WO2006124279A3 - Making relief image using removable film - Google Patents

Making relief image using removable film Download PDF

Info

Publication number
WO2006124279A3
WO2006124279A3 PCT/US2006/016865 US2006016865W WO2006124279A3 WO 2006124279 A3 WO2006124279 A3 WO 2006124279A3 US 2006016865 W US2006016865 W US 2006016865W WO 2006124279 A3 WO2006124279 A3 WO 2006124279A3
Authority
WO
WIPO (PCT)
Prior art keywords
imageable
relief image
film
article
exposed
Prior art date
Application number
PCT/US2006/016865
Other languages
French (fr)
Other versions
WO2006124279A2 (en
Inventor
Gregory L Zwadlo
Original Assignee
Eastman Kodak Co
Gregory L Zwadlo
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co, Gregory L Zwadlo filed Critical Eastman Kodak Co
Priority to CN2006800168063A priority Critical patent/CN101176039B/en
Priority to JP2008512318A priority patent/JP4971311B2/en
Priority to EP06752110.4A priority patent/EP1883858B1/en
Publication of WO2006124279A2 publication Critical patent/WO2006124279A2/en
Publication of WO2006124279A3 publication Critical patent/WO2006124279A3/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68Preparation processes not covered by groups G03F1/20 - G03F1/50
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54Absorbers, e.g. of opaque materials
    • G03F1/56Organic absorbers, e.g. of photo-resists
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame

Abstract

The invention is directed to methods of making an article bearing a relief image using a removable film. First, an imageable film that contains at least a mask substrate and an imageable material is imagewise exposed to imaging radiation to form an imaged film. The imaged film is then transferred to an imageable article, such as a flexographic printing plate precursor. The resulting assembly is exposed to curing radiation resulting in exposed and unexposed areas of photosensitive material on the imageable article. Following exposure to curing radiation, the imaged film is then removed from the imageable article. The imageable article is then developed with a suitable developer to form a relief image. The imaged film may then be reused to make additional articles bearing the relief image.
PCT/US2006/016865 2005-05-16 2006-05-02 Making relief image using removable film WO2006124279A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN2006800168063A CN101176039B (en) 2005-05-16 2006-05-02 Making a relief image using a removable film
JP2008512318A JP4971311B2 (en) 2005-05-16 2006-05-02 Relief image production using removable film
EP06752110.4A EP1883858B1 (en) 2005-05-16 2006-05-02 Making relief image using removable film

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/130,065 US7279254B2 (en) 2005-05-16 2005-05-16 Method of making an article bearing a relief image using a removable film
US11/130,065 2005-05-16

Publications (2)

Publication Number Publication Date
WO2006124279A2 WO2006124279A2 (en) 2006-11-23
WO2006124279A3 true WO2006124279A3 (en) 2007-04-19

Family

ID=37232950

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2006/016865 WO2006124279A2 (en) 2005-05-16 2006-05-02 Making relief image using removable film

Country Status (5)

Country Link
US (1) US7279254B2 (en)
EP (1) EP1883858B1 (en)
JP (1) JP4971311B2 (en)
CN (1) CN101176039B (en)
WO (1) WO2006124279A2 (en)

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US8399177B2 (en) * 2008-12-08 2013-03-19 Eastman Kodak Company Enhanced relief printing plate
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US20100151385A1 (en) * 2008-12-17 2010-06-17 Ray Kevin B Stack of negative-working imageable elements
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US9884342B2 (en) 2009-05-19 2018-02-06 Apple Inc. Techniques for marking product housings
US9173336B2 (en) 2009-05-19 2015-10-27 Apple Inc. Techniques for marking product housings
US8663806B2 (en) 2009-08-25 2014-03-04 Apple Inc. Techniques for marking a substrate using a physical vapor deposition material
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US9720326B2 (en) * 2009-10-01 2017-08-01 David A. Recchia Method of improving print performance in flexographic printing plates
US9845546B2 (en) 2009-10-16 2017-12-19 Apple Inc. Sub-surface marking of product housings
US10071583B2 (en) 2009-10-16 2018-09-11 Apple Inc. Marking of product housings
US8809733B2 (en) 2009-10-16 2014-08-19 Apple Inc. Sub-surface marking of product housings
US8628836B2 (en) 2010-03-02 2014-01-14 Apple Inc. Method and apparatus for bonding metals and composites
US8489158B2 (en) 2010-04-19 2013-07-16 Apple Inc. Techniques for marking translucent product housings
US8724285B2 (en) 2010-09-30 2014-05-13 Apple Inc. Cosmetic conductive laser etching
US8530142B2 (en) * 2011-03-15 2013-09-10 Eastman Kodak Company Flexographic printing plate precursor, imaging assembly, and use
US20120248001A1 (en) 2011-03-29 2012-10-04 Nashner Michael S Marking of Fabric Carrying Case for Portable Electronic Device
US9280183B2 (en) 2011-04-01 2016-03-08 Apple Inc. Advanced techniques for bonding metal to plastic
JP6111521B2 (en) * 2012-02-29 2017-04-12 東洋紡株式会社 Photosensitive relief letterpress printing plate
US8879266B2 (en) 2012-05-24 2014-11-04 Apple Inc. Thin multi-layered structures providing rigidity and conductivity
US10071584B2 (en) 2012-07-09 2018-09-11 Apple Inc. Process for creating sub-surface marking on plastic parts
US20150212410A1 (en) * 2012-09-28 2015-07-30 E I Du Pont De Nemours And Company Imageable article comprising a substrate having an imageable crosslinkable fluoropolymer film disposed thereupon
US8945813B2 (en) 2013-04-18 2015-02-03 Eastman Kodak Company Mask forming imageable material and use
US20140313493A1 (en) 2013-04-18 2014-10-23 E I Du Pont De Nemours And Company Exposure apparatus and a method for exposing a photosensitive element and a method for preparing a printing form from the photosensitive element
US9314871B2 (en) 2013-06-18 2016-04-19 Apple Inc. Method for laser engraved reflective surface structures
US9434197B2 (en) 2013-06-18 2016-09-06 Apple Inc. Laser engraved reflective surface structures
US9671695B2 (en) 2013-07-15 2017-06-06 Flint Group Germany Gmbh Process of manufacturing flexographic printing forms
CN106814542B (en) * 2015-11-30 2020-10-27 乐凯华光印刷科技有限公司 Ablation film and application thereof
CN108020991A (en) * 2016-10-31 2018-05-11 无锡中微掩模电子有限公司 Mask plate for integrated circuit carries on the back exposure method
CN110221731B (en) * 2018-03-02 2023-03-28 宸鸿光电科技股份有限公司 Direct patterning method of touch panel and touch panel thereof
US10999917B2 (en) 2018-09-20 2021-05-04 Apple Inc. Sparse laser etch anodized surface for cosmetic grounding
EP3865308A1 (en) * 2020-02-12 2021-08-18 Jesús Francisco Barberan Latorre Method and machine for producing reliefs, as well as panels containing said reliefs
CN111736435A (en) * 2020-07-23 2020-10-02 上海华力微电子有限公司 Photoetching device and exposure method thereof

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Also Published As

Publication number Publication date
US7279254B2 (en) 2007-10-09
CN101176039B (en) 2011-03-09
CN101176039A (en) 2008-05-07
EP1883858B1 (en) 2015-09-09
US20060257780A1 (en) 2006-11-16
JP2008541192A (en) 2008-11-20
EP1883858A2 (en) 2008-02-06
JP4971311B2 (en) 2012-07-11
WO2006124279A2 (en) 2006-11-23

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