WO2007081913A3 - Surface plasmon enhanced radiation methods and apparatus - Google Patents
Surface plasmon enhanced radiation methods and apparatus Download PDFInfo
- Publication number
- WO2007081913A3 WO2007081913A3 PCT/US2007/000458 US2007000458W WO2007081913A3 WO 2007081913 A3 WO2007081913 A3 WO 2007081913A3 US 2007000458 W US2007000458 W US 2007000458W WO 2007081913 A3 WO2007081913 A3 WO 2007081913A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- surface plasmon
- plasmon enhanced
- enhanced radiation
- radiation
- spei
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/008—Surface plasmon devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
- G01Q60/18—SNOM [Scanning Near-Field Optical Microscopy] or apparatus therefor, e.g. SNOM probes
- G01Q60/22—Probes, their manufacture, or their related instrumentation, e.g. holders
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0004—Microscopes specially adapted for specific applications
- G02B21/002—Scanning microscopes
- G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
- G02B21/0052—Optical details of the image generation
- G02B21/0072—Optical details of the image generation details concerning resolution or correction, including general design of CSOM objectives
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/1226—Basic optical elements, e.g. light-guiding paths involving surface plasmon interaction
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2203/00—Function characteristic
- G02F2203/12—Function characteristic spatial light modulator
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18305—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] with emission through the substrate, i.e. bottom emission
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18386—Details of the emission surface for influencing the near- or far-field, e.g. a grating on the surface
- H01S5/18388—Lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/42—Arrays of surface emitting lasers
- H01S5/423—Arrays of surface emitting lasers having a vertical cavity
Abstract
Methods and apparatus in which a plurality of independently controllable surface emitting lasers (SELs) are controlled to generate radiation that irradiates a plurality of surface plasmon enhanced illumination (SPEI) apparatus. The irradiated SPEI apparatus in turn generate surface plasmon enhanced radiation that may be employed for a variety of applications, including maskless (i.e., 'direct write') photolithography techniques in which a photoresist is exposed to individually controllable beams of surface plasmon enhanced radiation.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/087,301 US20090146081A1 (en) | 2006-01-06 | 2007-01-05 | Surface Plasmon Enhanced Radiation Methods and Apparatus |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US75721506P | 2006-01-06 | 2006-01-06 | |
US60/757,215 | 2006-01-06 | ||
US75739206P | 2006-01-09 | 2006-01-09 | |
US60/757,392 | 2006-01-09 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2007081913A2 WO2007081913A2 (en) | 2007-07-19 |
WO2007081913A3 true WO2007081913A3 (en) | 2007-12-06 |
Family
ID=38222198
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2007/000458 WO2007081913A2 (en) | 2006-01-06 | 2007-01-05 | Surface plasmon enhanced radiation methods and apparatus |
Country Status (2)
Country | Link |
---|---|
US (1) | US20090146081A1 (en) |
WO (1) | WO2007081913A2 (en) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102006019963B4 (en) * | 2006-04-28 | 2023-12-07 | Envisiontec Gmbh | Device and method for producing a three-dimensional object by layer-by-layer solidifying a material that can be solidified under the influence of electromagnetic radiation using mask exposure |
US8111440B2 (en) * | 2007-04-26 | 2012-02-07 | Hewlett-Packard Development Company, L.P. | Structure and method for modulating light |
WO2009023489A1 (en) * | 2007-08-14 | 2009-02-19 | Massachusetts Institute Of Technology | Nanoscale imaging via absorption modulation |
US20090145742A1 (en) * | 2007-12-11 | 2009-06-11 | Northwestern University | Energy transfer through surface plasmon resonance excitation on multisegmented nanowires |
JP2010027743A (en) * | 2008-07-16 | 2010-02-04 | Ebara Corp | Glass substrate for imprint, resist pattern forming method, and method and apparatus for inspecting glass substrate for imprint |
US8836948B2 (en) | 2009-01-29 | 2014-09-16 | The Regents Of The University Of California | High resolution structured illumination microscopy |
US20120006981A1 (en) * | 2009-03-31 | 2012-01-12 | Imec | Waveguide integrated photodetector |
US8965208B2 (en) * | 2009-05-22 | 2015-02-24 | Kotura, Inc. | Multi-channel optical device |
US8865402B2 (en) * | 2009-08-26 | 2014-10-21 | Clemson University Research Foundation | Nanostructured substrates for surface enhanced raman spectroscopy (SERS) and detection of biological and chemical analytes by electrical double layer (EDL) capacitance |
US9297955B2 (en) * | 2009-10-02 | 2016-03-29 | Lehigh University | Plasmonic interferometer sensor |
US8335999B2 (en) * | 2010-06-11 | 2012-12-18 | Orbotech Ltd. | System and method for optical shearing |
US9627434B2 (en) * | 2013-01-04 | 2017-04-18 | California Institute Of Technology | System and method for color imaging with integrated plasmonic color filters |
CN104518835B (en) * | 2013-10-08 | 2019-07-23 | 中兴通讯股份有限公司 | A kind of reception device of visible light communication mimo system |
CN105522278B (en) * | 2016-01-09 | 2017-06-06 | 长春理工大学 | Laser light transmission grid raw glass substrate Aided Machine scoring device and method |
US9667034B1 (en) * | 2016-06-27 | 2017-05-30 | Elwha Llc | Enhanced photoluminescence |
EP3482239A4 (en) * | 2016-07-07 | 2020-03-04 | Bar-Ilan University | Micron-size plasmonic color sorter |
US10254626B2 (en) * | 2016-11-10 | 2019-04-09 | Elwha Llc | Coherent upconversion of light |
US10295741B2 (en) * | 2017-03-31 | 2019-05-21 | Nokia Solutions And Networks Oy | Single mode grating coupler with vertical coupling direction and small back reflection |
CN108614130B (en) * | 2018-04-20 | 2023-08-25 | 华中科技大学 | Transmission-enhanced nano annular near-field optical probe and preparation method thereof |
CN114364115B (en) * | 2022-01-17 | 2023-10-27 | 中国航天空气动力技术研究院 | Transverse wave excited plasma array generator |
US20240085597A1 (en) * | 2022-09-12 | 2024-03-14 | SunDensity, Inc. | System and method for plasmonic spectral conversion using nano-holes and nano-disks |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5973316A (en) * | 1997-07-08 | 1999-10-26 | Nec Research Institute, Inc. | Sub-wavelength aperture arrays with enhanced light transmission |
US20020056816A1 (en) * | 2000-10-17 | 2002-05-16 | Stark Peter Randolph Hazard | Surface plasmon enhanced illumination system |
WO2003019245A2 (en) * | 2001-08-31 | 2003-03-06 | Universite Louis Pasteur | Optical transmission apparatus with directionality and divergence control |
US6834027B1 (en) * | 2000-02-28 | 2004-12-21 | Nec Laboratories America, Inc. | Surface plasmon-enhanced read/write heads for optical data storage media |
-
2007
- 2007-01-05 WO PCT/US2007/000458 patent/WO2007081913A2/en active Application Filing
- 2007-01-05 US US12/087,301 patent/US20090146081A1/en not_active Abandoned
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5973316A (en) * | 1997-07-08 | 1999-10-26 | Nec Research Institute, Inc. | Sub-wavelength aperture arrays with enhanced light transmission |
US6834027B1 (en) * | 2000-02-28 | 2004-12-21 | Nec Laboratories America, Inc. | Surface plasmon-enhanced read/write heads for optical data storage media |
US20020056816A1 (en) * | 2000-10-17 | 2002-05-16 | Stark Peter Randolph Hazard | Surface plasmon enhanced illumination system |
WO2003019245A2 (en) * | 2001-08-31 | 2003-03-06 | Universite Louis Pasteur | Optical transmission apparatus with directionality and divergence control |
Non-Patent Citations (1)
Title |
---|
THIO T ET AL: "Strongly enhanced optical transmission through subwavelength holes in metal films", PHYSICA B. CONDENSED MATTER, AMSTERDAM, NL, vol. 279, 2000, pages 90 - 93, XP002236331, ISSN: 0921-4526 * |
Also Published As
Publication number | Publication date |
---|---|
US20090146081A1 (en) | 2009-06-11 |
WO2007081913A2 (en) | 2007-07-19 |
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