WO2007008265A3 - Apparatus and method for in situ and ex situ measurement of spatial impulse response of an optical system using phase-shifting point-diffraction interferometry - Google Patents
Apparatus and method for in situ and ex situ measurement of spatial impulse response of an optical system using phase-shifting point-diffraction interferometry Download PDFInfo
- Publication number
- WO2007008265A3 WO2007008265A3 PCT/US2006/013330 US2006013330W WO2007008265A3 WO 2007008265 A3 WO2007008265 A3 WO 2007008265A3 US 2006013330 W US2006013330 W US 2006013330W WO 2007008265 A3 WO2007008265 A3 WO 2007008265A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- optical system
- situ
- impulse response
- spatial impulse
- phase
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title abstract 8
- 238000005259 measurement Methods 0.000 title abstract 3
- 238000011066 ex-situ storage Methods 0.000 title 1
- 238000011065 in-situ storage Methods 0.000 title 1
- 238000005305 interferometry Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 238000005316 response function Methods 0.000 abstract 2
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
- G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02022—Interferometers characterised by the beam path configuration contacting one object by grazing incidence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02024—Measuring in transmission, i.e. light traverses the object
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02056—Passive reduction of errors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02056—Passive reduction of errors
- G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
- G03F7/706—Aberration measurement
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
- G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
- G01J2009/0223—Common path interferometry; Point diffraction interferometry
Abstract
A point diffraction interferometer for measuring properties of a spatial impulse response function, the interferometer including: a source for generating a source beam; an optical system; an optical element including a test object located in an object plane of the optical system, the test object including a diffraction point for generating from the source beam a measurement beam that passes through the optical system, wherein the optical element also generates from the source beam a reference beam that is combined with the measurement beam to generate an interference pattern in an image plane of the optical system, the interference pattern representing the spatial impulse response function of the optical system.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP06799903A EP1869399A2 (en) | 2005-04-11 | 2006-04-10 | Apparatus and method for in situ and ex situ measurement of spatial impulse response of an optical system using phase-shifting point-diffraction interferometry |
JP2008506577A JP2008538006A (en) | 2005-04-11 | 2006-04-10 | Apparatus and method for INSITU measurement and EXSITU measurement of spatial impulse response of optical system using phase shift point diffraction interferometry |
Applications Claiming Priority (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US67021805P | 2005-04-11 | 2005-04-11 | |
US60/670,218 | 2005-04-11 | ||
US71102005P | 2005-08-24 | 2005-08-24 | |
US60/711,020 | 2005-08-24 | ||
US71425805P | 2005-09-06 | 2005-09-06 | |
US60/714,258 | 2005-09-06 | ||
US73710205P | 2005-11-15 | 2005-11-15 | |
US60/737,102 | 2005-11-15 |
Publications (3)
Publication Number | Publication Date |
---|---|
WO2007008265A2 WO2007008265A2 (en) | 2007-01-18 |
WO2007008265A8 WO2007008265A8 (en) | 2007-03-22 |
WO2007008265A3 true WO2007008265A3 (en) | 2008-01-17 |
Family
ID=37637645
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2006/013330 WO2007008265A2 (en) | 2005-04-11 | 2006-04-10 | Apparatus and method for in situ and ex situ measurement of spatial impulse response of an optical system using phase-shifting point-diffraction interferometry |
Country Status (4)
Country | Link |
---|---|
US (1) | US7508527B2 (en) |
EP (1) | EP1869399A2 (en) |
TW (1) | TW200700695A (en) |
WO (1) | WO2007008265A2 (en) |
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JP2008249691A (en) * | 2007-03-08 | 2008-10-16 | Advanced Lcd Technologies Development Center Co Ltd | Device and method for measuring aberration |
NL2008957A (en) * | 2011-07-08 | 2013-01-09 | Asml Netherlands Bv | Methods and systems for pattern design with tailored response to wavefront aberration. |
JP6180909B2 (en) * | 2013-12-06 | 2017-08-16 | 東京エレクトロン株式会社 | Method for obtaining distance, method for neutralizing electrostatic chuck, and processing apparatus |
US9810893B2 (en) * | 2014-03-27 | 2017-11-07 | The Board Of Trustees Of The Leland Stanford Junior University | Phase mask imaging with characterization of rotational mobility |
US10663657B2 (en) | 2016-07-15 | 2020-05-26 | Light Field Lab, Inc. | Selective propagation of energy in light field and holographic waveguide arrays |
DE102017101829A1 (en) * | 2017-01-31 | 2018-08-02 | Carl Zeiss Microscopy Gmbh | Arrangement for increasing the resolution of a laser scanning microscope |
US11181749B2 (en) | 2018-01-14 | 2021-11-23 | Light Field Lab, Inc. | Systems and methods for transverse energy localization in energy relays using ordered structures |
EP3737982B1 (en) | 2018-01-14 | 2024-01-10 | Light Field Lab, Inc. | Energy field three-dimensional printing system |
DE102018210315B4 (en) | 2018-06-25 | 2021-03-18 | Carl Zeiss Smt Gmbh | Method for detecting a structure of a lithography mask and device for carrying out the method |
CN109297683B (en) * | 2018-10-11 | 2024-02-20 | 广州博冠光电科技股份有限公司 | Device and method for rapidly detecting lens center deviation based on digital laser holography |
CN111948176B (en) * | 2019-05-15 | 2024-03-26 | 住友化学株式会社 | Inspection method for optical film and manufacturing method for optical film |
Citations (1)
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US6239878B1 (en) * | 1999-10-01 | 2001-05-29 | The Regents Of The University Of California | Fourier-transform and global contrast interferometer alignment methods |
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-
2006
- 2006-04-10 WO PCT/US2006/013330 patent/WO2007008265A2/en active Application Filing
- 2006-04-10 US US11/402,218 patent/US7508527B2/en not_active Expired - Fee Related
- 2006-04-10 EP EP06799903A patent/EP1869399A2/en not_active Withdrawn
- 2006-04-11 TW TW095112809A patent/TW200700695A/en unknown
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6239878B1 (en) * | 1999-10-01 | 2001-05-29 | The Regents Of The University Of California | Fourier-transform and global contrast interferometer alignment methods |
Also Published As
Publication number | Publication date |
---|---|
EP1869399A2 (en) | 2007-12-26 |
US20060250620A1 (en) | 2006-11-09 |
TW200700695A (en) | 2007-01-01 |
US7508527B2 (en) | 2009-03-24 |
WO2007008265A2 (en) | 2007-01-18 |
WO2007008265A8 (en) | 2007-03-22 |
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