WO2007059249A3 - Interferometer with coherent artifact reduction plus vibration and enviromental compensation - Google Patents
Interferometer with coherent artifact reduction plus vibration and enviromental compensation Download PDFInfo
- Publication number
- WO2007059249A3 WO2007059249A3 PCT/US2006/044416 US2006044416W WO2007059249A3 WO 2007059249 A3 WO2007059249 A3 WO 2007059249A3 US 2006044416 W US2006044416 W US 2006044416W WO 2007059249 A3 WO2007059249 A3 WO 2007059249A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- value
- interferometer
- omega
- angle
- enviromental
- Prior art date
Links
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02056—Passive reduction of errors
- G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
- G01B9/02002—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
- G01B9/02004—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies using frequency scans
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
- G01B9/02007—Two or more frequencies or sources used for interferometric measurement
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02056—Passive reduction of errors
- G01B9/02059—Reducing effect of parasitic reflections, e.g. cyclic errors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02075—Reduction or prevention of errors; Testing; Calibration of particular errors
- G01B9/02076—Caused by motion
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02075—Reduction or prevention of errors; Testing; Calibration of particular errors
- G01B9/02078—Caused by ambiguity
- G01B9/02079—Quadrature detection, i.e. detecting relatively phase-shifted signals
- G01B9/02081—Quadrature detection, i.e. detecting relatively phase-shifted signals simultaneous quadrature detection, e.g. by spatial phase shifting
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02083—Interferometers characterised by particular signal processing and presentation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
- G01N21/45—Refractivity; Phase-affecting properties, e.g. optical path length using interferometric methods; using Schlieren methods
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/25—Fabry-Perot in interferometer, e.g. etalon, cavity
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/45—Multiple detectors for detecting interferometer signals
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/65—Spatial scanning object beam
Abstract
An interferometric method including: generating a variable frequency source beam; from the source beam, generating a collimated beam propagating at an angle Ω relative to an optical axis; introducing the collimated beam into an interferometer that includes a reference object and a measurement object, wherein at least a portion of the collimated beam interacts with the reference object to generate a reference beam, at least a portion of the collimated beam interacts with the measurement object to generate a return measurement beam, and the reference beam and the return measurement beam are combined to generate a combined beam; causing the angle Ω to have a first value and at a later time a second value that is different from the first value; and causing the variable frequency F to have a first value that corresponds to the first value of the angle Ω and at the later time to have a second value that corresponds to the first value of the angle Ω.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US73710205P | 2005-11-15 | 2005-11-15 | |
US60/737,102 | 2005-11-15 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2007059249A2 WO2007059249A2 (en) | 2007-05-24 |
WO2007059249A3 true WO2007059249A3 (en) | 2007-11-22 |
Family
ID=38049289
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2006/044416 WO2007059249A2 (en) | 2005-11-15 | 2006-11-15 | Interferometer with coherent artifact reduction plus vibration and enviromental compensation |
Country Status (3)
Country | Link |
---|---|
US (1) | US20070121115A1 (en) |
TW (1) | TW200728685A (en) |
WO (1) | WO2007059249A2 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1869399A2 (en) | 2005-04-11 | 2007-12-26 | Zetetic Institute | Apparatus and method for in situ and ex situ measurement of spatial impulse response of an optical system using phase-shifting point-diffraction interferometry |
US8687204B2 (en) * | 2011-03-24 | 2014-04-01 | Canon Kabushiki Kaisha | Method and apparatus for measuring refractive index based on a ratio between a number of second fringes divided by a difference of the number of second fringes minus a number of first fringes |
US10254252B2 (en) * | 2013-07-23 | 2019-04-09 | Ler Technologies, Inc. | Surface and subsurface detection sensor |
EP3232245A1 (en) * | 2016-04-13 | 2017-10-18 | Charité - Universitätsmedizin Berlin | Method and arrangement for identifying optical aberrations |
WO2020180470A1 (en) * | 2019-03-01 | 2020-09-10 | Applied Materials, Inc. | Transparent wafer center finder |
CN113358324B (en) * | 2021-06-11 | 2022-09-02 | 中国空气动力研究与发展中心超高速空气动力研究所 | Speckle interference ablation measurement system and method based on spatial phase shift |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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US20030030819A1 (en) * | 2001-05-03 | 2003-02-13 | Michael Kuechel | Apparatus and method(s) for reducing the effects of coherent artifacts in an interferometer |
US6894788B2 (en) * | 2000-11-20 | 2005-05-17 | Zygo Corporation | Interferometric system for automated radius of curvature measurements |
Family Cites Families (30)
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AU528882B2 (en) * | 1978-09-26 | 1983-05-19 | Commonwealth Scientific And Industrial Research Organisation | Producing anhydrous aluminium chloride |
US4624569A (en) * | 1983-07-18 | 1986-11-25 | Lockheed Missiles & Space Company, Inc. | Real-time diffraction interferometer |
US4575248A (en) * | 1984-06-18 | 1986-03-11 | Itek Corporation | Wavefront sensor employing novel D.C. shearing interferometer |
DE3930632A1 (en) * | 1989-09-13 | 1991-03-14 | Steinbichler Hans | METHOD FOR DIRECT PHASE MEASUREMENT OF RADIATION, IN PARTICULAR LIGHT RADIATION, AND DEVICE FOR CARRYING OUT THIS METHOD |
DE4124223C2 (en) * | 1991-07-22 | 2001-07-26 | Zeiss Carl | Procedure for evaluating interferograms and interferometers |
EP0561015A1 (en) * | 1992-03-17 | 1993-09-22 | International Business Machines Corporation | Interferometric phase-measuring |
US5412474A (en) * | 1992-05-08 | 1995-05-02 | Smithsonian Institution | System for measuring distance between two points using a variable frequency coherent source |
US5398113A (en) * | 1993-02-08 | 1995-03-14 | Zygo Corporation | Method and apparatus for surface topography measurement by spatial-frequency analysis of interferograms |
JP3295583B2 (en) * | 1994-12-19 | 2002-06-24 | シャープ株式会社 | Optical device and head-mounted display using the optical device |
US5589938A (en) * | 1995-07-10 | 1996-12-31 | Zygo Corporation | Method and apparatus for optical interferometric measurements with reduced sensitivity to vibration |
US5663793A (en) * | 1995-09-05 | 1997-09-02 | Zygo Corporation | Homodyne interferometric receiver and calibration method having improved accuracy and functionality |
US5883717A (en) * | 1996-06-04 | 1999-03-16 | Northeastern University | Optical quadrature interferometry utilizing polarization to obtain in-phase and quadrature information |
US5915048A (en) * | 1996-06-05 | 1999-06-22 | Zetetic Institute | Method and apparatus for discriminating in-focus images from out-of-focus light signals from background and foreground light sources |
US5760901A (en) * | 1997-01-28 | 1998-06-02 | Zetetic Institute | Method and apparatus for confocal interference microscopy with background amplitude reduction and compensation |
US6480285B1 (en) * | 1997-01-28 | 2002-11-12 | Zetetic Institute | Multiple layer confocal interference microscopy using wavenumber domain reflectometry and background amplitude reduction and compensation |
US6271923B1 (en) * | 1999-05-05 | 2001-08-07 | Zygo Corporation | Interferometry system having a dynamic beam steering assembly for measuring angle and distance |
US6606159B1 (en) * | 1999-08-02 | 2003-08-12 | Zetetic Institute | Optical storage system based on scanning interferometric near-field confocal microscopy |
US6304330B1 (en) * | 1999-10-06 | 2001-10-16 | Metrolaser, Inc. | Methods and apparatus for splitting, imaging, and measuring wavefronts in interferometry |
WO2001088468A1 (en) * | 2000-05-17 | 2001-11-22 | Zygo Corporation | Interferometric apparatus and method |
FR2817030B1 (en) * | 2000-11-17 | 2003-03-28 | Centre Nat Rech Scient | METHOD AND DEVICE FOR MICROSCOPIC INTERFERENTIAL IMAGING OF A HIGH-THROUGHPUT OBJECT |
US6643024B2 (en) * | 2001-05-03 | 2003-11-04 | Zygo Corporation | Apparatus and method(s) for reducing the effects of coherent artifacts in an interferometer |
US6847452B2 (en) * | 2001-08-02 | 2005-01-25 | Zygo Corporation | Passive zero shear interferometers |
JP2006516763A (en) * | 2003-01-27 | 2006-07-06 | ゼテテック インスティテュート | Apparatus and method for simultaneous measurement of reflected / scattered and transmitted beams by interferometric objects in a quadrangular field of view. |
US7084983B2 (en) * | 2003-01-27 | 2006-08-01 | Zetetic Institute | Interferometric confocal microscopy incorporating a pinhole array beam-splitter |
EP1608934A4 (en) * | 2003-04-01 | 2007-03-21 | Zetetic Inst | Apparatus and method for joint measurement of fields of scattered/reflected or transmitted orthogonally polarized beams by an object in interferometry |
US7057738B2 (en) * | 2003-08-28 | 2006-06-06 | A D Technology Corporation | Simultaneous phase-shifting Fizeau interferometer |
US7355722B2 (en) * | 2003-09-10 | 2008-04-08 | Zetetic Institute | Catoptric and catadioptric imaging systems with adaptive catoptric surfaces |
TW200607991A (en) * | 2004-08-16 | 2006-03-01 | Zetetic Inst | Apparatus and method for joint and time delayed measurements of components of conjugated quadratures of fields of reflected/scattered and transmitted/scattered beams by an object in interferometry |
US20070014319A1 (en) * | 2005-07-15 | 2007-01-18 | Zetetic Institute | Continuously Tunable External Cavity Diode Laser Sources With High Tuning And Switching Rates And Extended Tuning Ranges |
TW200706831A (en) * | 2005-08-08 | 2007-02-16 | Zetetic Inst | Apparatus and methods for reduction and compensation of effects of vibrations and of environmental effects in wavefront interferometry |
-
2006
- 2006-11-15 WO PCT/US2006/044416 patent/WO2007059249A2/en active Application Filing
- 2006-11-15 US US11/600,310 patent/US20070121115A1/en not_active Abandoned
- 2006-11-15 TW TW095142240A patent/TW200728685A/en unknown
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6894788B2 (en) * | 2000-11-20 | 2005-05-17 | Zygo Corporation | Interferometric system for automated radius of curvature measurements |
US20030030819A1 (en) * | 2001-05-03 | 2003-02-13 | Michael Kuechel | Apparatus and method(s) for reducing the effects of coherent artifacts in an interferometer |
Also Published As
Publication number | Publication date |
---|---|
US20070121115A1 (en) | 2007-05-31 |
WO2007059249A2 (en) | 2007-05-24 |
TW200728685A (en) | 2007-08-01 |
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