WO2007025147A3 - Apparatus and method for measurement and compensation of atmospheric turbulence effects in wavefront interferometry - Google Patents

Apparatus and method for measurement and compensation of atmospheric turbulence effects in wavefront interferometry Download PDF

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Publication number
WO2007025147A3
WO2007025147A3 PCT/US2006/033256 US2006033256W WO2007025147A3 WO 2007025147 A3 WO2007025147 A3 WO 2007025147A3 US 2006033256 W US2006033256 W US 2006033256W WO 2007025147 A3 WO2007025147 A3 WO 2007025147A3
Authority
WO
WIPO (PCT)
Prior art keywords
array
atmospheric turbulence
measurement
compensation
computing
Prior art date
Application number
PCT/US2006/033256
Other languages
French (fr)
Other versions
WO2007025147A2 (en
Inventor
Henry A Hill
Original Assignee
Zetetic Inst
Henry A Hill
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zetetic Inst, Henry A Hill filed Critical Zetetic Inst
Priority to JP2008528200A priority Critical patent/JP2009506330A/en
Priority to EP06813758A priority patent/EP1917496A4/en
Publication of WO2007025147A2 publication Critical patent/WO2007025147A2/en
Publication of WO2007025147A3 publication Critical patent/WO2007025147A3/en

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02034—Interferometers characterised by particularly shaped beams or wavefronts
    • G01B9/02038—Shaping the wavefront, e.g. generating a spherical wavefront
    • G01B9/02039—Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02002—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
    • G01B9/02005—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies using discrete frequency stepping or switching
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/0207—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/06—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the phase of light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system

Abstract

[0261] A method of operating a wavefront interferometry system that generates an array of interference signals that contains information about relative wavefronts of measurement and reference beams, the method involving: from the array of interference signals, computing a first array of phase measurements for a first time and a second array of phase measurements for a second time; computing a difference of the first and second arrays of phase measurements to determine an array of rates of phase changes; and from the array of rates of phase changes, computing an array of atmospheric turbulence effect values which is a measure of atmospheric turbulence effects in the wavefront interferometry system.
PCT/US2006/033256 2005-08-26 2006-08-24 Apparatus and method for measurement and compensation of atmospheric turbulence effects in wavefront interferometry WO2007025147A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2008528200A JP2009506330A (en) 2005-08-26 2006-08-24 Apparatus and method for measuring and correcting atmospheric turbulence effects in wavefront interference
EP06813758A EP1917496A4 (en) 2005-08-26 2006-08-24 Apparatus and method for measurement and compensation of atmospheric turbulence effects in wavefront interferometry

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US71195205P 2005-08-26 2005-08-26
US60/711,952 2005-08-26

Publications (2)

Publication Number Publication Date
WO2007025147A2 WO2007025147A2 (en) 2007-03-01
WO2007025147A3 true WO2007025147A3 (en) 2009-05-07

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2006/033256 WO2007025147A2 (en) 2005-08-26 2006-08-24 Apparatus and method for measurement and compensation of atmospheric turbulence effects in wavefront interferometry

Country Status (5)

Country Link
US (1) US7460245B2 (en)
EP (1) EP1917496A4 (en)
JP (1) JP2009506330A (en)
TW (1) TW200714870A (en)
WO (1) WO2007025147A2 (en)

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US9140582B2 (en) 2009-05-27 2015-09-22 Silixa Limited Optical sensor and method of use
GB201006593D0 (en) * 2010-04-20 2010-06-02 Phase Focus Ltd Characteristic determination
US8558890B2 (en) 2010-08-12 2013-10-15 Goodrich Corporation Aerial reconnaissance camera system with atmospheric dispersion correction
AT520258B1 (en) * 2017-07-26 2022-02-15 Univ Wien Tech Process for the spectroscopic or spectrometric analysis of a sample
KR102150110B1 (en) * 2018-12-12 2020-08-31 주식회사 내일해 Method for generating 3d shape information of an object
CN114270169A (en) * 2019-09-18 2022-04-01 株式会社富士金 Concentration measuring device
US11237059B1 (en) * 2020-12-14 2022-02-01 Gerchberg Ophthalmic Dispensing, PLLC Totagraphy: Coherent diffractive/digital information reconstruction by iterative phase recovery using special masks
CA3232526A1 (en) * 2021-09-21 2023-03-30 National Research Council Of Canada Optical beamforming and interferometry using digital source modulation

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US6731570B1 (en) * 1998-02-06 2004-05-04 Bae Systems Electronics Limited Sound detection

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Also Published As

Publication number Publication date
EP1917496A4 (en) 2010-07-28
US7460245B2 (en) 2008-12-02
JP2009506330A (en) 2009-02-12
TW200714870A (en) 2007-04-16
US20070046951A1 (en) 2007-03-01
WO2007025147A2 (en) 2007-03-01
EP1917496A2 (en) 2008-05-07

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