WO2007027803A3 - Systems and methods for providing illumination of a specimen for inspection - Google Patents

Systems and methods for providing illumination of a specimen for inspection Download PDF

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Publication number
WO2007027803A3
WO2007027803A3 PCT/US2006/033905 US2006033905W WO2007027803A3 WO 2007027803 A3 WO2007027803 A3 WO 2007027803A3 US 2006033905 W US2006033905 W US 2006033905W WO 2007027803 A3 WO2007027803 A3 WO 2007027803A3
Authority
WO
WIPO (PCT)
Prior art keywords
specimen
inspection
predetermined pattern
systems
illumination
Prior art date
Application number
PCT/US2006/033905
Other languages
French (fr)
Other versions
WO2007027803A2 (en
Inventor
Andrew V Hill
Original Assignee
Kla Tencor Tech Corp
Andrew V Hill
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kla Tencor Tech Corp, Andrew V Hill filed Critical Kla Tencor Tech Corp
Publication of WO2007027803A2 publication Critical patent/WO2007027803A2/en
Publication of WO2007027803A3 publication Critical patent/WO2007027803A3/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/4738—Diffuse reflection, e.g. also for testing fluids, fibrous materials
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers

Abstract

Systems and methods for providing illumination of a specimen for inspection are provided. One system includes one or more first optical elements configured to illuminate a diffuser with a predetermined pattern of coherent light. The system also includes one or more second optical elements configured to image light exiting the diffuser onto an illumination pupil of the system such that the predetermined pattern is reproduced in the illumination pupil. In addition, the system includes an objective lens configured to focus light from the predetermined pattern in the illumination pupil onto a specimen plane. In one embodiment, the light focused onto the specimen plane is not substantially coherent. In another embodiment, the predetermined pattern is selected based on an illumination mode selected for the inspection of the specimen.
PCT/US2006/033905 2005-09-02 2006-08-30 Systems and methods for providing illumination of a specimen for inspection WO2007027803A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/219,014 US7304731B2 (en) 2005-09-02 2005-09-02 Systems and methods for providing illumination of a specimen for inspection
US11/219,014 2005-09-02

Publications (2)

Publication Number Publication Date
WO2007027803A2 WO2007027803A2 (en) 2007-03-08
WO2007027803A3 true WO2007027803A3 (en) 2007-12-21

Family

ID=37809476

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2006/033905 WO2007027803A2 (en) 2005-09-02 2006-08-30 Systems and methods for providing illumination of a specimen for inspection

Country Status (2)

Country Link
US (1) US7304731B2 (en)
WO (1) WO2007027803A2 (en)

Families Citing this family (30)

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JP4987708B2 (en) 2005-06-20 2012-07-25 パナソニック株式会社 Two-dimensional image display device, illumination light source, and exposure illumination device
US7589832B2 (en) * 2006-08-10 2009-09-15 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device method
JP5043488B2 (en) * 2007-03-30 2012-10-10 キヤノン株式会社 Detection apparatus and imaging apparatus
US7654715B1 (en) 2007-08-09 2010-02-02 Kla-Tencor Technologies Corporation System and method for illuminating a specimen with uniform angular and spatial distribution
US8023193B2 (en) * 2007-08-31 2011-09-20 Young Optics Inc. Illumination system
US7738092B1 (en) * 2008-01-08 2010-06-15 Kla-Tencor Corporation System and method for reducing speckle noise in die-to-die inspection systems
FR2931295B1 (en) * 2008-05-13 2010-08-20 Altatech Semiconductor DEVICE AND METHOD FOR INSPECTING SEMICONDUCTOR WAFERS
WO2010029549A1 (en) * 2008-09-12 2010-03-18 Ceramicam Ltd. Surface scanning device
JP5469839B2 (en) * 2008-09-30 2014-04-16 株式会社日立ハイテクノロジーズ Device surface defect inspection apparatus and method
CN102770873B (en) 2010-01-22 2017-09-19 纽约市哥伦比亚大学理事会 System, method and medium for recording image using optical diffuser
WO2011119678A2 (en) 2010-03-23 2011-09-29 California Institute Of Technology Super resolution optofluidic microscopes for 2d and 3d imaging
US8735030B2 (en) 2010-04-15 2014-05-27 Carl Zeiss Smt Gmbh Method and apparatus for modifying a substrate surface of a photolithographic mask
US9426429B2 (en) 2010-10-26 2016-08-23 California Institute Of Technology Scanning projective lensless microscope system
US9643184B2 (en) 2010-10-26 2017-05-09 California Institute Of Technology e-Petri dishes, devices, and systems having a light detector for sampling a sequence of sub-pixel shifted projection images
US9569664B2 (en) * 2010-10-26 2017-02-14 California Institute Of Technology Methods for rapid distinction between debris and growing cells
EP2681601A4 (en) 2011-03-03 2014-07-23 California Inst Of Techn Light guided pixel
EP2503364A1 (en) 2011-03-22 2012-09-26 Koninklijke Philips Electronics N.V. Camera system comprising a camera, camera, method of operating a camera and method for deconvoluting a recorded image
US9128064B2 (en) * 2012-05-29 2015-09-08 Kla-Tencor Corporation Super resolution inspection system
FR2996015B1 (en) * 2012-09-25 2014-09-12 Sagem Defense Securite PHOTOLITHOGRAPHIC DEVICE ILLUMINATOR PERMITTING CONTROLLED DIFFRACTION
EP2929235B1 (en) * 2012-12-07 2019-05-15 Robert Bosch GmbH Surveillance imaging system
JP5633836B1 (en) * 2014-04-17 2014-12-03 レーザーテック株式会社 Illumination device and inspection device
US9958758B2 (en) 2015-01-21 2018-05-01 Microsoft Technology Licensing, Llc Multiple exposure structured light pattern
DE102016116100A1 (en) * 2016-08-30 2018-03-01 B. Braun Avitum Ag Detecting device for a medium in a hose section
JP6924645B2 (en) * 2017-07-31 2021-08-25 日東電工株式会社 Polarizing film imaging device, inspection device, and inspection method
DE102018201010A1 (en) * 2018-01-23 2019-07-25 Carl Zeiss Smt Gmbh Illumination optics for projection lithography
CN108683844B (en) * 2018-05-04 2020-06-19 清华大学 Method and device for realizing TDI push-broom imaging based on DMD
JP7071650B2 (en) * 2019-06-19 2022-05-19 日亜化学工業株式会社 Image acquisition device
CN110501309A (en) * 2019-07-02 2019-11-26 北京航空航天大学 A kind of tumor tissue drug sensitivity Detection device
JP7450363B2 (en) * 2019-10-23 2024-03-15 キヤノン株式会社 Illumination optical system, exposure device, and article manufacturing method
WO2023117393A1 (en) 2021-12-23 2023-06-29 Asml Netherlands B.V. Projection unit for a level sensor, method of monitoring height of a substrate, and lithographic system comprising the projection unit

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6672739B1 (en) * 1999-08-30 2004-01-06 International Business Machines Corp. Laser beam homogenizer
US7001055B1 (en) * 2004-01-30 2006-02-21 Kla-Tencor Technologies Corporation Uniform pupil illumination for optical inspection systems

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6672739B1 (en) * 1999-08-30 2004-01-06 International Business Machines Corp. Laser beam homogenizer
US7001055B1 (en) * 2004-01-30 2006-02-21 Kla-Tencor Technologies Corporation Uniform pupil illumination for optical inspection systems

Also Published As

Publication number Publication date
US20070052953A1 (en) 2007-03-08
US7304731B2 (en) 2007-12-04
WO2007027803A2 (en) 2007-03-08

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