WO2007019548A3 - Apparatus and methods for reduction and compensation of effects of vibrations and of environmental effects in wavefront interferometry - Google Patents
Apparatus and methods for reduction and compensation of effects of vibrations and of environmental effects in wavefront interferometry Download PDFInfo
- Publication number
- WO2007019548A3 WO2007019548A3 PCT/US2006/031066 US2006031066W WO2007019548A3 WO 2007019548 A3 WO2007019548 A3 WO 2007019548A3 US 2006031066 W US2006031066 W US 2006031066W WO 2007019548 A3 WO2007019548 A3 WO 2007019548A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- effects
- wavefront
- measurement
- vibrations
- compensation
- Prior art date
Links
- 238000005305 interferometry Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 title abstract 2
- 230000000694 effects Effects 0.000 title 1
- 230000007613 environmental effect Effects 0.000 title 1
- 238000005259 measurement Methods 0.000 abstract 4
- 230000003287 optical effect Effects 0.000 abstract 1
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02034—Interferometers characterised by particularly shaped beams or wavefronts
- G01B9/02038—Shaping the wavefront, e.g. generating a spherical wavefront
- G01B9/02039—Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02056—Passive reduction of errors
- G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02062—Active error reduction, i.e. varying with time
- G01B9/02067—Active error reduction, i.e. varying with time by electronic control systems, i.e. using feedback acting on optics or light
- G01B9/02068—Auto-alignment of optical elements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02075—Reduction or prevention of errors; Testing; Calibration of particular errors
- G01B9/02076—Caused by motion
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
- G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/45—Multiple detectors for detecting interferometer signals
Abstract
A wavefront interferometry system including: a wavefront interferometer that during operation combines a reference beam from a reference object and a measurement beam from a measurement object to generate a combined beam; and a processor system programmed to processes the combined beam to concurrently generate therefrom a control signal and information about the difference in wavefront profiles of the reference and measurement objects, wherein the control signal controls a system parameter so as to maintain an optical path length difference between a spot on the reference object and a corresponding spot on the measurement object at a constant value mod 2π.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US70626805P | 2005-08-08 | 2005-08-08 | |
US60/706,268 | 2005-08-08 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2007019548A2 WO2007019548A2 (en) | 2007-02-15 |
WO2007019548A3 true WO2007019548A3 (en) | 2008-01-10 |
Family
ID=37728022
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2006/031066 WO2007019548A2 (en) | 2005-08-08 | 2006-08-08 | Apparatus and methods for reduction and compensation of effects of vibrations and of environmental effects in wavefront interferometry |
Country Status (3)
Country | Link |
---|---|
US (1) | US7405832B2 (en) |
TW (1) | TW200706831A (en) |
WO (1) | WO2007019548A2 (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007008265A2 (en) * | 2005-04-11 | 2007-01-18 | Zetetic Institute | Apparatus and method for in situ and ex situ measurement of spatial impulse response of an optical system using phase-shifting point-diffraction interferometry |
US7428058B2 (en) * | 2005-05-18 | 2008-09-23 | Zetetic Institute | Apparatus and method for in situ and ex situ measurements of optical system flare |
WO2007025147A2 (en) * | 2005-08-26 | 2007-03-01 | Zetetic Institute | Apparatus and method for measurement and compensation of atmospheric turbulence effects in wavefront interferometry |
TW200728685A (en) * | 2005-11-15 | 2007-08-01 | Zetetic Inst | Apparatus and method for reducing effects of coherent artifacts and compensation of effects of vibrations and environmental changes in interferometry |
WO2009009081A2 (en) | 2007-07-10 | 2009-01-15 | Massachusetts Institute Of Technology | Tomographic phase microscopy |
EP2954309B1 (en) | 2013-02-05 | 2019-08-28 | Massachusetts Institute of Technology | 3-d holographic imaging flow cytometry |
CN110793440B (en) * | 2019-11-01 | 2021-05-18 | 中国计量大学 | Optical deflection transient measurement method |
US11237059B1 (en) * | 2020-12-14 | 2022-02-01 | Gerchberg Ophthalmic Dispensing, PLLC | Totagraphy: Coherent diffractive/digital information reconstruction by iterative phase recovery using special masks |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6940602B2 (en) * | 2000-11-17 | 2005-09-06 | Centre National De La Recherche Scientific (C.N.R.S.) | Method and device for high-speed interferential microscopic imaging of an object |
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AU528882B2 (en) | 1978-09-26 | 1983-05-19 | Commonwealth Scientific And Industrial Research Organisation | Producing anhydrous aluminium chloride |
US4575248A (en) | 1984-06-18 | 1986-03-11 | Itek Corporation | Wavefront sensor employing novel D.C. shearing interferometer |
DE3930632A1 (en) | 1989-09-13 | 1991-03-14 | Steinbichler Hans | METHOD FOR DIRECT PHASE MEASUREMENT OF RADIATION, IN PARTICULAR LIGHT RADIATION, AND DEVICE FOR CARRYING OUT THIS METHOD |
EP0561015A1 (en) | 1992-03-17 | 1993-09-22 | International Business Machines Corporation | Interferometric phase-measuring |
US5412474A (en) | 1992-05-08 | 1995-05-02 | Smithsonian Institution | System for measuring distance between two points using a variable frequency coherent source |
JP3295583B2 (en) | 1994-12-19 | 2002-06-24 | シャープ株式会社 | Optical device and head-mounted display using the optical device |
US5589938A (en) | 1995-07-10 | 1996-12-31 | Zygo Corporation | Method and apparatus for optical interferometric measurements with reduced sensitivity to vibration |
US5663793A (en) | 1995-09-05 | 1997-09-02 | Zygo Corporation | Homodyne interferometric receiver and calibration method having improved accuracy and functionality |
US5883717A (en) | 1996-06-04 | 1999-03-16 | Northeastern University | Optical quadrature interferometry utilizing polarization to obtain in-phase and quadrature information |
US5915048A (en) | 1996-06-05 | 1999-06-22 | Zetetic Institute | Method and apparatus for discriminating in-focus images from out-of-focus light signals from background and foreground light sources |
US6480285B1 (en) | 1997-01-28 | 2002-11-12 | Zetetic Institute | Multiple layer confocal interference microscopy using wavenumber domain reflectometry and background amplitude reduction and compensation |
US5760901A (en) | 1997-01-28 | 1998-06-02 | Zetetic Institute | Method and apparatus for confocal interference microscopy with background amplitude reduction and compensation |
US6271923B1 (en) | 1999-05-05 | 2001-08-07 | Zygo Corporation | Interferometry system having a dynamic beam steering assembly for measuring angle and distance |
US6606159B1 (en) | 1999-08-02 | 2003-08-12 | Zetetic Institute | Optical storage system based on scanning interferometric near-field confocal microscopy |
US6304330B1 (en) | 1999-10-06 | 2001-10-16 | Metrolaser, Inc. | Methods and apparatus for splitting, imaging, and measuring wavefronts in interferometry |
WO2001088468A1 (en) | 2000-05-17 | 2001-11-22 | Zygo Corporation | Interferometric apparatus and method |
US6847452B2 (en) | 2001-08-02 | 2005-01-25 | Zygo Corporation | Passive zero shear interferometers |
EP1588119A4 (en) | 2003-01-27 | 2007-03-07 | Zetetic Inst | Apparatus and method for joint measurements of conjugated quadratures of fields of reflected/scattered and transmitted beams by an object in interferometry |
US7084983B2 (en) | 2003-01-27 | 2006-08-01 | Zetetic Institute | Interferometric confocal microscopy incorporating a pinhole array beam-splitter |
EP1608934A4 (en) | 2003-04-01 | 2007-03-21 | Zetetic Inst | Apparatus and method for joint measurement of fields of scattered/reflected or transmitted orthogonally polarized beams by an object in interferometry |
GB2404014B (en) * | 2003-07-18 | 2006-06-28 | Taylor Hobson Ltd | Surface profiling method and apparatus |
US7057738B2 (en) | 2003-08-28 | 2006-06-06 | A D Technology Corporation | Simultaneous phase-shifting Fizeau interferometer |
US7355722B2 (en) | 2003-09-10 | 2008-04-08 | Zetetic Institute | Catoptric and catadioptric imaging systems with adaptive catoptric surfaces |
US7161680B2 (en) | 2004-08-16 | 2007-01-09 | Zetetic Institute | Apparatus and method for joint and time delayed measurements of components of conjugated quadratures of fields of reflected/scattered and transmitted/scattered beams by an object in interferometry |
US20070014319A1 (en) | 2005-07-15 | 2007-01-18 | Zetetic Institute | Continuously Tunable External Cavity Diode Laser Sources With High Tuning And Switching Rates And Extended Tuning Ranges |
-
2006
- 2006-08-08 US US11/463,036 patent/US7405832B2/en not_active Expired - Fee Related
- 2006-08-08 TW TW095129016A patent/TW200706831A/en unknown
- 2006-08-08 WO PCT/US2006/031066 patent/WO2007019548A2/en active Application Filing
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6940602B2 (en) * | 2000-11-17 | 2005-09-06 | Centre National De La Recherche Scientific (C.N.R.S.) | Method and device for high-speed interferential microscopic imaging of an object |
Also Published As
Publication number | Publication date |
---|---|
TW200706831A (en) | 2007-02-16 |
WO2007019548A2 (en) | 2007-02-15 |
US20070058174A1 (en) | 2007-03-15 |
US7405832B2 (en) | 2008-07-29 |
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