WO2006116445A3 - Arc detection and handling in radio frequency power applications - Google Patents

Arc detection and handling in radio frequency power applications Download PDF

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Publication number
WO2006116445A3
WO2006116445A3 PCT/US2006/015716 US2006015716W WO2006116445A3 WO 2006116445 A3 WO2006116445 A3 WO 2006116445A3 US 2006015716 W US2006015716 W US 2006015716W WO 2006116445 A3 WO2006116445 A3 WO 2006116445A3
Authority
WO
WIPO (PCT)
Prior art keywords
arc
power
detection
handling
radio frequency
Prior art date
Application number
PCT/US2006/015716
Other languages
French (fr)
Other versions
WO2006116445A2 (en
Inventor
Zyl Gideon J Van
Original Assignee
Advanced Energy Ind Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Energy Ind Inc filed Critical Advanced Energy Ind Inc
Priority to KR1020077024782A priority Critical patent/KR101191103B1/en
Priority to EP06758605.7A priority patent/EP1872295B1/en
Priority to JP2008508000A priority patent/JP2008538852A/en
Priority to CN200680022298XA priority patent/CN101203858B/en
Priority to DE06758605T priority patent/DE06758605T1/en
Publication of WO2006116445A2 publication Critical patent/WO2006116445A2/en
Publication of WO2006116445A3 publication Critical patent/WO2006116445A3/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/3065—Plasma etching; Reactive-ion etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0203—Protection arrangements
    • H01J2237/0206—Extinguishing, preventing or controlling unwanted discharges

Abstract

A radio frequency power delivery system comprises an RF power generator, arc detection circuitry, and control logic responsive to the arc detection circuitry. A dynamic boundary is computed about the measured value of a parameter representative of or related to the power transferred from the power generator to a load. A subsequently measured value of the parameter that exceeds the computed dynamic boundary of the parameter indicates detection of an arc. Upon detection of an arc, power delivery from the generator is interrupted or adjusted, or other action is taken, until the arc is extinguished. By employing dynamic computation of arc detection boundaries, the invention allows for arc handling in RF power deliver systems regardless of whether the system has reached a stable power delivery condition.
PCT/US2006/015716 2005-04-22 2006-04-21 Arc detection and handling in radio frequency power applications WO2006116445A2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
KR1020077024782A KR101191103B1 (en) 2005-04-22 2006-04-21 Arc detection and handling in radio frequency power applications
EP06758605.7A EP1872295B1 (en) 2005-04-22 2006-04-21 Arc detection and handling in radio frequency power applications
JP2008508000A JP2008538852A (en) 2005-04-22 2006-04-21 Arc detection and handling in radio frequency power applications
CN200680022298XA CN101203858B (en) 2005-04-22 2006-04-21 Method, system and plasma processing system for transmitting radio frequency power
DE06758605T DE06758605T1 (en) 2005-04-22 2006-04-21 DETECTING AND TREATING LIGHT BOWS IN HIGH FREQUENCY SERVICE APPLICATIONS

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/112,113 2005-04-22
US11/112,113 US7305311B2 (en) 2005-04-22 2005-04-22 Arc detection and handling in radio frequency power applications

Publications (2)

Publication Number Publication Date
WO2006116445A2 WO2006116445A2 (en) 2006-11-02
WO2006116445A3 true WO2006116445A3 (en) 2007-04-19

Family

ID=37188116

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2006/015716 WO2006116445A2 (en) 2005-04-22 2006-04-21 Arc detection and handling in radio frequency power applications

Country Status (7)

Country Link
US (2) US7305311B2 (en)
EP (1) EP1872295B1 (en)
JP (1) JP2008538852A (en)
KR (1) KR101191103B1 (en)
CN (1) CN101203858B (en)
DE (1) DE06758605T1 (en)
WO (1) WO2006116445A2 (en)

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US7761247B2 (en) 2010-07-20
US20080156632A1 (en) 2008-07-03
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DE06758605T1 (en) 2008-06-05
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