WO2006107356A3 - Method of adding fabrication monitors to integrated circuit chips - Google Patents
Method of adding fabrication monitors to integrated circuit chips Download PDFInfo
- Publication number
- WO2006107356A3 WO2006107356A3 PCT/US2005/047083 US2005047083W WO2006107356A3 WO 2006107356 A3 WO2006107356 A3 WO 2006107356A3 US 2005047083 W US2005047083 W US 2005047083W WO 2006107356 A3 WO2006107356 A3 WO 2006107356A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- integrated circuit
- shapes
- monitors
- circuit chips
- fill
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Abstract
An integrated circuit, a method and a system for designing and a method fabricating the integrated circuit. The method including: (a) generating a photomask level design of an integrated circuit design (300) of the integrated circuit, the photomask level design comprising a multiplicity of integrated circuit element shapes; (b) designating regions of the photomask level design between adjacent integrated circuit element shapes, the designated regions large enough to require placement of fill shaped (305) between the adjacent integrated circuit elements based on fill shape rules (310), the fill shapes not required for the operation of the integrated circuit; and (c) placing one or more monitor structure shapes (320) of a monitor structure (315) in at least one of the designated regions, the monitor structure not required for the operation of the integrated circuit.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008504019A JP5052501B2 (en) | 2005-04-04 | 2005-12-22 | Method for adding a manufacturing monitor to an integrated circuit chip |
EP05855609.3A EP1869595B1 (en) | 2005-04-04 | 2005-12-22 | Method of adding fabrication monitors to integrated circuit chips |
CN2005800492611A CN101147148B (en) | 2005-04-04 | 2005-12-22 | Method of adding fabrication monitors to integrated circuit chips |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/907,494 | 2005-04-04 | ||
US10/907,494 US7240322B2 (en) | 2005-04-04 | 2005-04-04 | Method of adding fabrication monitors to integrated circuit chips |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2006107356A2 WO2006107356A2 (en) | 2006-10-12 |
WO2006107356A3 true WO2006107356A3 (en) | 2007-11-22 |
Family
ID=37072118
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2005/047083 WO2006107356A2 (en) | 2005-04-04 | 2005-12-22 | Method of adding fabrication monitors to integrated circuit chips |
Country Status (6)
Country | Link |
---|---|
US (3) | US7240322B2 (en) |
EP (1) | EP1869595B1 (en) |
JP (1) | JP5052501B2 (en) |
CN (1) | CN101147148B (en) |
TW (1) | TWI362598B (en) |
WO (1) | WO2006107356A2 (en) |
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US7240322B2 (en) * | 2005-04-04 | 2007-07-03 | International Business Machines Corporation | Method of adding fabrication monitors to integrated circuit chips |
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US8470674B2 (en) * | 2011-01-03 | 2013-06-25 | International Business Machines Corporation | Structure, method and system for complementary strain fill for integrated circuit chips |
TWI447887B (en) * | 2011-06-01 | 2014-08-01 | 矽品精密工業股份有限公司 | Circuit element via chain structure and layout method thereof |
US9524916B2 (en) * | 2012-10-31 | 2016-12-20 | International Business Machines Corporation | Structures and methods for determining TDDB reliability at reduced spacings using the structures |
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US10593604B1 (en) | 2015-12-16 | 2020-03-17 | Pdf Solutions, Inc. | Process for making semiconductor dies, chips, and wafers using in-line measurements obtained from DOEs of NCEM-enabled fill cells |
US10978438B1 (en) | 2015-12-16 | 2021-04-13 | Pdf Solutions, Inc. | IC with test structures and E-beam pads embedded within a contiguous standard cell area |
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US9929063B1 (en) | 2016-04-04 | 2018-03-27 | Pdf Solutions, Inc. | Process for making an integrated circuit that includes NCEM-Enabled, tip-to-side gap-configured fill cells, with NCEM pads formed from at least three conductive stripes positioned between adjacent gates |
US9653446B1 (en) | 2016-04-04 | 2017-05-16 | Pdf Solutions, Inc. | Integrated circuit containing standard logic cells and library-compatible, NCEM-enabled fill cells, including at least via-open-configured, AACNT-short-configured, TS-short-configured, and AA-short-configured, NCEM-enabled fill cells |
US9748153B1 (en) | 2017-03-29 | 2017-08-29 | Pdf Solutions, Inc. | Process for making and using a semiconductor wafer containing first and second does of standard cell compatible, NCEM-enabled fill cells, with the first DOE including side-to-side short configured fill cells, and the second DOE including tip-to-side short configure |
US9773774B1 (en) | 2017-03-30 | 2017-09-26 | Pdf Solutions, Inc. | Process for making and using a semiconductor wafer containing first and second DOEs of standard cell compatible, NCEM-enabled fill cells, with the first DOE including chamfer short configured fill cells, and the second DOE including corner short configured fill cells |
US9768083B1 (en) | 2017-06-27 | 2017-09-19 | Pdf Solutions, Inc. | Process for making and using a semiconductor wafer containing first and second DOEs of standard cell compatible, NCEM-enabled fill cells, with the first DOE including merged-via open configured fill cells, and the second DOE including snake open configured fill cells |
US9786649B1 (en) | 2017-06-27 | 2017-10-10 | Pdf Solutions, Inc. | Process for making and using a semiconductor wafer containing first and second DOEs of standard cell compatible, NCEM-enabled fill cells, with the first DOE including via open configured fill cells, and the second DOE including stitch open configured fill cells |
US10096530B1 (en) | 2017-06-28 | 2018-10-09 | Pdf Solutions, Inc. | Process for making and using a semiconductor wafer containing first and second DOEs of standard cell compatible, NCEM-enabled fill cells, with the first DOE including merged-via open configured fill cells, and the second DOE including stitch open configured fill cells |
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US7093213B2 (en) * | 2004-08-13 | 2006-08-15 | International Business Machines Corporation | Method for designing an integrated circuit defect monitor |
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-
2005
- 2005-04-04 US US10/907,494 patent/US7240322B2/en active Active
- 2005-12-22 CN CN2005800492611A patent/CN101147148B/en not_active Expired - Fee Related
- 2005-12-22 EP EP05855609.3A patent/EP1869595B1/en active Active
- 2005-12-22 WO PCT/US2005/047083 patent/WO2006107356A2/en active Application Filing
- 2005-12-22 JP JP2008504019A patent/JP5052501B2/en not_active Expired - Fee Related
-
2006
- 2006-04-03 TW TW095111771A patent/TWI362598B/en not_active IP Right Cessation
-
2007
- 2007-03-19 US US11/687,731 patent/US7323278B2/en active Active
- 2007-09-24 US US11/859,890 patent/US7620931B2/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6998866B1 (en) * | 2004-07-27 | 2006-02-14 | International Business Machines Corporation | Circuit and method for monitoring defects |
US7093213B2 (en) * | 2004-08-13 | 2006-08-15 | International Business Machines Corporation | Method for designing an integrated circuit defect monitor |
Also Published As
Publication number | Publication date |
---|---|
TWI362598B (en) | 2012-04-21 |
CN101147148A (en) | 2008-03-19 |
CN101147148B (en) | 2010-07-07 |
EP1869595B1 (en) | 2013-08-07 |
TW200705229A (en) | 2007-02-01 |
WO2006107356A2 (en) | 2006-10-12 |
JP2008535239A (en) | 2008-08-28 |
US20070160920A1 (en) | 2007-07-12 |
EP1869595A4 (en) | 2009-12-16 |
US7240322B2 (en) | 2007-07-03 |
EP1869595A2 (en) | 2007-12-26 |
US7323278B2 (en) | 2008-01-29 |
JP5052501B2 (en) | 2012-10-17 |
US20060225023A1 (en) | 2006-10-05 |
US20080017857A1 (en) | 2008-01-24 |
US7620931B2 (en) | 2009-11-17 |
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