WO2007076172A3 - Anti-stiction gas-phase lubricant for micromechanical systems - Google Patents

Anti-stiction gas-phase lubricant for micromechanical systems Download PDF

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Publication number
WO2007076172A3
WO2007076172A3 PCT/US2006/060543 US2006060543W WO2007076172A3 WO 2007076172 A3 WO2007076172 A3 WO 2007076172A3 US 2006060543 W US2006060543 W US 2006060543W WO 2007076172 A3 WO2007076172 A3 WO 2007076172A3
Authority
WO
WIPO (PCT)
Prior art keywords
contact surface
gas
phase lubricant
stiction
phase
Prior art date
Application number
PCT/US2006/060543
Other languages
French (fr)
Other versions
WO2007076172A2 (en
Inventor
Dongmin Chen
Fulin Xiong
Original Assignee
Miradia Inc
Dongmin Chen
Fulin Xiong
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/315,920 external-priority patent/US7471439B2/en
Priority claimed from US11/315,607 external-priority patent/US7580174B2/en
Application filed by Miradia Inc, Dongmin Chen, Fulin Xiong filed Critical Miradia Inc
Publication of WO2007076172A2 publication Critical patent/WO2007076172A2/en
Publication of WO2007076172A3 publication Critical patent/WO2007076172A3/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B81B3/0002—Arrangements for avoiding sticking of the flexible or moving parts
    • B81B3/0005—Anti-stiction coatings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00912—Treatments or methods for avoiding stiction of flexible or moving parts of MEMS
    • B81C1/0096—For avoiding stiction when the device is in use, i.e. after manufacture has been completed
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N1/00—Electrostatic generators or motors using a solid moving electrostatic charge carrier
    • H02N1/002—Electrostatic motors
    • H02N1/006—Electrostatic motors of the gap-closing type
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00—Specific applications of microelectromechanical systems
    • B81B2201/04—Optical MEMS
    • B81B2201/042—Micromirrors, not used as optical switches
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Micromachines (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)

Abstract

One embodiment of an micromechanical device includes a first contact surface, a moveable component having a second contact surface, where the second contact surface interacts with the first contact surface during device operation, and a gas-phase lubricant disposed between the first contact surface and the second contact surface, where the gas-phase lubricant is adapted to reduce stiction-related forces between the first contact surface and the second contact surface. One advantage of the disclosed device is that a gas-phase lubricant has a high diffusion rate and, therefore, is self-replenishing, meaning that it can quickly move back into a contact region after being physically displaced from the region by the contacting surfaces of the device during operation. Consequently, the gas-phase lubricant is more reliable than conventional solid or liquid lubricants in preventing stiction-related device failures.
PCT/US2006/060543 2005-11-03 2006-11-03 Anti-stiction gas-phase lubricant for micromechanical systems WO2007076172A2 (en)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US73373005P 2005-11-03 2005-11-03
US60/733,730 2005-11-03
US11/315,920 2005-12-22
US11/315,607 2005-12-22
US11/315,920 US7471439B2 (en) 2005-11-23 2005-12-22 Process of forming a micromechanical system containing an anti-stiction gas-phase lubricant
US11/315,607 US7580174B2 (en) 2005-11-23 2005-12-22 Anti-stiction gas-phase lubricant for micromechanical systems

Publications (2)

Publication Number Publication Date
WO2007076172A2 WO2007076172A2 (en) 2007-07-05
WO2007076172A3 true WO2007076172A3 (en) 2008-05-08

Family

ID=38218741

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2006/060543 WO2007076172A2 (en) 2005-11-03 2006-11-03 Anti-stiction gas-phase lubricant for micromechanical systems

Country Status (1)

Country Link
WO (1) WO2007076172A2 (en)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4916957A (en) * 1988-05-09 1990-04-17 Unisys Corporation Flexible disc rotor rate gyro
US5364547A (en) * 1989-06-09 1994-11-15 The Dow Chemical Company Lubricants containing perfluorocyclobutane rings
US5429708A (en) * 1993-12-22 1995-07-04 The Board Of Trustees Of The Leland Stanford Junior University Molecular layers covalently bonded to silicon surfaces
US6475570B2 (en) * 2000-12-29 2002-11-05 Texas Instruments Incorporated Diluent assisted lubrication of micromechanical devices
US20030002019A1 (en) * 2001-06-30 2003-01-02 Seth Miller Lubricating micro-machined devices using fluorosurfactants
US6674140B2 (en) * 2000-02-01 2004-01-06 Analog Devices, Inc. Process for wafer level treatment to reduce stiction and passivate micromachined surfaces and compounds used therefor
US20050157375A1 (en) * 2003-02-12 2005-07-21 Jonathan Doan Micromirror device and method for making the same

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4916957A (en) * 1988-05-09 1990-04-17 Unisys Corporation Flexible disc rotor rate gyro
US5364547A (en) * 1989-06-09 1994-11-15 The Dow Chemical Company Lubricants containing perfluorocyclobutane rings
US5429708A (en) * 1993-12-22 1995-07-04 The Board Of Trustees Of The Leland Stanford Junior University Molecular layers covalently bonded to silicon surfaces
US6674140B2 (en) * 2000-02-01 2004-01-06 Analog Devices, Inc. Process for wafer level treatment to reduce stiction and passivate micromachined surfaces and compounds used therefor
US6475570B2 (en) * 2000-12-29 2002-11-05 Texas Instruments Incorporated Diluent assisted lubrication of micromechanical devices
US20030002019A1 (en) * 2001-06-30 2003-01-02 Seth Miller Lubricating micro-machined devices using fluorosurfactants
US20050157375A1 (en) * 2003-02-12 2005-07-21 Jonathan Doan Micromirror device and method for making the same

Also Published As

Publication number Publication date
WO2007076172A2 (en) 2007-07-05

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