WO2007019548A3 - Apparatus and methods for reduction and compensation of effects of vibrations and of environmental effects in wavefront interferometry - Google Patents

Apparatus and methods for reduction and compensation of effects of vibrations and of environmental effects in wavefront interferometry Download PDF

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Publication number
WO2007019548A3
WO2007019548A3 PCT/US2006/031066 US2006031066W WO2007019548A3 WO 2007019548 A3 WO2007019548 A3 WO 2007019548A3 US 2006031066 W US2006031066 W US 2006031066W WO 2007019548 A3 WO2007019548 A3 WO 2007019548A3
Authority
WO
WIPO (PCT)
Prior art keywords
effects
wavefront
measurement
vibrations
compensation
Prior art date
Application number
PCT/US2006/031066
Other languages
French (fr)
Other versions
WO2007019548A2 (en
Inventor
Henry A Hill
Original Assignee
Zetetic Inst
Henry A Hill
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zetetic Inst, Henry A Hill filed Critical Zetetic Inst
Publication of WO2007019548A2 publication Critical patent/WO2007019548A2/en
Publication of WO2007019548A3 publication Critical patent/WO2007019548A3/en

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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02034Interferometers characterised by particularly shaped beams or wavefronts
    • G01B9/02038Shaping the wavefront, e.g. generating a spherical wavefront
    • G01B9/02039Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02055Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056Passive reduction of errors
    • G01B9/02057Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02055Reduction or prevention of errors; Testing; Calibration
    • G01B9/02062Active error reduction, i.e. varying with time
    • G01B9/02067Active error reduction, i.e. varying with time by electronic control systems, i.e. using feedback acting on optics or light
    • G01B9/02068Auto-alignment of optical elements
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02055Reduction or prevention of errors; Testing; Calibration
    • G01B9/02075Reduction or prevention of errors; Testing; Calibration of particular errors
    • G01B9/02076Caused by motion
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/45Multiple detectors for detecting interferometer signals

Abstract

A wavefront interferometry system including: a wavefront interferometer that during operation combines a reference beam from a reference object and a measurement beam from a measurement object to generate a combined beam; and a processor system programmed to processes the combined beam to concurrently generate therefrom a control signal and information about the difference in wavefront profiles of the reference and measurement objects, wherein the control signal controls a system parameter so as to maintain an optical path length difference between a spot on the reference object and a corresponding spot on the measurement object at a constant value mod 2π.
PCT/US2006/031066 2005-08-08 2006-08-08 Apparatus and methods for reduction and compensation of effects of vibrations and of environmental effects in wavefront interferometry WO2007019548A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US70626805P 2005-08-08 2005-08-08
US60/706,268 2005-08-08

Publications (2)

Publication Number Publication Date
WO2007019548A2 WO2007019548A2 (en) 2007-02-15
WO2007019548A3 true WO2007019548A3 (en) 2008-01-10

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2006/031066 WO2007019548A2 (en) 2005-08-08 2006-08-08 Apparatus and methods for reduction and compensation of effects of vibrations and of environmental effects in wavefront interferometry

Country Status (3)

Country Link
US (1) US7405832B2 (en)
TW (1) TW200706831A (en)
WO (1) WO2007019548A2 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007008265A2 (en) * 2005-04-11 2007-01-18 Zetetic Institute Apparatus and method for in situ and ex situ measurement of spatial impulse response of an optical system using phase-shifting point-diffraction interferometry
US7428058B2 (en) * 2005-05-18 2008-09-23 Zetetic Institute Apparatus and method for in situ and ex situ measurements of optical system flare
WO2007025147A2 (en) * 2005-08-26 2007-03-01 Zetetic Institute Apparatus and method for measurement and compensation of atmospheric turbulence effects in wavefront interferometry
TW200728685A (en) * 2005-11-15 2007-08-01 Zetetic Inst Apparatus and method for reducing effects of coherent artifacts and compensation of effects of vibrations and environmental changes in interferometry
WO2009009081A2 (en) 2007-07-10 2009-01-15 Massachusetts Institute Of Technology Tomographic phase microscopy
EP2954309B1 (en) 2013-02-05 2019-08-28 Massachusetts Institute of Technology 3-d holographic imaging flow cytometry
CN110793440B (en) * 2019-11-01 2021-05-18 中国计量大学 Optical deflection transient measurement method
US11237059B1 (en) * 2020-12-14 2022-02-01 Gerchberg Ophthalmic Dispensing, PLLC Totagraphy: Coherent diffractive/digital information reconstruction by iterative phase recovery using special masks

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6940602B2 (en) * 2000-11-17 2005-09-06 Centre National De La Recherche Scientific (C.N.R.S.) Method and device for high-speed interferential microscopic imaging of an object

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU528882B2 (en) 1978-09-26 1983-05-19 Commonwealth Scientific And Industrial Research Organisation Producing anhydrous aluminium chloride
US4575248A (en) 1984-06-18 1986-03-11 Itek Corporation Wavefront sensor employing novel D.C. shearing interferometer
DE3930632A1 (en) 1989-09-13 1991-03-14 Steinbichler Hans METHOD FOR DIRECT PHASE MEASUREMENT OF RADIATION, IN PARTICULAR LIGHT RADIATION, AND DEVICE FOR CARRYING OUT THIS METHOD
EP0561015A1 (en) 1992-03-17 1993-09-22 International Business Machines Corporation Interferometric phase-measuring
US5412474A (en) 1992-05-08 1995-05-02 Smithsonian Institution System for measuring distance between two points using a variable frequency coherent source
JP3295583B2 (en) 1994-12-19 2002-06-24 シャープ株式会社 Optical device and head-mounted display using the optical device
US5589938A (en) 1995-07-10 1996-12-31 Zygo Corporation Method and apparatus for optical interferometric measurements with reduced sensitivity to vibration
US5663793A (en) 1995-09-05 1997-09-02 Zygo Corporation Homodyne interferometric receiver and calibration method having improved accuracy and functionality
US5883717A (en) 1996-06-04 1999-03-16 Northeastern University Optical quadrature interferometry utilizing polarization to obtain in-phase and quadrature information
US5915048A (en) 1996-06-05 1999-06-22 Zetetic Institute Method and apparatus for discriminating in-focus images from out-of-focus light signals from background and foreground light sources
US6480285B1 (en) 1997-01-28 2002-11-12 Zetetic Institute Multiple layer confocal interference microscopy using wavenumber domain reflectometry and background amplitude reduction and compensation
US5760901A (en) 1997-01-28 1998-06-02 Zetetic Institute Method and apparatus for confocal interference microscopy with background amplitude reduction and compensation
US6271923B1 (en) 1999-05-05 2001-08-07 Zygo Corporation Interferometry system having a dynamic beam steering assembly for measuring angle and distance
US6606159B1 (en) 1999-08-02 2003-08-12 Zetetic Institute Optical storage system based on scanning interferometric near-field confocal microscopy
US6304330B1 (en) 1999-10-06 2001-10-16 Metrolaser, Inc. Methods and apparatus for splitting, imaging, and measuring wavefronts in interferometry
WO2001088468A1 (en) 2000-05-17 2001-11-22 Zygo Corporation Interferometric apparatus and method
US6847452B2 (en) 2001-08-02 2005-01-25 Zygo Corporation Passive zero shear interferometers
EP1588119A4 (en) 2003-01-27 2007-03-07 Zetetic Inst Apparatus and method for joint measurements of conjugated quadratures of fields of reflected/scattered and transmitted beams by an object in interferometry
US7084983B2 (en) 2003-01-27 2006-08-01 Zetetic Institute Interferometric confocal microscopy incorporating a pinhole array beam-splitter
EP1608934A4 (en) 2003-04-01 2007-03-21 Zetetic Inst Apparatus and method for joint measurement of fields of scattered/reflected or transmitted orthogonally polarized beams by an object in interferometry
GB2404014B (en) * 2003-07-18 2006-06-28 Taylor Hobson Ltd Surface profiling method and apparatus
US7057738B2 (en) 2003-08-28 2006-06-06 A D Technology Corporation Simultaneous phase-shifting Fizeau interferometer
US7355722B2 (en) 2003-09-10 2008-04-08 Zetetic Institute Catoptric and catadioptric imaging systems with adaptive catoptric surfaces
US7161680B2 (en) 2004-08-16 2007-01-09 Zetetic Institute Apparatus and method for joint and time delayed measurements of components of conjugated quadratures of fields of reflected/scattered and transmitted/scattered beams by an object in interferometry
US20070014319A1 (en) 2005-07-15 2007-01-18 Zetetic Institute Continuously Tunable External Cavity Diode Laser Sources With High Tuning And Switching Rates And Extended Tuning Ranges

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6940602B2 (en) * 2000-11-17 2005-09-06 Centre National De La Recherche Scientific (C.N.R.S.) Method and device for high-speed interferential microscopic imaging of an object

Also Published As

Publication number Publication date
TW200706831A (en) 2007-02-16
WO2007019548A2 (en) 2007-02-15
US20070058174A1 (en) 2007-03-15
US7405832B2 (en) 2008-07-29

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