-30 |
Family
ID=38437104
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2006/308613 WO2007097046A1 (ja) | 2006-02-24 | 2006-04-25 | シリコン粒子の処理方法及び装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20090274596A1 (ja) |
JP (1) | JPWO2007097046A1 (ja) |
KR (1) | KR101323765B1 (ja) |
CN (1) | CN101426723B (ja) |
HK (1) | HK1129649A1 (ja) |
WO (1) | WO2007097046A1 (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009146591A1 (zh) * | 2008-06-05 | 2009-12-10 | 佳科太阳能硅(厦门)有限公司 | 湿法冶硅的废酸回收处理方法 |
WO2010093026A1 (ja) * | 2009-02-16 | 2010-08-19 | 株式会社クラレ | ろ過装置およびその製造方法 |
JP2010540392A (ja) * | 2007-10-03 | 2010-12-24 | 6エヌ シリコン インコーポレイテッド | シリコン結晶を得るためのシリコン粉末の処理方法 |
JP2011036855A (ja) * | 2009-08-07 | 2011-02-24 | Brunob Ii Bv | 濾過ケークの回収方法、およびケーク形成・洗浄濾過用装置 |
WO2011162012A1 (ja) * | 2010-06-22 | 2011-12-29 | 株式会社Sumco | シリコン系太陽電池用原料の製造方法 |
CN115193101A (zh) * | 2021-04-09 | 2022-10-18 | 中国矿业大学 | 一种线切冷却液回收方法 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100985861B1 (ko) * | 2008-09-24 | 2010-10-08 | 씨앤지하이테크 주식회사 | 반도체용 슬러리 공급장치 및 슬러리 공급방법 |
SG172435A1 (en) * | 2008-12-31 | 2011-07-28 | Memc Singapore Pte Ltd | Methods to recover and purify silicon particles from saw kerf |
KR101408245B1 (ko) * | 2012-11-20 | 2014-06-23 | 남서울대학교 산학협력단 | 폐오일 여과 시스템 클리닝 방법 |
JP2016198841A (ja) * | 2015-04-09 | 2016-12-01 | 株式会社クラレ | シリコン回収方法及びシリコン回収装置 |
EP3434646A1 (en) * | 2017-07-25 | 2019-01-30 | Total Solar International | Method for recycling sub-micron si-particles from a si wafer production process |
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JP2002153708A (ja) * | 1999-05-27 | 2002-05-28 | Sanyo Electric Co Ltd | 被除去物の再利用方法 |
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-
2006
- 2006-04-25 WO PCT/JP2006/308613 patent/WO2007097046A1/ja active Application Filing
- 2006-04-25 US US12/280,169 patent/US20090274596A1/en not_active Abandoned
- 2006-04-25 JP JP2008501601A patent/JPWO2007097046A1/ja not_active Withdrawn
- 2006-04-25 CN CN2006800543209A patent/CN101426723B/zh not_active Expired - Fee Related
- 2006-04-25 KR KR1020087022682A patent/KR101323765B1/ko active IP Right Grant
-
2009
- 2009-08-18 HK HK09107584.8A patent/HK1129649A1/xx not_active IP Right Cessation
Patent Citations (3)
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JPH09165212A (ja) * | 1995-12-15 | 1997-06-24 | Kawasaki Steel Corp | 太陽電池用シリコン原料粉および太陽電池用シリコンインゴットの製造方法 |
JP2002153708A (ja) * | 1999-05-27 | 2002-05-28 | Sanyo Electric Co Ltd | 被除去物の再利用方法 |
JP2002001244A (ja) * | 2000-06-27 | 2002-01-08 | Mitsubishi Materials Silicon Corp | 粒状半導体材料洗浄装置 |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010540392A (ja) * | 2007-10-03 | 2010-12-24 | 6エヌ シリコン インコーポレイテッド | シリコン結晶を得るためのシリコン粉末の処理方法 |
US8801855B2 (en) | 2007-10-03 | 2014-08-12 | Silicor Materials Inc. | Method for processing silicon powder to obtain silicon crystals |
WO2009146591A1 (zh) * | 2008-06-05 | 2009-12-10 | 佳科太阳能硅(厦门)有限公司 | 湿法冶硅的废酸回收处理方法 |
US9050563B2 (en) | 2009-02-16 | 2015-06-09 | Kuraray Co., Ltd. | Filtering device and method of manufacturing same |
KR20110126624A (ko) * | 2009-02-16 | 2011-11-23 | 가부시키가이샤 구라레 | 여과 장치 및 그 제조 방법 |
CN102316953A (zh) * | 2009-02-16 | 2012-01-11 | 株式会社可乐丽 | 过滤装置及其制造方法 |
JP2010207800A (ja) * | 2009-02-16 | 2010-09-24 | Kuraray Co Ltd | ろ過ユニットおよびこれを備えたろ過装置 |
WO2010093026A1 (ja) * | 2009-02-16 | 2010-08-19 | 株式会社クラレ | ろ過装置およびその製造方法 |
KR101717307B1 (ko) * | 2009-02-16 | 2017-03-16 | 주식회사 쿠라레 | 여과 장치 및 그 제조 방법 |
JP2011036855A (ja) * | 2009-08-07 | 2011-02-24 | Brunob Ii Bv | 濾過ケークの回収方法、およびケーク形成・洗浄濾過用装置 |
WO2011162012A1 (ja) * | 2010-06-22 | 2011-12-29 | 株式会社Sumco | シリコン系太陽電池用原料の製造方法 |
CN115193101A (zh) * | 2021-04-09 | 2022-10-18 | 中国矿业大学 | 一种线切冷却液回收方法 |
CN115193101B (zh) * | 2021-04-09 | 2024-02-13 | 中国矿业大学 | 一种线切冷却液回收方法 |
Also Published As
Publication number | Publication date |
---|---|
KR101323765B1 (ko) | 2013-10-31 |
CN101426723B (zh) | 2011-12-14 |
KR20080104318A (ko) | 2008-12-02 |
CN101426723A (zh) | 2009-05-06 |
JPWO2007097046A1 (ja) | 2009-07-09 |
HK1129649A1 (en) | 2009-12-04 |
US20090274596A1 (en) | 2009-11-05 |
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