WO2007081913A3 - Surface plasmon enhanced radiation methods and apparatus - Google Patents

Surface plasmon enhanced radiation methods and apparatus Download PDF

Info

Publication number
WO2007081913A3
WO2007081913A3 PCT/US2007/000458 US2007000458W WO2007081913A3 WO 2007081913 A3 WO2007081913 A3 WO 2007081913A3 US 2007000458 W US2007000458 W US 2007000458W WO 2007081913 A3 WO2007081913 A3 WO 2007081913A3
Authority
WO
WIPO (PCT)
Prior art keywords
surface plasmon
plasmon enhanced
enhanced radiation
radiation
spei
Prior art date
Application number
PCT/US2007/000458
Other languages
French (fr)
Other versions
WO2007081913A2 (en
Inventor
Peter Randolph Hazard Stark
Original Assignee
Harvard College
Peter Randolph Hazard Stark
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Harvard College, Peter Randolph Hazard Stark filed Critical Harvard College
Priority to US12/087,301 priority Critical patent/US20090146081A1/en
Publication of WO2007081913A2 publication Critical patent/WO2007081913A2/en
Publication of WO2007081913A3 publication Critical patent/WO2007081913A3/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/008—Surface plasmon devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/18—SNOM [Scanning Near-Field Optical Microscopy] or apparatus therefor, e.g. SNOM probes
    • G01Q60/22—Probes, their manufacture, or their related instrumentation, e.g. holders
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/002—Scanning microscopes
    • G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
    • G02B21/0052—Optical details of the image generation
    • G02B21/0072—Optical details of the image generation details concerning resolution or correction, including general design of CSOM objectives
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/1226—Basic optical elements, e.g. light-guiding paths involving surface plasmon interaction
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00—Function characteristic
    • G02F2203/12—Function characteristic spatial light modulator
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18305—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] with emission through the substrate, i.e. bottom emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18386—Details of the emission surface for influencing the near- or far-field, e.g. a grating on the surface
    • H01S5/18388—Lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/42—Arrays of surface emitting lasers
    • H01S5/423—Arrays of surface emitting lasers having a vertical cavity

Abstract

Methods and apparatus in which a plurality of independently controllable surface emitting lasers (SELs) are controlled to generate radiation that irradiates a plurality of surface plasmon enhanced illumination (SPEI) apparatus. The irradiated SPEI apparatus in turn generate surface plasmon enhanced radiation that may be employed for a variety of applications, including maskless (i.e., 'direct write') photolithography techniques in which a photoresist is exposed to individually controllable beams of surface plasmon enhanced radiation.
PCT/US2007/000458 2006-01-06 2007-01-05 Surface plasmon enhanced radiation methods and apparatus WO2007081913A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US12/087,301 US20090146081A1 (en) 2006-01-06 2007-01-05 Surface Plasmon Enhanced Radiation Methods and Apparatus

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US75721506P 2006-01-06 2006-01-06
US60/757,215 2006-01-06
US75739206P 2006-01-09 2006-01-09
US60/757,392 2006-01-09

Publications (2)

Publication Number Publication Date
WO2007081913A2 WO2007081913A2 (en) 2007-07-19
WO2007081913A3 true WO2007081913A3 (en) 2007-12-06

Family

ID=38222198

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2007/000458 WO2007081913A2 (en) 2006-01-06 2007-01-05 Surface plasmon enhanced radiation methods and apparatus

Country Status (2)

Country Link
US (1) US20090146081A1 (en)
WO (1) WO2007081913A2 (en)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006019963B4 (en) * 2006-04-28 2023-12-07 Envisiontec Gmbh Device and method for producing a three-dimensional object by layer-by-layer solidifying a material that can be solidified under the influence of electromagnetic radiation using mask exposure
US8111440B2 (en) * 2007-04-26 2012-02-07 Hewlett-Packard Development Company, L.P. Structure and method for modulating light
WO2009023489A1 (en) * 2007-08-14 2009-02-19 Massachusetts Institute Of Technology Nanoscale imaging via absorption modulation
US20090145742A1 (en) * 2007-12-11 2009-06-11 Northwestern University Energy transfer through surface plasmon resonance excitation on multisegmented nanowires
JP2010027743A (en) * 2008-07-16 2010-02-04 Ebara Corp Glass substrate for imprint, resist pattern forming method, and method and apparatus for inspecting glass substrate for imprint
WO2010088418A1 (en) 2009-01-29 2010-08-05 The Regents Of The University Of California High resolution structured illumination microscopy
US20120006981A1 (en) * 2009-03-31 2012-01-12 Imec Waveguide integrated photodetector
US8965208B2 (en) * 2009-05-22 2015-02-24 Kotura, Inc. Multi-channel optical device
US8865402B2 (en) * 2009-08-26 2014-10-21 Clemson University Research Foundation Nanostructured substrates for surface enhanced raman spectroscopy (SERS) and detection of biological and chemical analytes by electrical double layer (EDL) capacitance
US9297955B2 (en) * 2009-10-02 2016-03-29 Lehigh University Plasmonic interferometer sensor
US8335999B2 (en) * 2010-06-11 2012-12-18 Orbotech Ltd. System and method for optical shearing
US9627434B2 (en) * 2013-01-04 2017-04-18 California Institute Of Technology System and method for color imaging with integrated plasmonic color filters
CN104518835B (en) * 2013-10-08 2019-07-23 中兴通讯股份有限公司 A kind of reception device of visible light communication mimo system
CN105522278B (en) * 2016-01-09 2017-06-06 长春理工大学 Laser light transmission grid raw glass substrate Aided Machine scoring device and method
US9667034B1 (en) * 2016-06-27 2017-05-30 Elwha Llc Enhanced photoluminescence
WO2018008029A1 (en) * 2016-07-07 2018-01-11 Bar-Ilan University Micron-size plasmonic color sorter
US10254626B2 (en) * 2016-11-10 2019-04-09 Elwha Llc Coherent upconversion of light
US10295741B2 (en) * 2017-03-31 2019-05-21 Nokia Solutions And Networks Oy Single mode grating coupler with vertical coupling direction and small back reflection
CN108614130B (en) * 2018-04-20 2023-08-25 华中科技大学 Transmission-enhanced nano annular near-field optical probe and preparation method thereof
CN114364115B (en) * 2022-01-17 2023-10-27 中国航天空气动力技术研究院 Transverse wave excited plasma array generator
WO2024059476A1 (en) * 2022-09-12 2024-03-21 Nishikant Sonwalkar System and method for plasmonic spectral conversion using nano-holes and nano-disks

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5973316A (en) * 1997-07-08 1999-10-26 Nec Research Institute, Inc. Sub-wavelength aperture arrays with enhanced light transmission
US20020056816A1 (en) * 2000-10-17 2002-05-16 Stark Peter Randolph Hazard Surface plasmon enhanced illumination system
WO2003019245A2 (en) * 2001-08-31 2003-03-06 Universite Louis Pasteur Optical transmission apparatus with directionality and divergence control
US6834027B1 (en) * 2000-02-28 2004-12-21 Nec Laboratories America, Inc. Surface plasmon-enhanced read/write heads for optical data storage media

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5973316A (en) * 1997-07-08 1999-10-26 Nec Research Institute, Inc. Sub-wavelength aperture arrays with enhanced light transmission
US6834027B1 (en) * 2000-02-28 2004-12-21 Nec Laboratories America, Inc. Surface plasmon-enhanced read/write heads for optical data storage media
US20020056816A1 (en) * 2000-10-17 2002-05-16 Stark Peter Randolph Hazard Surface plasmon enhanced illumination system
WO2003019245A2 (en) * 2001-08-31 2003-03-06 Universite Louis Pasteur Optical transmission apparatus with directionality and divergence control

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
THIO T ET AL: "Strongly enhanced optical transmission through subwavelength holes in metal films", PHYSICA B. CONDENSED MATTER, AMSTERDAM, NL, vol. 279, 2000, pages 90 - 93, XP002236331, ISSN: 0921-4526 *

Also Published As

Publication number Publication date
WO2007081913A2 (en) 2007-07-19
US20090146081A1 (en) 2009-06-11

Similar Documents

Publication Publication Date Title
WO2007081913A3 (en) Surface plasmon enhanced radiation methods and apparatus
ATE544094T1 (en) COMPOUND FOR USE IN A PHOTOSENSITIVE COMPOSITION
TW200634442A (en) Pattern exposure method and apparatus
EP3211121A3 (en) Method for removal of carbon from an organosilicate material
TW200617616A (en) Lithographic apparatus and device manufacturing method
JP2009055062A5 (en)
SG146599A1 (en) Lithographic apparatus and method
WO2007059294A3 (en) Process for pulsed uv curing of coatings on wood
WO2006081221A3 (en) Phototherapy treatment devices for applying area lighting to a wound
WO2008120785A1 (en) Exposure apparatus and exposure method
ATE532105T1 (en) LIGHTING METHOD
TW200634443A (en) Exposure apparatus and exposing method and method of manufacturing a printed wiring board
MX2008002439A (en) Absorbent articles comprising surface cross-linked superabsorbent polymer particles made by a method using ultraviolet radiation.
TW200721285A (en) Laser processing method for wafer
WO2007146082A3 (en) Molded polymer comprising silicone and at least one metal trace and a process of manufacturing the same
SG132661A1 (en) Illumination system
TW200739248A (en) Photomask, method for manufacturing such photomask, pattern forming method using such photomask and mask data creating method
TW200632552A (en) Process for producing resist pattern and conductor pattern
WO2005064401A3 (en) Lithographic apparatus having a debris-mitigation system, a source for producing euv radiation having a debris mitigation system and a method for mitigating debris
ATE509664T1 (en) DEVICE FOR PERFORMING AESTHETIC TREATMENTS
TW200739213A (en) Method for patterning alignment layer
WO2007076184A3 (en) Method and apparatus for intensity control of multiple light sources
WO2011000357A3 (en) Method and device for the deposition of thin layers
WO2010094696A3 (en) Nano plasmonic parallel lithography
ATE537484T1 (en) SYSTEMS AND METHODS FOR UV LITHOGRAPHY

Legal Events

Date Code Title Description
NENP Non-entry into the national phase

Ref country code: DE

WWE Wipo information: entry into national phase

Ref document number: 12087301

Country of ref document: US

122 Ep: pct application non-entry in european phase

Ref document number: 07716436

Country of ref document: EP

Kind code of ref document: A2